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Indent Level
Color Curly Brackets (indicating CPC extensions to IPC)

CPC
COOPERATIVE PATENT CLASSIFICATION
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SEMICONDUCTOR DEVICES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR( use of semiconductor devices for measuring G01; resistors in general H01C; magnets, inductors
{
in general
}
, transformers H01F; capacitors in general H01G; electrolytic devices H01G 9/00 ; batteries, accumulators H01M; waveguides, resonators or lines of the waveguide type H01P; line connectors, current collectors H01R; stimulated emission devices H01S; electromechanical resonators H03H; loudspeakers, microphones, gramophone pick-ups or like acoustic electromechanical transducers H04R; electric light sources in general H05B; printed circuits, hybrid circuits, casings or constructional details of electric apparatus, manufacture of assemblages of electrical components H05K; use of semiconductor devices in circuits having a particular application, see the subclass for the application )
NOTE
-
This subclass covers electric solid state devices which are not provided for in any other subclass and details thereof. This includes:
- semiconductor devices adapted for rectifying, amplifying, oscillating or switching;
- semiconductor devices sensitive to radiation;
- electric solid state devices using thermoelectric,
superconductive, piezo-electric, electrostrictive,
magnetostrictive, galvano-magnetic or bulk negative
resistance effects and integrated circuit devices.
Also covered by this subclass are photo-resistors, magnetic field dependent resistors, field effect resistors, capacitors with potential-jump barrier, resistors with potential-jump barrier or surface barrier, incoherent light emitting diodes, electromechanical solid state transducers and thin-film or thick-film circuits. Furthermore, it provides for processes and apparatus adapted for the manufacture or treatment of such devices, except where such processes relate to single step processes for which provision exists elsewhere.

In this subclass:
The expression "solid state body" refers to the body of material within which, or at the surface of which, the physical effects characteristic of the device occur. In thermoelectric devices it includes all materials in the current path.
Regions in or on the body of the device (other than the solid state body itself), which exert an influence on the solid state body electrically, are considered to be "electrodes" whether or not an external electrical connection is made thereto.
{
Electrodes are often referred to as "contacts" in the literature.
}
An electrode may include several portions and the term includes metallic regions which exert influence on the solid state body through an insulating region, (e.g. capacitive coupling) and inductive coupling arrangements to the body. The dielectric region in a capacitive arrangement is regarded as part of the electrode. In arrangements including several portions only those portions which exert an influence on the solid state body by virtue of their shape, size or disposition or the material of which they are formed are considered to be part of the electrode. The other portions are considered to be "arrangements for conducting electric current to or from the solid state body" or "interconnections between solid state components formed in or on a common substrate", i.e. leads.
The word "device" refers to an electric circuit element; where an electric circuit element is one of a plurality or elements formed in or on a common substrate it is referred to as a "component".
A "complete device" is a device in its fully assembled state which may or may not require further treatment, e.g. electro-forming, before it is ready for use but which does not require the addition of further structural units.
The word "parts" includes all structural units which are included in a complete device.
A "container" is an enclosure forming part of the complete device and is essentially a solid construction in which the body of the device is placed, or which is formed around the body without forming an intimate layer thereon. An enclosure which consists of one or more layers formed on the body and in intimate contact therewith is referred to as an "encapsulation".
"Integrated circuit" is a device where all components, e.g. diodes, resistors, are built up on a common substrate and form the device including interconnections between the components.

"Integration processes" are processes for the manufacture of at least two different components where the process is especially adapted to their integration, e.g. to take advantage of it or to reduce their manufacturing cost.
Example: in a CMOS process, the same ion implant dopes the p-MOS gate and the n-MNOS source and drain.
Consequently, a process for the manufacture of a component per se is not considered as an integration process, even though that component will be part of an integrated circuit.
"Assembly" of a device is the building up of the device from its component constructional units and includes the provision of fillings in containers.
When referring to the periodic table of the elements, either the new IUPAC notation, i.e. numbering system from 1 to 18, or the previous IUPAC form may be used to indicate an element group, e.g. group IV elements according to the previous IUPAC form correspond to group 14 elements according to the new notation

WARNING
-
The following IPC groups are not used in the CPC scheme. Subject matter covered by these groups is classified in the following CPC groups
H01L21/301 covered by H01L 21/30
H01L21/328 covered by H01L 29/66075H01L21/329 covered by H01L 29/66083H01L21/33 covered by H01L 29/66227H01L21/331 covered by H01L 29/66234H01L21/332 covered by H01L 29/66363H01L21/334 covered by H01L 29/66075H01L21/335 covered by H01L 29/66409H01L21/336 covered by H01L 29/66477H01L21/337 covered by H01L 29/66893H01L21/338 covered by H01L 29/66848H01L21/339 covered by H01L 29/66946H01L 21/58 covered by H01L 24/80
H01L 21/8239 covered by H01L 27/1052H01L21/60 covered by H01L 24/80
H01L21/66 covered by H01L 22/34H01L21/603 covered by H01L 24/80
H01L21/607 covered by H01L 24/80
H01L21/8242 covered by H01L 27/10844
H01L21/8244 covered by H01L 27/11H01L21/8246 covered by H01L 27/112H01L21/8247 covered by H01L 27/11517H01L21/98 covered by H01L 25/50
H01L29/38 covered by H01L 29/04 to H01L29/36D
H01L29/96 covered by H01L 29/68 to H01L 29/945H01L51/30 covered by H01L 51/0032
H01L51/40 covered by H01L51/00A
H01L51/46 covered by H01L 51/0032
H01L51/48 covered by H01L51/00A
H01L51/54 covered by H01L 51/0032

Groups H01L 23/562 to H01L 23/576 do not correspond to former or current IPC groups. Concordance CPC : IPC for these groups is as follows: - H01L 23/562 - H01L 23/564 : H01L 23/00 - H01L 23/57 : H01L 23/58

Groups H01L 22/00 to H01L 22/34 do not correspond to a former or current IPC group. Concordance CPC : IPC for these groups is as follows: - H01L 22/00 - H01L 22/34 : H01L21/66

Groups H01L 24/00 to H01L 24/98 do not correspond to former or current IPC groups. Concordance CPC : IPC for these groups is as follows: - H01L 24/00 - H01L 24/98 : H01L 23/00

Group H01L 25/50 does not correspond to a former or current IPC group. Concordance CPC : IPC for this group is as follows: - H01L 25/50 : H01L21/98

Groups H01L 28/00 - H01L 28/92 do not correspond to former or current IPC groups. Concordance CPC : IPC for these groups is as follows: - H01L 28/00 - H01L 28/92 : H01L 49/02

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Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof(
{
testing or measuring during manufacture or treatment, or reliability measurements H01L 22/00 ; multistep manufacturing processes for passive two-terminal components without a potential-jump or surface barrier for integrated circuits H01L 28/00 ;
}
( processes or apparatus peculiar to the manufacture or treatment of devices provided for in groups H01L 31/00 to H01L 51/00 or of parts thereof, see these groups; single-step processes covered by other subclasses, see the relevant subclasses, e.g. C23C, C30B; photomechanical production of textured or patterned surfaces, materials or originals therefor, apparatus specially adapted therefor, in general G03F ) )
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H01L 21/02
.
Manufacture or treatment of semiconductor devices or of parts thereof
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. .
{
Preparing wafers
}
NOTE
-
1. This group covers processes for manufacturing wafers prior to the fabrication of any device, i.e. between the sawing of ingots (covered by B28D) and the cleaning of substrates (covered by H01L 21/02 F).
2. This group does not cover:
- simple use of grinding or polishing machines B24B
- thermal smoothening H01L 21/324

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. . .
{
Preparing bulk and homogeneous wafers
}
WARNING
-
Not complete, see H01L 21/30 and subgroups

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H01L 21/02008
. . . .
{
Multistep processes
}
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. . . . .
{
Specific process step
}
. . . . . .
{
Grinding, lapping
}
. . . . . .
{
Backside treatment
}
. . . . . .
{
Chemical etching
}
. . . . . .
{
Edge treatment, chamfering
}
. . . . . .
{
Mirror polishing
}
. . . .
{
Setting crystal orientation
}
. . . .
{
Making porous regions on the surface
}
. . . .
{
by reclaiming or re-processing
}
. . . .
{
Shaping
}
. . .
{
Preparing wafers having an insulating layer, e.g. SOI wafers
}
WARNING
-
Not complete, see H01L 21/7624 and subgroups

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. .
{
Cleaning
}
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. . .
{
Cleaning before device manufacture, i.e. Begin-Of-Line process
}
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. . . .
{
Dry cleaning only( H01L 21/02085 takes precedence )
}
H01L 21/02049
. . . . .
{
with gaseous HF
}
. . . .
{
Wet cleaning only( H01L 21/02085 takes precedence )
}
. . . .
{
combining dry and wet cleaning steps( H01L 21/02085 takes precedence )
}
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. . .
{
Cleaning during device manufacture
}
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. . . .
{
during, before or after processing of insulating layers
}
H01L 21/02063
. . . . .
{
the processing being the formation of vias or contact holes
}
H01L 21/02065
. . . . .
{
the processing being a planarization of insulating layers
}
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H01L 21/02068
. . . .
{
during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
}
H01L 21/02071
. . . . .
{
the processing being a delineation, e.g. RIE, of conductive layers
}
H01L 21/02074
. . . . .
{
the processing being a planarization of conductive layers
}
H01L 21/02076
. . .
{
Cleaning after the substrates have been singulated
}
. . .
{
Cleaning for reclaiming
}
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. . .
{
product to be cleaned
}
H01L 21/02085
. . . .
{
Cleaning of diamond
}
. . . .
{
Cleaning of wafer edges
}
. . . .
{
Cleaning of wafer backside
}
H01L 21/02093
. . . .
{
Cleaning of porous materials
}
. . .
{
only mechanical cleaning
}
. . .
{
only involving lasers, e.g. laser ablation
}
. . .
{
only involving supercritical fluids
}
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. .
{
Forming layers( deposition in general C23C; crystal growth in general C30B )
}
WARNING
-
Group H01L 21/02104 and subgroups are not complete pending reorganisation. See also groups H01L 21/20 , H01L 21/36 , H01L 21/06 , H01L 21/16 and subgroups

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. . .
{
Forming insulating materials on a substrate
}
WARNING
-
This group and subgroups are not complete pending the completion of a reclassification; see also H01L 21/312 , H01L 21/314 , H01L 21/316 , and H01L 21/318 and subgroups thereof

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H01L 21/02109
. . . .
{
characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
}
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. . . . .
{
characterised by the material of the layer
}
NOTE
-
Layers comprising sublayers, i.e. multi-layers, are additionally classified in H01L 21/022 ; porous layers are additionally classified in H01L 21/02203

. . . . . .
{
the material being carbon, e.g. alpha-C, diamond or hydrogen doped carbon
}
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. . . . . .
{
carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC( polymers per se C08G, photoresist per se G03F )
}
H01L 21/0212
. . . . . . .
{
the material being fluoro carbon compounds, e.g.( CFx )
}
n,(CHxFy)n or polytetrafluoroethylene]
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H01L 21/02123
. . . . . .
{
the material containing silicon
}
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H01L 21/02126
. . . . . . .
{
the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
}
. . . . . . . .
{
the material being boron or phosphorus doped silicon oxides, e.g. BPSG, BSG or PSG
}
NOTE
-
Halogen, e.g. fluorine, containing BPSG, PSG, BSG, and the like, are additionally classified in H01L 21/02131

H01L 21/02131
. . . . . . . .
{
the material being halogen doped silicon oxides, e.g. FSG
}
H01L 21/02134
. . . . . . . .
{
the material comprising hydrogen silsesquioxane, e.g. HSQ
}
H01L 21/02137
. . . . . . . .
{
the material comprising alkyl silsesquioxane, e.g. MSQ
}
H01L 21/0214
. . . . . . . .
{
the material being a silicon oxynitride, e.g. SiON or SiON:H
}
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H01L 21/02142
. . . . . . .
{
the material containing silicon and at least one metal element, e.g. metal silicate based insulators or metal silicon oxynitrides
}
H01L 21/02145
. . . . . . . .
{
the material containing aluminium, e.g. AlSiOx
}
H01L 21/02148
. . . . . . . .
{
the material containing hafnium, e.g. HfSiOx or HfSiON
}
H01L 21/0215
. . . . . . . .
{
the material containing tantalum, e.g. TaSiOx
}
H01L 21/02153
. . . . . . . .
{
the material containing titanium, e.g. TiSiOx
}
H01L 21/02156
. . . . . . . .
{
the material containing at least one rare earth element, e.g. silicate of lanthanides, scandium or yttrium
}
H01L 21/02159
. . . . . . . .
{
the material containing zirconium, e.g. ZrSiOx
}
H01L 21/02161
. . . . . . . .
{
the material containing more than one metal element
}
. . . . . . .
{
the material being a silicon oxide, e.g. SiO2
}
NOTE
-
The formation of silicon oxide layers is classified in this group regardless of the precursor or of the process of formation; in case of explicit statements on doping, on rest-groups, or on material components see H01L 21/02126 and subgroups; deposition of silicon oxide from organic precursors without further statements on film composition is classified here and in H01L 21/02205 and subgroups

. . . . . . .
{
the material being a silicon carbide not containing oxygen, e.g. SiC, SiC:H or silicon carbonitrides( H01L 21/02126 and H01L 21/0214 take precedence )
}
. . . . . . .
{
the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz( H01L 21/02126 and H01L 21/0214 take precedence )
}
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. . . . . .
{
the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides( materials containing silicon H01L 21/02123 ; metal silicates H01L 21/02142 )
}
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. . . . . . .
{
characterised by the metal( H01L 21/02197 takes precedence )
}
H01L 21/02178
. . . . . . . .
{
the material containing aluminium, e.g. Al2O3
}
H01L 21/02181
. . . . . . . .
{
the material containing hafnium, e.g. HfO2
}
H01L 21/02183
. . . . . . . .
{
the material containing tantalum, e.g. Ta2O5
}
H01L 21/02186
. . . . . . . .
{
the material containing titanium, e.g. TiO2
}
H01L 21/02189
. . . . . . . .
{
the material containing zirconium, e.g. ZrO2
}
H01L 21/02192
. . . . . . . .
{
the material containing at least one rare earth metal element, e.g. oxides of lanthanides, scandium or yttrium
}
H01L 21/02194
. . . . . . . .
{
the material containing more than one metal element
}
. . . . . . .
{
the material having a perovskite structure, e.g. BaTiO3
}
. . . . .
{
the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides( adhesion layers or buffer layers H01L 21/02304 , H01L 21/02362 )
}
H01L 21/02203
. . . . .
{
the layer being porous
}
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H01L 21/02205
. . . . .
{
the layer being characterised by the precursor material for deposition
}
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H01L 21/02208
. . . . . .
{
the precursor containing a compound comprising Si
}
H01L 21/02211
. . . . . . .
{
the compound being a silane, e.g. disilane, methylsilane or chlorosilane
}
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. . . . . . .
{
the compound comprising silicon and oxygen
}
NOTE
-
This group does not cover mixtures of a silane and oxygen

. . . . . . . .
{
the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
}
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. . . . . . .
{
the compound comprising silicon and nitrogen
}
NOTE
-
This group does not cover mixtures of silane and nitrogen

H01L 21/02222
. . . . . . . .
{
the compound being a silazane
}
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H01L 21/02225
. . . .
{
characterised by the process for the formation of the insulating layer
}
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. . . . .
{
formation by a process other than a deposition process
}
NOTE
-
Subject matter classified in the range of H01L 21/0223 to H01L 21/02249 is additionally classified in H01L 21/02249 , H01L 21/02255 and H01L 21/02252 , depending on the type of reaction

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H01L 21/0223
. . . . . .
{
formation by oxidation, e.g. oxidation of the substrate
}
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H01L 21/02233
. . . . . . .
{
of the semiconductor substrate or a semiconductor layer
}
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H01L 21/02236
. . . . . . . .
{
group IV semiconductor
}
H01L 21/02238
. . . . . . . . .
{
silicon in uncombined form, i.e. pure silicon
}
H01L 21/02241
. . . . . . . .
{
III-V semiconductor
}
H01L 21/02244
. . . . . . .
{
of a metallic layer
}
H01L 21/02247
. . . . . .
{
formation by nitridation, e.g. nitridation of the substrate
}
H01L 21/02249
. . . . . .
{
formation by combined oxidation and nitridation performed simultaneously
}
. . . . . .
{
formation by plasma treatment, e.g. plasma oxidation of the substrate( after treatment of an insulating film by plasma H01L 21/3105 and subgroups )
}
. . . . . .
{
formation by thermal treatment( H01L 21/02252 takes precedence; after treatment of an insulating film H01L 21/3105 and subgroups )
}
H01L 21/02258
. . . . . .
{
formation by anodic treatment, e.g. anodic oxidation
}
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H01L 21/0226
. . . . .
{
formation by a deposition process( per se C23C )
}
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. . . . . .
{
deposition from the gas or vapour phase
}
NOTE
-
This group and subgroups also cover deposition methods in which the gas or vapour is produced by physical means, e.g. ablation from targets or heating of source material

. . . . . . .
{
deposition by physical ablation of a target, e.g. sputtering, reactive sputtering, physical vapour deposition or pulsed laser deposition
}
. . . . . . .
{
deposition by thermal evaporation, H01L 21/02293 takes precedence
}
NOTE
-
Subject matter relating to molecular beam epitaxy is classified in this group

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. . . . . . .
{
deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition( H01L 21/02266 takes precedence )
}
H01L 21/02274
. . . . . . . .
{
in the presence of a plasma (PECVD)
}
H01L 21/02277
. . . . . . . .
{
the reactions being activated by other means than plasma or thermal, e.g. photo-CVD
}
. . . . . . . .
{
deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
}
NOTE
-
Subject matter relating to cyclic plasma CVD is additionally classified in H01L 21/02274

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H01L 21/02282
. . . . . .
{
liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
}
H01L 21/02285
. . . . . . .
{
Langmuir-Blodgett techniques
}
. . . . . . .
{
printing, e.g. ink-jet printing( per se B41J )
}
H01L 21/0229
. . . . . . .
{
liquid atomic layer deposition
}
. . . . . .
{
formation of epitaxial layers by a deposition process( epitaxial growth per se C30B )
}
NOTE
-
Formation of non-epitaxial layers by MBE, ALE, etc. is not covered by this group; for MBE see H01L 21/02269 ; for ALE see H01L 21/0228

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. . . .
{
characterised by the treatment performed before or after the formation of the layer( H01L 21/02227 and subgroups take precedence )
}
NOTE
-
This group and subgroups only cover processes which are directly linked to the layer formation; routine anneals, i.e. thermal treatment without further features like a special atmosphere, presence of a plasma, thermally induced chemical reactions, change of phase (crystal structure) etc. are not classified here; for cleaning see H01L 21/02041 and subgroups; for etching processes see H01L 21/311 and subgroups; for planarization processes see H01L 21/31051 and subgroups; for processes to repair etch damage see H01L 21/3105 and subgroups

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. . . . .
{
pre-treatment
}
NOTE
-
This group and subgroups cover treatments to improve adhesion or change the surface termination; for etching see H01L 21/306 and subgroups and H01L 21/311 and subgroups

. . . . . .
{
in-situ cleaning
}
NOTE
-
Subject matter relating to the cleaning processes for semiconductor devices in general is covered by H01L 21/02041 and subgroups

H01L 21/02304
. . . . . .
{
formation of intermediate layers, e.g. buffer layers, layers to improve adhesion, lattice match or diffusion barriers
}
H01L 21/02307
. . . . . .
{
treatment by exposure to a liquid
}
H01L 21/0231
. . . . . .
{
treatment by exposure to electromagnetic radiation, e.g. UV light
}
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H01L 21/02312
. . . . . .
{
treatment by exposure to a gas or vapour
}
H01L 21/02315
. . . . . . .
{
treatment by exposure to a plasma
}
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. . . . .
{
post-treatment
}
NOTE
-
This group only covers processes that are part of the layer formation; treatments which are performed after completion of the insulating layer are covered by H01L 21/3105 and subgroups

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. . . . . .
{
introduction of substances into an already existing insulating layer; H01L 21/02227 and subgroups take precedence
}
NOTE
-
processes like the introduction of phosphorus into silicon oxide by diffusion, or doping of an already existing insulating layer are covered by this group and subgroups; for the method of introduction, see H01L 21/02337 , H01L 21/02343 , H01L 21/02345 and subgroups

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H01L 21/02323
. . . . . . .
{
introduction of oxygen
}
. . . . . . . .
{
into a nitride layer, e.g. changing SiN to SiON
}
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H01L 21/02329
. . . . . . .
{
introduction of nitrogen
}
. . . . . . . .
{
into an oxide layer, e.g. changing SiO to SiON
}
. . . . . .
{
in-situ cleaning after layer formation, e.g. removing process residues( cleaning compositions per se C30D; cleaning in general B08B )
}
NOTE
-
Subject matter relating to the cleaning processes for semiconductor devices in general is covered by H01L 21/02041 and subgroups

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H01L 21/02337
. . . . . .
{
treatment by exposure to a gas or vapour
}
H01L 21/0234
. . . . . . .
{
treatment by exposure to a plasma
}
H01L 21/02343
. . . . . .
{
treatment by exposure to a liquid
}
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H01L 21/02345
. . . . . .
{
treatment by exposure to radiation, e.g. visible light
}
H01L 21/02348
. . . . . . .
{
treatment by exposure to UV light
}
H01L 21/02351
. . . . . . .
{
treatment by exposure to corpuscular radiation, e.g. exposure to electrons, alpha-particles, protons or ions
}
H01L 21/02354
. . . . . . .
{
using a coherent radiation, e.g. a laser
}
H01L 21/02356
. . . . . .
{
treatment to change the morphology of the insulating layer, e.g. transformation of an amorphous layer into a crystalline layer
}
H01L 21/02359
. . . . . .
{
treatment to change the surface groups of the insulating layer
}
H01L 21/02362
. . . . . .
{
formation of intermediate layers, e.g. capping layers or diffusion barriers
}
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. . .
{
Forming inorganic semiconducting materials on a substrate( for light-sensitive devices H01L 31/00 )
}
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H01L 21/02367
. . . .
{
Substrates
}
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H01L 21/0237
. . . . .
{
Materials
}
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H01L 21/02373
. . . . . .
{
Group 14 semiconducting materials
}
H01L 21/02376
. . . . . . .
{
Carbon, e.g. diamond-like carbon
}
H01L 21/02378
. . . . . . .
{
Silicon carbide
}
H01L 21/02381
. . . . . . .
{
Silicon, silicon germanium, germanium
}
H01L 21/02384
. . . . . . .
{
including tin
}
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H01L 21/02387
. . . . . .
{
Group 13/15 materials
}
H01L 21/02389
. . . . . . .
{
Nitrides
}
H01L 21/02392
. . . . . . .
{
Phosphides
}
H01L 21/02395
. . . . . . .
{
Arsenides
}
H01L 21/02398
. . . . . . .
{
Antimonides
}
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H01L 21/024
. . . . . .
{
Group 12/16 materials
}
H01L 21/02403
. . . . . . .
{
Oxides
}
H01L 21/02406
. . . . . . .
{
Sulfides
}
H01L 21/02409
. . . . . . .
{
Selenides
}
H01L 21/02411
. . . . . . .
{
Tellurides
}
H01L 21/02414
. . . . . .
{
Oxide semiconducting materials not being Group 12/16 materials, e.g. ternary compounds
}
H01L 21/02417
. . . . . .
{
Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
}
H01L 21/0242
. . . . . .
{
Crystalline insulating materials
}
H01L 21/02422
. . . . . .
{
Non-crystalline insulating materials, e.g. glass, polymers
}
H01L 21/02425
. . . . . .
{
Conductive materials, e.g. metallic silicides
}
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H01L 21/02428
. . . . .
{
Structure
}
H01L 21/0243
. . . . . .
{
Surface structure
}
H01L 21/02433
. . . . .
{
Crystal orientation
}
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H01L 21/02436
. . . .
{
Intermediate layers between substrates and deposited layers
}
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H01L 21/02439
. . . . .
{
Materials
}
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H01L 21/02441
. . . . . .
{
Group 14 semiconducting materials
}
H01L 21/02444
. . . . . . .
{
Carbon, e.g. diamond-like carbon
}
H01L 21/02447
. . . . . . .
{
Silicon carbide
}
H01L 21/0245
. . . . . . .
{
Silicon, silicon germanium, germanium
}
H01L 21/02452
. . . . . . .
{
including tin
}
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H01L 21/02455
. . . . . .
{
Group 13/15 materials
}
H01L 21/02458
. . . . . . .
{
Nitrides
}
H01L 21/02461
. . . . . . .
{
Phosphides
}
H01L 21/02463
. . . . . . .
{
Arsenides
}
H01L 21/02466
. . . . . . .
{
Antimonides
}
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H01L 21/02469
. . . . . .
{
Group 12/16 materials
}
H01L 21/02472
. . . . . . .
{
Oxides
}
H01L 21/02474
. . . . . . .
{
Sulfides
}
H01L 21/02477
. . . . . . .
{
Selenides
}
H01L 21/0248
. . . . . . .
{
Tellurides
}
H01L 21/02483
. . . . . .
{
Oxide semiconducting materials not being Group 12/16 materials, e.g. ternary compounds
}
H01L 21/02485
. . . . . .
{
Other chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
}
H01L 21/02488
. . . . . .
{
Insulating materials
}
H01L 21/02491
. . . . . .
{
Conductive materials
}
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H01L 21/02494
. . . . .
{
Structure
}
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H01L 21/02496
. . . . . .
{
Layer structure
}
H01L 21/02499
. . . . . . .
{
Monolayers
}
H01L 21/02502
. . . . . . .
{
consisting of two layers
}
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H01L 21/02505
. . . . . . .
{
consisting of more than two layers
}
H01L 21/02507
. . . . . . . .
{
Alternating layers, e.g. superlattice
}
H01L 21/0251
. . . . . . .
{
Graded layers
}
H01L 21/02513
. . . . . .
{
Microstructure
}
H01L 21/02516
. . . . .
{
Crystal orientation
}
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H01L 21/02518
. . . .
{
Deposited layers
}
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H01L 21/02521
. . . . .
{
Materials
}
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H01L 21/02524
. . . . . .
{
Group 14 semiconducting materials
}
H01L 21/02527
. . . . . . .
{
Carbon, e.g. diamond-like carbon
}
H01L 21/02529
. . . . . . .
{
Silicon carbide
}
H01L 21/02532
. . . . . . .
{
Silicon, silicon germanium, germanium
}
H01L 21/02535
. . . . . . .
{
including tin
}
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H01L 21/02538
. . . . . .
{
Group 13/15 materials
}
H01L 21/0254
. . . . . . .
{
Nitrides
}
H01L 21/02543
. . . . . . .
{
Phosphides
}
H01L 21/02546
. . . . . . .
{
Arsenides
}
H01L 21/02549
. . . . . . .
{
Antimonides
}
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H01L 21/02551
. . . . . .
{
Group 12/16 materials
}
H01L 21/02554
. . . . . . .
{
Oxides
}
H01L 21/02557
. . . . . . .
{
Sulfides
}
H01L 21/0256
. . . . . . .
{
Selenides
}
H01L 21/02562
. . . . . . .
{
Tellurides
}
H01L 21/02565
. . . . . .
{
Oxide semiconducting materials not being Group 12/16 materials, e.g. ternary compounds
}
H01L 21/02568
. . . . . .
{
Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
}
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H01L 21/0257
. . . . .
{
Doping during depositing
}
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H01L 21/02573
. . . . . .
{
Conductivity type
}
H01L 21/02576
. . . . . . .
{
N-type
}
H01L 21/02579
. . . . . . .
{
P-type
}
H01L 21/02581
. . . . . . .
{
Transition metal or rare earth elements
}
H01L 21/02584
. . . . . .
{
Delta-doping
}
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H01L 21/02587
. . . . .
{
Structure
}
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H01L 21/0259
. . . . . .
{
Microstructure
}
H01L 21/02592
. . . . . . .
{
amorphous
}
H01L 21/02595
. . . . . . .
{
polycrystalline
}
H01L 21/02598
. . . . . . .
{
monocrystalline
}
H01L 21/02601
. . . . . . .
{
Nanoparticles( fullerenes H01L 51/0046 )
}
H01L 21/02603
. . . . . . .
{
Nanowires
}
. . . . . . .
{
Nanotubes( carbon nanotubes H01L 51/0048 )
}
H01L 21/02609
. . . . .
{
Crystal orientation
}
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H01L 21/02612
. . . .
{
Formation types
}
H01L 21/02614
. . . . .
{
Transformation of metal, e.g. oxidation, nitridation
}
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H01L 21/02617
. . . . .
{
Deposition types
}
H01L 21/0262
. . . . . .
{
Reduction or decomposition of gaseous compounds, e.g. CVD
}
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H01L 21/02623
. . . . . .
{
Liquid deposition
}
H01L 21/02625
. . . . . . .
{
using melted materials
}
H01L 21/02628
. . . . . . .
{
using solutions
}
H01L 21/02631
. . . . . .
{
Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
}
H01L 21/02634
. . . . . .
{
Homoepitaxy
}
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H01L 21/02636
. . . . . .
{
Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
}
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H01L 21/02639
. . . . . . .
{
Preparation of substrate for selective deposition
}
H01L 21/02642
. . . . . . . .
{
Mask materials other than SiO2 or SiN
}
H01L 21/02645
. . . . . . . .
{
Seed materials
}
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H01L 21/02647
. . . . . . .
{
Lateral overgrowth
}
H01L 21/0265
. . . . . . . .
{
Pendeoepitaxy
}
H01L 21/02653
. . . . . . .
{
Vapour-liquid-solid growth
}
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H01L 21/02656
. . . .
{
Special treatments
}
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. . . . .
{
Pretreatments( cleaning in general H01L 21/02041 )
}
H01L 21/02661
. . . . . .
{
In-situ cleaning
}
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. . . . .
{
Aftertreatments( planarisation in general H01L 21/304 )
}
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H01L 21/02667
. . . . . .
{
Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
}
H01L 21/02669
. . . . . . .
{
using crystallisation inhibiting elements
}
H01L 21/02672
. . . . . . .
{
using crystallisation enhancing elements
}
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H01L 21/02675
. . . . . . .
{
using laser beams
}
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H01L 21/02678
. . . . . . . .
{
Beam shaping, e.g. using a mask
}
H01L 21/0268
. . . . . . . . .
{
Shape of mask
}
H01L 21/02683
. . . . . . . .
{
Continuous wave laser beam
}
H01L 21/02686
. . . . . . . .
{
Pulsed laser beam
}
H01L 21/02689
. . . . . . .
{
using particle beams
}
H01L 21/02691
. . . . . . .
{
Scanning of a beam
}
H01L 21/02694
. . . . . .
{
Controlling the interface between substrate and epitaxial layer, e.g. by ion implantation followed by annealing
}
. . .
{
Forming conducting materials on a substrate
}
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. .
Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L 21/18 or H01L 21/34
{
( photographic masks or originals per se G03F 1/00 ; registration or positioning of photographic masks or originals G03F 9/00 ; photographic cameras G03B; control of position G05D 3/00 )
}
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. . .
{
comprising organic layers
}
H01L 21/0272
. . . .
{
for lift-off processes
}
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. . . .
{
characterised by the treatment of photoresist layers
}
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H01L 21/0274
. . . . .
{
Photolithographic processes
}
H01L 21/0275
. . . . . .
{
using lasers
}
. . . . . .
{
using an anti-reflective coating( anti-reflective coating for lithography in general G03F 7/09 )
}
. . . . .
{
Electrolithographic processes
}
. . . . .
{
Röntgenlithographic or X-ray lithographic processes
}
H01L 21/0279
. . . . .
{
Ionlithographic processes
}
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. . .
comprising inorganic layers
. . . .
{
for lift-off processes
}
H01L 21/0332
. . . .
{
characterised by their composition, e.g. multilayer masks, materials
}
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. . . .
{
characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
}
. . . . .
{
characterised by their behaviour during the process, e.g. soluble masks, redeposited masks
}
. . . . .
{
characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
}
. . . . .
{
Process specially adapted to improve the resolution of the mask
}
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. .
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
{
( multistep processes specially adapted for the manufacture of said devices H01L 29/66007 , H01L 29/401 ; details of semiconductor bodies H01L 29/02 )
}
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. . .
{
the devices having semiconductor bodies comprising semiconducting carbon, e.g. diamond, diamond-like carbon( multistep processes for the manufacture of said devices H01L 29/66015 )
}
NOTE
-
This group covers passivation

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H01L 21/041
. . . .
{
Making n- or p-doped regions
}
H01L 21/0415
. . . . .
{
using ion implantation
}
H01L 21/042
. . . .
N: Changing their shape, e.g. forming recesses( etching of the semiconductor body H01L 21/302 )]
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H01L 21/0425
. . . .
{
Making electrodes
}
H01L 21/043
. . . . .
{
Ohmic electrodes
}
H01L 21/0435
. . . . .
{
Schottky electrodes
}
H01L 21/044
. . . . .
{
Conductor-insulator-semiconductor electrodes
}
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. . .
{
the devices having semiconductor bodies comprising crystalline silicon carbide( multistep processes for the manufacture of said devices H01L 29/66053 )
}
H01L 21/045
. . . .
{
passivating silicon carbide surfaces
}
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H01L 21/0455
. . . .
{
Making n or p doped regions or layers, e.g. using diffusion
}
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. . . . .
{
using ion implantation
}
NOTE
-
Processes where ion implantation of boron and subsequent annealing does not produce a p-doped region are classified elsewhere, e.g. H01L 21/0445

H01L 21/0465
. . . . . .
{
using masks
}
H01L 21/047
. . . . . .
{
characterised by the angle between the ion beam and the crystal planes or the main crystal surface
}
H01L 21/0475
. . . .
{
Changing the shape of the semiconductor body, e.g. forming recesses,( etching of the semiconductor body H01L 21/302 )
}
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H01L 21/048
. . . .
{
Making electrodes
}
H01L 21/0485
. . . . .
{
Ohmic electrodes
}
H01L 21/049
. . . . .
{
Conductor-insulator-semiconductor electrodes, e.g. MIS contacts
}
H01L 21/0495
. . . . .
{
Schottky electrodes
}
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H01L 21/06
. . .
the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
WARNING
-
This group is no longer used for the classification of new documents as from December 1, 2009. The backlog of this group is being continuously reclassified to H01L 21/02365 and subgroups

H01L 21/08
. . . .
Preparation of the foundation plate
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H01L 21/10
. . . .
Preliminary treatment of the selenium or tellurium, its application to the foundation plate, or the subsequent treatment of the combination
H01L 21/101
. . . . .
{
Application of the selenium or tellurium to the foundation plate
}
H01L 21/103
. . . . .
Conversion of the selenium or tellurium to the conductive state
H01L 21/105
. . . . .
Treatment of the surface of the selenium or tellurium layer after having been made conductive
H01L 21/108
. . . . .
Provision of discrete insulating layers, i.e. non-genetic barrier layers
H01L 21/12
. . . .
Application of an electrode to the exposed surface of the selenium or tellurium after the selenium or tellurium has been applied to the foundation plate
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H01L 21/14
. . . .
Treatment of the complete device, e.g. by electroforming to form a barrier
H01L 21/145
. . . . .
Ageing
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H01L 21/16
. . .
the devices having semiconductor bodies comprising cuprous oxide or cuprous iodide
WARNING
-
This group is no longer used for the classification of new documents as from December 1, 2009. The backlog of this group is being continuously reclassified to H01L 21/02365 and subgroups]

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H01L 21/161
. . . .
{
Preparation of the foundation plate, preliminary treatment oxidation of the foundation plate, reduction treatment
}
H01L 21/162
. . . . .
{
Preliminary treatment of the foundation plate
}
. . . . .
{
Oxidation and subsequent heat treatment of the foundation plate( H01L 21/165 takes precedence )
}
H01L 21/165
. . . . .
{
Reduction of the copper oxide, treatment of the oxide layer
}
H01L 21/167
. . . . .
{
Application of a non-genetic conductive layer
}
H01L 21/168
. . . .
{
Treatment of the complete device, e.g. electroforming, ageing
}
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. . .
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
{
( H01L 21/041 to H01L 21/0425 , H01L 21/045 to H01L 21/048 take precedence )
}
NOTE
-
This group covers also processes and apparatus which, by using the appropriate technology, are clearly suitable for manufacture or treatment of devices whose bodies comprise elements of the fourth group of the Periodic System or AIIIBV compounds, even if the material used is not explicitly specified.

H01L 21/182
. . . .
{
Intermixing or interdiffusion or disordering of III-V heterostructures, e.g. IILD
}
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. . . .
{
Joining of semiconductor bodies for junction formation
}
. . . . .
{
by direct bonding
}
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. . . .
Deposition of semiconductor materials on a substrate, e.g. epitaxial growth
{
solid phase epitaxy
}
WARNING
-
This group is no longer used for the classification of new documents as from December 1, 2009. The backlog of this group is being continuously reclassified to H01L 21/02365 and subgroups

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H01L 21/2003
. . . . .
{
Characterised by the substrate( H01L 21/203 , H01L 21/205 , H01L 21/208 take precedence )
}
H01L 21/2007
. . . . . .
{
Bonding of semiconductor wafers to insulating substrates or to semiconducting substrates using an intermediate insulating layer( H01L 21/2011 takes precedence; bonding of semiconductor wafers to semiconductor wafers for junction formation H01L 21/187 )
}
H01L 21/2011
. . . . . .
{
the substrate being of crystalline insulating material, e.g. sapphire
}
H01L 21/2015
. . . . . .
{
the substrate being of crystalline semiconductor material, e.g. lattice adaptation, heteroepitaxy
}
H01L 21/2018
. . . . .
{
Selective epilaxial growth, e.g. simultaneous deposition of mono - and non-mono semiconductor materials
}
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H01L 21/2022
. . . . .
{
Epitaxial regrowth of non-monocrystalline semiconductor materials, e.g. lateral epitaxy by seeded solidification, solid-state crystallization, solid-state graphoepitaxy, explosive crystallization, grain growth in polycrystalline materials
}
H01L 21/2026
. . . . . .
{
using a coherent energy beam, e.g. laser or electron beam
}
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H01L 21/203
. . . . .
using physical deposition, e.g. vacuum deposition, sputtering
H01L 21/2033
. . . . . .
{
Epitaxial deposition of elements of the Fourth Group of the Periodic System, e.g. Si, Ge
}
H01L 21/2036
. . . . . .
{
Epitaxial deposition of AIII BV compounds
}
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H01L 21/205
. . . . .
using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition
H01L 21/2053
. . . . . .
{
Expitaxial deposition of elements of the Fourth Group of the Periodic System, e.g. Si, Ge
}
H01L 21/2056
. . . . . .
{
Epitaxial deposition of AIIIBV compounds
}
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H01L 21/208
. . . . .
using liquid deposition
H01L 21/2085
. . . . . .
{
Epitaxial deposition of AIIIBV compounds
}
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. . . .
Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions;
{
Interactions between two or more impurities; Redistribution of impurities
}
H01L 21/2205
. . . . .
{
from the substrate during epitaxy, e.g. autodoping; Preventing or using autodoping
}
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H01L 21/221
. . . . .
{
of killers
}
H01L 21/2215
. . . . . .
{
in AIIIBV compounds
}
H01L 21/222
. . . . .
{
Lithium-drift
}
H01L 21/2225
. . . . .
{
Diffusion sources
}
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. . . . .
using diffusion into or out of a solid from or into a gaseous phase
{
( H01L 21/221 to H01L 21/222 take precedence; diffusion through an applied layer H01L 21/225 )
}
H01L 21/2233
. . . . . .
{
Diffusion into or out of AIIIBV compounds
}
H01L 21/2236
. . . . . .
{
from or into a plasma phase
}
Collapse
. . . . .
using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
{
( H01L 21/221 to H01L 21/222 take precedence )
}
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H01L 21/2251
. . . . . .
{
Diffusion into or out of group IV semiconductors
}
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H01L 21/2252
. . . . . . .
{
using predeposition of impurities into the semiconductor surface, e.g. from a gaseous phase
}
H01L 21/2253
. . . . . . . .
{
by ion implantation
}
NOTE
-
In groups H01L 21/2254 to H01L 21/2257 one should consider the main compositional parts of the applied layer just before the diffusion step

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. . . . . . .
{
from or through or into an applied layer, e.g. photoresist, nitrides
}
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H01L 21/2255
. . . . . . . .
{
the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides
}
H01L 21/2256
. . . . . . . . .
{
through the applied layer
}
H01L 21/2257
. . . . . . . .
{
the applied layer being silicon or silicide or SIPOS, e.g. polysilicon, porous silicon
}
H01L 21/2258
. . . . . .
{
Diffusion into or out of AIIIBV compounds
}
. . . . .
using diffusion into or out of a solid from or into a liquid phase, e.g. alloy diffusion processes
{
( H01L 21/221 to H01L 21/222 take precedence )
}
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. . . .
Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
{
( H01L 21/182 takes precedence )
}
H01L 21/242
. . . . .
{
Alloying of doping materials with AIIIBV compounds
}
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H01L 21/244
. . . . .
{
Alloying of electrode materials
}
H01L 21/246
. . . . . .
{
with AIIIBV compounds
}
H01L 21/248
. . . . .
{
Apparatus specially adapted for the alloying
}
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. . . .
Bombardment with radiation
{
( H01L 21/3105 takes precedence )
}
H01L 21/2605
. . . . .
{
using natural radiation, e.g. alpha, beta or gamma radiation
}
H01L 21/261
. . . . .
to produce a nuclear reaction transmuting chemical elements
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. . . . .
with high-energy radiation( H01L 21/261 takes precedence )
H01L 21/2633
. . . . . .
{
for etching, e.g. sputteretching
}
H01L 21/2636
. . . . . .
{
for heating, e.g. electron beam heating
}
Collapse
. . . . . .
producing ion implantation( ion beam tubes for localised treatment H01J 37/30 )
WARNING
-
The groups H10L21/26566, H01L 21/2658 and H01L 21/26593 are not complete, see provisionally also H01L 21/26506 and H01L 21/2654 and their subgroups

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H01L 21/26506
. . . . . . .
{
in group IV semiconductors
}
Collapse
H01L 21/26513
. . . . . . . .
{
of electrically active species
}
H01L 21/2652
. . . . . . . . .
{
Through-implantation
}
H01L 21/26526
. . . . . . . .
{
Recoil-implantation
}
H01L 21/26533
. . . . . . . .
{
of electrically inactive species in silicon to make buried insulating layers
}
Collapse
H01L 21/2654
. . . . . . .
{
in AIIIBV compounds
}
Collapse
H01L 21/26546
. . . . . . . .
{
of electrically active species
}
H01L 21/26553
. . . . . . . . .
{
Through-implantation
}
H01L 21/2656
. . . . . . . .
{
characterised by the implantation of both electrically active and inactive species in the same semiconductor region to be doped
}
H01L 21/26566
. . . . . . .
{
of a cluster, e.g. using a gas cluster ion beam
}
H01L 2021/26573
. . . . . . .
{
in diamond
}
H01L 21/2658
. . . . . . .
{
of a molecular ion, e.g. decaborane
}
H01L 21/26586
. . . . . . .
{
characterised by the angle between the ion beam and the crystal planes or the main crystal surface
}
H01L 21/26593
. . . . . . .
{
at a temperature lower than room temperature
}
. . . . . . .
using masks
{
( H01L 21/26586 takes precedence )
}
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H01L 21/268
. . . . . .
using electromagnetic radiation, e.g. laser radiation
H01L 21/2683
. . . . . . .
{
using X-ray lasers
}
H01L 21/2686
. . . . . . .
{
using incoherent radiation
}
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. . . .
Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in H01L 21/20 to H01L 21/268 ;
{
etching for patterning the electrodes H01L 21/311 and H01L 21/3213
}
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. . . . .
{
Making conductor-insulator-semiconductor electrodes
}
Collapse
. . . . . .
{
the insulator being formed after the semiconductor body, the semiconductor being silicon
}
NOTE
-
This group covers deposition of the insulators, including epitaxial insulators, and the conductors within the same process or chamber

Collapse
. . . . . . .
{
characterised by the conductor( H01L 21/28176 takes precedence )
}
NOTE
-
When the final conductor comprises a superconductor, subject matter is not classified according to the subgroups H01L 21/28035 to H01L 21/28097 . Instead, it is classified in H01L 21/28026

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. . . . . . . .
{
the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities( H01L 21/28105 takes precedence )
}
NOTE
-
A very thin, e.g. silicon, adhesion or seed layer is not considered as the one next to the insulator

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H01L 21/28044
. . . . . . . . .
{
the conductor comprising at least another non-silicon conductive layer
}
. . . . . . . . . .
{
the conductor comprising a silicide layer formed by the silicidation reaction of silicon with a metal layer( formed by metal ion implantation H01L 21/28044 )
}
. . . . . . . . . .
{
the conductor comprising a metal or metallic silicode formed by deposition, e.g. sputter deposition, i.e. without a silicidation reaction( H01L 21/28052 takes precedence )
}
NOTE
-
To assess the coverage of groups H01L 21/28052 and H01L 21/28061 , barrier layers, e.g. TaSiN, are not considered

H01L 21/2807
. . . . . . . .
{
the final conductor layer next to the insulator being Si or Ge or C and their alloys except Si
}
H01L 21/28079
. . . . . . . .
{
the final conductor layer next to the insulator being a single metal, e.g. Ta, W, Mo, Al
}
H01L 21/28088
. . . . . . . .
{
the final conductor layer next to the insulator being a composite, e.g. TiN
}
H01L 21/28097
. . . . . . . .
{
the final conductor layer next to the insulator being a metallic silicide
}
H01L 21/28105
. . . . . . . .
{
the final conductor next to the insulator having a lateral composition or doping variation, or being formed laterally by more than one deposition step
}
. . . . . . . .
{
characterised by the sectional shape, e.g. T, inverted-T
}
NOTE
-
Documents are also classified in groups H01L 21/28035 to H01L 21/28105 when the composition is also relevant

Collapse
. . . . . . . .
{
Lithography-related aspects, e.g. sub-lithography lengths; Isolation-related aspects, e.g. to solve problems arising at the crossing with the side of the device isolation; Planarisation aspects
}
H01L 21/28132
. . . . . . . . .
{
conducting part of electrode is difined by a sidewall spacer or a similar technique, e.g. oxidation under mask, plating
}
H01L 21/28141
. . . . . . . . .
{
insulating part of the electrode is defined by a sidewall spacer, e.g. dummy spacer, or a similar technique, e.g. oxidation under mask, plating
}
H01L 21/2815
. . . . . . . . .
{
part or whole of the electrode is a sidewall spacer or made by a similar technique, e.g. transformation under mask, plating
}
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. . . . . . .
{
Making the insulator
}
Collapse
H01L 21/28167
. . . . . . . .
{
on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
}
H01L 21/28176
. . . . . . . . .
{
with a treatment, e.g. annealing, after the formation of the definitive gate conductor
}
. . . . . . . . .
{
with a treatment, e.g. annealing, after the formation of the gate insulator and before the formation of the definitive gate conductor
}
H01L 21/28194
. . . . . . . . .
{
by deposition, e.g. evaporation, ALD, CVD, sputtering, laser deposition( H01L 21/28202 takes precedence )
}
H01L 21/28202
. . . . . . . . .
{
in a nitrogen-containing ambient, e.g. nitride deposition, growth, oxynitridation, NH3 nitridation, N2O oxidation, thermal nitridation, RTN, plasma nitridation, RPN
}
. . . . . . . . .
{
in a gaseous ambient using an oxygen or a water vapour, e.g. RTO, possibly through a layer( H01L 21/28194 and H01L 21/28202 take precedence )
}
{
Note: thin oxidation layers used as a barrier layer or as a buffer layer, e.g. before the fomation of a high-k insulator, are classified here only if important per se
}
H01L 21/2822
. . . . . . . .
{
with substrate doping, e.g. N, Ge, C implantation, before formation of the insulator
}
. . . . . . . .
{
by deposition of a layer, e.g. metal, metal compound or poysilicon, followed by transformation thereof into an insulating layer
}
H01L 21/28238
. . . . . . . .
{
with sacrificial oxide
}
H01L 21/28247
. . . . . . .
{
passivation or protection of the electrode, e.g. using re-oxidation
}
H01L 21/28255
. . . . . .
{
the insulator being formed after the semiconductor body, the semiconductor belonging to the fourth group and not being elemental silicon, e.g. Ge, SiGe, SiGeC
}
H01L 21/28264
. . . . . .
{
the insulator being formed after the semiconductor body, the semiconductor being a III-V compound
}
H01L 21/28273
. . . . .
{
Making conductor-insulator-conductor-insulator-semiconductor electrodes( H01L 21/28291 takes precedence )
}
H01L 21/28282
. . . . .
{
comprising a charge trapping insulator
}
H01L 21/28291
. . . . .
{
comprising a layer which is used for its ferroelectric properties
}
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. . . . .
Deposition of conductive or insulating materials for electrodes
{
conducting electric current
}
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. . . . . .
from a gas or vapour, e.g. condensation
Collapse
H01L 21/28506
. . . . . . .
{
of conductive layers
}
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H01L 21/28512
. . . . . . . .
{
on semiconductor bodies comprising elements of the fourth group of the Periodic System
}
H01L 21/28518
. . . . . . . . .
{
the conductive layers comprising silicides( H01L 21/28537 takes precedence )
}
Collapse
. . . . . . . . .
{
the conductive layers comprising semiconducting material( H01L 21/28518 , H01L 21/28537 take precedence )
}
. . . . . . . . . .
{
Making of side-wall contacts
}
H01L 21/28537
. . . . . . . . .
{
Deposition of Schottky electrodes
}
H01L 2021/28543
. . . . . . . . .
{
on semiconductor bodies comprising diamond
}
H01L 21/2855
. . . . . . . . .
{
by physical means, e.g. sputtering, evaporation( H01L 21/28518 to H01L 21/28537 and H01L 21/28568 take precedence )
}
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H01L 21/28556
. . . . . . . . .
{
by chemical means, e.g. CVD, LPCVD, PECVD, laser CVD( H01L 21/28518 to H01L 21/28537 and H01L 21/28568 take precedence )
}
H01L 21/28562
. . . . . . . . . .
{
Selective deposition
}
H01L 21/28568
. . . . . . . . .
{
the conductive layers comprising transition metals( H01L 21/28518 takes precedence )
}
Collapse
H01L 21/28575
. . . . . . . .
{
on semiconductor bodies comprising AIIIBV compounds
}
H01L 21/28581
. . . . . . . . .
{
Deposition of Schottky electrodes
}
Collapse
H01L 21/28587
. . . . . . . . .
{
characterised by the sectional shape, e.g. T, inverted T
}
H01L 21/28593
. . . . . . . . . .
{
asymmetrical sectional shape
}
Collapse
. . . . . .
from a liquid, e.g. electrolytic deposition
H01L 21/2885
. . . . . . .
{
using an external electrical current, i.e. electro-deposition
}
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. . . .
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L 21/20 to H01L 21/26( manufacture of electrodes thereon H01L 21/28 )
Collapse
H01L 21/3003
. . . . .
{
Hydrogenation or deuterisation, e.g. using atomic hydrogen from a plasma
}
H01L 21/3006
. . . . . .
{
of AIIIBV compounds
}
Collapse
H01L 21/302
. . . . .
to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
Collapse
. . . . . .
Mechanical treatment, e.g. grinding, polishing, cutting
{
( H01L 21/30625 takes precedence )
}
. . . . . . .
{
Making grooves, e.g. cutting
}
H01L 21/3046
. . . . . . .
{
using blasting, e.g. sand-blasting( H01L 21/2633 takes precedence )
}
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. . . . . .
Chemical or electrical treatment, e.g. electrolytic etching( to form insulating layers H01L 21/31 )
Collapse
H01L 21/30604
. . . . . . .
{
Chemical etching
}
. . . . . . . .
{
Anisotropic liquid etching( H01L 21/3063 takes precedence )
}
Collapse
H01L 21/30612
. . . . . . . .
{
Etching of AIIIBV compounds
}
H01L 21/30617
. . . . . . . . .
{
Anisotropic liquid etching
}
. . . . . . . . .
{
Vapour phase etching
}
. . . . . . .
{
With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
}
Collapse
. . . . . . .
Electrolytic etching
H01L 21/30635
. . . . . . . .
{
of A three - B five compounds
}
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. . . . . . .
Plasma etching ; Reactive-ion etching
H01L 21/30655
. . . . . . . .
{
comprising alternated and repeated etching and passivation steps, e.g. Bosch process
}
Collapse
. . . . . . .
using masks( H01L 21/3063 , H01L 21/3065 take precedence )
H01L 21/3081
. . . . . . . .
{
characterised by their composition, e.g. multilayer masks, materials
}
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H01L 21/3083
. . . . . . . .
{
characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
}
. . . . . . . . .
{
characterised by their behaviour during the process, e.g. soluble masks, redeposited masks
}
. . . . . . . . .
{
characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
}
. . . . . . . . .
{
Process specially adapted to improve the resolution of the mask
}
Collapse
. . . . .
to form insulating layers thereon, e.g. for masking or by using photolithographic techniques( layers forming electrodes H01L 21/28 ; encapsulating layers H01L 21/56 ) ; After treatment of these layers
Collapse
. . . . . .
After-treatment
Collapse
. . . . . . .
{
Planarisation of the insulating layers( H01L 21/31058 takes precedence )
}
Collapse
. . . . . . . .
{
involving a dielectric removal step
}
Collapse
. . . . . . . . .
{
the removal being a chemical etching step, e.g. dry etching( etching per se H01L 21/311 )
}
. . . . . . . . . .
{
the removal being a selective chemical etching step, e.g. selective dry etching through a mask
}
H01L 21/31058
. . . . . . .
{
of organic layers
}
Collapse
H01L 21/311
. . . . . . .
Etching the insulating layers
{
by chemical or physical means( H01L 21/31058 takes precedence )
}
Collapse
. . . . . . . .
{
Etching inorganic layers
}
Collapse
. . . . . . . . .
{
by chemical means
}
Collapse
. . . . . . . . . .
{
by dry-etching
}
H01L 21/31122
. . . . . . . . . . .
{
of layers not containing Si, e.g. PZT, Al2O3
}
Collapse
. . . . . . . .
{
Etching organic layers
}
Collapse
. . . . . . . . .
{
by chemical means
}
H01L 21/31138
. . . . . . . . . .
{
by dry-etching
}
. . . . . . . .
{
using masks
}
Collapse
. . . . . . .
Doping the insulating layers
H01L 21/31155
. . . . . . . .
{
by ion implantation
}
Collapse
. . . . . .
Organic layers, e.g. photoresist( H01L 21/3105 , H01L 21/32 take precedence;
{
photoresists per se G03C
}
)
WARNING
-
This group and subgroups are no longer used for the classification of new documents as from May 1, 2011. The backlog of this group is being continuously reclassified to H01L 21/02107 and subgroups thereof

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H01L 21/3121
. . . . . . .
{
Layers comprising organo-silicon compounds
}
Collapse
H01L 21/3122
. . . . . . . .
{
layers comprising polysiloxane compounds
}
H01L 21/3124
. . . . . . . . .
{
layers comprising hydrogen silsesquioxane
}
H01L 21/3125
. . . . . . . .
{
layers comprising silazane compounds
}
H01L 21/3127
. . . . . . .
{
Layers comprising fluoro (hydro)carbon compounds, e.g. polytetrafluoroethylene
}
H01L 21/3128
. . . . . . .
{
by Langmuir-Blodgett techniques
}
Collapse
. . . . . .
Inorganic layers( H01L 21/3105 , H01L 21/32 take precedence )
WARNING
-
This group and subgroups are no longer used for the classification of new documents as from May 1, 2011. The backlog of this group is being continuously reclassified to H01L 21/02107 and subgroups thereof

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H01L 21/3141
. . . . . . .
{
Deposition using atomic layer deposition techniques (ALD)
}
H01L 21/3142
. . . . . . . .
{
of nano-laminates, e.g. alternating layers of Al203-Hf02
}
Collapse
H01L 21/3143
. . . . . . .
{
composed of alternated layers or of mixtures of nitrides and oxides or of oxinitrides, e.g. formation of oxinitride by oxidation of nitride layers
}
H01L 21/3144
. . . . . . . .
{
on silicon
}
H01L 21/3145
. . . . . . . .
{
formed by deposition from a gas or vapour
}
H01L 21/3146
. . . . . . .
{
Carbon layers, e.g. diamond-like layers
}
H01L 21/3147
. . . . . . .
{
Epitaxial deposition of insulating materials
}
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H01L 21/3148
. . . . . . .
{
Silicon Carbide layers
}
H01L 2021/3149
. . . . . . . .
{
Langmuir-Blodgett techniques
}
Collapse
H01L 21/316
. . . . . . .
composed of oxides or glassy oxides or oxide based glass
WARNING
-
This group and subgroups are no longer used for the classification of new documents as from May 1, 2011. The backlog of this group is being continuously reclassified to H01L 21/02107 and subgroups thereof

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H01L 21/31604
. . . . . . . .
{
Deposition from a gas or vapour( H01L 21/31691 , H01L 21/31695 take precedence )
}
Collapse
H01L 21/31608
. . . . . . . . .
{
Deposition of SiO2( H01L 21/31625 , H01L 21/31629 and H01L 21/31633 take precedence )
}
H01L 21/31612
. . . . . . . . . .
{
on a silicon body
}
Collapse
H01L 21/31616
. . . . . . . . .
{
Deposition of Al2O3
}
H01L 21/3162
. . . . . . . . . .
{
on a silicon body
}
H01L 21/31625
. . . . . . . . .
{
Deposition of boron or phosphorus doped silicon oxide, e.g. BSG, PSG, BPSG
}
H01L 21/31629
. . . . . . . . .
{
Deposition of halogen doped silicon oxide, e.g. fluorine doped silicon oxide
}
H01L 21/31633
. . . . . . . . .
{
Deposition of carbon doped silicon oxide, e.g. SiOC
}
H01L 21/31637
. . . . . . . . .
{
Deposition of Tantalum oxides, e.g. Ta2O5
}
H01L 21/31641
. . . . . . . . .
{
Deposition of Zirconium oxides, e.g. ZrO2
}
H01L 21/31645
. . . . . . . . .
{
Deposition of Hafnium oxides, e.g. HfO2
}
Collapse
H01L 21/3165
. . . . . . . .
{
formed by oxidation( H01L 21/31691 , H01L 21/31695 take precedence )
}
Collapse
H01L 21/31654
. . . . . . . . .
{
of semiconductor materials, e.g. the body itself
}
Collapse
H01L 21/31658
. . . . . . . . . .
{
by thermal oxidation, e.g. of SiGe
}
H01L 21/31662
. . . . . . . . . . .
{
of silicon in uncombined form
}
H01L 21/31666
. . . . . . . . . . .
{
of AIII BV compounds
}
Collapse
H01L 21/3167
. . . . . . . . . .
{
of anodic oxidation
}
H01L 21/31675
. . . . . . . . . . .
{
of silicon
}
H01L 21/31679
. . . . . . . . . . .
{
of AIII BV compounds
}
Collapse
H01L 21/31683
. . . . . . . . .
{
of metallic layers, e.g. Al deposited on the body, e.g. formation of multi-layer insulating structures
}
H01L 21/31687
. . . . . . . . . .
{
by anodic oxidation
}
H01L 21/31691
. . . . . . . .
{
with perovskite structure
}
H01L 21/31695
. . . . . . . .
{
Deposition of porous oxides or porous glassy oxides or oxide based porous glass
}
Collapse
H01L 21/318
. . . . . . .
composed of nitrides
WARNING
-
This group and subgroups are no longer used for the classification of new documents as from May 1, 2011. The backlog of this group is being continuously reclassified to H01L 21/02107 and subgroups thereof

H01L 21/3185
. . . . . . . .
{
of siliconnitrides
}
H01L 21/32
. . . . . .
using masks
Collapse
. . . . . .
Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers ; After-treatment of these layers( manufacture of electrodes H01L 21/28 )
Collapse
H01L 21/32051
. . . . . . .
{
Deposition of metallic or metal-silicide layers
}
H01L 21/32053
. . . . . . . .
{
of metal-silicide layers
}
H01L 21/32055
. . . . . . .
{
Deposition of semiconductive layers, e.g. poly - or amorphous silicon layers
}
H01L 21/32056
. . . . . . .
{
Deposition of conductive or semi-conductive organic layers( H01L 21/32058 takes precedence )
}
H01L 21/32058
. . . . . . .
{
Deposition of supra-conductive layers
}
Collapse
. . . . . . .
After treatment
. . . . . . . .
{
Oxidation of silicon-containing layers
}
. . . . . . . .
{
Nitridation of silicon-containing layers
}
Collapse
. . . . . . . .
{
Planarisation
}
Collapse
. . . . . . . . .
{
by chemical mechanical polishing (CMP)
}
H01L 21/32125
. . . . . . . . . .
{
by simultaneously passing an electrical current, i.e. electrochemical mechanical polishing, e.g. ECMP
}
Collapse
. . . . . . . .
Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
Collapse
. . . . . . . . .
{
by physical means only
}
. . . . . . . . . .
{
of silicon-containing layers
}
Collapse
. . . . . . . . .
{
by chemical means only
}
. . . . . . . . . .
{
by liquid etching only
}
Collapse
H01L 21/32135
. . . . . . . . . .
{
by vapour etching only
}
Collapse
. . . . . . . . . . .
{
using plasmas
}
. . . . . . . . . . . .
{
of silicon-containing layers
}
. . . . . . . . . . .
{
pre- or post-treatments, e.g. anti-corrosion processes
}
. . . . . . . . .
{
using masks
}
Collapse
. . . . . . . .
Doping the layers
H01L 21/32155
. . . . . . . . .
{
Doping polycristalline - or amorphous silicon layers
}
Collapse
. . . . .
to modify their internal properties, e.g. to produce internal imperfections
Collapse
. . . . . .
{
of silicon bodies, e.g. for gettering
}
H01L 21/3223
. . . . . . .
{
using cavities formed by hydrogen or noble gas ion implantation
}
. . . . . . .
{
Thermally inducing defects using oxygen present in the silicon body for intrinsic gettering( H01L 21/3226 takes precedence )
}
NOTE
-
Gettering using both extrinsic and intrinsic gettering techniques is classified in both H01L 21/3221 and H01L 21/3225

H01L 21/3226
. . . . . . .
{
of silicon on insulator
}
H01L 21/3228
. . . . . .
{
of AIIIBV compounds, e.g. to make them semi-insulating
}
Collapse
H01L 21/324
. . . . .
Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering( H01L 21/20 to H01L 21/288 and H01L 21/302 to H01L 21/322 take precedence )
H01L 21/3242
. . . . . .
{
for the formation of PN junctions without addition of impurities( H01L 21/22 takes precedence )
}
H01L 21/3245
. . . . . .
{
of III-V compounds
}
H01L 21/3247
. . . . . .
{
for altering the shape, e.g. smoothing the surface
}
{
Warning: Not complete, see provisionally also H01L 21/324
}
H01L 21/326
. . . . .
Application of electric currents or fields, e.g. for electroforming( H01L 21/20 to H01L 21/288 and H01L 21/302 to H01L 21/324 take precedence )
Collapse
. . .
the devices having semiconductor bodies not provided for in groups
{
H01L 21/0405 , H01L 21/0445
}
, H01L 21/06 , H01L 21/16 and H01L 21/18 with or without impurities, e.g. doping materials
Collapse
. . . .
Deposition of semiconductor materials on a substrate, e.g. epitaxial growth
WARNING
-
This group is no longer used for the classification of new documents as from December 1, 2009. The backlog of this group is being continuously reclassified to H01L 21/02365 and subgroups

H01L 21/363
. . . . .
using physical deposition, e.g. vacuum deposition, sputtering
H01L 21/365
. . . . .
using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition
H01L 21/368
. . . . .
using liquid deposition
Collapse
. . . .
Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions
H01L 21/383
. . . . .
using diffusion into or out of a solid from or into a gaseous phase
H01L 21/385
. . . . .
using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
H01L 21/388
. . . . .
using diffusion into or out of a solid from or into a liquid phase, e.g. alloy diffusion processes
H01L 21/40
. . . .
Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
Collapse
. . . .
Bombardment with radiation
Collapse
H01L 21/423
. . . . .
with high-energy radiation
Collapse
. . . . . .
producing ion implantation( ion beam tubes for localized treatment H01J 37/30 )
. . . . . . .
using masks
H01L 21/428
. . . . . .
using electromagnetic radiation, e.g. laser radiation
Collapse
. . . .
Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L 21/36 to H01L 21/428
Collapse
. . . . .
Deposition of conductive or insulating materials for electrodes
H01L 21/443
. . . . . .
from a gas or vapour, e.g. condensation
. . . . . .
from a liquid, e.g. electrolytic deposition
. . . . .
involving the application of pressure, e.g. thermo-compression bonding
. . . . .
involving the application of mechanical vibrations, e.g. ultrasonic vibrations
Collapse
. . . .
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L 21/428( manufacture of electrodes thereon H01L 21/44 )
Collapse
H01L 21/461
. . . . .
to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
H01L 21/463
. . . . . .
Mechanical treatment, e.g. grinding, ultrasonic treatment
Collapse
. . . . . .
Chemical or electrical treatment, e.g. electrolytic etching( to form insulating layers H01L 21/469 )
. . . . . . .
using masks
Collapse
. . . . . .
to form insulating layers thereon, e.g. for masking or by using photolithographic techniques( layers forming electrodes H01L 21/44 ; encapsulating layers H01L 21/56 ) ; After-treatment of these layers
. . . . . . .
organic layers, e.g. photoresist( H01L 21/475 , H01L 21/4757 take precedence )
Collapse
H01L 21/471
. . . . . . .
Inorganic layers( H01L 21/475 , H01L 21/4757 take precedence )
H01L 21/473
. . . . . . . .
composed of oxides or glassy oxides or oxide based glass
H01L 21/475
. . . . . . .
using masks
Collapse
H01L 21/4757
. . . . . . .
After-treatment
H01L 21/47573
. . . . . . . .
{
Etching the layer
}
H01L 21/47576
. . . . . . . .
{
Doping the layer
}
Collapse
. . . . . .
Deposition of non-insulating, e.g. conductive -, resistive -, layers on insulating layers ; After-treatment of these layers( manufacture of electrodes H01L 21/28 ,
{
H01L 21/44
}
)
H01L 21/47635
. . . . . . .
{
After-treatment of these layers
}
H01L 21/477
. . . . .
Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering( H01L 21/36 to H01L 21/449 and H01L 21/461 to H01L 21/475 take precedence )
H01L 21/479
. . . . .
Application of electric currents or fields, e.g. for electroforming( H01L 21/36 to H01L 21/449 and H01L 21/461 to H01L 21/477 take precedence )
Collapse
. . .
Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L 21/06 to H01L 21/326(
{
apparatus therefor H01L 21/67005 ; insulative sealing of leads in bases H01L 21/50
}
; containers, encapsulations, fillings, mountings per se H01L 23/00 ;
{
marking of parts H01L 23/544
}
)
NOTE
-
In this group, the expression "treatment" covers also the removal of leads from parts

Collapse
H01L 21/4803
. . . .
{
Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks( H01L 21/4846 takes precedence; printed circuit boards H05K 1/00 )
}
H01L 21/4807
. . . . .
{
Ceramic parts
}
H01L 21/481
. . . . .
{
Insulating layers on insulating parts, with or without metallisation
}
Collapse
H01L 21/4814
. . . .
{
Conductive parts
}
H01L 21/4817
. . . . .
{
for containers, e.g. caps( H01L 21/4871 takes precedence )
}
Collapse
H01L 21/4821
. . . . .
{
Flat leads, e.g. lead frames with or without insulating supports
}
H01L 21/4825
. . . . . .
{
Connection or disconnection of other leads to or from flat leads, e.g. wires, bumps, other flat leads
}
Collapse
H01L 21/4828
. . . . . .
{
Etching( etching for cleaning without patterning H01L 21/4835 )
}
H01L 21/4832
. . . . . . .
{
Etching a temporary substrate after encapsulation process to form leads
}
H01L 21/4835
. . . . . .
{
Cleaning, e.g. removing of solder
}
H01L 21/4839
. . . . . .
{
Assembly of a flat lead with an insulating support, e.g. for TAB
}
H01L 21/4842
. . . . . .
{
Mechanical treatment, e.g. punching, cutting, deforming, cold welding
}
Collapse
H01L 21/4846
. . . . .
{
Leads on or in insulating or insulated substrates, e.g. metallisation( H01L 21/4821 takes precedence; metallisation of ceramics in general C04B 41/51 ; printed circuits H05K 3/00 )
}
H01L 21/485
. . . . . .
{
Adaptation of interconnections, e.g. engineering charges, repair techniques
}
H01L 21/4853
. . . . . .
{
Connection or disconnection of other leads to or from a metallisation, e.g. pins, wires, bumps
}
H01L 21/4857
. . . . . .
{
Multilayer substrates( multilayer metallisation on monolayer substrate H01L 21/4846 )
}
H01L 21/486
. . . . . .
{
Via connections through the substrate with or without pins
}
H01L 21/4864
. . . . . .
{
Cleaning, e.g. removing of solder
}
H01L 21/4867
. . . . . .
{
Applying pastes or inks, e.g. screen printing( H01L 21/486 takes precedence )
}
Collapse
H01L 21/4871
. . . . .
{
Bases, plates or heatsinks
}
H01L 21/4875
. . . . . .
{
Connection or disconnection of other leads to or from bases or plates
}
H01L 21/4878
. . . . . .
{
Mechanical treatment, e.g. deforming
}
H01L 21/4882
. . . . . .
{
Assembly of heatsink parts
}
Collapse
H01L 21/4885
. . . . .
{
Wire-like parts or pins( wire ball formation B23K 20/00 ; methods related to connecting semiconductor or other solid state bodies H01L 24/00 )
}
WARNING
-
The documents of this group and subgroups dealing with methods for connecting semiconductor or other solid state bodies are being continuously reclassified to H01L 24/43

H01L 21/4889
. . . . . .
{
Connection or disconnection of other leads to or from wire-like parts, e.g. wires
}
H01L 21/4892
. . . . . .
{
Cleaning
}
H01L 21/4896
. . . . . .
{
Mechanical treatment, e.g. cutting, bending
}
Collapse
. . .
Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L 21/06 to H01L 21/326 ,
{
e.g. sealing of a cap to a base of a container
}
NOTE
-
Arrangements for connecting or disconnecting semiconductor or other solid state bodies, or methods related thereto, other than those arrangements or methods covered by the following subgroups, are covered by H01L 24/00

H01L 21/52
. . . .
Mounting semiconductor bodies in containers
H01L 21/54
. . . .
Providing fillings in containers, e.g. gas fillings
Collapse
H01L 21/56
. . . .
Encapsulations, e.g. encapsulation layers, coatings
H01L 21/561
. . . . .
{
Batch processing
}
H01L 21/563
. . . . .
{
Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
}
Collapse
H01L 21/565
. . . . .
{
Moulds
}
H01L 21/566
. . . . . .
{
Release layers for moulds, e.g. release layers, layers against residue during moulding
}
H01L 21/568
. . . . .
{
Temporary substrate used as encapsulation process aid( H01L 21/4832 and H01L 21/566 take precedence )
}
. . . .
{
Insulative
}
mounting semiconductor devices on supports
{
( H01L 21/563 , H01L 23/49513 take precedence )
}
WARNING
-
This group is no longer used for the classification of new documents as from June 1, 2010. The backlog of this group is being continuously reclassified to H01L 24/80 and subgroups

Collapse
H01L 2021/60
. . . .
{
Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
}
Collapse
H01L 2021/60007
. . . . .
{
involving a soldering or an alloying process
}
H01L 2021/60015
. . . . . .
{
using plate connectors, e.g. layer, film
}
Collapse
H01L 2021/60022
. . . . . .
{
using bump connectors, e.g. for flip chip mounting
}
H01L 2021/6003
. . . . . . .
{
Apparatus therefor
}
H01L 2021/60037
. . . . . . .
{
Right-up bonding
}
Collapse
H01L 2021/60045
. . . . . . .
{
Pre-treatment step of the bump connectors prior to bonding
}
H01L 2021/60052
. . . . . . . .
{
Oxide removing step, e.g. flux, rosin
}
H01L 2021/6006
. . . . . . .
{
with temporary supporting member not part of an apparatus, e.g. removable coating, film or substrate
}
Collapse
H01L 2021/60067
. . . . . . .
{
Aligning the bump connectors with the mounting substrate
}
H01L 2021/60075
. . . . . . . .
{
involving active alignment, i.e. by apparatus steering, e.g. using alignment marks, sensors
}
H01L 2021/60082
. . . . . . . .
{
involving passive alignment, e.g. using surface energy, chemical reactions, thermal equilibrium
}
H01L 2021/6009
. . . . . . . .
{
involving guiding structures, e.g. structures that are left at least partly in the bonded product, spacers
}
Collapse
H01L 2021/60097
. . . . . . .
{
Applying energy, e.g. for the soldering or alloying process
}
Collapse
H01L 2021/60105
. . . . . . . .
{
using electromagnetic radiation
}
H01L 2021/60112
. . . . . . . . .
{
Coherent radiation, i.e. laser beam
}
H01L 2021/6012
. . . . . . . . .
{
Incoherent radiation, e.g. polychromatic heating lamp
}
H01L 2021/60127
. . . . . . . . .
{
Induction heating, i.e. eddy currents
}
Collapse
H01L 2021/60135
. . . . . . . .
{
using convection, e.g. reflow oven
}
H01L 2021/60142
. . . . . . . . .
{
with a graded temperature profile
}
Collapse
H01L 2021/6015
. . . . . . . .
{
using conduction, e.g. chuck heater, thermocompression
}
H01L 2021/60157
. . . . . . . . .
{
with a graded temperature profile
}
H01L 2021/60165
. . . . . . . .
{
using an electron beam
}
Collapse
H01L 2021/60172
. . . . . . . .
{
using static pressure
}
H01L 2021/6018
. . . . . . . . .
{
Unidirectional static pressure
}
H01L 2021/60187
. . . . . . . . .
{
Isostatic pressure, e.g. degassing using vacuum or pressurised liquid
}
H01L 2021/60195
. . . . . . . .
{
using dynamic pressure, e.g. ultrasonic or thermosonic bonding
}
H01L 2021/60202
. . . . . . . .
{
using a protective atmosphere, e.g. with forming or shielding gas
}
H01L 2021/6021
. . . . . . . .
{
using an autocatalytic reaction
}
H01L 2021/60217
. . . . . . .
{
Detaching bump connectors, e.g. after testing
}
Collapse
H01L 2021/60225
. . . . . . .
{
Arrangement of bump connectors prior to mounting
}
H01L 2021/60232
. . . . . . . .
{
wherein the bump connectors are disposed only on the semiconductor chip
}
H01L 2021/6024
. . . . . . . .
{
wherein the bump connectors are disposed only on the mounting substrate
}
H01L 2021/60247
. . . . . . . .
{
wherein the bump connectors are disposed on both the semiconductor chip and the mounting substrate, e.g. bump to bump
}
H01L 2021/60255
. . . . . . . .
{
wherein the bump connectors are provided as prepeg, e.g. are provided in an insulating plate member
}
H01L 2021/60262
. . . . . . . .
{
Lateral distribution of bump connectors prior to mounting
}
H01L 2021/6027
. . . . . .
{
Mounting on semiconductor conductive members
}
H01L 2021/60277
. . . . .
{
involving the use of conductive adhesives
}
H01L 2021/60285
. . . . .
{
involving the use of mechanical auxiliary parts without the use of an alloying of soldering process, e.g. pressure contacts
}
H01L 2021/60292
. . . . .
{
involving the use of an electron or laser beam
}
H01L 2021/603
. . . . .
{
involving the application of pressure, e.g. thermo-compression bonding
}
H01L 2021/607
. . . . .
{
involving the application of mechanical vibrations, e.g. ultrasonic vibrations
}
H01L 21/62
. .
the devices having no potential-jump barriers or surface barriers
H01L 21/64
.
Manufacture or treatment of solid state devices other than semiconductor devices, or of parts thereof, not peculiar to a single device provided for in groups H01L 31/00 to H01L 51/00
Collapse
.
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof ; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components;
{
Apparatus not specifically provided for elsewhere( processes per se H01L 21/30 , H01L 21/46 , H01L 23/00 ; simple temporary support means, e.g. using adhesives, electric or magnetic means H01L 21/68 , H01L 21/302 ; apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto H01L 24/74 ; )
}
NOTE
-
In this subgroup the term substrate designates a semiconductor or electric solid state device or component, or a wafer

Collapse
H01L 21/67005
. .
{
Apparatus not specifically provided for elsewhere( processes per se H01L 21/30 , H01L 21/46 , H01L 23/00 ; simple temporary support means, e.g. using adhesives, electric or magnetic means H01L 21/68 , H01L 21/302 )
}
Collapse
H01L 21/67011
. . .
{
Apparatus for manufacture or treatment( processes H01L 21/30 , H01L 21/46 ; for production or after-treatment of single crystals or homogeneous polycrystalline material C30B 35/00 )
}
Collapse
. . . .
{
Apparatus for fluid treatment( H01L 21/67126 , H01L 21/6715 take precedence )
}
H01L 21/67023
. . . . .
{
for general liquid treatment, e.g. etching followed by cleaning
}
Collapse
. . . . .
{
for cleaning followed by drying, rinsing, stripping, blasting or the like
}
H01L 21/67034
. . . . . .
{
for drying
}
Collapse
H01L 21/6704
. . . . . .
{
for wet cleaning or washing
}
H01L 21/67046
. . . . . . .
{
using mainly scrubbing means, e.g. brushes
}
H01L 21/67051
. . . . . . .
{
using mainly spraying means, e.g. nozzles
}
H01L 21/67057
. . . . . . .
{
with the semiconductor substrates being dipped in baths or vessels
}
Collapse
H01L 21/67063
. . . . .
{
for etching
}
H01L 21/67069
. . . . . .
{
for drying etching
}
Collapse
H01L 21/67075
. . . . . .
{
for wet etching
}
H01L 21/6708
. . . . . . .
{
using mainly spraying means, e.g. nozzles
}
H01L 21/67086
. . . . . . .
{
with the semiconductor substrates being dipped in baths or vessels
}
. . . .
{
Apparatus for mechanical treatment( or grinding or cutting, see the relevant groups in subclasses B24B or B28D )
}
Collapse
H01L 21/67098
. . . .
{
Apparatus for thermal treatment
}
. . . . .
{
mainly by conduction
}
. . . . .
{
mainly by convection
}
. . . . .
{
mainly by radiation
}
H01L 21/67121
. . . .
{
Apparatus for making assemblies not otherwise provided for, e.g. package constructions
}
. . . .
{
Apparatus for sealing, encapsulating, glassing, decapsulating or the like( processes H01L 23/02 , H01L 23/28 )
}
. . . .
{
Apparatus for placing on an insulating substrate, e.g. tape
}
H01L 21/67138
. . . .
{
Apparatus for wiring semiconductor or solid state device
}
. . . .
{
Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
}
. . . .
{
Apparatus for applying a liquid, a resin, an ink or the like( H01L 21/67126 takes precedence )
}
Collapse
H01L 21/67155
. . . .
{
Apparatus for manufacturing or treating in a plurality of work-stations
}
Collapse
H01L 21/67161
. . . . .
{
characterized by the layout of the process chambers
}
H01L 21/67167
. . . . . .
{
surrounding a central transfer chamber
}
H01L 21/67173
. . . . . .
{
in-line arrangement
}
H01L 21/67178
. . . . . .
{
vertical arrangement
}
H01L 21/67184
. . . . .
{
characterized by the presence of more than one transfer chamber
}
H01L 21/6719
. . . . .
{
characterized by the construction of the processing chambers, e.g. modular processing chambers
}
H01L 21/67196
. . . . .
{
characterized by the construction of the transfer chamber
}
H01L 21/67201
. . . . .
{
characterized by the construction of the load-lock chamber
}
Collapse
H01L 21/67207
. . . . .
{
comprising a chamber adapted to a particular process
}
. . . . . .
{
comprising at least one ion or electron beam chamber( coating by ion implantation C23C; ion or electron beam tubes H01J 37/00 )
}
. . . . . .
{
comprising at least one polishing chamber( polishing apparatuses B24B )
}
. . . . . .
{
comprising at least one lithography chamber( lithographic apparatuses G03F 7/00 )
}
. . . . . .
{
comprising at least one plating chamber( electroless plating apparatuses C23C, electroplating apparatuses C25D )
}
H01L 21/67236
. . . . .
{
the substrates being processed being not semiconductor wafers, e.g. leadframes or chips
}
Collapse
. . .
{
Apparatus for monitoring, sorting or marking( testing or measuring during manufacture H01L 22/00 , marks per se H01L 23/544 ; testing individual semiconductor devices G01R 31/26 )
}
H01L 21/67248
. . . .
{
Temperature monitoring
}
H01L 21/67253
. . . .
{
Process monitoring, e.g. flow or thickness monitoring
}
Collapse
H01L 21/67259
. . . .
{
Position monitoring, e.g. misposition detection or presence detection
}
H01L 21/67265
. . . . .
{
of substrates stored in a container, a magazine, a carrier, a boat or the like
}
H01L 21/67271
. . . .
{
Sorting devices
}
. . . .
{
Production flow monitoring, e.g. for increasing throughput( program-control systems per se G05B 19/00 , e.g. total factory control G05B 19/418 )
}
H01L 21/67282
. . . .
{
Marking devices
}
H01L 21/67288
. . . .
{
Monitoring of warpage, curvature, damage, defects or the like
}
H01L 21/67294
. . . .
{
using identification means, e.g. labels on substrates or labels on containers
}
Collapse
. .
using specially adapted carriers
{
or holders; Fixing the workpieces on such carriers or holders( holders for supporting a complete device in operation H01L 23/32 )
}
Collapse
H01L 21/67303
. . .
{
Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
}
H01L 21/67306
. . . .
{
characterized by a material, a roughness, a coating or the like
}
H01L 21/67309
. . . .
{
characterized by the substrate support
}
Collapse
H01L 21/67313
. . .
{
Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
}
H01L 21/67316
. . . .
{
characterized by a material, a roughness, a coating or the like
}
Collapse
H01L 21/6732
. . .
{
Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
}
H01L 21/67323
. . . .
{
characterized by a material, a roughness, a coating or the like
}
Collapse
H01L 21/67326
. . .
{
Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
}
H01L 21/6733
. . . .
{
characterized by a material, a roughness, a coating or the like
}
Collapse
. . .
{
Trays for chips( magazine for components H05K 13/0084 )
}
H01L 21/67336
. . . .
{
characterized by a material, a roughness, a coating or the like
}
Collapse
. . .
{
specially adapted for supporting large square shaped substrates( containers and packaging elements for glass sheets B65D 85/48 , transporting of glass products during their manufacture C03B 35/00 )
}
H01L 21/67343
. . . .
{
characterized by a material, a roughness, a coating or the like
}
H01L 21/67346
. . .
{
characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports
}
Collapse
H01L 21/6735
. . .
{
Closed carriers
}
H01L 21/67353
. . . .
{
specially adapted for a single substrate
}
H01L 21/67356
. . . .
{
specially adapted for containing chips, dies or ICs
}
H01L 21/67359
. . . .
{
specially adapted for containing masks, reticles or pellicles
}
. . . .
{
specially adapted for containing substrates other than wafers( H01L 21/67356 , H01L 21/67359 take precedence )
}
. . . .
{
characterised by materials, roughness, coatings or the like( materials relating to an injection moulding process B29C 45/00 ; chemical composition of materials C08L 51/00 )
}
H01L 21/67369
. . . .
{
characterised by shock absorbing elements, e.g. retainers or cushions
}
H01L 21/67373
. . . .
{
characterised by locking systems
}
H01L 21/67376
. . . .
{
characterised by sealing arrangements
}
H01L 21/67379
. . . .
{
characterised by coupling elements, kinematic members, handles or elements to be externally gripped
}
H01L 21/67383
. . . .
{
characterised by substrate supports
}
H01L 21/67386
. . . .
{
characterised by the construction of the closed carrier
}
Collapse
H01L 21/67389
. . . .
{
characterised by atmosphere control
}
H01L 21/67393
. . . . .
{
characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
}
H01L 21/67396
. . . .
{
characterised by the presence of antistatic elements
}
Collapse
H01L 21/677
. .
for conveying, e.g. between different workstations
Collapse
H01L 21/67703
. . .
{
between different workstations
}
WARNING
-
This group and subgroups are not complete pending completion of reorganization; see also H01L 21/677

. . . .
{
Mechanical details, e.g. roller, belt( H01L 21/67709 takes precedence )
}
H01L 21/67709
. . . .
{
using magnetic elements
}
H01L 21/67712
. . . .
{
the substrate being handled substantially vertically
}
H01L 21/67715
. . . .
{
Changing the direction of the conveying path
}
H01L 21/67718
. . . .
{
Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
}
. . . .
{
the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames, H01L 21/6773 takes precedence
}
H01L 21/67724
. . . .
{
by means of a cart or a vehicule
}
H01L 21/67727
. . . .
{
using a general scheme of a conveying path within a factory
}
H01L 21/6773
. . . .
{
Conveying cassettes, containers or carriers
}
H01L 21/67733
. . . .
{
Overhead conveying
}
H01L 21/67736
. . . .
{
Loading to or unloading from a conveyor
}
Collapse
H01L 21/67739
. . .
{
into and out of processing chamber
}
. . . .
{
Mechanical parts of transfer devices( robots in general in B25J )
}
H01L 21/67745
. . . .
{
characterized by movements or sequence of movements of transfer devices
}
H01L 21/67748
. . . .
{
horizontal transfer of a single workpiece
}
H01L 21/67751
. . . .
{
vertical transfer of a single workpiece
}
H01L 21/67754
. . . .
{
horizontal transfer of a batch of workpieces
}
H01L 21/67757
. . . .
{
vertical transfer of a batch of workpieces
}
H01L 21/6776
. . . .
{
Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
}
WARNING
-
Not complete pending completion of reorganization; see also H01L 21/677

Collapse
. . .
{
the wafers being stored in a carrier, involving loading and unloading( H01L 21/6779 takes precedence )
}
. . . .
{
Mechanical parts of transfer devices( robots in general in B25J )
}
H01L 21/67769
. . . .
{
Storage means
}
H01L 21/67772
. . . .
{
involving removal of lid, door, cover
}
H01L 21/67775
. . . .
{
Docking arrangements
}
Collapse
H01L 21/67778
. . . .
{
involving loading and unloading of waers
}
H01L 21/67781
. . . . .
{
Batch transfer of wafers
}
Collapse
. . .
{
using air tracks
}
H01L 21/67787
. . . .
{
with angular orientation of the workpieces
}
H01L 21/6779
. . . .
{
the workpieces being stored in a carrier, involving loading and unloading
}
H01L 21/67793
. . .
{
with orientating and positioning by means of a vibratory bowl or track
}
. . .
{
with angular orientation of workpieces( H01L 21/67787 and H01L 21/67793 take precedence )
}
Collapse
. .
for positioning, orientation or alignment( for conveying H01L 21/677 )
WARNING
-
This group is in reorganisation. See provisionally also group H01L 21/6835

H01L 21/681
. . .
{
using optical controlling means
}
. . .
{
Mask-wafer alignment( in general G03F 7/70 , G03F 9/70 )
}
Collapse
. .
for supporting or gripping( for conveying H01L 21/677 , for positioning, orientation or alignment H01L 21/68 )
Collapse
H01L 21/6831
. . .
{
using electrostatic chucks
}
H01L 21/6833
. . . .
{
Details of electrostatic chucks
}
Collapse
. . .
{
using temporarily an auxiliary support
}
NOTE
-
H01L 21/6835 , details of the apparatus are to be further indexed using the indexing codes chosen from H01L 2221/68304 and subgroups

. . . .
{
Wafer tapes, e.g. grinding or dicing support tapes( adhesive tapes in general C09J 7/02 )
}
H01L 21/6838
. . .
{
with gripping and holding devices using a vacuum; Bernoulli devices
}
Collapse
. . .
using mechanical means, e.g. chucks, clamps or pinches
{
( using elecrostatic chucks H01L21/683C )
}
H01L 21/68707
. . . .
{
the wafers being placed on a robot blade, or gripped by a gripper for conveyance
}
Collapse
H01L 21/68714
. . . .
{
the wafers being placed on a susceptor, stage or support
}
H01L 21/68721
. . . . .
{
characterised by edge clamping, e.g. clamping ring
}
H01L 21/68728
. . . . .
{
characterised by a plurality of separate clamping members, e.g. clamping fingers
}
H01L 21/68735
. . . . .
{
characterised by edge profile or support profile
}
H01L 21/68742
. . . . .
{
characterised by a lifting arrangement, e.g. lift pins
}
H01L 21/6875
. . . . .
{
characterised by a plurality of individual support members, e.g. support posts or protrusions
}
H01L 21/68757
. . . . .
{
characterised by a coating or a hardness or a material
}
H01L 21/68764
. . . . .
{
characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
}
H01L 21/68771
. . . . .
{
characterised by supporting more than one semiconductor substrate
}
H01L 21/68778
. . . . .
{
characterised by supporting substrates others than wafers, e.g. chips
}
H01L 21/68785
. . . . .
{
characterised by the mechanical construction of the susceptor, stage or support
}
H01L 21/68792
. . . . .
{
characterised by the construction of the shaft
}
Collapse
.
Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof ; Manufacture of integrated circuit devices or of parts thereof(
{
multistep manufacturing processes of assemblies consisting of a plurality of individual semiconductor or other solid state devices H01L 25/00
}
, manufacture of assemblies consisting or preformed electrical components H05K 3/00 , H05K 13/00 )
Collapse
H01L 21/702
. .
{
of thick-or thin-film circuits or parts thereof
}
H01L 21/705
. . .
{
of thick-film circuits or parts thereof
}
H01L 21/707
. . .
{
of thin-film circuits or parts thereof
}
Collapse
. .
Manufacture of specific parts of devices defined in group H01L 21/70(
{
H01L 21/0405 , H01L 21/0445
}
, H01L 21/28 , H01L 21/44 , H01L 21/48 take precedence )
Collapse
. . .
Making of
{
localized
}
buried regions, e.g. buried collector layers, internal connections
{
substrate contacts
}
. . . .
{
Making of internal connections, substrate contacts
}
H01L 21/746
. . . .
{
for AIII-BV integrated circuits
}
Collapse
. . .
Making of isolation regions between components
H01L 21/7602
. . . .
{
between components manufactured in an active substrate comprising SiC compounds
}
H01L 21/7605
. . . .
{
between components manufactured in an active substrate comprising AIII BV compounds
}
H01L 21/7607
. . . .
{
between components manufactured in an active substrate comprising II-VI compounds
}
H01L 21/761
. . . .
PN junctions
Collapse
. . . .
Dielectric regions,
{
e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
}
Collapse
H01L 21/76202
. . . . .
{
using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO( H01L 21/76235 takes precedence; together with vertical isolation, e.g. LOCOS in a SOI substrate, H01L 21/76264 )
}
Collapse
H01L 21/76205
. . . . . .
{
in a region being recessed from the surface, e.g. in a recess, groove, tub or trench region
}
H01L 21/76208
. . . . . . .
{
using auxiliary pillars in the recessed region, e.g. to form LOCOS over extended areas
}
H01L 21/7621
. . . . . . .
{
the recessed region having a shape other than rectangular, e.g. rounded or oblique shape( H01L 21/76208 takes precedence )
}
Collapse
H01L 21/76213
. . . . . .
{
introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose
}
Collapse
H01L 21/76216
. . . . . . .
{
introducing electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers
}
H01L 21/76218
. . . . . . . .
{
introducing both types of electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers, e.g. for isolation of complementary doped regions
}
H01L 21/76221
. . . . . .
{
with a plurality of successive local oxidation steps
}
Collapse
. . . . .
{
using trench refilling with dielectric materials( trench filling with polycristalline silicon H01L 21/763 ; together with vertical isolation, e.g. trench refilling in a SOI substrate H01L 21/76264 )
}
H01L 21/76227
. . . . . .
{
the dielectric materials being obtained by full chemical transformation of non-dielectric materials, such as polycristalline silicon, metals
}
H01L 21/76229
. . . . . .
{
Concurrent filling of a plurality of trenches having a different trench shape or dimension, e.g. rectangular and V-shaped trenches, wide and narrow trenches, shallow and deep trenches
}
Collapse
H01L 21/76232
. . . . . .
{
of trenches having a shape other than rectangular or V-shape, e.g. rounded corners, oblique or rounded trench walls( H01L 21/76229 takes precedence )
}
H01L 21/76235
. . . . . . .
{
trench shape altered by a local oxidation of silicon process step, e.g. trench corner rounding by LOCOS
}
H01L 21/76237
. . . . . .
{
introducing impurities in trench side or bottom walls, e.g. for forming channel stoppers or alter isolation behavior
}
Collapse
. . . . .
{
using semiconductor on insulator (SOI) technology( H01L 21/76297 takes precedence; manufacture of integrated circuits on insulating substrates H01L 21/84 ; silicon on sapphire (SOS) technology H01L 21/86 )
}
H01L 21/76243
. . . . . .
{
using silicon implanted buried insulating layers, e.g. oxide layers, i.e. SIMOX techniques
}
H01L 21/76245
. . . . . .
{
using full isolation by porous oxide silicon, i.e. FIPOS techniques
}
H01L 21/76248
. . . . . .
{
using lateral overgrowth techniques, i.e. ELO techniques
}
Collapse
H01L 21/76251
. . . . . .
{
using bonding techniques
}
H01L 21/76254
. . . . . . .
{
with separation/delamination along an ion implanted layer, e.g. Smart-cut, Unibond
}
H01L 21/76256
. . . . . . .
{
using silicon etch back techniques, e.g. BESOI, ELTRAN
}
H01L 21/76259
. . . . . . .
{
with separation/delamination along a porous layer
}
H01L 21/76262
. . . . . .
{
using selective deposition of single crystal silicon, i.e. SEG techniques
}
Collapse
H01L 21/76264
. . . . . .
{
SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
}
H01L 21/76267
. . . . . . .
{
Vertical isolation by silicon implanted buried insulating layers, e.g. oxide layers, i.e. SIMOX techniques
}
H01L 21/7627
. . . . . . .
{
Vertical isolation by full isolation by porous oxide silicon, i.e. FIPOS techniques
}
H01L 21/76272
. . . . . . .
{
Vertical isolation by lateral overgrowth techniques, i.e. ELO techniques
}
H01L 21/76275
. . . . . . .
{
Vertical isolation by bonding techniques
}
H01L 21/76278
. . . . . . .
{
Vertical isolation by selective deposition of single crystal silicon, i.e. SEG techniques
}
H01L 21/76281
. . . . . . .
{
Lateral isolation by selective oxidation of silicon
}
H01L 21/76283
. . . . . . .
{
Lateral isolation by refilling of trenches with dielectric material
}
H01L 21/76286
. . . . . . .
{
Lateral isolation by refilling of trenches with polycristalline material
}
H01L 21/76289
. . . . . . .
{
Lateral isolation by air gap
}
H01L 21/76291
. . . . . . .
{
Lateral isolation by field effect
}
H01L 21/76294
. . . . .
{
using selective deposition of single crystal silicon, i.e. SEG techniques
}
H01L 21/76297
. . . . .
{
Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit
}
H01L 21/763
. . . .
Polycristalline semiconductor regions
{
( H01L 21/76264 takes precedence )
}
H01L 21/764
. . . .
Air gaps
{
( H01L 21/76264 takes precedence )
}
H01L 21/765
. . . .
by field effect
{
( H01L 21/76264 takes precedence )
}
Collapse
. . .
Applying interconnections to be used for carrying current between separate components within a device
{
comprising conductors and dielectrics
}
NOTE
-
Groups H01L 21/768 to H01L 21/76898 cover multi-step processes for manufacturing interconnections.
Information peculiar to single-step processes should also be classified in the corresponding group, e.g.
- cleaning H02L21/02041
- etching H01L 21/311 , H01L 21/3213
- masking H01L 21/027 , H01L 21/033 , H01L 21/31144, H01L 21/32139
- planarizing H01L 21/3105 , H01L 21/321

Collapse
H01L 21/76801
. . . .
{
characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
}
Collapse
H01L 21/76802
. . . . .
{
by forming openings in dielectrics
}
. . . . . .
{
by forming tapered via holes
}
. . . . . .
{
the opening being a via or contact hole penetrating the underlying conductor
}
Collapse
H01L 21/76807
. . . . . .
{
for dual damascene structures
}
. . . . . . .
{
involving intermediate temporary filling with material
}
. . . . . . .
{
involving one or more buried masks
}
. . . . . . .
{
involving multiple stacked pre-patterned masks
}
. . . . . . .
{
involving a partial via etch
}
. . . . . .
{
post-treatment or after-treatment, e.g. cleaning or removal of oxides on underlying conductors
}
WARNING
-
Groups H01L 21/76814 - H01L 21/76817 are not complete; see provisionally H01L 21/76802

. . . . . .
üN: Aspects relating to the layout of the pattern or to the size of vias or trenches( layout of the interconnections per se H01L 23/528 ; CAD of ICs G06F 17/50 )]
. . . . . .
{
using printing or stamping techniques
}
. . . . .
{
Smoothing of the dielectric( planarisation of insulating materials per se H01L 21/31051 )
}
H01L 21/7682
. . . . .
{
the dielectric comprising air gaps
}
Collapse
. . . . .
{
Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc.
}
{
WARNING: Groups H01L 21/76822 - H01L 21/76837 are not complete; see provisionally H01L 21/76801
}
. . . . . .
{
transforming an insulating layer into a conductive layer
}
. . . . . .
{
by exposing the layer to particle radiation, e.g. ion implantation, irradiation with UV light or electrons etc.( plasma treatment H01L 21/76826 )
}
. . . . . .
{
by contacting the layer with gases, liquids or plasmas
}
. . . . . .
{
thermal treatment
}
Collapse
. . . . .
{
characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
}
. . . . . .
{
in via holes or trenches, e.g. non-conductive sidewall liners
}
. . . . . .
{
Multiple layers
}
. . . . . .
{
formation of thin insulating films on the sidewalls or on top of conductors( H01L 21/76831 takes precedence )
}
. . . . .
{
Combinations of two or more different dielectric layers having a low dielectric constant( H01L 21/76832 takes precedence )
}
. . . . .
{
Filling up the space between adjacent conductive structures; Gap-filling properties of dielectrics
}
Collapse
. . . .
{
characterised by the formation and the after-treatment of the conductors( etching for patterning the conductors H01L 21/3213 )
}
NOTE
-
When the interconnect is also used as the conductor part of a conductor insulator semiconductor electrode (gate level interconnections), documents are classified in the relevant electrode manufacture groups, e.g. H01L 21/28026

H01L 21/7684
. . . . .
{
Smoothing; Planarisation
}
Collapse
H01L 21/76841
. . . . .
{
Barrier, adhesion or liner layers
}
Collapse
. . . . . .
{
formed in openings in a dielectric
}
. . . . . . .
{
Bottomless liners
}
. . . . . . .
{
Layer combinations
}
. . . . . . .
{
the layer being positioned within the main fill metal
}
. . . . . . .
{
the layer being positioned on top of the main fill metal
}
Collapse
. . . . . .
{
the layer covering a conductive structure( H01L 21/76849 takes precedence )
}
. . . . . . .
{
the layer also covering the sidewalls of the conductive structure
}
Collapse
. . . . . .
{
characterized by particular after-treatment steps
}
Collapse
. . . . . . .
{
After-treatment introducing at least one additional element into the layer
}
. . . . . . . .
{
by treatment in plasmas or gaseous environments, e.g. nitriding a refractory metal liner
}
. . . . . . . .
{
by diffusing alloying elements
}
. . . . . . . .
{
by ion implantation
}
Collapse
. . . . . . .
{
Post-treatment or after-treatment not introducing additional chemical elements into the layer
}
. . . . . . . .
{
Bombardment with particles, e.g. treatment in noble gas plasmas; UV irradiation
}
. . . . . . . .
{
Thermal treatment
}
. . . . . . .
{
Selective removal of parts of the layer( H01L 21/76844 takes precedence )
}
. . . . . .
{
characterized by methods of formation other than PVD, CVD or deposition from a liquids( PVD H01L 21/2855 ; CVD H01L 21/28556 ; deposition from liquids H01L 21/288 )
}
. . . . . .
{
Forming or treating discontinuous thin films, e.g. repair, enhancement or reinforcement of discontinuous thin films
}
. . . . . .
{
Thin films associated with contacts of capacitors
}
Collapse
. . . . . .
{
Layers specifically deposited to enhance or enable the nucleation of further layers, i.e. seed layers
}
H01L 21/76873
. . . . . . .
{
for electroplating
}
. . . . . . .
{
for electroless plating
}
H01L 21/76876
. . . . . . .
{
for deposition from the gas phase, e.g. CVD
}
Collapse
H01L 21/76877
. . . . .
{
Filling of holes, grooves or trenches, e.g. vias, with conductive material
}
. . . . . .
{
by selective deposition of conductive material in the vias, e.g. selective C.V.D. on semiconductor material, plating( plating on semiconductors in general H01L 21/288 )
}
. . . . . .
{
by deposition over sacrificial masking layer, e.g. lift-off( lift-off per se H01L 21/0272 )
}
H01L 21/76882
. . . . . .
{
Reflowing or applying of pressure to better fill the contact hole
}
. . . . . .
{
Post-treatment or after-treatment of the conductive material
}
. . . . .
{
By forming conductive members before deposition of protective insulating material, e.g. pillars, studs
}
Collapse
. . . . .
{
Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
}
H01L 21/76888
. . . . . .
{
By rendering at least a portion of the conductor non conductive, e.g. oxidation
}
H01L 21/76889
. . . . . .
{
by forming silicides of refractory metals
}
H01L 21/76891
. . . . . .
{
by using supraconducting materials
}
Collapse
H01L 21/76892
. . . . . .
{
modifying the pattern
}
H01L 21/76894
. . . . . . .
{
using a laser, e.g. laser cutting, laser direct writing, laser repair
}
H01L 21/76895
. . . . .
{
Local interconnects; Local pads, as exemplified by patent document EP0896365
}
. . . .
{
Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step( self-aligned silicidation on field effect transistors H01L 29/665 )
}
. . . .
{
formed through a semiconductor substrate
}
Collapse
. .
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
NOTE
-
Integration processes for the manufacture of devices of the type classified in H01L 27/14 to H01L 27/32 are not classified in this group and its sub-groups. Instead, as they are peculiar to said devices, they are classified together with the devices Multistep processes for manufacturing memory structures in general using field effect technology are covered by H01L 27/1052; Multistep processes for manufacturing dynamic random access memory structures are covered by H01L 27/10844; Multistep processes for manufacturing static random access memory structures are covered by H01L 27/11 ; Multistep processes for manufacturing read-only memory structures are covered by H01L 27/112 ; Multistep processes for manufacturing electrically programmable read-only memory structures are covered by H01L 27/115

. . .
{
comprising a plurality of TFTs on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
}
Collapse
. . .
with subsequent division of the substrate into plural individual devices( cutting to change the surface-physical characteristics or shape of semiconductor bodies H01L 21/304 )
Collapse
. . . .
{
involving the separation of the active layers from a substrate
}
H01L 21/7813
. . . . .
{
leaving a reusable substrate, e.g. epitaxial lift off
}
Collapse
. . . .
to produce devices, each consisting of a single circuit element( H01L 21/82 takes precedence )
. . . . .
the substrate being a semiconductor body
. . . . .
the substrate being other than a semiconductor body, e.g. insulating body
Collapse
. . . .
to produce devices, e.g. integrated circuits, each consisting of a plurality of components
H01L 21/8206
. . . . .
{
the substrate being a semiconductor, using diamond technology( H01L 21/8258 takes precedence )
}
H01L 21/8213
. . . . .
{
the substrate being a semiconductor, using SiC technology( H01L 21/8258 takes precedence )
}
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H01L 21/822
. . . . .
the substrate being a semiconductor, using silicon technology( H01L 21/8258 takes precedence )
. . . . . .
{
Three dimensional integrated circuits stacked in different levels
}
Collapse
H01L 21/8222
. . . . . .
Bipolar technology
H01L 21/8224
. . . . . . .
comprising a combination of vertical and lateral transistors
H01L 21/8226
. . . . . . .
comprising merged transistor logic or integrated injection logic
Collapse
H01L 21/8228
. . . . . . .
Complementary devices, e.g. complementary transistors
H01L 21/82285
. . . . . . . .
{
Complementary vertical transistors
}
H01L 21/8229
. . . . . . .
Memory structures
Collapse
H01L 21/8232
. . . . . .
Field-effect technology
Collapse
H01L 21/8234
. . . . . . .
MIS technology
{
, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
}
H01L 21/823406
. . . . . . . .
{
Combination of charge coupled devices, i.e. CCD, or BBD
}
H01L 21/823412
. . . . . . . .
{
with a particular manufacturing method of the channel structures, e.g. channel implants, halo or pocket implants, or channel materials
}
Collapse
H01L 21/823418
. . . . . . . .
{
with a particular manufacturing method of the source or drain structures, e.g. specific source or drain implants or silicided source or drain structures or raised source or drain structures
}
H01L 21/823425
. . . . . . . . .
{
manufacturing common source or drain regions between a plurality of conductor-insulator-semiconductor structures
}
H01L 21/823431
. . . . . . . .
{
with a particular manufacturing method of transistors with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
}
Collapse
H01L 21/823437
. . . . . . . .
{
with a particular manufacturing method of the gate conductors, e.g. particular materials, shapes
}
H01L 21/823443
. . . . . . . . .
{
silicided or salicided gate conductors
}
H01L 21/82345
. . . . . . . . .
{
gate conductors with different gate conductor materials or different gate conductor implants, e.g. dual gate structures
}
H01L 21/823456
. . . . . . . . .
{
gate conductors with different shapes, lengths or dimensions
}
H01L 21/823462
. . . . . . . .
{
with a particular manufacturing method of the gate insulating layers, e.g. different gate insulating layer thicknesses, particular gate insulator materials or particular gate insulator implants
}
H01L 21/823468
. . . . . . . .
{
with a particular manufacturing method of the gate sidewall spacers, e.g. double spacers, particular spacer material or shape
}
H01L 21/823475
. . . . . . . .
{
interconnection or wiring or contact manufacturing related aspects
}
H01L 21/823481
. . . . . . . .
{
isolation region manufacturing related aspects, e.g. to avoid interaction of isolation region with adjacent structure
}
. . . . . . . .
{
with a particular manufacturing method of vertical transistor structures, i.e. with channel vertical to the substrate surface( with a current flow parallel to the substrate surface H01L 21/823431 )
}
H01L 21/823493
. . . . . . . .
{
with a particular manufacturing method of the wells or tubs, e.g. twin tubs, high energy well implants, buried implanted layers for lateral isolation (BILLI)
}
H01L 21/8236
. . . . . . . .
Combination of enhancement and depletion transistors
Collapse
H01L 21/8238
. . . . . . . .
Complementary field-effect transistors, e.g. CMOS
H01L 21/823807
. . . . . . . . .
{
with a particular manufacturing method of the channel structures, e.g. channel implants, halo or pocket implants, or channel materials
}
H01L 21/823814
. . . . . . . . .
{
with a particular manufacturing method of the source or drain structures, e.g. specific source or drain implants or silicided source or drain structures or raised source or drain structures
}
H01L 21/823821
. . . . . . . . .
{
with a particular manufacturing method of transistors with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
}
Collapse
H01L 21/823828
. . . . . . . . .
{
with a particular manufacturing method of the gate conductors, e.g. particular materials, shapes
}
H01L 21/823835
. . . . . . . . . .
{
silicided or salicided gate conductors
}
H01L 21/823842
. . . . . . . . . .
{
gate conductors with different gate conductor materials or different gate conductor implants, e.g. dual gate structures
}
H01L 21/82385
. . . . . . . . . .
{
gate conductors with different shapes, lengths or dimensions
}
H01L 21/823857
. . . . . . . . .
{
with a particular manufacturing method of the gate insulating layers, e.g. different gate insulating layer thicknesses, particular gate insulator materials or particular gate insulator implants
}
H01L 21/823864
. . . . . . . . .
{
with a particular manufacturing method of the gate sidewall spacers, e.g. double spacers, particular spacer material or shape
}
H01L 21/823871
. . . . . . . . .
{
interconnection or wiring or contact manufacturing related aspects
}
H01L 21/823878
. . . . . . . . .
{
isolation region manufacturing related aspects, e.g. to avoid interaction of isolation region with adjacent structure
}
. . . . . . . . .
{
with a particular manufacturing method of vertical transistor structures, i.e. with channel vertical to the substrate surface( with a current flow parallel to the substrate surface H01L 21/823821 )
}
H01L 21/823892
. . . . . . . . .
{
with a particular manufacturing method of the wells or tubs, e.g. twin tubs, high energy well implants, buried implanted layers for lateral isolation (BILLI)
}
. . . . . . . .
Memory structures
Collapse
H01L 21/8248
. . . . . .
Combination of bipolar and field-effect technology
H01L 21/8249
. . . . . . .
Bipolar and MOS technology
H01L 21/8252
. . . . .
the substrate being a semiconductor, using III-V technology( H01L 21/8258 takes precedence )
H01L 21/8254
. . . . .
the substrate being a semiconductor, using II-VI technology( H01L 21/8258 takes precedence )
H01L 21/8256
. . . . .
the substrate being a semiconductor, using technologies not covered by one of groups
{
H01L 21/8206 , H01L 21/8213
}
, H01L 21/822 , H01L 21/8252 and H01L 21/8254( H01L 21/8258 takes precedence )
H01L 21/8258
. . . . .
the substrate being a semiconductor, using a combination of technologies covered by
{
H01L 21/8206 , H01L 21/8213
}
, H01L 21/822 , H01L 21/8252 , H01L 21/8254 or H01L 21/8256
Collapse
H01L 21/84
. . . . .
the substrate being other than a semiconductor body, e.g. being an insulating body
H01L 21/845
. . . . . .
{
including field-effect transistors with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
}
H01L 21/86
. . . . . .
the insulating body being sapphire, e.g. silicon on sapphire structure, i.e. SOS
Collapse
{
Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor( detecting or counting or handling H01L 21/67005 ; marks applied to semiconductor devices H01L 23/544 ; testing methods or structures peculiar to devices provided for in groups H01L 31/00 to H01L 51/00 , see these groups; investigating or analysing materials by the use of optical means G01N 21/00 ; testing electrical properties of individual semiconductor devices G01R 31/26 ; testing of photovoltaic systems H02S 50/00 )
}
Collapse
.
{
Measuring as part of the manufacturing process( burn-in G01R 31/2855 )
}
. .
{
for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions( electrical measurement of diffusions H01L 22/14 )
}
H01L 22/14
. .
{
for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
}
Collapse
.
{
Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
}
H01L 22/22
. .
{
Connection or disconnection of sub-entities or redundant parts of a device in response to a measurement( testing and repair of stores after manufacture including at wafer scale G11C 29/00 ; fuses per se H01L 23/525 )
}
. .
{
Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change( voltage contrast G01R 31/311 )
}
. .
{
Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement( endpoint detection arrangements in CMP apparatus B24B 37/013 , in discharge apparatus H01J 37/32 )
}
Collapse
H01L 22/30
.
{
Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
}
H01L 22/32
. .
{
Additional lead-in metallisation on a device or substrate, e.g. additional pads or pad portions, lines in the scribe line, sacrificed conductors( arrangements for conducting electric current to or from the solid state body in operation H01L 23/48 )
}
. .
{
Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line( switching, multiplexing, gating devices G01R 19/25 ; process control with lithography, e.g. dose control, G03F 7/20 ; structures for alignment control by optical means G03F 7/70633 )
}
Collapse
Details of semiconductor or other solid state devices( H01L 25/00 takes precedence;
{
structural arrangements for testing or measuring during manufacture or treatment, or for reliability measurements H01L 22/00 ; arrangements for connecting or disconnecting semiconductor or solid-state bodies, or methods related thereto H01L 24/00 ; finger print sensors G06K 9/00006
}
)
NOTE
-
This group does not cover:
- details of semiconductor bodies or of electrodes of devices provided for in group H01L 29/00 , which details are covered by that group;
- details peculiar to devices provided for in a single main group of groups H01L 31/00 to H01L 51/00 , which details are covered by those groups.

Collapse
.
Containers ; Seals( H01L 23/12 , H01L 23/34 , H01L 23/48 , H01L 23/552 ,
{
H01L 23/66
}
take precedence;
{
for memories G11C
}
)
Collapse
H01L 23/04
. .
characterised by the shape
{
of the container or parts, e.g. caps, walls
}
H01L 23/041
. . .
{
the container being a hollow construction having no base used as a mounting for the semiconductor body
}
Collapse
H01L 23/043
. . .
the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body
H01L 23/045
. . . .
the other leads having an insulating passage through the base
H01L 23/047
. . . .
the other leads being parallel to the base
H01L 23/049
. . . .
the other leads being perpendicular to the base
H01L 23/051
. . . .
another lead being formed by a cover plate parallel to the base plate, e.g. sandwich type
Collapse
H01L 23/053
. . .
the container being a hollow construction and having an insulating
{
or insulated
}
base as a mounting for the semiconductor body
. . . .
the leads having a passage through the base
{
( H01L 23/057 takes precedence )
}
H01L 23/057
. . . .
the leads being parallel to the base
Collapse
H01L 23/06
. .
characterised by the material of the container or its electrical properties
H01L 23/08
. . .
the material being an electrical insulator, e.g. glass
H01L 23/10
. .
characterised by the material or arrangement of seals between parts,ween cap e.g. between cap and base of the container or between leads and walls of the container
Collapse
.
Mountings, e.g. non-detachable insulating substrates
H01L 23/13
. .
characterised by the shape
Collapse
H01L 23/14
. .
characterised by the material or its electrical properties
{
( printed circuit boards H05K 1/00 )
}
H01L 23/142
. . .
{
Metallic substrates having insulating layers
}
H01L 23/145
. . .
{
Organic substrates, e.g. plastic
}
. . .
{
Semiconductor insulating substrates( semiconductor conductive substrates H01L 23/4926 )
}
H01L 23/15
. . .
Ceramic or glass substrates
{
( H01L 23/142 , H01L 23/145 , H01L 23/147 take precedence )
}
Collapse
.
Fillings or auxiliary members in containers
{
or encapsulations
}
, e.g. centering rings( H01L 23/42 , H01L 23/552 take precedence )
Collapse
H01L 23/18
. .
Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
NOTE
-
Group H01L 23/26 takes precedence over groups H01L 23/20 to H01L 23/24

. . .
gaseous at the normal operating temperature of the device
. . .
liquid at the normal operating temperature of the device
. . .
Solid or gel at the normal operating temperature of the device
{
( H01L 23/3135 takes precedence )
}
H01L 23/26
. . .
including materials for absorbing or reacting with moisture or other undesired substances,
{
e.g. getters
}
Collapse
.
Encapsulations, e.g. encapsulating layers, coatings,
{
e.g. for protection
}
( H01L 23/552 takes precedence;
{
insulating layers for contacts or interconnections H01L 23/5329
}
)
Collapse
H01L 23/29
. .
characterised by the material
{
e.g. carbon( interlayer dielectrics H01L 23/5329 )
}
H01L 23/291
. . .
{
Oxides or nitrides or carbides, e.g. ceramics, glass
}
Collapse
H01L 23/293
. . .
{
Organic, e.g. plastic
}
. . . .
{
containing a filler( H01L 23/296 takes precedence )
}
H01L 23/296
. . . .
{
Organo-silicon compounds
}
H01L 23/298
. . .
{
Semiconductor material, e.g. amorphous silicon
}
Collapse
H01L 23/31
. .
characterised by the arrangement
{
or shape
}
Collapse
H01L 23/3107
. . .
{
the device being completely enclosed
}
H01L 23/3114
. . . .
{
the device being a chip scale package, e.g. CSP
}
Collapse
H01L 23/3121
. . . .
{
a substrate forming part of the encapsulation
}
H01L 23/3128
. . . . .
{
the substrate having spherical bumps for external connection
}
H01L 23/3135
. . . .
{
Double encapsulation or coating and encapsulation
}
H01L 23/3142
. . . .
{
Sealing arrangements between parts, e.g. adhesion promotors
}
H01L 23/315
. . . .
{
the encapsulation having a cavity
}
Collapse
. . .
{
Partial encapsulation or coating( mask layer used as insulation layer H01L 21/31 )
}
H01L 23/3164
. . . .
{
the coating being a foil
}
H01L 23/3171
. . . .
{
the coating being directly applied to the semiconductor body, e.g. passivation layer( H01L 23/3178 takes precedence )
}
. . . .
{
Coating or filling in grooves made in the semiconductor body
}
H01L 23/3185
. . . .
{
the coating covering also the sidewalls of the semiconductor body
}
H01L 23/3192
. . . .
{
Multilayer coating
}
.
Holders for supporting the complete device in operation, i.e. detachable fixtures( H01L 23/40 takes precedence; connectors,
{
e.g. sockets
}
, in general H01R ; for printed circuits H05K )
Collapse
.
Arrangements for cooling, heating, ventilating or temperature compensation;
{
Temperature sensing arrangements( thermal treatment apparatus H01L 21/00 )
}
H01L 23/345
. .
{
Arrangements for heating( thermal treatment apparatus H01L 21/00 )
}
Collapse
. .
Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
{
( H01L 23/28 , H01L 23/40 , H01L 23/42 , H01L 23/44 , H01L 23/46 take precedence; heating H01L 23/345 )
}
Collapse
. . .
Cooling facilitated by shape of device
{
( H01L 23/38 , H01L 23/40 , H01L 23/42 , H01L 23/44 , H01L 23/46 take precedence )
}
. . . .
{
Foil-like cooling fins or heat sinks( being part of lead-frames H01L 23/49568 )
}
H01L 23/3675
. . . .
{
characterised by the shape of the housing
}
H01L 23/3677
. . . .
{
Wire-like or pin-like cooling fins or heat sinks
}
Collapse
H01L 23/373
. . .
Cooling facilitated by selection of materials for the device
{
or materials for thermal expansion adaptation, e.g. carbon
}
. . . .
{
Ceramic materials or glass( H01L 23/3732 , H01L 23/3733 , H01L 23/3735 , H01L 23/3737 , H01L 23/3738 take precedence )
}
. . . .
{
Diamonds
}
. . . .
{
having a heterogeneous or anisotropic structure, e.g. powder or fibres in a matrix, wire mesh, porous structures( H01L 23/3732 , H01L 23/3737 take precedence )
}
H01L 23/3735
. . . .
{
Laminates or multilayers, e.g. direct bond copper ceramic substrates
}
. . . .
{
Metallic materials( H01L 23/3732 , H01L 23/3733 , H01L 23/3735 , H01L 23/3737 , H01L 23/3738 take precedence )
}
H01L 23/3737
. . . .
{
Organic materials with or without a thermoconductive filler
}
H01L 23/3738
. . . .
{
Semiconductor materials
}
H01L 23/38
. .
Cooling arrangements using the Peltier effect
Collapse
H01L 23/40
. .
Mountings or securing means for detachable cooling or heating arrangements
{
( heating H01L 23/345 ); fixed by friction, plugs or springs
}
Collapse
H01L 23/4006
. . .
{
with bolts or screws
}
. . . .
{
for stacked arrangements of a plurality of semiconductor devices( assemblies per se H01L 25/00 )
}
Collapse
H01L 2023/4018
. . . .
{
characterised by the type of device to be heated or cooled
}
H01L 2023/4025
. . . . .
{
Base discrete devices, e.g. presspack, disc-type transistors
}
H01L 2023/4031
. . . . .
{
Packaged discrete devices, e.g. to-3 housings, diodes
}
Collapse
H01L 2023/4037
. . . .
{
characterised by thermal path or place of attachment of heatsink
}
H01L 2023/4043
. . . . .
{
heatsink to have chip
}
H01L 2023/405
. . . . .
{
heatsink to package
}
H01L 2023/4056
. . . . .
{
heatsink to additional heatsink
}
H01L 2023/4062
. . . . .
{
heatsink to or through board or cabinet
}
H01L 2023/4068
. . . . .
{
Heatconductors between device and heatsink, e.g. compliant heat-spreaders, heat-conducting bands
}
Collapse
H01L 2023/4075
. . . .
{
Mechanical elements
}
H01L 2023/4081
. . . . .
{
Compliant clamping elements not primarily serving heat-conduction
}
H01L 2023/4087
. . . . .
{
Mounting accessories, interposers, clamping or screwing parts
}
H01L 23/4093
. . .
{
Snap-on arrangements, e.g. clips
}
Collapse
. .
Fillings or auxiliary members in containers
{
or encapsulations
}
selected or arranged to facilitate heating or cooling(
{
heating H01L 23/345
}
; characterised by selection of materials for the device H01L 23/373 )
Collapse
. . .
Cooling by change of state, e.g. use of heat pipes
{
( by liquefied gas H01L 23/445 )
}
H01L 23/4275
. . . .
{
by melting or evaporation of solids
}
Collapse
H01L 23/433
. . .
Auxiliary members
{
in containers
}
characterised by their shape, e.g. pistons
H01L 23/4332
. . . .
{
Bellows
}
. . . .
{
Auxiliary members in encapsulations( H01L 23/49568 takes precedence )
}
H01L 23/4336
. . . .
{
in combination with jet impingement
}
H01L 23/4338
. . . .
{
Pistons, e.g. spring-loaded members
}
Collapse
. .
the complete device being wholly immersed in a fluid other than air
{
( H01L 23/427 takes precedence )
}
H01L 23/445
. . .
{
the fluid being a liquefied gas, e.g. in a cryogenic vessel
}
Collapse
. .
involving the transfer of heat by flowing fluids( H01L 23/42 , H01L 23/44 take precedence )
. . .
by flowing gases, e.g. air
{
( H01L 23/473 takes precedence )
}
Collapse
. . .
by flowing liquids
{
( H01L 23/4332 , H01L 23/4338 take precedence )
}
. . . .
{
Jet impingement( H01L 23/4336 takes precedence )
}
Collapse
.
Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements( in general H01R );
{
Selection of materials therefor
}
NOTE
-
Arrangements for connecting or disconnecting semiconductor or other solid state bodies, or methods related thereto, other than those arrangements or methods covered by the following subgroups, are covered by H01L 24/00

H01L 23/481
. .
{
Internal lead connections, e.g. via connections, feedthrough structures
}
Collapse
. .
consisting of lead-in layers inseparably applied to the semiconductor body
{
( electrodes H01L 29/40 )
}
WARNING
-
The documents of this group dealing with arrangements for connecting semiconductor or other solid state bodies are being continuously reclassified to H01L 24/01 and subgroups

H01L 23/4821
. . .
{
Bridge structure with air gap
}
H01L 23/4822
. . .
{
Beam leads
}
H01L 23/4824
. . .
{
Pads with extended contours, e.g. grid structure, branch structure, finger structure
}
H01L 23/4825
. . .
{
for devices consisting of semiconductor layers on insulating or semi-insulating substrates, e.g. silicon on sapphire devices, i.e. SOS
}
Collapse
H01L 23/4827
. . .
{
Materials
}
H01L 23/4828
. . . .
{
Conductive organic material or pastes, e.g. conductive adhesives, inks
}
Collapse
. . .
consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
{
( H01L 23/4821 , H01L 23/4822 , H01L 23/4824 , H01L 23/4825 take precedence; materials H01L 23/532 , bond pads H01L 24/02 , bump connectors H01L 24/10 )
}
WARNING
-
The documents of this group dealing with arrangements for connecting semiconductor or other solid state bodies are being continuously reclassified to H01L 24/01 and subgroups

H01L 23/4855
. . . .
{
Overhang structure
}
Collapse
. .
consisting of soldered
{
or bonded
}
constructions
{
( bump connectors H01L 24/01 )
}
H01L 23/49
. . .
Wire-like
{
arrangements or pins or rods( using optical fibres H01L 23/48 ; pins attached to insulating substrates H01L 23/49811 )
}
WARNING
-
This group is no longer used for the classification of new documents as from June 1, 2010. The backlog of this group is being continuously reclassified to H01L23/00C2W and subgroups

Collapse
H01L 23/492
. . .
Bases or plates
{
or solder therefor
}
H01L 23/4922
. . . .
{
having a heterogeneous or anisotropic structure
}
Collapse
H01L 23/4924
. . . .
{
characterised by the materials
}
H01L 23/4926
. . . . .
{
the materials containing semiconductor material
}
H01L 23/4928
. . . . .
{
the materials containing carbon
}
Collapse
. . .
Lead-frames
{
or other flat leads( H01L 23/498 takes precedence; lead frame interconnections between components H01L 23/52 )
}
Collapse
H01L 23/49503
. . . .
{
characterised by the die pad
}
. . . . .
{
an insulative substrate being used as a diepad, e.g. ceramic, plastic( H01L 23/49531 takes precedence )
}
H01L 23/4951
. . . . .
{
Chip-on-leads or leads-on-chip techniques, i.e. inner lead fingers being used as die pad
}
H01L 23/49513
. . . . .
{
having bonding material between chip and die pad
}
Collapse
H01L 23/49517
. . . .
{
Additional leads
}
H01L 23/4952
. . . . .
{
the additional leads being a bump or a wire
}
H01L 23/49524
. . . . .
{
the additional leads being a tape carrier or flat leads
}
H01L 23/49527
. . . . .
{
the additional leads being a multilayer
}
H01L 23/49531
. . . . .
{
the additional leads being a wiring board
}
H01L 23/49534
. . . .
{
Multi-layer
}
H01L 23/49537
. . . .
{
Plurality of lead frames mounted in one device
}
Collapse
H01L 23/49541
. . . .
{
Geometry of the lead-frame
}
. . . . .
{
Deformation absorbing parts in the lead frame plane, e.g. meanderline shape( H01L 23/49562 takes precedence )
}
Collapse
. . . . .
{
Cross section geometry( H01L 23/49562 takes precedence )
}
Collapse
H01L 23/49551
. . . . . .
{
characterised by bent parts
}
H01L 23/49555
. . . . . . .
{
the bent parts being the outer leads
}
H01L 23/49558
. . . . .
{
Insulating layers on lead frames, e.g. bridging members
}
H01L 23/49562
. . . . .
{
for devices being provided for in H01L 29/00
}
H01L 23/49565
. . . . .
{
Side rails of the lead frame, e.g. with perforations, sprocket holes
}
H01L 23/49568
. . . .
{
specifically adapted to facilitate heat dissipation
}
. . . .
{
consisting of thin flexible metallic tape with or without a film carrier( H01L 23/49503 to H01L 23/49568 and H01L 23/49575 to H01L 23/49579 take precedence )
}
H01L 23/49575
. . . .
{
Assemblies of semiconductor devices on lead frames
}
Collapse
H01L 23/49579
. . . .
{
characterised by the materials of the lead frames or layers thereon
}
H01L 23/49582
. . . . .
{
Metallic layers on lead frames
}
H01L 23/49586
. . . . .
{
Insulating layers on lead frames
}
H01L 23/49589
. . . .
{
Capacitor integral with or on the leadframe
}
H01L 23/49593
. . . .
{
Battery in combination with a leadframe
}
H01L 23/49596
. . . .
{
Oscillators in combination with lead-frames
}
Collapse
. . .
Leads,
{
i.e. metallisations or lead-frames
}
on insulating substrates,
{
e.g. chip carriers( shape of the substrate H01L 23/13 )
}
H01L 23/49805
. . . .
{
the leads being also applied on the sidewalls or the bottom of the substrate, e.g. leadless packages for surface mounting
}
Collapse
. . . .
{
Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads( H01L 23/49827 takes precedence )
}
H01L 23/49816
. . . . .
{
Spherical bumps on the substrate for external connection, e.g. ball grid arrays (BGA)
}
. . . .
{
Multilayer substrates( multilayer metallisation on monolayer substrate H01L 23/498 )
}
. . . .
{
Via connections through the substrates, e.g. pins going through the substrate, coaxial cables( H01L 23/49822 , H01L 23/49833 , H01L 23/4985 , H01L 23/49861 take precedence )
}
H01L 23/49833
. . . .
{
the chip support structure consisting of a plurality of insulating substrates
}
Collapse
H01L 23/49838
. . . .
{
Geometry or layout
}
H01L 23/49844
. . . . .
{
for devices being provided for in H01L 29/00
}
. . . .
{
Flexible insulating substrates( H01L 23/49572 and H01L 23/49855 take precedence )
}
. . . .
{
for flat-cards, e.g. credit cards( cards per se G06K 19/00 )
}
. . . .
{
Lead-frames fixed on or encapsulated in insulating substrates( H01L 23/4985 , H01L 23/49805 take precedence )
}
Collapse
. . . .
{
characterised by the materials( materials of the substrates H01L 23/14 , of the lead-frames H01L 23/49579 )
}
H01L 23/49872
. . . . .
{
the conductive materials containing semiconductor material
}
. . . . .
{
Carbon, e.g. fullerenes( superconducting fullerenes H01L 39/123 )
}
. . . . .
{
the conductive materials containing organic materials or pastes, e.g. for thick films( for printed circuits H05K 1/092 )
}
H01L 23/49888
. . . . .
{
the conductive materials containing superconducting material
}
H01L 23/49894
. . . . .
{
Materials of the insulating layers or coatings
}
. .
for integrated circuit devices,
{
e.g. power bus, number of leads
}
( H01L 23/482 to H01L 23/498 take precedence )
Collapse
H01L 23/52
.
Arrangements for conducting electric current within the device in operation from one component to another,
{
i.e. interconnections, e.g. wires, lead frames( optical interconnections G02B 6/00 )
}
Collapse
H01L 23/522
. .
including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
H01L 23/5221
. . .
{
Crossover interconnections
}
Collapse
. . .
{
Capacitive arrangements or effects of, or between wiring layers( other capacitive arrangements H01L 23/642 )
}
H01L 23/5223
. . . .
{
Capacitor integral with wiring layers
}
H01L 23/5225
. . . .
{
Shielding layers formed together with wiring layers
}
H01L 23/5226
. . .
{
Via connections in a multilevel interconnection structure
}
. . .
{
Inductive arrangements or effects of, or between, wiring layers( other inductive arrangements H01L 23/645 )
}
. . .
{
Resistive arrangements or effects of, or between, wiring layers( other resistive arrangements H01L 23/647 )
}
Collapse
H01L 23/525
. . .
with adaptable interconnections
Collapse
H01L 23/5252
. . . .
{
comprising anti-fuses, i.e. connections having their state changed from non-conductive to conductive
}
H01L 23/5254
. . . . .
{
the change of state resulting from the use of an external beam, e.g. laser beam or ion beam
}
Collapse
H01L 23/5256
. . . .
{
comprising fuses, i.e. connections having their state changed from conductive to non-conductive
}
H01L 23/5258
. . . . .
{
the change of state resulting from the use of an external beam, e.g. laser beam or ion beam
}
Collapse
. . .
{
Geometry or
}
layout of the interconnection structure
{
( H01L 27/0207 takes precedence; algorithms G06F 17/50 )
}
H01L 23/5283
. . . .
{
Cross-sectional geometry
}
H01L 23/5286
. . . .
{
Arrangements of power or ground buses
}
Collapse
H01L 23/532
. . .
characterised by the materials
Collapse
H01L 23/53204
. . . .
{
Conductive materials
}
Collapse
. . . . .
{
based on metals, e.g. alloys, metal silicides( H01L 23/53285 takes precedence )
}
Collapse
H01L 23/53214
. . . . . .
{
the principal metal being aluminium
}
H01L 23/53219
. . . . . . .
{
Aluminium alloys
}
H01L 23/53223
. . . . . . .
{
Additional layers associated with aluminium layers, e.g. adhesion, barrier, cladding layers
}
Collapse
H01L 23/53228
. . . . . .
{
the principal metal being copper
}
H01L 23/53233
. . . . . . .
{
Copper alloys
}
H01L 23/53238
. . . . . . .
{
Additional layers associated with copper layers, e.g. adhesion, barrier, cladding layers
}
Collapse
H01L 23/53242
. . . . . .
{
the principal metal being a noble metal, e.g. gold
}
H01L 23/53247
. . . . . . .
{
Noble-metal alloys
}
H01L 23/53252
. . . . . . .
{
Additional layers associated with noble-metal layers, e.g. adhesion, barrier, cladding layers
}
Collapse
H01L 23/53257
. . . . . .
{
the principal metal being a refractory metal
}
H01L 23/53261
. . . . . . .
{
Refractory-metal alloys
}
H01L 23/53266
. . . . . . .
{
Additional layers associated with refractory-metal layers, e.g. adhesion, barrier, cladding layers
}
H01L 23/53271
. . . . .
{
containing semiconductor material, e.g. polysilicon
}
. . . . .
{
containing carbon, e.g. fullerenes( superconducting fullerenes H01L 39/123 )
}
H01L 23/5328
. . . . .
{
containing conductive organic materials or pastes, e.g. conductive adhesives, inks
}
H01L 23/53285
. . . . .
{
containing superconducting materials
}
Collapse
H01L 23/5329
. . . .
{
Insulating materials
}
H01L 23/53295
. . . . .
{
Stacked insulating layers
}
. .
including internal interconnections, e.g. cross-under constructions
{
( internal lead connections H01L 23/481 )
}
Collapse
. .
the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates(
{
H05K takes precedence; manufacture or treatment H01L 21/4846
}
; mountings per se H01L 23/12 ;
{
materials H01L 23/49866
}
)
H01L 23/5381
. . .
{
Crossover interconnections, e.g. bridge stepovers
}
H01L 23/5382
. . .
{
Adaptable interconnections, e.g. for engineering changes
}
. . .
{
Multilayer substrates( H01L 23/5385 takes precedence; multilayer metallisation on monolayer substrates H01L 23/538 )
}
. . .
{
Conductive vias through the substrate with or without pins, e.g. buried coaxial conductors( H01L 23/5383 , H01L 23/5385 take precedence; pins attached to insulating substrates H01L 23/49811 )
}
H01L 23/5385
. . .
{
Assembly of a plurality of insulating substrates
}
H01L 23/5386
. . .
{
Geometry or layout of the interconnection structure
}
. . .
{
Flexible insulating substrates( H01L 23/5388 takes precedence )
}
. . .
{
for flat cards, e.g. credit cards( cards per se G06K 19/00 )
}
H01L 23/5389
. . .
{
the chips being integrally enclosed by the interconnect and support structures
}
.
Marks applied to semiconductor devices
{
or parts
}
, e.g. registration marks,
{
alignment structures, wafer maps( test patterns for characterising or monitoring manufacturing processes H01L 22/00 )
}
NOTE
-
When classifying in group H01L 23/544 , details are to be further indexed by using the indexing codes chosen from H01L 2223/544 and subgroups

Collapse
.
Protection against radiation, e.g. light
{
or electromagnetic waves
}
H01L 23/556
. .
against alpha rays
H01L 23/562
.
{
Protection against mechanical damage( H01L 23/02 , H01L 23/28 take precedence )
}
H01L 23/564
.
{
Details not otherwise provided for, e.g. protection against moisture( getters H01L 23/26 )
}
Collapse
H01L 23/57
.
{
Protection from inspection, reverse engineering or tampering
}
H01L 23/573
. .
{
using passive means
}
H01L 23/576
. .
{
using active circuits
}
Collapse
.
Structural electrical arrangements for semiconductor devices not otherwise provided for,
{
e.g. in combination with batteries( H01L 23/49593 , H01L 23/49596 take precedence )
}
. .
{
comprising conductive layers or plates or strips or rods or rings( H01L 23/60 , H01L 23/62 , H01L 23/64 , H01L 23/66 take precedence )
}
. .
Protection against electrostatic charges or discharges, e.g. Faraday shields( in general H05F )
H01L 23/62
. .
Protection against overvoltage, e.g. fuses, shunts
Collapse
H01L 23/64
. .
Impedance arrangements
. . .
{
Capacitive arrangements( H01L 23/49589 , H01L 23/645 , H01L 23/647 , H01L 23/66 take precedence; capacitive effects between wiring layers on the semiconductor body H01L 23/5222 )
}
. . .
{
Inductive arrangements( H01L 23/647 , H01L 23/66 take precedence )
}
. . .
{
Resistive arrangements( H01L 23/66 , H01L 23/62 take precedence )
}
H01L 23/66
. . .
High-frequency adaptations
NOTE
-
When classifying in group H01L 23/66 , details are to be further indexed by using the indexing codes chosen from H01L 2223/66 and subgroups

Collapse
{
Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
}
NOTE
-
1. This group does not cover: - details of semiconductor bodies or of electrodes of devices provided for in group H01L 29/00 , which details are covered by that group; - details peculiar to devices provided for in a single main group of groups H01L 31/00 to H01L 51/00 , which details are covered by those groups. - printed circuits, which are covered by groups H05K 1/00 to H05K1/18F; - apparatus or manufacturing processes for printed circuits, which are covered by groups H05K 3/00 to H05K3/46D; - manufacture or treatment of parts, which are covered by group H01L 21/48 and subgroups except H01L 21/4885 to H01L 21/4896 ; - assemblies of semiconductor devices, which are covered by groups H01L 21/50 to H01L21/56T; - applying interconnections to be used for carrying current between separate components within a device, which is covered by group H01L 21/768 and subgroups; - containers or seals, which are covered by groups H01L 23/02 to H01L 23/10 ; - mountings, which are covered by groups H01L 23/12 to H01L 23/15 and subgroups; - arrangements for cooling, heating, ventilating or temperature compensation, which are covered by groups H01L 23/34 to H01L23/473J; - arrangements for conducting electric current, which are covered by groups H01L 23/48 to H01L 23/50 , and by groups H01L 23/52 to H01L23/538V; - structural electrical arrangements, which are covered by groups H01L 23/58 to H01L 23/66 ; - assemblies of semiconductor or other solid state devices, which are covered by groups H01L 25/00 to H01L 25/18 . 2. In this group the following indexing codes are used : H01L 24/00H01L 2224/00 , H01L 2924/00 , and subgroups thereof

WARNING
-
H01L 21/4885 , H01L 21/58 , H01L 23/48 , H01L 23/482 , H01L 23/485 , H01L 23/488

Collapse
H01L 24/01
.
{
Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
}
WARNING
-
1. Not complete, see provisionally also H01L 23/482 , H01L 23/485 and subgroups 2. Pending reorganisation subgroups of this group are not complete; see also this group and the other subgroups

Collapse
. .
{
Bonding areas( on insulating substrates, e.g. chip carriers, H01L 23/49816 , H01L 23/49838 , H01L 23/5389 ); Manufacturing methods related thereto
}
WARNING
-
1. Pending reorganisation see provisionally also H01L 24/10 for Under Bump Metallization [UBM] 2. Pending reorganisation, subgroups of this group are not complete; see also this group

H01L 24/03
. . .
{
Manufacturing methods
}
Collapse
H01L 24/04
. . .
{
Structure, shape, material or disposition of the bonding areas prior to the connecting process
}
H01L 24/05
. . . .
{
of an individual bonding area
}
. . . .
{
of a plurality of bonding areas
}
Collapse
H01L 24/07
. . .
{
Structure, shape, material or disposition of the bonding areas after the connecting process
}
H01L 24/08
. . . .
{
of an individual bonding area
}
H01L 24/09
. . . .
{
of a plurality of bonding areas
}
Collapse
. .
{
Bump connectors( bumps on insulating substrates, e.g. chip carriers, H01L 23/49816 ); Manufacturing methods related thereto
}
WARNING
-

. . .
{
Manufacturing methods( for bumps on insulating substrates H01L 21/4853 )
}
Collapse
. . .
{
Structure, shape, material or disposition of the bump connectors prior to the connecting process
}
H01L 24/13
. . . .
{
of an individual bump connector
}
. . . .
{
of a plurality of bump connectors
}
Collapse
H01L 24/15
. . .
{
Structure, shape, material or disposition of the bump connectors after the connecting process
}
H01L 24/16
. . . .
{
of an individual bump connector
}
H01L 24/17
. . . .
{
of a plurality of bump connectors
}
Collapse
. .
{
High density interconnect [HDI
}
connectors ; Manufacturing methods related thereto( interconnection structure between a plurality of semiconductor chips H01L 23/5389 )]
WARNING
-
1. Pending reorganisation, see provisionally also H01L24/822 2. Pending reorganisation, subgroups of this group are not complete; see also this group . Pending reorganisation, subgroups of this group are not complete; see also this group

H01L 24/19
. . .
{
Manufacturing methods of high density interconnect preforms
}
H01L 24/20
. . .
{
Structure, shape, material or disposition of high density interconnect preforms
}
Collapse
H01L 24/23
. . .
{
Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
}
H01L 24/24
. . . .
{
of an individual high density interconnect connector
}
H01L 24/25
. . . .
{
of a plurality of high density interconnect connectors
}
Collapse
. .
{
Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
}
. . .
{
Manufacturing methods
}
Collapse
H01L 24/28
. . .
{
Structure, shape, material or disposition of the layer connectors prior to the connecting process
}
H01L 24/29
. . . .
{
of an individual layer connector
}
H01L 24/30
. . . .
{
of a plurality of layer connectors
}
Collapse
H01L 24/31
. . .
{
Structure, shape, material or disposition of the layer connectors after the connecting process
}
H01L 24/32
. . . .
{
of an individual layer connector
}
H01L 24/33
. . . .
{
of a plurality of layer connectors
}
Collapse
. .
{
Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
}
WARNING
-
1. Pending reorganisation see provisionally also H01L 24/01 , H01L 24/42 , H01L 24/85 2. Pending reorganisation, subgroups of this group are not complete; see also this group

H01L 24/35
. . .
{
Manufacturing methods
}
Collapse
H01L 24/36
. . .
{
Structure, shape, material or disposition of the strap connectors prior to the connecting process
}
H01L 24/37
. . . .
{
of an individual strap connector
}
H01L 24/38
. . . .
{
of a plurality of strap connectors
}
Collapse
H01L 24/39
. . .
{
Structure, shape, material or disposition of the strap connectors after the connecting process
}
H01L 24/40
. . . .
{
of an individual strap connector
}
H01L 24/41
. . . .
{
of a plurality of strap connectors
}
Collapse
H01L 24/42
. .
{
Wire connectors; Manufacturing methods related thereto
}
WARNING
-

H01L 24/43
. . .
{
Manufacturing methods
}
WARNING
-
H01L 21/4885 and subgroups, H01L 24/42 , H01L 24/85

Collapse
H01L 24/44
. . .
{
Structure, shape, material or disposition of the wire connectors prior to the connecting process
}
H01L 24/45
. . . .
{
of an individual wire connector
}
H01L 24/46
. . . .
{
of a plurality of wire connectors
}
Collapse
H01L 24/47
. . .
{
Structure, shape, material or disposition of the wire connectors after the connecting process
}
H01L 24/48
. . . .
{
of an individual wire connector
}
H01L 24/49
. . . .
{
of a plurality of wire connectors
}
. .
{
Tape automated bonding [TAB
}
connectors, i.e. film carriers ; Manufacturing methods related thereto( thin flexible metallic tape with or without a film carrier H01L 23/49572 , flexible insulating substrates H01L 23/4985 , H01L 23/5387 )]
WARNING
-
H01L 24/86

Collapse
H01L 24/63
. .
{
Connectors not provided for in any of the groups H01L 24/10 to H01L 24/50 and subgroups; Manufacturing methods related thereto
}
H01L 24/64
. . .
{
Manufacturing methods
}
Collapse
H01L 24/65
. . .
{
Structure, shape, material or disposition of the connectors prior to the connecting process
}
H01L 24/66
. . . .
{
of an individual connector
}
H01L 24/67
. . . .
{
of a plurality of connectors
}
Collapse
H01L 24/68
. . .
{
Structure, shape, material or disposition of the connectors after the connecting process
}
H01L 24/69
. . . .
{
of an individual connector
}
H01L 24/70
. . . .
{
of a plurality of connectors
}
Collapse
.
{
Means for bonding not being attached to, or not being formed on, the surface to be connected( holders for supporting the complete device in operation  H01L 23/32 )
}
H01L 24/72
. .
{
Detachable connecting means consisting of mechanical auxiliary parts connecting the device, e.g. pressure contacts using springs or clips
}
H01L 24/73
.
{
Means for bonding being of different types provided for in two or more of groups H01L 24/10 , H01L 24/18 , H01L 24/26 , H01L 24/34 , H01L 24/42 , H01L 24/50 , H01L 24/63 , H01L 24/71
}
Collapse
H01L 24/74
.
{
Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
}
Collapse
H01L 24/741
. .
{
Apparatus for manufacturing means for bonding, e.g. connectors
}
H01L 24/742
. . .
{
Apparatus for manufacturing bump connectors
}
H01L 24/743
. . .
{
Apparatus for manufacturing layer connectors
}
H01L 24/744
. . .
{
Apparatus for manufacturing strap connectors
}
H01L 24/745
. . .
{
Apparatus for manufacturing wire connectors
}
H01L 24/75
. .
{
Apparatus for connecting with bump connectors or layer connectors
}
H01L 24/76
. .
{
Apparatus for connecting with build-up interconnects
}
H01L 24/77
. .
{
Apparatus for connecting with strap connectors
}
H01L 24/78
. .
{
Apparatus for connecting with wire connectors
}
H01L 24/79
. .
{
Apparatus for Tape Automated Bonding [TAB]
}
H01L 24/799
. .
{
Apparatus for disconnecting
}
Collapse
.
{
Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
}
WARNING
-
1. Pending reorganisation see provisionally also H01L21/60 2. Subgroups of this group are not complete; see also this group and the other subgroups

H01L 24/81
. .
{
using a bump connector
}
WARNING
-
H01L 24/81

. .
{
by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI
}
( interconnection structure between a plurality of semiconductor chips H01L 23/5389 )]
H01L 24/83
. .
{
using a layer connector
}
H01L 24/84
. .
{
using a strap connector
}
WARNING
-
H01L 24/85

. .
{
using a wire connector( wire bonding in general B23K 20/004 )
}
H01L 24/86
. .
{
using tape automated bonding [TAB
}
]
H01L 24/89
. .
{
using at least one connector not provided for in any of the groups H01L 24/81 to H01L 24/86
}
H01L 24/90
.
{
Methods for connecting semiconductor or solid state bodies using means for bonding not being attached to, or not being formed on, the body surface to be connected, e.g. pressure contacts using springs or clips
}
WARNING
-
H01L21/60E

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H01L 24/91
.
{
Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L 24/80 to H01L 24/90
}
H01L 24/92
. .
{
Specific sequence of method steps
}
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.
{
Batch processes
}
WARNING
-
H01L 24/80 and subgroups and H01L 24/90

H01L 24/94
. .
{
at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
}
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H01L 24/95
. .
{
at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
}
. . .
{
the devices being encapsulated in a common layer, e.g. neo-wafer or pseudo-wafer, said common layer being separable into individual assemblies after connecting
}
H01L 24/97
. . .
{
the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
}
H01L 24/98
.
{
Methods for disconnecting semiconductor or solid-state bodies
}
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Assemblies consisting of a plurality of individual semiconductor or other solid state devices
{
; Multistep manufacturing processes thereof
}
(
{
lead frames with assemblies of semiconductor devices thereon H01L 23/49575 ; assembling semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L 21/06 to H01L 21/326 , e.g. sealing of a cap to a base of a container, H01L 21/50
}
; devices consisting of a plurality of solid state components formed in or on a common substrate H01L 27/00 ; assemblies of photoelectric cells H01L 31/042 ,
{
H01G 9/20
}
; generators using solar cells or solar panels
{
H02S
}
; details of complete circuit assemblies for which provision exists in another subclass, e.g. details of television receivers, see the relevant subclass, e.g. H04N; details of assemblies of electrical components in general H05K )
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.
all the devices being of a type provided for in the same subgroup of groups H01L 27/00 to H01L 51/00 , e.g. assemblies of rectifier diodes
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H01L 25/04
. .
the devices not having separate containers
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H01L 25/041
. . .
{
the devices being of a type provided for in group H01L 31/00
}
. . . .
{
the devices being arranged next to each other( solar cells H01L 31/042 )
}
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. . . .
{
Stacked arrangements of devices
}
H01L 25/045
. . . . .
{
the devices being solar cells
}
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H01L 25/046
. . .
{
the devices being of a type provided for in group H01L 51/00
}
. . . .
{
the devices being of a type provided for in group H01L 51/42 , e.g. photovoltaic modules based on organic solar cells
}
. . . .
{
the devices being of a type provided for in group H01L 51/50 , e.g. assembly of organic light emitting devices
}
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H01L 25/065
. . .
the devices being of a type provided for in group H01L 27/00
NOTE
-
Group H01L 25/0652 takes precedence over groups H01L 25/0655 and H01L 25/0657

H01L 25/0652
. . . .
{
the devices being arranged next and on each other, i.e. mixed assemblies
}
H01L 25/0655
. . . .
{
the devices being arranged next to each other
}
H01L 25/0657
. . . .
{
Stacked arrangements of devices
}
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H01L 25/07
. . .
the devices being of a type provided for in group H01L 29/00
NOTE
-
Group H01L 25/071 takes precedence over groups H01L 25/072 to H01L 25/074

H01L 25/071
. . . .
{
the devices being arranged next and on each other, i.e. mixed assemblies
}
H01L 25/072
. . . .
{
the devices being arranged next to each other
}
H01L 25/073
. . . .
{
Apertured devices mounted on one or more rods passed through the apertures
}
H01L 25/074
. . . .
{
Stacked arrangements of non-apertured devices
}
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. . .
the devices being of a type provided for in group H01L 33/00
H01L 25/0753
. . . .
{
the devices being arranged next to each other
}
H01L 25/0756
. . . .
{
Stacked arrangements of devices
}
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H01L 25/10
. .
the devices having separate containers
H01L 25/105
. . .
{
the devices being of a type provided for in group H01L 27/00
}
NOTE
-
When classifying in group H01L 25/105 , details of the assemblies are to be further indexed by using the indexing codes chosen from H01L 2225/1005 and subgroups

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H01L 25/11
. . .
the devices being of a type provided for in group H01L 29/00
NOTE
-
Group H01L 25/112 takes precedence over groups H01L 25/115 and H01L 25/117

H01L 25/112
. . . .
{
Mixed assemblies
}
H01L 25/115
. . . .
{
the devices being arranged next to each other
}
H01L 25/117
. . . .
{
Stacked arrangements of devices
}
H01L 25/13
. . .
the devices being of a type provided for in group H01L 33/00
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.
the devices being of types provided for in two or more different main groups of H01L 27/00 to H01L 49/00
{
and H01L 51/00
}
, e.g. forming hybrid circuits
{
( interconnections for hybrid circuits H01L 23/5389 )
}
H01L 25/162
. .
{
the devices being mounted on two or more different substrates
}
H01L 25/165
. .
{
Containers
}
H01L 25/167
. .
{
comprising optoelectronic devices, e.g. LED, photodiodes
}
.
the devices being of types provided for in two or more different subgroups of the same main group of groups H01L 27/00 to H01L 51/00
{
( comprising devices provided for in H01L 27/144 and subgroups, see H01L 27/144 and subgroups )
}
.
{
Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L 27/00 or H01L 29/00( H01L 21/50 takes precedence )
}
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Devices consisting of a plurality of semiconductor or other solid state components formed in or on a common substrate( processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof H01L 21/70 , H01L 31/00 to H01L 51/00 ; details thereof H01L 23/00 , H01L 29/00 to H01L 51/00 ; assemblies consisting of a plurality of individual solid state devices H01L 25/00 ; assemblies of electrical components in general H05K )
NOTE
-
In this group, in the absence of an indication to the contrary, classification is made in the last appropriate place.

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.
comprising only passive thin-film or thick-film elements formed on a common insulating substrate
{
( passive two-terminal components without a potential-jump or surface barrier for integrated circuits, details thereof and multistep manufacturing processes therefor H01L 28/00 )
}
NOTE
-
In groups H01L 27/01 to H01L 27/26 , in the absence of an indication to the contrary, classification is made in the last appropriate place.

. .
{
Thick-film circuits
}
. .
{
Thin-film circuits
}
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.
including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier ; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
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H01L 27/0203
. .
{
Particular design considerations for integrated circuits
}
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