| Outline |
Indent Level
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| Color | Curly Brackets (indicating CPC extensions to IPC) | |
CPC | COOPERATIVE PATENT CLASSIFICATION | |||||||||||||
![]() | SINGLE-CRYSTAL-GROWTH (by using ultra-high pressure, e.g. for the formation of diamonds B01J 3/06); UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL (zone-refining of metals or alloys C22B); PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE (casting of metals, casting of other substances by the same processes or devices B22D; working of plastics B29; modifying the physical structure of metals or alloys C21D, C22F); SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE (for producing semiconductor devices or parts thereof H01L); APPARATUS THEREFOR NOTE -
WARNING -
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![]() | Guide Heading: | Single-crystal growth from solids or gels |
![]() | Single-crystal growth directly from the solid state (unidirectional demixing of eutectoid materials C30B 3/00; under a protective fluid C30B 27/00) |
![]() | C30B 1/02 | . | by thermal treatment, e.g. strain annealing (C30B 1/12 takes precedence) |
C30B 1/023 | . . | { from solids with amorphous structure} |
C30B 1/026 | . . | { Solid phase epitaxial growth through a disordered intermediate layer} |
C30B 1/04 | . . | Isothermal recrystallisation |
![]() | C30B 1/06 | . . | Recrystallisation under a temperature gradient |
C30B 1/10 | . | by solid state reactions or multi-phase diffusion |
C30B 1/12 | . | by pressure treatment during the growth |
C30B 3/00 | Unidirectional demixing of eutectoid materials |
![]() | Single-crystal growth from gels (under a protective fluid C30B 27/00) |
![]() | Guide Heading: | Single-crystal growth from liquids; Unidirectional solidification of eutectic materials |
![]() | Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions (from molten solvents C30B 9/00; by normal or gradient freezing C30B 11/00; under a protective fluid C30B 27/00) |
C30B 7/005 | . | { Epitaxial layer growth} |
![]() | C30B 7/02 | . | by evaporation of the solvent |
C30B 7/08 | . | by cooling of the solution |
![]() | C30B 7/10 | . | by application of pressure, e.g. hydrothermal processes |
C30B 7/12 | . | by electrolysis |
C30B 7/14 | . | the crystallising material being formed by chemical reactions in the solution |
![]() | Single-crystal growth from melt solutions using molten solvents (by normal or gradient freezing C30B 11/00; by zone-melting C30B 13/00; by crystal pulling C30B 15/00; on immersed seed crystal C30B 17/00; by liquid phase epitaxial growth C30B 19/00; under a protective fluid C30B 27/00) |
C30B 9/02 | . | by evaporation of the molten solvent |
![]() | C30B 9/04 | . | by cooling of the solution |
C30B 9/06 | . . | using as solvent a component of the crystal composition |
![]() | C30B 9/08 | . . | using other solvents |
C30B 9/14 | . | by electrolysis |
![]() | Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method (C30B 13/00, C30B 15/00, C30B 17/00, C30B 19/00 take precedence; under a protective fluid C30B 27/00) |
C30B 11/001 | . | { Continuous growth} |
C30B 11/002 | . | { Crucibles or containers for supporting the melt} |
C30B 11/003 | . | { Heating or cooling of the melt or the crystallised material} |
C30B 11/005 | . | { by irradiation or electric discharge} |
C30B 11/006 | . | { Controlling or regulating} |
C30B 11/007 | . | { Mechanisms for moving either the charge or the heater} |
C30B 11/008 | . | { using centrifugal force to the charge} |
C30B 11/02 | . | without using solvents (C30B 11/06 takes precedence) |
![]() | C30B 11/04 | . | adding crystallising material or reactants forming it in situ to the melt |
![]() | C30B 11/06 | . . | at least one but not all components of the crystal composition being added |
![]() | C30B 11/08 | . . | every component of the crystal composition being added during the crystallisation |
C30B 11/14 | . | characterised by the seed, e.g. its crystallographic orientation |
![]() | Single-crystal growth by zone-melting; Refining by zone-melting (C30B 17/00 takes precedence; by changing the cross-section of the treated solid C30B 15/00; under a protective fluid C30B 27/00; zone-refining of specific materials, see the relevant subclasses for the materials) |
C30B 13/005 | . | { Continuous growth} |
C30B 13/02 | . | Zone-melting with a solvent, e.g. travelling solvent process |
C30B 13/04 | . | Homogenisation by zone-levelling |
C30B 13/06 | . | the molten zone not extending over the whole cross-section |
![]() | C30B 13/08 | . | adding crystallising material or reactants forming it in situ to the molten zone |
C30B 13/14 | . | Crucibles or vessels |
![]() | C30B 13/16 | . | Heating of the molten zone |
C30B 13/18 | . . | the heating element being in contact with, or immersed in, the molten zone |
C30B 13/20 | . . | by induction, e.g. hot wire technique (C30B 13/18 takes precedence; induction coils H05B 6/36) |
![]() | C30B 13/22 | . . | by irradiation or electric discharge |
C30B 13/26 | . | Stirring of the molten zone |
![]() | C30B 13/28 | . | Controlling or regulating (controlling or regulating in general G05) |
C30B 13/285 | . . | { Crystal holders, e.g. chucks} |
C30B 13/30 | . . | Stabilisation or shape controlling of the molten zone, e.g. by concentrators, by electromagnetic fields; Controlling the section of the crystal |
C30B 13/32 | . | Mechanisms for moving either the charge or the heater |
C30B 13/34 | . | characterised by the seed, e.g. by its crystallographic orientation |
![]() | Single-crystal growth by pulling from a melt, e.g. Czochralski method (under a protective fluid C30B 27/00) |
C30B 15/002 | . | { Continuous growth} |
C30B 15/005 | . | { Simultaneous pulling of more than one crystal} |
C30B 15/007 | . | { Pulling on a substrate} |
![]() | C30B 15/02 | . | adding crystallising material or reactants forming it in situ to the melt |
C30B 15/06 | . | Non-vertical pulling |
C30B 15/08 | . | Downward pulling |
![]() | C30B 15/10 | . | Crucibles or containers for supporting the melt |
![]() | C30B 15/14 | . | Heating of the melt or the crystallised material |
C30B 15/16 | . . | by irradiation or electric discharge |
C30B 15/18 | . . | using direct resistance heating in addition to other methods of heating, e.g. using Peltier heat |
![]() | C30B 15/20 | . | Controlling or regulating (controlling or regulating in general G05) |
C30B 15/203 | . . | { the relationship of pull rate (v) to axial thermal gradient (G)} |
C30B 15/206 | . . | { the thermal history of growing the ingot} |
![]() | C30B 15/22 | . . | Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal |
C30B 15/24 | . . . | using mechanical means, e.g. shaping guides (shaping dies for edge-defined film-fed crystal growth C30B 15/34) |
C30B 15/26 | . . . | using television detectors; using photo or X-ray detectors |
C30B 15/28 | . . . | using weight changes of the crystal or the melt, e.g. flotation methods |
![]() | C30B 15/30 | . | Mechanisms for rotating or moving either the melt or the crystal (flotation methods C30B 15/28) |
C30B 15/32 | . | Seed holders, e.g. chucks |
C30B 15/34 | . | Edge-defined film-fed crystal-growth using dies or slits |
C30B 15/36 | . | characterised by the seed, e.g. its crystallographic orientation |
C30B 17/00 | Single-crystal growth onto a seed which remains in the melt during growth, e.g. Nacken-Kyropoulos method (C30B 15/00 takes precedence) |
![]() | Liquid-phase epitaxial-layer growth |
![]() | C30B 19/02 | . | using molten solvents, e.g. flux |
![]() | C30B 19/06 | . | Reaction chambers; Boats for supporting the melt; Substrate holders |
C30B 19/061 | . . | { Tipping system, e.g. by rotation} |
C30B 19/062 | . . | { Vertical dipping system} |
C30B 19/063 | . . | { Sliding boat system} |
C30B 19/064 | . . | { Rotating sliding boat system} |
C30B 19/065 | . . | { Multiple stacked slider system} |
C30B 19/066 | . . | { Injection or centrifugal force system} |
C30B 19/067 | . . | { Boots or containers} |
C30B 19/068 | . . | { Substrate holders} |
C30B 19/08 | . | Heating of the reaction chamber or the substrate |
![]() | C30B 19/10 | . | Controlling or regulating (controlling or regulating in general G05) |
C30B 19/103 | . . | { Current controlled or induced growth} |
C30B 19/106 | . . | { adding crystallising material or reactants forming it in situ to the liquid} |
C30B 19/12 | . | characterised by the substrate |
![]() | Unidirectional solidification of eutectic materials |
![]() | Guide Heading: | Single-crystal growth from vapours |
![]() | Single-crystal growth by condensing evaporated or sublimed material NOTE -
WARNING -
|
![]() | C30B 23/002 | . | { Controlling or regulating} |
C30B 23/007 | . | { Growth of whiskers or needles} |
![]() | . | Epitaxial-layer growth |
C30B 23/025 | . . | { characterised by the substrate} |
C30B 23/04 | . . | Pattern deposit, e.g. by using masks |
![]() | C30B 23/06 | . . | Heating of the deposition chamber, the substrate or the material to be evaporated |
C30B 23/063 | . . . | { Heating of the substrate} |
C30B 23/066 | . . . | { Heating of the material to be evaporated} |
C30B 23/08 | . . | by condensing ionised vapours (by reactive sputtering C30B 25/06) |
![]() | Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth |
C30B 25/005 | . | { Growth of whiskers or needles} |
![]() | . | Epitaxial-layer growth |
C30B 25/025 | . . | { Continuous growth} |
C30B 25/04 | . . | Pattern deposit, e.g. by using masks |
C30B 25/06 | . . | by reactive sputtering |
C30B 25/08 | . . | Reaction chambers; Selection of material therefor |
![]() | C30B 25/10 | . . | Heating of the reaction chamber or the substrate |
C30B 25/12 | . . | Substrate holders or susceptors |
C30B 25/14 | . . | Feed and outlet means for the gases; Modifying the flow of the reactive gases |
![]() | C30B 25/16 | . . | Controlling or regulating (controlling or regulating in general G05) |
![]() | C30B 25/18 | . . | characterised by the substrate |
C30B 25/183 | . . . | { being provided with a buffer layer, e.g. a lattice matching layer} |
C30B 25/186 | . . . | { being specially pre-treated by e.g. chemical or physical means} |
![]() | C30B 25/20 | . . . | the substrate being of the same material as the epitaxial layer |
C30B 25/22 | . . | Sandwich processes |
![]() | Single-crystal growth under a protective fluid |
![]() | Production of homogeneous polycrystalline material with defined structure |
C30B 28/02 | . | directly from the solid state |
![]() | C30B 28/04 | . | from liquids |
C30B 28/06 | . . | by normal freezing or freezing under temperature gradient |
C30B 28/08 | . . | by zone-melting |
C30B 28/10 | . . | by pulling from a melt |
![]() | C30B 28/12 | . | directly from the gas state |
![]() | Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape (alloys C22C) NOTE -
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![]() | . | Elements |
![]() | C30B 29/10 | . | Inorganic compounds or compositions |
C30B 29/12 | . . | Halides |
C30B 29/14 | . . | Phosphates |
![]() | C30B 29/16 | . . | Oxides |
C30B 29/18 | . . . | Quartz |
C30B 29/20 | . . . | Aluminium oxides |
![]() | C30B 29/22 | . . . | Complex oxides |
C30B 29/225 | . . . . | { based on rare earth copper oxides, e.g. high T-superconductors} |
C30B 29/24 | . . . . | with formula AMeO3, wherein A is a rare earth metal and Me is Fe, Ga, Sc, Cr, Co or Al, e.g. ortho ferrites |
C30B 29/26 | . . . . | with formula BMe2O4, wherein B is Mg, Ni, Co, Al, Zn, or Cd and Me is Fe, Ga, Sc, Cr, Co, or Al |
C30B 29/28 | . . . . | with formula A3Me5O12 wherein A is a rare earth metal and Me is Fe, Ga, Sc, Cr, Co or Al, e.g. garnets |
C30B 29/30 | . . . . | Niobates; Vanadates; Tantalates |
C30B 29/32 | . . . . | Titanates; Germanates; Molybdates; Tungstates |
C30B 29/34 | . . | Silicates |
C30B 29/36 | . . | Carbides |
C30B 29/38 | . . | Nitrides |
![]() | C30B 29/40 | . . | AIIIBV compounds { wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi} |
![]() | C30B 29/46 | . . | Sulfur-, selenium- or tellurium-containing compounds |
C30B 29/52 | . . | Alloys |
![]() | C30B 29/54 | . | Organic compounds |
![]() | . | characterised by shape |
C30B 29/602 | . . | { Nanotubes} |
C30B 29/605 | . . | { Products containing multiple oriented crystallites, e.g. columnar crystallites} |
C30B 29/607 | . . | { Crystals of complex geometrical shape, e.g. tubes, cylinders } (nanotubes 29/60B) |
C30B 29/62 | . . | Whiskers or needles |
C30B 29/64 | . . | Flat crystals, e.g. plates, strips, disks |
C30B 29/66 | . . | Crystals of complex geometrical shape, e.g. tubes, cylinders |
C30B 29/68 | . . | Crystals with laminate structure, e.g. "superlattices" |
![]() | Production of single crystals or homogeneous polycrystalline material with defined structure characterised by the action of electric or magnetic fields, wave energy or other specific physical conditions NOTE -
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![]() | Guide Heading: | After-treatment of single crystals or homogeneous polycrystalline material with defined structure |
![]() | Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor |
C30B 31/02 | . | by contacting with diffusion material in the solid state |
![]() | C30B 31/04 | . | by contacting with diffusion material in the liquid state |
![]() | C30B 31/06 | . | by contacting with diffusion material in the gaseous state (C30B 31/18 takes precedence) |
C30B 31/08 | . . | the diffusion material being a compound of the elements to be diffused |
![]() | C30B 31/10 | . . | Reaction chambers; Selection of material therefor |
C30B 31/103 | . . . | { Mechanisms for moving either the charge or heater} |
C30B 31/106 | . . . | { Continuous processes} |
C30B 31/12 | . . | Heating of the reaction chamber |
C30B 31/14 | . . | Substrate holders or susceptors |
![]() | C30B 31/16 | . . | Feed and outlet means for the gases; Modifying the flow of the gases |
![]() | C30B 31/18 | . . | Controlling or regulating (controlling or regulating in general G05) |
![]() | C30B 31/20 | . | Doping by irradiation with electromagnetic waves or by particle radiation |
![]() | After-treatment of single crystals or homogeneous polycrystalline material with defined structure (C30B 31/00 takes precedence; grinding, polishing B24; mechanical fine working of gems, jewels, crystals B28D 5/00) |
C30B 33/005 | . | { Oxydation} |
C30B 33/02 | . | Heat treatment (C30B 33/04, C30B 33/06 take precedence) |
C30B 33/04 | . | using electric or magnetic fields or particle radiation |
C30B 33/06 | . | Joining of crystals |
![]() | C30B 33/08 | . | Etching |
![]() | Apparatus in general, specially adapted for the growth, production or after-treatment of single crystals or a homogeneous polycrystalline material with defined structure |
C30B 35/002 | . | { Crucibles or containers} |
C30B 35/005 | . | { Transport systems} |
C30B 35/007 | . | { Apparatus for preparing, pre-treating the source material tio be used for crystal growth} WARNING -
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