United States Patent and Trademark Office

Outline		Indent Level
Color		Curly Brackets (indicating CPC extensions to IPC)

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	CPC	COOPERATIVE PATENT CLASSIFICATION

C23F

NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE (working metal by laser beams B23K 26/00; desurfacing by applying flames B23K 7/00; working of metal by electro-erosion B23H; producing decorative effects by removing surface material, e.g. by engraving, by etching, B44C 1/22; electrolytic etching or polishing C25F); INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25.

NOTE

protective layers or coating compositions or methods of applying them; these are classified in the appropriate places, e.g. B05, B44, C09D, C23C.

mechanical devices or constructional features of particular articles for inhibiting incrustation; these are classified in the appropriate places, e.g. in pipes or pipe fittings F16L 58/00.

articles characterised by being made of materials selected for their properties of resistance to corrosion or incrustation; these are classified in the appropriate places, e.g. turbine blades F01D 5/28.

C23F 1/00

Etching metallic material by chemical means (manufacture of printing surfaces B41C; manufacture of printed circuits H05K)

C23F 1/02

Local etching

C23F 1/04

. .

Chemical milling

C23F 1/06

Sharpening files

C23F 1/08

Apparatus, e.g. for photomechanical printing surfaces (photo- mechanical reproduction G03F)

C23F 1/10

Etching compositions (C23F 1/44 takes precedence)

C23F 1/12

. .

Gaseous compositions

C23F 1/14

. .

Aqueous compositions

C23F 1/16

. . .

Acidic compositions (C23F 1/42 takes precedence)

C23F 1/18

. . . .

for etching copper or alloys thereof

C23F 1/20

. . . .

for etching aluminium or alloys thereof

C23F 1/22

. . . .

for etching magnesium or alloys thereof

C23F 1/26

. . . .

for etching refractory metals

C23F 1/28

. . . .

for etching iron group metals

C23F 1/30

. . . .

for etching other metallic material

C23F 1/32

. . .

Alkaline compositions (C23F 1/42 takes precedence)

C23F 1/34

. . . .

for etching copper or alloys thereof

C23F 1/36

. . . .

for etching aluminium or alloys thereof

C23F 1/38

. . . .

for etching refractory metals

C23F 1/40

. . . .

for etching other metallic material

C23F 1/42

. . .

containing a dispersed water-immiscible liquid

C23F 1/44

Compositions for etching metallic material from a metallic material substrate of different composition

C23F 1/46

Regeneration of etching compositions

C23F 3/00

Brightening metals by chemical means

C23F 3/02

Light metals

C23F 3/03

. .

with acidic solutions

C23F 3/04

Heavy metals

C23F 3/06

. .

with acidic solutions

C23F 4/00

Processes for removing metallic material from surfaces, not provided for in group C23F 1/00 or C23F 3/00

C23F 4/02

by evaporation

C23F 4/04

by physical dissolution

C23F 11/00

Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent (adding inhibitors to mineral oil, fuels, or lubricants C10; adding inhibitors to pickling solutions C23G)

C23F 11/02

in air or gases by adding vapour phase inhibitors

C23F 11/04

in markedly acid liquids

C23F 11/06

in markedly alkaline liquids

C23F 11/08

in other liquids

C23F 11/10

. .

using organic inhibitors

NOTE

A compound is classified in the last appropriate place.

Esters or anhydrides of organic acids are classified as the relevant acid unless otherwise indicated. Salts of a compound with an inorganic compound are classified as that compound unless specifically provided for.

C23F 11/12

. . .

Oxygen-containing compounds

C23F 11/122

. . . .

Alcohols; Aldehydes; Ketones

C23F 11/124

. . . .

Carboxylic acids

C23F 11/126

. . . . .

Aliphatic acids

C23F 11/128

. . . .

Esters of carboxylic acids

C23F 11/14

. . .

Nitrogen containing compounds

C23F 11/141

. . . .

Amines; Quaternary ammonium compounds

C23F 11/142

. . . . .

Hydroxy amines

C23F 11/143

. . . . .

Salts of amines

C23F 11/144

. . . .

Aminocarboxylic acids

C23F 11/145

. . . .

Amides; N-substituded amides

C23F 11/146

. . . .

containing a multiple nitrogen-to-carbon bond

C23F 11/147

. . . .

containing a nitrogen-to-oxygen bond

C23F 11/148

. . . .

containing a nitrogen-to-nitrogen bond

C23F 11/149

. . . .

Heterocyclic compounds containing nitrogen as hetero atom

C23F 11/16

. . .

Sulfur containing compounds

C23F 11/161

. . . .

Mercaptans

C23F 11/162

. . . .

Thioaldehydes; Thioketones

C23F 11/163

. . . .

Sulfonic acids

C23F 11/164

. . . .

containing a -SO2-N group

C23F 11/165

. . . .

Heterocyclic compounds containing sulfur as hetero atom

C23F 11/167

. . .

Phosphorus-containing compounds

C23F 11/1673

. . . .

Esters of phosphoric or thiophosphoric acids

C23F 11/1676

. . . .

Phosphonic acids

C23F 11/173

. . .

Macromolecular compounds

C23F 11/18

. .

using inorganic inhibitors

C23F 11/181

. . .

Nitrogen containing compounds

C23F 11/182

. . .

Sulfur, boron or silicon containing compounds

C23F 11/184

. . .

Phosphorous, arsenic, antimony or bismuth containing compound

C23F 11/185

. . .

Refractory metal-containing compounds

C23F 11/187

. . .

Mixtures of inorganic inhibitors

C23F 11/188

. . . .

containing phosphates

C23F 13/00

Inhibiting corrosion of metals by anodic or cathodic protection

C23F 13/005

{

Anodic protection

}

C23F 13/02

cathodic; Selection of conditions, parameters or procedures for cathodic protection, e.g. of electrical conditions

C23F 13/04

. .

Controlling or regulating desired parameters

C23F 13/06

. .

Constructional parts, or assemblies of cathodic-protection apparatus

C23F 13/08

. . .

Electrodes specially adapted for inhibiting corrosion by cathodic protection; Manufacture thereof; Conducting electric current thereto

C23F 13/10

. . . .

Electrodes characterised by the structure (C23F 13/16 takes precedence)

C23F 13/12

. . . .

Electrodes characterised by the material (C23F 13/16 takes precedence)

C23F 13/14

. . . . .

Material for sacrificial anodes

C23F 13/16

. . . .

Electrodes characterised by the combination of the structure and the material

C23F 13/18

. . . .

Means for supporting electrodes

C23F 13/20

. . . .

Conducting electric current to electrodes

C23F 13/22

. . . .

Monitoring arrangements therefor

C23F 14/00

Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes (adding scale preventives or removers to water C02F 5/00)

{

inhibiting incrustation in polymerisation reactors C23F 15/005

}

C23F 14/02

by chemical means

C23F 15/00

Other methods of preventing corrosion or incrustation

C23F 15/005

{

Inhibiting incrustation

}

C23F 17/00

Multi-step processes for surface treatment of metallic material involving at least one process provided for in class C23 and at least one process covered by subclass C21D or C22F or class C25 (C23C 28/00 takes precedence)

C23F 2201/00

Type of materials to be protected by cathodic protection

C23F 2201/02

Concrete, e.g. reinforced

C23F 2213/00

Aspects of inhibiting corrosion of metals by anodic or cathodic protection

C23F 2213/10

Controlling or regulating parameters

C23F 2213/11

. .

for structures subject to stray currents

C23F 2213/20

Constructional parts or assemblies of the anodic or cathodic protection apparatus

C23F 2213/21

. .

combining at least two types of anodic or cathodic protection

C23F 2213/22

. .

characterized by the ionic conductor, e.g. humectant, hydratant or backfill

C23F 2213/30

Anodic or cathodic protection specially adapted for a specific object

C23F 2213/31

. .

Immersed structures, e.g. submarine structures

C23F 2213/32

. .

Pipes