Version: 2024.08
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CPC | COOPERATIVE PATENT CLASSIFICATION | ||||||
| C23C | COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C 23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D 39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B 41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M 11/83; decorating textiles by locally metallising D06Q 1/04) [2019-08] NOTE
WARNING
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Coating by applying the coating material in the molten state [2022-08] |
C23C 2/00 | Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor [2024-05] |
C23C 2/003 | . | {Apparatus} [2024-05] |
C23C 2/0032 | . . | {specially adapted for batch coating of substrate} [2024-05] |
C23C 2/00322 | . . . | {Details of mechanisms for immersing or removing substrate from molten liquid bath, e.g. basket or lifting mechanism} [2022-08] |
C23C 2/0034 | . . | {Details related to elements immersed in bath} [2024-05] |
C23C 2/00342 | . . . | {Moving elements, e.g. pumps or mixers} [2022-08] |
C23C 2/00344 | . . . . | {Means for moving substrates, e.g. immersed rollers or immersed bearings} [2022-08] |
C23C 2/00348 | . . . | {Fixed work supports or guides} [2022-08] |
C23C 2/0035 | . . | {Means for continuously moving substrate through, into or out of the bath (C23C 2/00344 takes precedence)} [2024-05] |
C23C 2/0036 | . . | {Crucibles} [2024-05] |
C23C 2/00361 | . . . | {characterised by structures including means for immersing or extracting the substrate through confining wall area} [2022-08] |
C23C 2/00362 | . . . . | {Details related to seals, e.g. magnetic means} [2022-08] |
C23C 2/0038 | . . | {characterised by the pre-treatment chambers located immediately upstream of the bath or occurring locally before the dipping process} [2024-05] |
C23C 2/006 | . | {Pattern or selective deposits} [2024-05] |
C23C 2/0062 | . . | {without pre-treatment of the material to be coated, e.g. using masking elements such as casings, shields, fixtures or blocking elements} [2024-05] |
C23C 2/0064 | . . | {using masking layers} [2024-05] |
C23C 2/02 | . | Pretreatment of the material to be coated, e.g. for coating on selected surface areas (C23C 2/30 takes precedence) [2024-05] |
C23C 2/022 | . . | {by heating} [2024-05] |
C23C 2/0222 | . . . | {in a reactive atmosphere, e.g. oxidising or reducing atmosphere (C23C 2/024 takes precedence)} [2022-08] |
C23C 2/0224 | . . . | {Two or more thermal pretreatments} [2022-08] |
C23C 2/024 | . . | {by cleaning or etching} [2024-05] |
C23C 2/026 | . . | {Deposition of sublayers, e.g. adhesion layers or pre-applied alloying elements or corrosion protection} [2024-05] |
C23C 2/04 | . | characterised by the coating material [2013-01] |
C23C 2/06 | . . | Zinc or cadmium or alloys based thereon [2013-01] |
C23C 2/08 | . . | Tin or alloys based thereon [2013-01] |
C23C 2/10 | . . | Lead or alloys based thereon [2013-01] |
C23C 2/12 | . . | Aluminium or alloys based thereon [2013-01] |
C23C 2/14 | . | Removing excess of molten coatings; Controlling or regulating the coating thickness [2024-05] |
C23C 2/16 | . . | using fluids under pressure, e.g. air knives [2013-01] |
C23C 2/18 | . . . | Removing excess of molten coatings from elongated material [2013-01] |
C23C 2/185 | . . . . | {Tubes; Wires} [2013-01] |
C23C 2/20 | . . . . | Strips; Plates [2013-01] |
C23C 2/22 | . . | by rubbing, e.g. using knives {, e.g. rubbing solids} [2017-08] |
C23C 2/24 | . . | using magnetic or electric fields [2013-01] |
C23C 2/26 | . |
C23C 2/261 | . . | {in a gas atmosphere, e.g. inert or reducing atmosphere} [2024-05] |
C23C 2/265 | . . | {by applying solid particles to the molten coating} [2024-05] |
C23C 2/28 | . . | Thermal after-treatment, e.g. treatment in oil bath [2024-05] |
C23C 2/285 | . . . | {for remelting the coating} [2024-05] |
C23C 2/29 | . . . | {Cooling or quenching} [2024-05] |
C23C 2/30 | . |
C23C 2/32 | . |
C23C 2/325 | . | {Processes or devices for cleaning the bath} [2024-05] |
C23C 2/34 | . |
C23C 2/36 | . . | Elongated material [2013-01] |
C23C 2/38 | . . . | Wires; Tubes [2013-01] |
C23C 2/385 | . . . . | {Tubes of specific length} [2013-01] |
C23C 2/40 | . . . | Plates; Strips [2013-01] |
C23C 2/405 | . . . . | {Plates of specific length} [2013-01] |
C23C 2/50 | . | {Controlling or regulating the coating processes (C23C 2/14 takes precedence)} [2024-05] |
C23C 2/51 | . . | {Computer-controlled implementation} [2022-08] |
C23C 2/52 | . . | {with means for measuring or sensing} [2022-08] |
C23C 2/521 | . . . | {Composition of the bath} [2022-08] |
C23C 2/522 | . . . | {Temperature of the bath} [2022-08] |
C23C 2/523 | . . . | {Bath level or amount} [2022-08] |
C23C 2/524 | . . . | {Position of the substrate} [2022-08] |
C23C 2/5245 | . . . . | {for reducing vibrations of the substrate} [2022-08] |
C23C 2/525 | . . . | {Speed of the substrate} [2022-08] |
C23C 2/526 | . . . | {for visually inspecting the surface quality of the substrate} [2022-08] |
C23C 2/54 | . . | {of the mixing or stirring the bath} [2022-08] |
C23C 2/542 | . . . | {using static devices separate from the substrate, e.g. a fixed plate} [2022-08] |
C23C 2/544 | . . . | {using moving mixing devices separate from the substrate, e.g. an impeller of blade} [2022-08] |
C23C 4/00 |
C23C 4/01 | . | Selective coating, e.g. pattern coating, without pre-treatment of the material to be coated [2016-01] |
C23C 4/02 | . | Pretreatment of the material to be coated, e.g. for coating on selected surface areas [2017-08] |
C23C 4/04 | . | characterised by the coating material [2013-01] |
C23C 4/06 | . . | Metallic material [2016-01] |
C23C 4/067 | . . . | containing free particles of non-metal elements, e.g. carbon, silicon, boron, phosphorus or arsenic [2016-01] |
C23C 4/073 | . . . | containing MCrAl or MCrAlY alloys, where M is nickel, cobalt or iron, with or without non-metal elements [2016-01] |
C23C 4/08 | . . . |
C23C 4/10 | . . | Oxides, borides, carbides, nitrides or silicides; Mixtures thereof [2016-01] |
C23C 4/12 | . | characterised by the method of spraying [2021-01] |
C23C 4/123 | . . | Spraying molten metal [2016-01] |
C23C 4/126 | . . | Detonation spraying [2016-01] |
C23C 4/129 | . . | Flame spraying [2016-01] |
C23C 4/131 | . . | Wire arc spraying [2016-01] |
C23C 4/134 | . . | Plasma spraying [2016-01] |
C23C 4/137 | . . | Spraying in vacuum or in an inert atmosphere [2016-01] |
C23C 4/14 | . . | for coating elongate material [2016-01] |
C23C 4/16 | . . . | Wires; Tubes [2013-01] |
C23C 4/18 | . | After-treatment [2013-01] |
C23C 4/185 | . . | {Separation of the coating from the substrate} [2013-01] |
C23C 6/00 | Coating by casting molten material on the substrate [2013-01] |
Solid state diffusion into metallic material surfaces [2013-01] |
C23C 8/00 | Solid state diffusion of only non-metal elements into metallic material surfaces (diffusion of silicon C23C 10/00); Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals (C23C 14/00 takes precedence) [2013-01] |
C23C 8/02 | . |
C23C 8/04 | . | Treatment of selected surface areas, e.g. using masks [2013-01] |
C23C 8/06 | . |
C23C 8/08 | . . | only one element being applied [2017-08] |
C23C 8/10 | . . . | Oxidising [2013-01] |
C23C 8/12 | . . . . | using elemental oxygen or ozone [2013-01] |
C23C 8/14 | . . . . . | Oxidising of ferrous surfaces [2013-01] |
C23C 8/16 | . . . . | using oxygen-containing compounds, e.g. water, carbon dioxide [2013-01] |
C23C 8/18 | . . . . . | Oxidising of ferrous surfaces [2017-08] |
C23C 8/20 | . . . | Carburising [2013-01] |
C23C 8/22 | . . . . | of ferrous surfaces [2013-01] |
C23C 8/24 | . . . | Nitriding [2013-01] |
C23C 8/26 | . . . . | of ferrous surfaces [2013-01] |
C23C 8/28 | . . | more than one element being applied in one step [2013-01] |
C23C 8/30 | . . . | Carbo-nitriding [2013-01] |
C23C 8/32 | . . . . | of ferrous surfaces [2013-01] |
C23C 8/34 | . . | more than one element being applied in more than one step [2013-01] |
C23C 8/36 | . . | using ionised gases, e.g. ionitriding [2018-01] |
C23C 8/38 | . . . | Treatment of ferrous surfaces [2013-01] |
C23C 8/40 | . | using liquids, e.g. salt baths, liquid suspensions [2013-01] |
C23C 8/42 | . . | only one element being applied [2013-01] |
C23C 8/44 | . . . | Carburising [2013-01] |
C23C 8/46 | . . . . | of ferrous surfaces [2013-01] |
C23C 8/48 | . . . | Nitriding [2013-01] |
C23C 8/50 | . . . . | of ferrous surfaces [2013-01] |
C23C 8/52 | . . | more than one element being applied in one step [2013-01] |
C23C 8/54 | . . . | Carbo-nitriding [2013-01] |
C23C 8/56 | . . . . | of ferrous surfaces [2013-01] |
C23C 8/58 | . . | more than one element being applied in more than one step [2013-01] |
C23C 8/60 | . |
C23C 8/62 | . . | only one element being applied [2013-01] |
C23C 8/64 | . . . | Carburising [2013-01] |
C23C 8/66 | . . . . | of ferrous surfaces [2013-01] |
C23C 8/68 | . . . | Boronising [2013-01] |
C23C 8/70 | . . . . | of ferrous surfaces [2013-01] |
C23C 8/72 | . . | more than one element being applied in one step [2013-01] |
C23C 8/74 | . . . | Carbo-nitriding [2013-01] |
C23C 8/76 | . . . . | of ferrous surfaces [2013-01] |
C23C 8/78 | . . | more than one element being applied in more than one step [2013-01] |
C23C 8/80 | . | After-treatment [2013-01] |
C23C 10/00 | Solid state diffusion of only metal elements or silicon into metallic material surfaces [2013-01] |
C23C 10/02 | . |
C23C 10/04 | . | Diffusion into selected surface areas, e.g. using masks [2013-01] |
C23C 10/06 | . | using gases [2013-01] |
C23C 10/08 | . . | only one element being diffused [2013-01] |
C23C 10/10 | . . . | Chromising [2013-01] |
C23C 10/12 | . . . . | of ferrous surfaces [2013-01] |
C23C 10/14 | . . | more than one element being diffused in one step [2013-01] |
C23C 10/16 | . . | more than one element being diffused in more than one step [2013-01] |
C23C 10/18 | . | using liquids, e.g. salt baths, liquid suspensions [2013-01] |
C23C 10/20 | . . | only one element being diffused [2013-01] |
C23C 10/22 | . . . | Metal melt containing the element to be diffused [2013-01] |
C23C 10/24 | . . . | Salt bath containing the element to be diffused [2013-01] |
C23C 10/26 | . . | more than one element being diffused [2013-01] |
C23C 10/28 | . | using solids, e.g. powders, pastes [2013-01] |
C23C 10/30 | . . | using a layer of powder or paste on the surface (using liquid suspensions of solids C23C 10/18) [2013-01] |
C23C 10/32 | . . . | Chromising [2013-01] |
C23C 10/34 | . . | Embedding in a powder mixture, i.e. pack cementation [2013-01] |
C23C 10/36 | . . . | only one element being diffused [2013-01] |
C23C 10/38 | . . . . | Chromising [2013-01] |
C23C 10/40 | . . . . . | of ferrous surfaces [2013-01] |
C23C 10/42 | . . . . . . | in the presence of volatile transport additives, e.g. halogenated substances [2013-01] |
C23C 10/44 | . . . . | Siliconising [2013-01] |
C23C 10/46 | . . . . . | of ferrous surfaces [2013-01] |
C23C 10/48 | . . . . | Aluminising [2013-01] |
C23C 10/50 | . . . . . | of ferrous surfaces [2013-01] |
C23C 10/52 | . . . | more than one element being diffused in one step [2013-01] |
C23C 10/54 | . . . . | Diffusion of at least chromium [2013-01] |
C23C 10/56 | . . . . . | and at least aluminium [2013-01] |
C23C 10/58 | . . . | more than one element being diffused in more than one step [2013-01] |
C23C 10/60 | . | After-treatment [2013-01] |
C23C 12/00 | Solid state diffusion of at least one non-metal element other than silicon and at least one metal element or silicon into metallic material surfaces [2013-01] |
C23C 12/02 | . | Diffusion in one step [2013-01] |
Coating by vacuum evaporation, by sputtering or by ion implantation [2013-01] |
C23C 14/00 | Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material [2018-01] |
C23C 14/0005 | . | {Separation of the coating from the substrate} [2013-01] |
C23C 14/001 | . | {Coating on a liquid substrate} [2013-01] |
C23C 14/0015 | . | {characterized by the colour of the layer} [2013-01] |
C23C 14/0021 | . | {Reactive sputtering or evaporation} [2013-01] |
C23C 14/0026 | . . | {Activation or excitation of reactive gases outside the coating chamber} [2013-01] |
C23C 14/0031 | . . . | {Bombardment of substrates by reactive ion beams} [2013-01] |
C23C 14/0036 | . . | {Reactive sputtering} [2013-01] |
C23C 14/0042 | . . . | {Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements} [2013-01] |
C23C 14/0047 | . . . | {Activation or excitation of reactive gases outside the coating chamber} [2013-01] |
C23C 14/0052 | . . . . | {Bombardment of substrates by reactive ion beams} [2013-01] |
C23C 14/0057 | . . . | {using reactive gases other than O2, H2O, N2, NH3 or CH4} [2013-01] |
C23C 14/0063 | . . . | {characterised by means for introducing or removing gases} [2013-01] |
C23C 14/0068 | . . . | {characterised by means for confinement of gases or sputtered material, e.g. screens, baffles} [2013-01] |
C23C 14/0073 | . . . | {by exposing the substrates to reactive gases intermittently} [2013-01] |
C23C 14/0078 | . . . . | {by moving the substrates between spatially separate sputtering and reaction stations} [2013-01] |
C23C 14/0084 | . . . | {Producing gradient compositions} [2013-01] |
C23C 14/0089 | . . . | {in metallic mode} [2013-01] |
C23C 14/0094 | . . . | {in transition mode} [2013-01] |
C23C 14/02 | . |
C23C 14/021 | . . | {Cleaning or etching treatments} [2013-01] |
C23C 14/022 | . . . | {by means of bombardment with energetic particles or radiation} [2013-01] |
C23C 14/024 | . . | {Deposition of sublayers, e.g. to promote adhesion of the coating (C23C 14/027 takes precedence)} [2013-01] |
C23C 14/025 | . . . | {Metallic sublayers} [2013-01] |
C23C 14/027 | . . | {Graded interfaces} [2013-01] |
C23C 14/028 | . . | {Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing} [2013-01] |
C23C 14/04 | . | Coating on selected surface areas, e.g. using masks [2013-01] |
C23C 14/042 | . . | {using masks} [2013-01] |
C23C 14/044 | . . . | {using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient} [2013-01] |
C23C 14/046 | . . | {Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates} [2013-01] |
C23C 14/048 | . . | {using irradiation by energy or particles} [2013-01] |
C23C 14/06 | . |
C23C 14/0605 | . . | {Carbon} [2013-01] |
C23C 14/0611 | . . . | {Diamond} [2013-01] |
C23C 14/0617 | . . | {AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi} [2013-01] |
C23C 14/0623 | . . | {Sulfides, selenides or tellurides} [2013-01] |
C23C 14/0629 | . . . | {of zinc, cadmium or mercury} [2013-01] |
C23C 14/0635 | . . | {Carbides} [2013-01] |
C23C 14/0641 | . . | {Nitrides (C23C 14/0617 takes precedence)} [2013-01] |
C23C 14/0647 | . . . | {Boron nitride} [2013-01] |
C23C 14/0652 | . . . | {Silicon nitride} [2013-01] |
C23C 14/0658 | . . . | {Carbon nitride} [2013-01] |
C23C 14/0664 | . . | {Carbonitrides} [2013-01] |
C23C 14/067 | . . | {Borides} [2013-01] |
C23C 14/0676 | . . | {Oxynitrides} [2013-01] |
C23C 14/0682 | . . | {Silicides} [2013-01] |
C23C 14/0688 | . . | {Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides} [2013-01] |
C23C 14/0694 | . . | {Halides} [2013-01] |
C23C 14/08 | . . |
C23C 14/081 | . . . | {of aluminium, magnesium or beryllium} [2013-01] |
C23C 14/082 | . . . | {of alkaline earth metals} [2013-01] |
C23C 14/083 | . . . | {of refractory metals or yttrium} [2013-01] |
C23C 14/085 | . . . | {of iron group metals} [2013-01] |
C23C 14/086 | . . . | {of zinc, germanium, cadmium, indium, tin, thallium or bismuth} [2013-01] |
C23C 14/087 | . . . | {of copper or solid solutions thereof} [2013-01] |
C23C 14/088 | . . . | {of the type ABO3 with A representing alkali, alkaline earth metal or Pb and B representing a refractory or rare earth metal} [2013-01] |
C23C 14/10 | . . | Glass or silica [2013-01] |
C23C 14/12 | . . | Organic material [2013-01] |
C23C 14/14 | . . | Metallic material, boron or silicon [2013-01] |
C23C 14/16 | . . . | on metallic substrates or on substrates of boron or silicon [2013-01] |
C23C 14/165 | . . . . | {by cathodic sputtering} [2013-01] |
C23C 14/18 | . . . | on other inorganic substrates [2013-01] |
C23C 14/185 | . . . . | {by cathodic sputtering} [2013-01] |
C23C 14/20 | . . . | on organic substrates [2013-01] |
C23C 14/205 | . . . . | {by cathodic sputtering} [2013-01] |
C23C 14/22 | . | characterised by the process of coating [2013-01] |
C23C 14/221 | . . | {Ion beam deposition (C23C 14/46, C23C 14/48 take precedence)} [2013-01] |
C23C 14/223 | . . | {specially adapted for coating particles} [2017-02] |
C23C 14/225 | . . | {Oblique incidence of vaporised material on substrate} [2013-01] |
C23C 14/226 | . . . | {in order to form films with columnar structure} [2013-01] |
C23C 14/228 | . . | {Gas flow assisted PVD deposition} [2013-01] |
C23C 14/24 | . . | Vacuum evaporation [2013-01] |
C23C 14/243 | . . . | {Crucibles for source material (C23C 14/28, C23C 14/30 take precedence)} [2013-01] |
C23C 14/246 | . . . | {Replenishment of source material} [2013-01] |
C23C 14/26 | . . . | by resistance or inductive heating of the source [2013-01] |
C23C 14/28 | . . . |
C23C 14/30 | . . . . | by electron bombardment [2013-01] |
C23C 14/32 | . . . | by explosion; by evaporation and subsequent ionisation of the vapours {, e.g. ion-plating}(C23C 14/34 - C23C 14/48 take precedence) [2016-08] |
C23C 14/325 | . . . . | {Electric arc evaporation} [2013-01] |
C23C 14/34 | . . | Sputtering [2013-01] |
C23C 14/3407 | . . . | {Cathode assembly for sputtering apparatus, e.g. Target} [2013-01] |
C23C 14/3414 | . . . . | {Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy} [2013-01] |
C23C 14/3421 | . . . . | {using heated targets} [2013-01] |
C23C 14/3428 | . . . . | {using liquid targets} [2013-01] |
C23C 14/3435 | . . . | {Applying energy to the substrate during sputtering} [2013-01] |
C23C 14/3442 | . . . . | {using an ion beam} [2013-01] |
C23C 14/345 | . . . . | {using substrate bias} [2013-01] |
C23C 14/3457 | . . . | {using other particles than noble gas ions (C23C 14/0036, C23C 14/46 take precedence)} [2013-01] |
C23C 14/3464 | . . . | {using more than one target (C23C 14/56 takes precedence)} [2013-01] |
C23C 14/3471 | . . . | {Introduction of auxiliary energy into the plasma} [2013-01] |
C23C 14/3478 | . . . . | {using electrons, e.g. triode sputtering} [2013-01] |
C23C 14/3485 | . . . | {using pulsed power to the target} [2013-01] |
C23C 14/3492 | . . . | {Variation of parameters during sputtering} [2013-01] |
C23C 14/35 | . . . | by application of a magnetic field, e.g. magnetron sputtering {(C23C 14/3457 takes precedence)} [2013-01] |
C23C 14/351 | . . . . | {using a magnetic field in close vicinity to the substrate} [2013-01] |
C23C 14/352 | . . . . | {using more than one target (C23C 14/56 takes precedence)} [2013-01] |
C23C 14/354 | . . . . | {Introduction of auxiliary energy into the plasma} [2013-01] |
C23C 14/355 | . . . . . | {using electrons, e.g. triode sputtering} [2013-01] |
C23C 14/357 | . . . . . | {Microwaves, e.g. electron cyclotron resonance enhanced sputtering} [2013-01] |
C23C 14/358 | . . . . . | {Inductive energy} [2013-01] |
C23C 14/46 | . . . | by ion beam produced by an external ion source [2013-01] |
C23C 14/48 | . . | Ion implantation [2013-01] |
C23C 14/50 | . . | Substrate holders [2013-01] |
C23C 14/505 | . . . | {for rotation of the substrates} [2013-01] |
C23C 14/52 | . . | Means for observation of the coating process [2013-01] |
C23C 14/54 | . . | Controlling or regulating the coating process [2018-01] |
C23C 14/541 | . . . | {Heating or cooling of the substrates} [2013-01] |
C23C 14/542 | . . . | {Controlling the film thickness or evaporation rate} [2013-01] |
C23C 14/543 | . . . . | {using measurement on the vapor source} [2013-01] |
C23C 14/544 | . . . . | {using measurement in the gas phase} [2013-01] |
C23C 14/545 | . . . . | {using measurement on deposited material} [2013-01] |
C23C 14/546 | . . . . . | {using crystal oscillators} [2013-01] |
C23C 14/547 | . . . . . | {using optical methods} [2013-01] |
C23C 14/548 | . . . | {Controlling the composition} [2013-01] |
C23C 14/56 | . . | Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks [2013-01] |
C23C 14/562 | . . . | {for coating elongated substrates} [2013-01] |
C23C 14/564 | . . . | {Means for minimising impurities in the coating chamber such as dust, moisture, residual gases} [2013-01] |
C23C 14/566 | . . . . | {using a load-lock chamber} [2013-01] |
C23C 14/568 | . . . | {Transferring the substrates through a series of coating stations (C23C 14/562 takes precedence)} [2013-01] |
C23C 14/58 | . | After-treatment [2013-01] |
C23C 14/5806 | . . | {Thermal treatment} [2013-01] |
C23C 14/5813 | . . . | {using lasers} [2013-01] |
C23C 14/582 | . . . | {using electron bombardment} [2020-08] |
C23C 14/5826 | . . | {Treatment with charged particles (C23C 14/582 takes precedence)} [2020-08] |
C23C 14/5833 | . . . | {Ion beam bombardment} [2013-01] |
C23C 14/584 | . . | {Non-reactive treatment} [2013-01] |
C23C 14/5846 | . . | {Reactive treatment} [2013-01] |
C23C 14/5853 | . . . | {Oxidation} [2013-01] |
C23C 14/586 | . . . | {Nitriding} [2013-01] |
C23C 14/5866 | . . . | {Treatment with sulfur, selenium or tellurium} [2013-01] |
C23C 14/5873 | . . | {Removal of material} [2013-01] |
C23C 14/588 | . . . | {by mechanical treatment} [2013-01] |
C23C 14/5886 | . . | {Mechanical treatment (involving removal of material C23C 14/588)} [2013-01] |
C23C 14/5893 | . . | {Mixing of deposited material} [2013-01] |
Chemical deposition or plating by decomposition; Contact plating [2022-08] |
C23C 16/00 | Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C 14/00) [2013-01] |
C23C 16/003 | . | {Coating on a liquid substrate} [2013-01] |
C23C 16/006 | . | {characterized by the colour of the layer} [2013-01] |
C23C 16/01 | . | on temporary substrates, e.g. substrates subsequently removed by etching [2013-01] |
C23C 16/02 | . |
C23C 16/0209 | . . | {by heating} [2013-01] |
C23C 16/0218 | . . . | {in a reactive atmosphere (C23C 16/0227 takes precedence)} [2013-01] |
C23C 16/0227 | . . | {by cleaning or etching} [2013-01] |
C23C 16/0236 | . . . | {by etching with a reactive gas} [2013-01] |
C23C 16/0245 | . . . | {by etching with a plasma} [2013-01] |
C23C 16/0254 | . . | {Physical treatment to alter the texture of the surface, e.g. scratching or polishing} [2013-01] |
C23C 16/0263 | . . . | {Irradiation with laser or particle beam} [2013-01] |
C23C 16/0272 | . . | {Deposition of sub-layers, e.g. to promote the adhesion of the main coating} [2013-01] |
C23C 16/0281 | . . . | {of metallic sub-layers (C23C 16/029 takes precedence)} [2013-01] |
C23C 16/029 | . . . | {Graded interfaces} [2013-01] |
C23C 16/04 | . | Coating on selected surface areas, e.g. using masks [2013-01] |
C23C 16/042 | . . | {using masks} [2013-01] |
C23C 16/045 | . . | {Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates} [2013-01] |
C23C 16/047 | . . | {using irradiation by energy or particles} [2013-01] |
C23C 16/06 | . | characterised by the deposition of metallic material [2013-01] |
C23C 16/08 | . . | from metal halides [2013-01] |
C23C 16/10 | . . . | Deposition of chromium only [2013-01] |
C23C 16/12 | . . . | Deposition of aluminium only [2013-01] |
C23C 16/14 | . . . | Deposition of only one other metal element [2013-01] |
C23C 16/16 | . . | from metal carbonyl compounds [2013-01] |
C23C 16/18 | . . | from metallo-organic compounds [2013-01] |
C23C 16/20 | . . . | Deposition of aluminium only [2013-01] |
C23C 16/22 | . | characterised by the deposition of inorganic material, other than metallic material [2013-01] |
C23C 16/24 | . . | Deposition of silicon only [2013-01] |
C23C 16/26 | . . | Deposition of carbon only [2013-01] |
C23C 16/27 | . . . | Diamond only [2013-01] |
C23C 16/271 | . . . . | {using hot filaments} [2013-01] |
C23C 16/272 | . . . . | {using DC, AC or RF discharges} [2013-01] |
C23C 16/274 | . . . . | {using microwave discharges} [2013-01] |
C23C 16/275 | . . . . | {using combustion torches} [2013-01] |
C23C 16/276 | . . . . | {using plasma jets} [2013-01] |
C23C 16/277 | . . . . | {using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets} [2013-01] |
C23C 16/278 | . . . . | {doping or introduction of a secondary phase in the diamond} [2013-01] |
C23C 16/279 | . . . . | {control of diamond crystallography} [2013-01] |
C23C 16/28 | . . | Deposition of only one other non-metal element [2013-01] |
C23C 16/30 | . . | Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides [2013-01] |
C23C 16/301 | . . . | {AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi} [2013-01] |
C23C 16/303 | . . . . | {Nitrides} [2013-01] |
C23C 16/305 | . . . | {Sulfides, selenides, or tellurides} [2013-01] |
C23C 16/306 | . . . . | {AII BVI compounds, where A is Zn, Cd or Hg and B is S, Se or Te} [2013-01] |
C23C 16/308 | . . . | {Oxynitrides} [2013-01] |
C23C 16/32 | . . . | Carbides [2013-01] |
C23C 16/325 | . . . . | {Silicon carbide} [2013-01] |
C23C 16/34 | . . . |
C23C 16/342 | . . . . | {Boron nitride} [2013-01] |
C23C 16/345 | . . . . | {Silicon nitride} [2013-01] |
C23C 16/347 | . . . . | {Carbon nitride} [2013-01] |
C23C 16/36 | . . . | Carbonitrides [2013-01] |
C23C 16/38 | . . . | Borides [2013-01] |
C23C 16/40 | . . . | Oxides [2013-01] |
C23C 16/401 | . . . . | {containing silicon} [2013-01] |
C23C 16/402 | . . . . . | {Silicon dioxide} [2013-01] |
C23C 16/403 | . . . . | {of aluminium, magnesium or beryllium} [2013-01] |
C23C 16/404 | . . . . | {of alkaline earth metals} [2013-01] |
C23C 16/405 | . . . . | {of refractory metals or yttrium} [2013-01] |
C23C 16/406 | . . . . | {of iron group metals} [2013-01] |
C23C 16/407 | . . . . | {of zinc, germanium, cadmium, indium, tin, thallium or bismuth} [2013-01] |
C23C 16/408 | . . . . | {of copper or solid solutions thereof} [2013-01] |
C23C 16/409 | . . . . | {of the type ABO3 with A representing alkali, alkaline earth metal or lead and B representing a refractory metal, nickel, scandium or a lanthanide} [2013-01] |
C23C 16/42 | . . . | Silicides [2013-01] |
C23C 16/44 | . |
C23C 16/4401 | . . | {Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber} [2013-01] |
C23C 16/4402 | . . . | {Reduction of impurities in the source gas} [2013-01] |
C23C 16/4404 | . . . | {Coatings or surface treatment on the inside of the reaction chamber or on parts thereof} [2013-01] |
C23C 16/4405 | . . . | {Cleaning of reactor or parts inside the reactor by using reactive gases} [2013-01] |
C23C 16/4407 | . . . | {Cleaning of reactor or reactor parts by using wet or mechanical methods} [2013-01] |
C23C 16/4408 | . . . | {by purging residual gases from the reaction chamber or gas lines} [2013-01] |
C23C 16/4409 | . . . | {characterised by sealing means} [2013-01] |
C23C 16/4411 | . . | {Cooling of the reaction chamber walls (C23C 16/45572 takes precedence)} [2013-01] |
C23C 16/4412 | . . | {Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps} [2013-01] |
C23C 16/4414 | . . | {Electrochemical vapour deposition [EVD]} [2013-01] |
C23C 16/4415 | . . | {Acoustic wave CVD} [2013-01] |
C23C 16/4417 | . . | {Methods specially adapted for coating powder} [2013-01] |
C23C 16/4418 | . . | {Methods for making free-standing articles (C23C 16/01 takes precedence)} [2013-01] |
C23C 16/442 | . . | using fluidised bed process [2013-01] |
C23C 16/448 | . . | characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials [2013-01] |
C23C 16/4481 | . . . | {by evaporation using carrier gas in contact with the source material (C23C 16/4486 takes precedence)} [2013-01] |
C23C 16/4482 | . . . . | {by bubbling of carrier gas through liquid source material} [2013-01] |
C23C 16/4483 | . . . . | {using a porous body} [2013-01] |
C23C 16/4485 | . . . | {by evaporation without using carrier gas in contact with the source material (C23C 16/4486 takes precedence)} [2013-01] |
C23C 16/4486 | . . . | {by producing an aerosol and subsequent evaporation of the droplets or particles} [2013-01] |
C23C 16/4487 | . . . | {by using a condenser} [2013-01] |
C23C 16/4488 | . . . | {by in situ generation of reactive gas by chemical or electrochemical reaction} [2013-01] |
C23C 16/452 | . . . | by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species [2015-11] |
C23C 16/453 | . . | passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD (C23C 16/513 takes precedence; for flame or plasma spraying of coating material in the molten state C23C 4/00) [2013-01] |
C23C 16/455 | . . | characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber [2013-01] |
C23C 16/45502 | . . . | {Flow conditions in reaction chamber} [2013-01] |
C23C 16/45504 | . . . . | {Laminar flow} [2013-01] |
C23C 16/45506 | . . . . | {Turbulent flow} [2013-01] |
C23C 16/45508 | . . . . | {Radial flow} [2013-01] |
C23C 16/4551 | . . . . | {Jet streams} [2013-01] |
C23C 16/45512 | . . . | {Premixing before introduction in the reaction chamber} [2013-01] |
C23C 16/45514 | . . . | {Mixing in close vicinity to the substrate} [2013-01] |
C23C 16/45517 | . . . | {Confinement of gases to vicinity of substrate} [2013-01] |
C23C 16/45519 | . . . | {Inert gas curtains} [2013-01] |
C23C 16/45521 | . . . . | {the gas, other than thermal contact gas, being introduced the rear of the substrate to flow around its periphery} [2013-01] |
C23C 16/45523 | . . . | {Pulsed gas flow or change of composition over time} [2013-01] |
C23C 16/45525 | . . . . | {Atomic layer deposition [ALD]} [2013-01] |
C23C 16/45527 | . . . . . | {characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations} [2013-01] |
C23C 16/45529 | . . . . . . | {specially adapted for making a layer stack of alternating different compositions or gradient compositions} [2013-01] |
C23C 16/45531 | . . . . . . | {specially adapted for making ternary or higher compositions} [2013-01] |
C23C 16/45534 | . . . . . . | {Use of auxiliary reactants other than used for contributing to the composition of the main film, e.g. catalysts, activators or scavengers} [2013-01] |
C23C 16/45536 | . . . . . . | {Use of plasma, radiation or electromagnetic fields} [2013-01] |
C23C 16/45538 | . . . . . . . | {Plasma being used continuously during the ALD cycle} [2013-01] |
C23C 16/4554 | . . . . . . . | {Plasma being used non-continuously in between ALD reactions (C23C 16/56 takes precedence)} [2013-01] |
C23C 16/45542 | . . . . . . . | {Plasma being used non-continuously during the ALD reactions} [2013-01] |
C23C 16/45544 | . . . . . | {characterized by the apparatus} [2013-01] |
C23C 16/45546 | . . . . . . | {specially adapted for a substrate stack in the ALD reactor} [2013-01] |
C23C 16/45548 | . . . . . . | {having arrangements for gas injection at different locations of the reactor for each ALD half-reaction} [2013-01] |
C23C 16/45551 | . . . . . . . | {for relative movement of the substrate and the gas injectors or half-reaction reactor compartments} [2013-01] |
C23C 16/45553 | . . . . . | {characterized by the use of precursors specially adapted for ALD} [2013-01] |
C23C 16/45555 | . . . . . | {applied in non-semiconductor technology} [2013-01] |
C23C 16/45557 | . . . | {Pulsed pressure or control pressure} [2013-01] |
C23C 16/45559 | . . . | {Diffusion of reactive gas to substrate} [2013-01] |
C23C 16/45561 | . . . | {Gas plumbing upstream of the reaction chamber} [2013-01] |
C23C 16/45563 | . . . | {Gas nozzles} [2013-01] |
C23C 16/45565 | . . . . | {Shower nozzles} [2013-01] |
C23C 16/45568 | . . . . | {Porous nozzles} [2013-01] |
C23C 16/4557 | . . . . | {Heated nozzles} [2013-01] |
C23C 16/45572 | . . . . | {Cooled nozzles} [2013-01] |
C23C 16/45574 | . . . . | {Nozzles for more than one gas} [2013-01] |
C23C 16/45576 | . . . . | {Coaxial inlets for each gas} [2013-01] |
C23C 16/45578 | . . . . | {Elongated nozzles, tubes with holes} [2013-01] |
C23C 16/4558 | . . . . | {Perforated rings} [2013-01] |
C23C 16/45582 | . . . | {Expansion of gas before it reaches the substrate} [2013-01] |
C23C 16/45585 | . . . | {Compression of gas before it reaches the substrate} [2013-01] |
C23C 16/45587 | . . . | {Mechanical means for changing the gas flow} [2013-01] |
C23C 16/45589 | . . . . | {Movable means, e.g. fans} [2013-01] |
C23C 16/45591 | . . . . | {Fixed means, e.g. wings, baffles} [2013-01] |
C23C 16/45593 | . . . | {Recirculation of reactive gases} [2013-01] |
C23C 16/45595 | . . . | {Atmospheric CVD gas inlets with no enclosed reaction chamber} [2013-01] |
C23C 16/45597 | . . . | {Reactive back side gas} [2013-01] |
C23C 16/458 | . . | characterised by the method used for supporting substrates in the reaction chamber [2013-01] |
C23C 16/4581 | . . . | {characterised by material of construction or surface finish of the means for supporting the substrate} [2013-01] |
C23C 16/4582 | . . . | {Rigid and flat substrates, e.g. plates or discs (C23C 16/4581 takes precedence)} [2013-01] |
C23C 16/4583 | . . . . | {the substrate being supported substantially horizontally} [2013-01] |
C23C 16/4584 | . . . . . | {the substrate being rotated} [2013-01] |
C23C 16/4585 | . . . . . | {Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds} [2013-01] |
C23C 16/4586 | . . . . . | {Elements in the interior of the support, e.g. electrodes, heating or cooling devices} [2013-01] |
C23C 16/4587 | . . . . | {the substrate being supported substantially vertically} [2013-01] |
C23C 16/4588 | . . . . . | {the substrate being rotated} [2013-01] |
C23C 16/46 | . . | characterised by the method used for heating the substrate (C23C 16/48, C23C 16/50 take precedence) [2013-01] |
C23C 16/463 | . . . | {Cooling of the substrate} [2013-01] |
C23C 16/466 | . . . . | {using thermal contact gas} [2013-01] |
C23C 16/48 | . . | by irradiation, e.g. photolysis, radiolysis, particle radiation [2013-01] |
C23C 16/481 | . . . | {by radiant heating of the substrate} [2013-01] |
C23C 16/482 | . . . | {using incoherent light, UV to IR, e.g. lamps} [2013-01] |
C23C 16/483 | . . . | {using coherent light, UV to IR, e.g. lasers} [2013-01] |
C23C 16/484 | . . . | {using X-ray radiation} [2013-01] |
C23C 16/485 | . . . | {using synchrotron radiation} [2013-01] |
C23C 16/486 | . . . | {using ion beam radiation} [2013-01] |
C23C 16/487 | . . . | {using electron radiation} [2013-01] |
C23C 16/488 | . . . | {Protection of windows for introduction of radiation into the coating chamber} [2013-01] |
C23C 16/50 | . . | using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J 37/32, H01J 37/34)} [2013-01] |
C23C 16/503 | . . . | using dc or ac discharges [2013-01] |
C23C 16/505 | . . . | using radio frequency discharges [2013-01] |
C23C 16/507 | . . . . | using external electrodes, e.g. in tunnel type reactors [2013-01] |
C23C 16/509 | . . . . | using internal electrodes [2013-01] |
C23C 16/5093 | . . . . . | {Coaxial electrodes} [2013-01] |
C23C 16/5096 | . . . . . | {Flat-bed apparatus} [2013-01] |
C23C 16/511 | . . . | using microwave discharges [2013-01] |
C23C 16/513 | . . . | using plasma jets [2013-01] |
C23C 16/515 | . . . | using pulsed discharges [2013-01] |
C23C 16/517 | . . . | using a combination of discharges covered by two or more of groups C23C 16/503 - C23C 16/515 [2016-05] |
C23C 16/52 | . . | Controlling or regulating the coating process {(C23C 16/45557, C23C 16/279 take precedence)} [2018-01] |
C23C 16/54 | . . | Apparatus specially adapted for continuous coating [2013-01] |
C23C 16/545 | . . . | {for coating elongated substrates} [2013-01] |
C23C 16/56 | . | After-treatment [2013-01] |
C23C 18/02 | . | by thermal decomposition [2013-01] |
C23C 18/04 | . . |
C23C 18/06 | . . | Coating on selected surface areas, e.g. using masks [2013-01] |
C23C 18/08 | . . | characterised by the deposition of metallic material [2013-01] |
C23C 18/10 | . . . | Deposition of aluminium only [2013-01] |
C23C 18/12 | . . | characterised by the deposition of inorganic material other than metallic material [2020-05] |
C23C 18/1204 | . . . | {inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds} [2014-06] |
C23C 18/1208 | . . . . | {Oxides, e.g. ceramics} [2013-01] |
C23C 18/1212 | . . . . . | {Zeolites, glasses} [2013-01] |
C23C 18/1216 | . . . . . | {Metal oxides (C23C 18/1212 takes precedence)} [2013-01] |
C23C 18/122 | . . . . | {Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes} [2013-01] |
C23C 18/1225 | . . . | {Deposition of multilayers of inorganic material} [2013-01] |
C23C 18/1229 | . . . | {Composition of the substrate} [2013-01] |
C23C 18/1233 | . . . . | {Organic substrates} [2013-01] |
C23C 18/1237 | . . . . . | {Composite substrates, e.g. laminated, premixed} [2013-01] |
C23C 18/1241 | . . . . | {Metallic substrates} [2013-01] |
C23C 18/1245 | . . . . | {Inorganic substrates other than metallic} [2013-01] |
C23C 18/125 | . . . | {Process of deposition of the inorganic material} [2013-01] |
C23C 18/1254 | . . . . | {Sol or sol-gel processing} [2013-01] |
C23C 18/1258 | . . . . | {Spray pyrolysis} [2013-01] |
C23C 18/1262 | . . . . | {involving particles, e.g. carbon nanotubes [CNT], flakes} [2013-01] |
C23C 18/1266 | . . . . . | {Particles formed in situ} [2013-01] |
C23C 18/127 | . . . . . | {Preformed particles} [2013-01] |
C23C 18/1275 | . . . . | {performed under inert atmosphere} [2013-01] |
C23C 18/1279 | . . . . | {performed under reactive atmosphere, e.g. oxidising or reducing atmospheres} [2013-01] |
C23C 18/1283 | . . . . | {Control of temperature, e.g. gradual temperature increase, modulation of temperature} [2013-01] |
C23C 18/1287 | . . . . | {with flow inducing means, e.g. ultrasonic} [2013-01] |
C23C 18/1291 | . . . . | {by heating of the substrate} [2013-01] |
C23C 18/1295 | . . . . | {with after-treatment of the deposited inorganic material} [2013-01] |
C23C 18/14 | . | Decomposition by irradiation, e.g. photolysis, particle radiation {or by mixed irradiation sources} [2021-02] |
C23C 18/143 | . . | {Radiation by light, e.g. photolysis or pyrolysis} [2021-02] |
C23C 18/145 | . . | {Radiation by charged particles, e.g. electron beams or ion irradiation} [2021-02] |
C23C 18/16 | . |
C23C 18/1601 | . . | {Process or apparatus} [2013-01] |
C23C 18/1603 | . . . | {coating on selected surface areas} [2013-01] |
C23C 18/1605 | . . . . | {by masking} [2020-05] |
C23C 18/1607 | . . . . | {by direct patterning} [2013-01] |
C23C 18/1608 | . . . . . | {from pretreatment step, i.e. selective pre-treatment} [2013-01] |
C23C 18/161 | . . . . . | {from plating step, e.g. inkjet} [2013-01] |
C23C 18/1612 | . . . . . | {through irradiation means} [2013-01] |
C23C 18/1614 | . . . . | {plating on one side} [2013-01] |
C23C 18/1616 | . . . . . | {interior or inner surface} [2013-01] |
C23C 18/1617 | . . . | {Purification and regeneration of coating baths} [2013-01] |
C23C 18/1619 | . . . | {Apparatus for electroless plating} [2020-05] |
C23C 18/1621 | . . . . | {Protection of inner surfaces of the apparatus} [2013-01] |
C23C 18/1623 | . . . . . | {through electrochemical processes} [2013-01] |
C23C 18/1625 | . . . . . | {through chemical processes} [2013-01] |
C23C 18/1626 | . . . . . | {through mechanical processes} [2013-01] |
C23C 18/1628 | . . . . | {Specific elements or parts of the apparatus} [2013-01] |
C23C 18/163 | . . . . . | {Supporting devices for articles to be coated} [2013-01] |
C23C 18/1632 | . . . . | {Features specific for the apparatus, e.g. layout of cells and of its equipment, multiple cells} [2013-01] |
C23C 18/1633 | . . . | {Process of electroless plating} [2013-01] |
C23C 18/1635 | . . . . | {Composition of the substrate} [2013-01] |
C23C 18/1637 | . . . . . | {metallic substrate} [2013-01] |
C23C 18/1639 | . . . . . | {Substrates other than metallic, e.g. inorganic or organic or non-conductive} [2013-01] |
C23C 18/1641 | . . . . . . | {Organic substrates, e.g. resin, plastic} [2013-01] |
C23C 18/1642 | . . . . . . | {semiconductor (semiconductor H01L 21/288)} [2013-01] |
C23C 18/1644 | . . . . . | {porous substrates} [2013-01] |
C23C 18/1646 | . . . . | {Characteristics of the product obtained} [2013-01] |
C23C 18/1648 | . . . . . | {Porous product} [2013-01] |
C23C 18/165 | . . . . . | {Multilayered product (layered product B32B)} [2013-01] |
C23C 18/1651 | . . . . . . | {Two or more layers only obtained by electroless plating} [2013-01] |
C23C 18/1653 | . . . . . . | {Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating} [2013-01] |
C23C 18/1655 | . . . . | {Process features} [2013-01] |
C23C 18/1657 | . . . . . | {Electroless forming, i.e. substrate removed or destroyed at the end of the process} [2013-01] |
C23C 18/1658 | . . . . . | {with two steps starting with metal deposition followed by addition of reducing agent} [2013-01] |
C23C 18/166 | . . . . . | {with two steps starting with addition of reducing agent followed by metal deposition} [2013-01] |
C23C 18/1662 | . . . . . | {Use of incorporated material in the solution or dispersion, e.g. particles, whiskers, wires} [2013-01] |
C23C 18/1664 | . . . . . | {with additional means during the plating process} [2013-01] |
C23C 18/1666 | . . . . . . | {Ultrasonics} [2013-01] |
C23C 18/1667 | . . . . . . | {Radiant energy, e.g. laser} [2013-01] |
C23C 18/1669 | . . . . . . | {Agitation, e.g. air introduction} [2016-11] |
C23C 18/1671 | . . . . . . | {Electric field} [2013-01] |
C23C 18/1673 | . . . . . . | {Magnetic field} [2013-01] |
C23C 18/1675 | . . . . | {Process conditions} [2013-01] |
C23C 18/1676 | . . . . . | {Heating of the solution} [2013-01] |
C23C 18/1678 | . . . . . | {Heating of the substrate} [2013-01] |
C23C 18/168 | . . . . . | {Control of temperature, e.g. temperature of bath, substrate} [2013-01] |
C23C 18/1682 | . . . . . | {Control of atmosphere} [2013-01] |
C23C 18/1683 | . . . . . | {Control of electrolyte composition, e.g. measurement, adjustment (regeneration of bath C23C 18/1617)} [2013-01] |
C23C 18/1685 | . . . . . | {with supercritical condition, e.g. chemical fluid deposition} [2013-01] |
C23C 18/1687 | . . . . . | {with ionic liquid} [2013-01] |
C23C 18/1689 | . . . . | {After-treatment} [2013-01] |
C23C 18/1691 | . . . . . | {Cooling, e g. forced or controlled cooling} [2013-01] |
C23C 18/1692 | . . . . . | {Heat-treatment} [2013-01] |
C23C 18/1694 | . . . . . . | {Sequential heat treatment} [2013-01] |
C23C 18/1696 | . . . . . . | {Control of atmosphere} [2013-01] |
C23C 18/1698 | . . . . . . | {Control of temperature} [2013-01] |
C23C 18/18 | . . | Pretreatment of the material to be coated [2017-08] |
C23C 18/1803 | . . . | {of metallic material surfaces or of a non-specific material surfaces} [2020-05] |
C23C 18/1806 | . . . . | {by mechanical pretreatment, e.g. grinding, sanding} [2013-01] |
C23C 18/181 | . . . . . | {by formation of electrostatic charges, e.g. tribofriction} [2013-01] |
C23C 18/1813 | . . . . | {by radiant energy} [2013-01] |
C23C 18/1817 | . . . . . | {Heat} [2013-01] |
C23C 18/182 | . . . . . | {Radiation, e.g. UV, laser} [2013-01] |
C23C 18/1824 | . . . . | {by chemical pretreatment} [2013-01] |
C23C 18/1827 | . . . . . | {only one step pretreatment} [2013-01] |
C23C 18/1831 | . . . . . . | {Use of metal, e.g. activation, sensitisation with noble metals} [2013-01] |
C23C 18/1834 | . . . . . . | {Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers} [2013-01] |
C23C 18/1837 | . . . . . | {Multistep pretreatment} [2013-01] |
C23C 18/1841 | . . . . . . | {with use of metal first} [2013-01] |
C23C 18/1844 | . . . . . . | {with use of organic or inorganic compounds other than metals, first} [2013-01] |
C23C 18/1848 | . . . . | {by electrochemical pretreatment} [2013-01] |
C23C 18/1851 | . . . | {of surfaces of non-metallic or semiconducting in organic material} [2013-01] |
| C23C 18/1855 | . . . . | {by mechanical pretreatment, e.g. grinding, sanding} [2016-05] WARNING
|
C23C 18/1858 | . . . . . | {by formation of electrostatic charges, e.g. tribofriction} [2013-01] |
C23C 18/1862 | . . . . | {by radiant energy} [2013-01] |
C23C 18/1865 | . . . . . | {Heat} [2013-01] |
C23C 18/1868 | . . . . . | {Radiation, e.g. UV, laser} [2013-01] |
C23C 18/1872 | . . . . | {by chemical pretreatment} [2013-01] |
C23C 18/1875 | . . . . . | {only one step pretreatment} [2013-01] |
C23C 18/1879 | . . . . . . | {Use of metal, e.g. activation, sensitisation with noble metals} [2013-01] |
C23C 18/1882 | . . . . . . | {Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers} [2013-01] |
C23C 18/1886 | . . . . . | {Multistep pretreatment} [2013-01] |
C23C 18/1889 | . . . . . . | {with use of metal first} [2013-01] |
C23C 18/1893 | . . . . . . | {with use of organic or inorganic compounds other than metals, first} [2013-01] |
C23C 18/1896 | . . . . | {by electrochemical pretreatment} [2013-01] |
C23C 18/20 | . . . | of organic surfaces, e.g. resins [2013-01] |
C23C 18/2006 | . . . . | {by other methods than those of C23C 18/22 - C23C 18/30} [2016-05] |
| C23C 18/2013 | . . . . . | {by mechanical pretreatment, e.g. grinding, sanding} [2016-05] WARNING
|
C23C 18/202 | . . . . . . | {by formation of electrostatic charges, e.g. tribofriction} [2013-01] |
C23C 18/2026 | . . . . . | {by radiant energy} [2013-01] |
C23C 18/2033 | . . . . . . | {Heat} [2013-01] |
C23C 18/204 | . . . . . . | {Radiation, e.g. UV, laser} [2013-01] |
C23C 18/2046 | . . . . . | {by chemical pretreatment} [2013-01] |
C23C 18/2053 | . . . . . . | {only one step pretreatment} [2013-01] |
C23C 18/206 | . . . . . . . | {Use of metal other than noble metals and tin, e.g. activation, sensitisation with metals (sensitising with tin C23C 18/285, sensitising with noble metals C23C 18/30)} [2017-08] |
C23C 18/2066 | . . . . . . . | {Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers} [2013-01] |
C23C 18/2073 | . . . . . . | {Multistep pretreatment} [2013-01] |
C23C 18/208 | . . . . . . . | {with use of metal first} [2013-01] |
C23C 18/2086 | . . . . . . . | {with use of organic or inorganic compounds other than metals, first} [2013-01] |
C23C 18/2093 | . . . . . | {by electrochemical pretreatment} [2013-01] |
C23C 18/22 | . . . . | Roughening, e.g. by etching [2013-01] |
C23C 18/24 | . . . . . | using acid aqueous solutions [2013-01] |
C23C 18/26 | . . . . . | using organic liquids [2013-01] |
C23C 18/28 | . . . . | Sensitising or activating [2020-05] |
C23C 18/285 | . . . . . | {Sensitising or activating with tin based compound or composition} [2013-01] |
C23C 18/30 | . . . . . | Activating {or accelerating or sensitising with palladium or other noble metal} [2015-11] |
C23C 18/31 | . . | Coating with metals [2013-01] |
C23C 18/32 | . . . | Coating with nickel, cobalt or mixtures thereof with phosphorus or boron (C23C 18/50 takes precedence) [2013-01] |
C23C 18/34 | . . . . | using reducing agents [2013-01] |
C23C 18/36 | . . . . . | using hypophosphites [2013-01] |
C23C 18/38 | . . . | Coating with copper [2013-01] |
C23C 18/40 | . . . . | using reducing agents [2013-01] |
C23C 18/405 | . . . . . | {Formaldehyde} [2013-01] |
C23C 18/42 | . . . | Coating with noble metals [2013-01] |
C23C 18/44 | . . . . | using reducing agents [2013-01] |
C23C 18/48 | . . | Coating with alloys [2013-01] |
C23C 18/50 | . . . | with alloys based on iron, cobalt or nickel [2013-01] |
C23C 18/52 | . . | using reducing agents for coating with metallic material not provided for in a single one of groups C23C 18/32 - C23C 18/50 [2016-05] |
C23C 18/54 | . | Contact plating, i.e. electroless electrochemical plating [2013-01] |
C23C 20/02 | . | Coating with metallic material [2013-01] |
C23C 20/04 | . . | with metals [2013-01] |
C23C 20/06 | . | Coating with inorganic material, other than metallic material [2013-01] |
C23C 20/08 | . . | with compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides [2013-01] |
Chemical surface treatment of metallic material by reaction of the surface with a reactive medium [2022-08] |
| C23C 22/00 | Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals [2018-01] NOTES
|
C23C 22/02 | . | using non-aqueous solutions [2013-01] |
C23C 22/03 | . . | containing phosphorus compounds [2013-01] |
C23C 22/04 | . . | containing hexavalent chromium compounds [2013-01] |
C23C 22/05 | . | using aqueous solutions [2013-01] |
C23C 22/06 | . . | using aqueous acidic solutions with pH less than 6 [2013-01] |
C23C 22/07 | . . . | containing phosphates [2013-01] |
C23C 22/08 | . . . . | Orthophosphates [2013-01] |
C23C 22/10 | . . . . . | containing oxidants [2013-01] |
C23C 22/12 | . . . . . | containing zinc cations [2013-01] |
C23C 22/13 | . . . . . . | containing also nitrate or nitrite anions [2013-01] |
C23C 22/14 | . . . . . . | containing also chlorate anions [2013-01] |
C23C 22/16 | . . . . . . | containing also peroxy-compounds [2013-01] |
C23C 22/17 | . . . . . . | containing also organic acids [2013-01] |
C23C 22/18 | . . . . . | containing manganese cations [2013-01] |
C23C 22/182 | . . . . . . | {containing also zinc cations} [2013-01] |
C23C 22/184 | . . . . . . . | {containing also nickel cations} [2013-01] |
C23C 22/186 | . . . . . . | {containing also copper cations} [2013-01] |
C23C 22/188 | . . . . . . | {containing also magnesium cations} [2013-01] |
C23C 22/20 | . . . . . | containing aluminium cations [2013-01] |
C23C 22/22 | . . . . . | containing alkaline earth metal cations [2013-01] |
C23C 22/23 | . . . . | Condensed phosphates [2013-01] |
C23C 22/24 | . . . | containing hexavalent chromium compounds [2013-01] |
C23C 22/26 | . . . . | containing also organic compounds [2013-01] |
C23C 22/27 | . . . . . | Acids [2013-01] |
C23C 22/28 | . . . . . | Macromolecular compounds [2013-01] |
C23C 22/30 | . . . . | containing also trivalent chromium [2013-01] |
C23C 22/32 | . . . . | containing also pulverulent metals [2013-01] |
C23C 22/33 | . . . . | containing also phosphates [2013-01] |
C23C 22/34 | . . . | containing fluorides or complex fluorides [2013-01] |
C23C 22/36 | . . . . | containing also phosphates [2013-01] |
C23C 22/361 | . . . . . | {containing titanium, zirconium or hafnium compounds} [2013-01] |
C23C 22/362 | . . . . . | {containing also zinc cations} [2013-01] |
C23C 22/364 | . . . . . | {containing also manganese cations} [2013-01] |
C23C 22/365 | . . . . . . | {containing also zinc and nickel cations} [2013-01] |
C23C 22/367 | . . . . . | {containing alkaline earth metal cations} [2013-01] |
C23C 22/368 | . . . . . | {containing magnesium cations} [2013-01] |
C23C 22/37 | . . . . | containing also hexavalent chromium compounds [2013-01] |
C23C 22/38 | . . . . . | containing also phosphates [2013-01] |
C23C 22/40 | . . . | containing molybdates, tungstates or vanadates [2013-01] |
C23C 22/42 | . . . . | containing also phosphates [2013-01] |
C23C 22/43 | . . . . | containing also hexavalent chromium compounds [2013-01] |
C23C 22/44 | . . . . | containing also fluorides or complex fluorides [2013-01] |
C23C 22/46 | . . . | containing oxalates [2013-01] |
C23C 22/47 | . . . . | containing also phosphates [2013-01] |
C23C 22/48 | . . . | not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates [2013-01] |
C23C 22/50 | . . . . | Treatment of iron or alloys based thereon [2013-01] |
C23C 22/52 | . . . . | Treatment of copper or alloys based thereon [2013-01] |
C23C 22/53 | . . . . | Treatment of zinc or alloys based thereon [2013-01] |
C23C 22/54 | . . . . | Treatment of refractory metals or alloys based thereon [2013-01] |
C23C 22/56 | . . . . | Treatment of aluminium or alloys based thereon [2013-01] |
C23C 22/57 | . . . . | Treatment of magnesium or alloys based thereon [2013-01] |
C23C 22/58 | . . . . | Treatment of other metallic material [2013-01] |
C23C 22/60 | . . | using alkaline aqueous solutions with pH greater than 8 [2013-01] |
C23C 22/62 | . . . | Treatment of iron or alloys based thereon [2013-01] |
C23C 22/63 | . . . | Treatment of copper or alloys based thereon [2013-01] |
C23C 22/64 | . . . | Treatment of refractory metals or alloys based thereon [2013-01] |
C23C 22/66 | . . . | Treatment of aluminium or alloys based thereon [2013-01] |
C23C 22/67 | . . . . | with solutions containing hexavalent chromium [2013-01] |
C23C 22/68 | . . | using aqueous solutions with pH between 6 and 8 [2013-01] |
C23C 22/70 | . | using melts [2013-01] |
C23C 22/72 | . . | Treatment of iron or alloys based thereon [2013-01] |
C23C 22/73 | . | characterised by the process [2013-01] |
C23C 22/74 | . . | for obtaining burned-in conversion coatings [2013-01] |
C23C 22/76 | . . | Applying the liquid by spraying [2013-01] |
C23C 22/77 | . . | Controlling or regulating of the coating process [2018-01] |
C23C 22/78 | . | Pretreatment of the material to be coated [2017-08] |
C23C 22/80 | . . | with solutions containing titanium or zirconium compounds [2013-01] |
C23C 22/82 | . | After-treatment [2013-01] |
C23C 22/83 | . . | Chemical after-treatment [2013-01] |
C23C 22/84 | . . | Dyeing [2013-01] |
C23C 22/86 | . | Regeneration of coating baths [2013-01] |
C23C 24/00 | Coating starting from inorganic powder (spraying of the coating material in molten state C23C 4/00; solid state diffusion C23C 8/00 - C23C 12/00) [2018-01] |
C23C 24/02 | . | by application of pressure only [2013-01] |
C23C 24/04 | . . | Impact or kinetic deposition of particles [2013-01] |
C23C 24/045 | . . . | {by trembling using impacting inert media} [2013-01] |
C23C 24/06 | . . | Compressing powdered coating material, e.g. by milling [2013-01] |
C23C 24/08 | . |
C23C 24/082 | . . | {without intermediate formation of a liquid in the layer} [2013-01] |
C23C 24/085 | . . . | {Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides} [2013-01] |
C23C 24/087 | . . . . | {Coating with metal alloys or metal elements only} [2013-01] |
C23C 24/10 | . . | with intermediate formation of a liquid phase in the layer [2013-01] |
C23C 24/103 | . . . | {Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides} [2013-01] |
C23C 24/106 | . . . . | {Coating with metal alloys or metal elements only} [2013-01] |
C23C 26/00 | Coating not provided for in groups C23C 2/00 - C23C 24/00 [2016-05] |
C23C 28/00 | Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C 2/00 - C23C 26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D [2016-05] |
C23C 28/02 | . | only coatings {only including layers} of metallic material [2013-01] |
C23C 28/021 | . . | {including at least one metal alloy layer} [2015-10] |
C23C 28/022 | . . . | {with at least one MCrAlX layer} [2015-10] |
C23C 28/023 | . . | {only coatings of metal elements only} [2013-01] |
C23C 28/025 | . . . | {with at least one zinc-based layer} [2015-10] |
C23C 28/026 | . . | {including at least one amorphous metallic material layer} [2015-10] |
C23C 28/027 | . . | {including at least one metal matrix material comprising a mixture of at least two metals or metal phases or metal matrix composites, e.g. metal matrix with embedded inorganic hard particles, CERMET, MMC.} [2015-10] |
C23C 28/028 | . . | {Including graded layers in composition or in physical properties, e.g. density, porosity, grain size} [2015-10] |
C23C 28/04 | . | only coatings of inorganic non-metallic material [2013-01] |
C23C 28/042 | . . | {including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides} [2015-10] |
C23C 28/044 | . . | {coatings specially adapted for cutting tools or wear applications} [2016-05] |
C23C 28/046 | . . | {with at least one amorphous inorganic material layer, e.g. DLC, a-C:H, a-C:Me, the layer being doped or not} [2013-01] |
C23C 28/048 | . . | {with layers graded in composition or physical properties} [2013-01] |
C23C 28/30 | . | {Coatings combining at least one metallic layer and at least one inorganic non-metallic layer} [2013-01] |
C23C 28/32 | . . | {including at least one pure metallic layer} [2013-01] |
C23C 28/321 | . . . | {with at least one metal alloy layer} [2013-01] |
C23C 28/3215 | . . . . | {at least one MCrAlX layer} [2013-01] |
C23C 28/322 | . . . | {only coatings of metal elements only} [2013-01] |
C23C 28/3225 | . . . . | {with at least one zinc-based layer} [2013-01] |
C23C 28/323 | . . . | {with at least one amorphous metallic material layer} [2013-01] |
C23C 28/324 | . . . | {with at least one metal matrix material layer comprising a mixture of at least two metals or metal phases or a metal-matrix material with hard embedded particles, e.g. WC-Me} [2013-01] |
C23C 28/325 | . . . | {with layers graded in composition or in physical properties} [2013-01] |
C23C 28/34 | . . | {including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates} [2013-01] |
C23C 28/341 | . . . | {with at least one carbide layer} [2013-01] |
C23C 28/343 | . . . | {with at least one DLC or an amorphous carbon based layer, the layer being doped or not} [2013-01] |
C23C 28/345 | . . . | {with at least one oxide layer} [2013-01] |
C23C 28/3455 | . . . . | {with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer} [2013-01] |
C23C 28/347 | . . . | {with layers adapted for cutting tools or wear applications} [2013-01] |
C23C 28/36 | . . | {including layers graded in composition or physical properties} [2013-01] |
C23C 28/40 | . | {Coatings including alternating layers following a pattern, a periodic or defined repetition} [2013-01] |
C23C 28/42 | . . | {characterized by the composition of the alternating layers} [2013-01] |
C23C 28/44 | . . | {characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness} [2013-01] |
C23C 30/00 | Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process (C23C 26/00, C23C 28/00 take precedence) [2013-01] |
C23C 2222/00 | Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium [2013-01] |
C23C 2222/10 | . | Use of solutions containing trivalent chromium but free of hexavalent chromium [2013-01] |
C23C 2222/20 | . | Use of solutions containing silanes [2013-01] |