Cooperative Patent Classification


Version: 2018.05
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CPC
COOPERATIVE PATENT CLASSIFICATION
C23C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C 23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D 39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B 41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M 11/83; decorating textiles by locally metallising D06Q 1/04) [2018-01]
NOTE

  • In this subclass, an operation is considered as pre-treatment or after-treatment when it is specially adapted for, but quite distinct from, the coating process concerned and constitutes an independent operation. If an operation results in the formation of a permanent sub- or upper layer, it is not considered as pre-treatment or after-treatment and is classified as a multi-coating process.
WARNING

  • The following IPC groups are not in the CPC scheme. The subject matter for these IPC groups is classified in the following CPC groups:
    C23C14/36 - C23C14/44 covered by C23C 14/34 and subgroups.
    C23C18/28 covered by C23C 18/2006 - C23C 18/2093
Coating by applying the coating material in the molten state (casting B22D, e.g. B22D 19/08, B22D 23/04, B29; built-up welding B23K, e.g. B23K 5/18, B23K 9/04) [2013-01]
C23C 2/00
Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor [2013-01]
C23C 2/003
.
{Apparatus, e.g. crucibles, heating devices} [2013-01]
C23C 2/006
.
{Pattern or selective deposit without pre-treatment of the material to be coated} [2013-01]
C23C 2/02
.
Pretreatment of the material to be coated, e.g. for coating on selected surface areas (C23C 2/30 takes precedence) [2017-08]
C23C 2/04
.
characterised by the coating material [2013-01]
C23C 2/06
. .
Zinc or cadmium or alloys based thereon [2013-01]
C23C 2/08
. .
Tin or alloys based thereon [2013-01]
C23C 2/10
. .
Lead or alloys based thereon [2013-01]
C23C 2/12
. .
Aluminium or alloys based thereon [2013-01]
C23C 2/14
.
Removing excess of molten coatings; Controlling or regulating the coating thickness [2018-01]
C23C 2/16
. .
using fluids under pressure, e.g. air knives [2013-01]
C23C 2/18
. . .
Removing excess of molten coatings from elongated material [2013-01]
C23C 2/185
. . . .
{Tubes; Wires} [2013-01]
C23C 2/20
. . . .
Strips; Plates [2013-01]
C23C 2/22
. .
by rubbing, e.g. using knives {, e.g. rubbing solids} [2017-08]
C23C 2/24
. .
using magnetic or electric fields [2013-01]
C23C 2/26
.
After-treatment (C23C 2/14 takes precedence) [2013-01]
C23C 2/265
. .
{by applying solid particles to the molten coating} [2013-01]
C23C 2/28
. .
Thermal aftertreatment, e.g. treatment in oil bath [2013-01]
C23C 2/285
. . .
{for remelting the coating} [2013-01]
C23C 2/30
.
Fluxes or coverings on molten baths (C23C 2/22 takes precedence) [2013-01]
C23C 2/32
.
using vibratory energy applied to the bath or substrate (C23C 2/14 takes precedence) [2013-01]
C23C 2/34
.
characterised by the shape of the material to be treated (C23C 2/14 takes precedence) [2013-01]
C23C 2/36
. .
Elongated material [2013-01]
C23C 2/38
. . .
Wires; Tubes [2013-01]
C23C 2/385
. . . .
{Tubes of specific length} [2013-01]
C23C 2/40
. . .
Plates; Strips [2013-01]
C23C 2/405
. . . .
{Plates of specific length} [2013-01]
C23C 4/00
Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge (build-up welding B23K, e.g. B23K 5/18, B23K 9/04) [2016-01]
C23C 4/01
.
Selective coating, e.g. pattern coating, without pre-treatment of the material to be coated [2016-01]
C23C 4/02
.
Pretreatment of the material to be coated, e.g. for coating on selected surface areas [2017-08]
C23C 4/04
.
characterised by the coating material [2013-01]
C23C 4/06
. .
Metallic material [2016-01]
C23C 4/067
. . .
containing free particles of non-metal elements, e.g. carbon, silicon, boron, phosphorus or arsenic [2016-01]
C23C 4/073
. . .
containing MCrAl or MCrAlY alloys, where M is nickel, cobalt or iron, with or without non-metal elements [2016-01]
C23C 4/08
. . .
containing only metal elements (C23C 4/073 takes precedence) [2016-01]
C23C 4/10
. .
Oxides, borides, carbides, nitrides or silicides; Mixtures thereof [2016-01]
C23C 4/11
. . .
Oxides [2016-01]
C23C 4/12
.
characterised by the method of spraying [2016-01]
NOTE

  • In this group, multi-aspect classification is applied, so that subject matter characterised by aspects covered by more than one of its subgroups should be classified in each of those subgroups.
C23C 4/123
. .
Spraying molten metal [2016-01]
C23C 4/126
. .
Detonation spraying [2016-01]
C23C 4/129
. .
Flame spraying [2016-01]
C23C 4/131
. .
Wire arc spraying [2016-01]
C23C 4/134
. .
Plasma spraying [2016-01]
C23C 4/137
. .
Spraying in vacuum or in an inert atmosphere [2016-01]
C23C 4/14
. .
for coating elongate material [2016-01]
C23C 4/16
. . .
Wires; Tubes [2013-01]
C23C 4/18
.
After-treatment [2013-01]
C23C 4/185
. .
{Separation of the coating from the substrate} [2013-01]
C23C 6/00
Coating by casting molten material on the substrate [2013-01]
Solid state diffusion into metallic material surfaces [2013-01]
C23C 8/00
Solid state diffusion of only non-metal elements into metallic material surfaces (diffusion of silicon C23C 10/00); Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals (C23C 14/00 takes precedence) [2013-01]
C23C 8/02
.
Pretreatment of the material to be coated (C23C 8/04 takes precedence) [2017-08]
C23C 8/04
.
Treatment of selected surface areas, e.g. using masks [2013-01]
C23C 8/06
.
using gases (C23C 8/36 takes precedence) [2013-01]
C23C 8/08
. .
only one element being applied [2017-08]
C23C 8/10
. . .
Oxidising [2013-01]
C23C 8/12
. . . .
using elemental oxygen or ozone [2013-01]
C23C 8/14
. . . . .
Oxidising of ferrous surfaces [2013-01]
C23C 8/16
. . . .
using oxygen-containing compounds, e.g. water, carbon dioxide [2013-01]
C23C 8/18
. . . . .
Oxidising of ferrous surfaces [2017-08]
C23C 8/20
. . .
Carburising [2013-01]
C23C 8/22
. . . .
of ferrous surfaces [2013-01]
C23C 8/24
. . .
Nitriding [2013-01]
C23C 8/26
. . . .
of ferrous surfaces [2013-01]
C23C 8/28
. .
more than one element being applied in one step [2013-01]
C23C 8/30
. . .
Carbo-nitriding [2013-01]
C23C 8/32
. . . .
of ferrous surfaces [2013-01]
C23C 8/34
. .
more than one element being applied in more than one step [2013-01]
C23C 8/36
. .
using ionised gases, e.g. ionitriding [2018-01]
C23C 8/38
. . .
Treatment of ferrous surfaces [2013-01]
C23C 8/40
.
using liquids, e.g. salt baths, liquid suspensions [2013-01]
C23C 8/42
. .
only one element being applied [2013-01]
C23C 8/44
. . .
Carburising [2013-01]
C23C 8/46
. . . .
of ferrous surfaces [2013-01]
C23C 8/48
. . .
Nitriding [2013-01]
C23C 8/50
. . . .
of ferrous surfaces [2013-01]
C23C 8/52
. .
more than one element being applied in one step [2013-01]
C23C 8/54
. . .
Carbo-nitriding [2013-01]
C23C 8/56
. . . .
of ferrous surfaces [2013-01]
C23C 8/58
. .
more than one element being applied in more than one step [2013-01]
C23C 8/60
.
using solids, e.g. powders, pastes (using liquid suspensions of solids C23C 8/40) [2013-01]
C23C 8/62
. .
only one element being applied [2013-01]
C23C 8/64
. . .
Carburising [2013-01]
C23C 8/66
. . . .
of ferrous surfaces [2013-01]
C23C 8/68
. . .
Boronising [2013-01]
C23C 8/70
. . . .
of ferrous surfaces [2013-01]
C23C 8/72
. .
more than one element being applied in one step [2013-01]
C23C 8/74
. . .
Carbo-nitriding [2013-01]
C23C 8/76
. . . .
of ferrous surfaces [2013-01]
C23C 8/78
. .
more than one element being applied in more than one step [2013-01]
C23C 8/80
.
After-treatment [2013-01]
C23C 10/00
Solid state diffusion of only metal elements or silicon into metallic material surfaces [2013-01]
C23C 10/02
.
Pretreatment of the material to be coated (C23C 10/04 takes precedence) [2013-01]
C23C 10/04
.
Diffusion into selected surface areas, e.g. using masks [2013-01]
C23C 10/06
.
using gases [2013-01]
C23C 10/08
. .
only one element being diffused [2013-01]
C23C 10/10
. . .
Chromising [2013-01]
C23C 10/12
. . . .
of ferrous surfaces [2013-01]
C23C 10/14
. .
more than one element being diffused in one step [2013-01]
C23C 10/16
. .
more than one element being diffused in more than one step [2013-01]
C23C 10/18
.
using liquids, e.g. salt baths, liquid suspensions [2013-01]
C23C 10/20
. .
only one element being diffused [2013-01]
C23C 10/22
. . .
Metal melt containing the element to be diffused [2013-01]
C23C 10/24
. . .
Salt bath containing the element to be diffused [2013-01]
C23C 10/26
. .
more than one element being diffused [2013-01]
C23C 10/28
.
using solids, e.g. powders, pastes [2013-01]
C23C 10/30
. .
using a layer of powder or paste on the surface (using liquid suspensions of solids C23C 10/18) [2013-01]
C23C 10/32
. . .
Chromising [2013-01]
C23C 10/34
. .
Embedding in a powder mixture, i.e. pack cementation [2013-01]
C23C 10/36
. . .
only one element being diffused [2013-01]
C23C 10/38
. . . .
Chromising [2013-01]
C23C 10/40
. . . . .
of ferrous surfaces [2013-01]
C23C 10/42
. . . . . .
in the presence of volatile transport additives, e.g. halogenated substances [2013-01]
C23C 10/44
. . . .
Siliconising [2013-01]
C23C 10/46
. . . . .
of ferrous surfaces [2013-01]
C23C 10/48
. . . .
Aluminising [2013-01]
C23C 10/50
. . . . .
of ferrous surfaces [2013-01]
C23C 10/52
. . .
more than one element being diffused in one step [2013-01]
C23C 10/54
. . . .
Diffusion of at least chromium [2013-01]
C23C 10/56
. . . . .
and at least aluminium [2013-01]
C23C 10/58
. . .
more than one element being diffused in more than one step [2013-01]
C23C 10/60
.
After-treatment [2013-01]
C23C 12/00
Solid state diffusion of at least one non-metal element other than silicon and at least one metal element or silicon into metallic material surfaces [2013-01]
C23C 12/02
.
Diffusion in one step [2013-01]
Coating by vacuum evaporation, by sputtering or by ion implantation [2013-01]
C23C 14/00
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material [2018-01]
C23C 14/0005
.
{Separation of the coating from the substrate} [2013-01]
C23C 14/001
.
{Coating on a liquid substrate} [2013-01]
C23C 14/0015
.
{characterized by the colour of the layer} [2013-01]
C23C 14/0021
.
{Reactive sputtering or evaporation} [2013-01]
C23C 14/0026
. .
{Activation or excitation of reactive gases outside the coating chamber} [2013-01]
C23C 14/0031
. . .
{Bombardment of substrates by reactive ion beams} [2013-01]
C23C 14/0036
. .
{Reactive sputtering} [2013-01]
C23C 14/0042
. . .
{Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements} [2013-01]
C23C 14/0047
. . .
{Activation or excitation of reactive gases outside the coating chamber} [2013-01]
C23C 14/0052
. . . .
{Bombardment of substrates by reactive ion beams} [2013-01]
C23C 14/0057
. . .
{using reactive gases other than O2, H2O, N2, NH3 or CH4} [2013-01]
C23C 14/0063
. . .
{characterised by means for introducing or removing gases} [2013-01]
C23C 14/0068
. . .
{characterised by means for confinement of gases or sputtered material, e.g. screens, baffles} [2013-01]
C23C 14/0073
. . .
{by exposing the substrates to reactive gases intermittently} [2013-01]
C23C 14/0078
. . . .
{by moving the substrates between spatially separate sputtering and reaction stations} [2013-01]
C23C 14/0084
. . .
{Producing gradient compositions} [2013-01]
C23C 14/0089
. . .
{in metallic mode} [2013-01]
C23C 14/0094
. . .
{in transition mode} [2013-01]
C23C 14/02
.
Pretreatment of the material to be coated (C23C 14/04 takes precedence) [2017-08]
C23C 14/021
. .
{Cleaning or etching treatments} [2013-01]
C23C 14/022
. . .
{by means of bombardment with energetic particles or radiation} [2013-01]
C23C 14/024
. .
{Deposition of sublayers, e.g. to promote adhesion of the coating (C23C 14/027 takes precedence)} [2013-01]
C23C 14/025
. . .
{Metallic sublayers} [2013-01]
C23C 14/027
. .
{Graded interfaces} [2013-01]
C23C 14/028
. .
{Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing} [2013-01]
C23C 14/04
.
Coating on selected surface areas, e.g. using masks [2013-01]
C23C 14/042
. .
{using masks} [2013-01]
C23C 14/044
. . .
{using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient} [2013-01]
C23C 14/046
. .
{Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates} [2013-01]
C23C 14/048
. .
{using irradiation by energy or particles} [2013-01]
C23C 14/06
.
characterised by the coating material ({C23C 14/0021 } , C23C 14/04 take precedence) [2013-01]
C23C 14/0605
. .
{Carbon} [2013-01]
C23C 14/0611
. . .
{Diamond} [2013-01]
C23C 14/0617
. .
{AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi} [2013-01]
C23C 14/0623
. .
{Sulfides, selenides or tellurides} [2013-01]
C23C 14/0629
. . .
{of zinc, cadmium or mercury} [2013-01]
C23C 14/0635
. .
{Carbides} [2013-01]
C23C 14/0641
. .
{Nitrides (C23C 14/0617 takes precedence)} [2013-01]
C23C 14/0647
. . .
{Boron nitride} [2013-01]
C23C 14/0652
. . .
{Silicon nitride} [2013-01]
C23C 14/0658
. . .
{Carbon nitride} [2013-01]
C23C 14/0664
. .
{Carbonitrides} [2013-01]
C23C 14/067
. .
{Borides} [2013-01]
C23C 14/0676
. .
{Oxynitrides} [2013-01]
C23C 14/0682
. .
{Silicides} [2013-01]
C23C 14/0688
. .
{Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides} [2013-01]
C23C 14/0694
. .
{Halides} [2013-01]
C23C 14/08
. .
Oxides (C23C 14/10 takes precedence) [2013-01]
C23C 14/081
. . .
{of aluminium, magnesium or beryllium} [2013-01]
C23C 14/082
. . .
{of alkaline earth metals} [2013-01]
C23C 14/083
. . .
{of refractory metals or yttrium} [2013-01]
C23C 14/085
. . .
{of iron group metals} [2013-01]
C23C 14/086
. . .
{of zinc, germanium, cadmium, indium, tin, thallium or bismuth} [2013-01]
C23C 14/087
. . .
{of copper or solid solutions thereof} [2013-01]
C23C 14/088
. . .
{of the type ABO3 with A representing alkali, alkaline earth metal or Pb and B representing a refractory or rare earth metal} [2013-01]
C23C 14/10
. .
Glass or silica [2013-01]
C23C 14/12
. .
Organic material [2013-01]
C23C 14/14
. .
Metallic material, boron or silicon [2013-01]
C23C 14/16
. . .
on metallic substrates or on substrates of boron or silicon [2013-01]
C23C 14/165
. . . .
{by cathodic sputtering} [2013-01]
C23C 14/18
. . .
on other inorganic substrates [2013-01]
C23C 14/185
. . . .
{by cathodic sputtering} [2013-01]
C23C 14/20
. . .
on organic substrates [2013-01]
C23C 14/205
. . . .
{by cathodic sputtering} [2013-01]
C23C 14/22
.
characterised by the process of coating [2013-01]
C23C 14/221
. .
{Ion beam deposition (C23C 14/46, C23C 14/48 take precedence)} [2013-01]
C23C 14/223
. .
{specially adapted for coating particles} [2017-02]
C23C 14/225
. .
{Oblique incidence of vaporised material on substrate} [2013-01]
C23C 14/226
. . .
{in order to form films with columnar structure} [2013-01]
C23C 14/228
. .
{Gas flow assisted PVD deposition} [2013-01]
C23C 14/24
. .
Vacuum evaporation [2013-01]
C23C 14/243
. . .
{Crucibles for source material (C23C 14/28, C23C 14/30 take precedence)} [2013-01]
C23C 14/246
. . .
{Replenishment of source material} [2013-01]
C23C 14/26
. . .
by resistance or inductive heating of the source [2013-01]
C23C 14/28
. . .
by wave energy or particle radiation (C23C 14/32 - C23C 14/48 take precedence) [2016-05]
C23C 14/30
. . . .
by electron bombardment [2013-01]
C23C 14/32
. . .
by explosion; by evaporation and subsequent ionisation of the vapours {, e.g. ion-plating }(C23C 14/34 - C23C 14/48 take precedence) [2016-08]
C23C 14/325
. . . .
{Electric arc evaporation} [2013-01]
C23C 14/34
. .
Sputtering [2013-01]
C23C 14/3407
. . .
{Cathode assembly for sputtering apparatus, e.g. Target} [2013-01]
C23C 14/3414
. . . .
{Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy} [2013-01]
C23C 14/3421
. . . .
{using heated targets} [2013-01]
C23C 14/3428
. . . .
{using liquid targets} [2013-01]
C23C 14/3435
. . .
{Applying energy to the substrate during sputtering} [2013-01]
C23C 14/3442
. . . .
{using an ion beam} [2013-01]
C23C 14/345
. . . .
{using substrate bias} [2013-01]
C23C 14/3457
. . .
{using other particles than noble gas ions (C23C 14/0036, C23C 14/46 take precedence)} [2013-01]
C23C 14/3464
. . .
{using more than one target (C23C 14/56 takes precedence)} [2013-01]
C23C 14/3471
. . .
{Introduction of auxiliary energy into the plasma} [2013-01]
C23C 14/3478
. . . .
{using electrons, e.g. triode sputtering} [2013-01]
C23C 14/3485
. . .
{using pulsed power to the target} [2013-01]
C23C 14/3492
. . .
{Variation of parameters during sputtering} [2013-01]
C23C 14/35
. . .
by application of a magnetic field, e.g. magnetron sputtering {(C23C 14/3457 takes precedence)} [2013-01]
C23C 14/351
. . . .
{using a magnetic field in close vicinity to the substrate} [2013-01]
C23C 14/352
. . . .
{using more than one target (C23C 14/56 takes precedence)} [2013-01]
C23C 14/354
. . . .
{Introduction of auxiliary energy into the plasma} [2013-01]
C23C 14/355
. . . . .
{using electrons, e.g. triode sputtering} [2013-01]
C23C 14/357
. . . . .
{Microwaves, e.g. electron cyclotron resonance enhanced sputtering} [2013-01]
C23C 14/358
. . . . .
{Inductive energy} [2013-01]
C23C 14/46
. . .
by ion beam produced by an external ion source [2013-01]
C23C 14/48
. .
Ion implantation [2013-01]
C23C 14/50
. .
Substrate holders [2013-01]
C23C 14/505
. . .
{for rotation of the substrates} [2013-01]
C23C 14/52
. .
Means for observation of the coating process [2013-01]
C23C 14/54
. .
Controlling or regulating the coating process [2018-01]
C23C 14/541
. . .
{Heating or cooling of the substrates} [2013-01]
C23C 14/542
. . .
{Controlling the film thickness or evaporation rate} [2013-01]
C23C 14/543
. . . .
{using measurement on the vapor source} [2013-01]
C23C 14/544
. . . .
{using measurement in the gas phase} [2013-01]
C23C 14/545
. . . .
{using measurement on deposited material} [2013-01]
C23C 14/546
. . . . .
{using crystal oscillators} [2013-01]
C23C 14/547
. . . . .
{using optical methods} [2013-01]
C23C 14/548
. . .
{Controlling the composition} [2013-01]
C23C 14/56
. .
Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks [2013-01]
C23C 14/562
. . .
{for coating elongated substrates} [2013-01]
C23C 14/564
. . .
{Means for minimising impurities in the coating chamber such as dust, moisture, residual gases} [2013-01]
C23C 14/566
. . . .
{using a load-lock chamber} [2013-01]
C23C 14/568
. . .
{Transferring the substrates through a series of coating stations (C23C 14/562 takes precedence)} [2013-01]
C23C 14/58
.
After-treatment [2013-01]
C23C 14/5806
. .
{Thermal treatment} [2013-01]
C23C 14/5813
. . .
{using lasers} [2013-01]
C23C 14/582
. . .
{using electron bombardment} [2013-01]
C23C 14/5826
. .
{Plasma treatment} [2013-01]
C23C 14/5833
. . .
{Ion beam bombardment} [2013-01]
C23C 14/584
. .
{Non-reactive treatment} [2013-01]
C23C 14/5846
. .
{Reactive treatment} [2013-01]
C23C 14/5853
. . .
{Oxidation} [2013-01]
C23C 14/586
. . .
{Nitriding} [2013-01]
C23C 14/5866
. . .
{Treatment with sulfur, selenium or tellurium} [2013-01]
C23C 14/5873
. .
{Removal of material} [2013-01]
C23C 14/588
. . .
{by mechanical treatment} [2013-01]
C23C 14/5886
. .
{Mechanical treatment (involving removal of material C23C 14/588)} [2013-01]
C23C 14/5893
. .
{Mixing of deposited material} [2013-01]
Chemical deposition or plating by decomposition; Contact plating (solid state diffusion C23C 8/00 - C23C 12/00) [2016-05]
C23C 16/00
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C 14/00) [2013-01]
C23C 16/003
.
{Coating on a liquid substrate} [2013-01]
C23C 16/006
.
{characterized by the colour of the layer} [2013-01]
C23C 16/01
.
on temporary substrates, e.g. substrates subsequently removed by etching [2013-01]
C23C 16/02
.
Pretreatment of the material to be coated (C23C 16/04 takes precedence) [2013-01]
C23C 16/0209
. .
{by heating} [2013-01]
C23C 16/0218
. . .
{in a reactive atmosphere (C23C 16/0227 takes precedence)} [2013-01]
C23C 16/0227
. .
{by cleaning or etching} [2013-01]
C23C 16/0236
. . .
{by etching with a reactive gas} [2013-01]
C23C 16/0245
. . .
{by etching with a plasma} [2013-01]
C23C 16/0254
. .
{Physical treatment to alter the texture of the surface, e.g. scratching or polishing} [2013-01]
C23C 16/0263
. . .
{Irradiation with laser or particle beam} [2013-01]
C23C 16/0272
. .
{Deposition of sub-layers, e.g. to promote the adhesion of the main coating} [2013-01]
C23C 16/0281
. . .
{of metallic sub-layers (C23C 16/029 takes precedence)} [2013-01]
C23C 16/029
. . .
{Graded interfaces} [2013-01]
C23C 16/04
.
Coating on selected surface areas, e.g. using masks [2013-01]
C23C 16/042
. .
{using masks} [2013-01]
C23C 16/045
. .
{Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates} [2013-01]
C23C 16/047
. .
{using irradiation by energy or particles} [2013-01]
C23C 16/06
.
characterised by the deposition of metallic material [2013-01]
C23C 16/08
. .
from metal halides [2013-01]
C23C 16/10
. . .
Deposition of chromium only [2013-01]
C23C 16/12
. . .
Deposition of aluminium only [2013-01]
C23C 16/14
. . .
Deposition of only one other metal element [2013-01]
C23C 16/16
. .
from metal carbonyl compounds [2013-01]
C23C 16/18
. .
from metallo-organic compounds [2013-01]
C23C 16/20
. . .
Deposition of aluminium only [2013-01]
C23C 16/22
.
characterised by the deposition of inorganic material, other than metallic material [2013-01]
C23C 16/24
. .
Deposition of silicon only [2013-01]
C23C 16/26
. .
Deposition of carbon only [2013-01]
C23C 16/27
. . .
Diamond only [2013-01]
C23C 16/271
. . . .
{using hot filaments} [2013-01]
C23C 16/272
. . . .
{using DC, AC or RF discharges} [2013-01]
C23C 16/274
. . . .
{using microwave discharges} [2013-01]
C23C 16/275
. . . .
{using combustion torches} [2013-01]
C23C 16/276
. . . .
{using plasma jets} [2013-01]
C23C 16/277
. . . .
{using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets} [2013-01]
C23C 16/278
. . . .
{doping or introduction of a secondary phase in the diamond} [2013-01]
C23C 16/279
. . . .
{control of diamond crystallography} [2013-01]
C23C 16/28
. .
Deposition of only one other non-metal element [2013-01]
C23C 16/30
. .
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides [2013-01]
C23C 16/301
. . .
{AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi} [2013-01]
C23C 16/303
. . . .
{Nitrides} [2013-01]
C23C 16/305
. . .
{Sulfides, selenides, or tellurides} [2013-01]
C23C 16/306
. . . .
{AII BVI compounds, where A is Zn, Cd or Hg and B is S, Se or Te} [2013-01]
C23C 16/308
. . .
{Oxynitrides} [2013-01]
C23C 16/32
. . .
Carbides [2013-01]
C23C 16/325
. . . .
{Silicon carbide} [2013-01]
C23C 16/34
. . .
Nitrides {(C23C 16/303 takes precedence)} [2013-01]
C23C 16/342
. . . .
{Boron nitride} [2013-01]
C23C 16/345
. . . .
{Silicon nitride} [2013-01]
C23C 16/347
. . . .
{Carbon nitride} [2013-01]
C23C 16/36
. . .
Carbonitrides [2013-01]
C23C 16/38
. . .
Borides [2013-01]
C23C 16/40
. . .
Oxides [2013-01]
C23C 16/401
. . . .
{containing silicon} [2013-01]
C23C 16/402
. . . . .
{Silicon dioxide} [2013-01]
C23C 16/403
. . . .
{of aluminium, magnesium or beryllium} [2013-01]
C23C 16/404
. . . .
{of alkaline earth metals} [2013-01]
C23C 16/405
. . . .
{of refractory metals or yttrium} [2013-01]
C23C 16/406
. . . .
{of iron group metals} [2013-01]
C23C 16/407
. . . .
{of zinc, germanium, cadmium, indium, tin, thallium or bismuth} [2013-01]
C23C 16/408
. . . .
{of copper or solid solutions thereof} [2013-01]
C23C 16/409
. . . .
{of the type ABO3 with A representing alkali, alkaline earth metal or lead and B representing a refractory metal, nickel, scandium or a lanthanide} [2013-01]
C23C 16/42
. . .
Silicides [2013-01]
C23C 16/44
.
characterised by the method of coating (C23C 16/04 takes precedence) [2013-01]
C23C 16/4401
. .
{Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber} [2013-01]
C23C 16/4402
. . .
{Reduction of impurities in the source gas} [2013-01]
C23C 16/4404
. . .
{Coatings or surface treatment on the inside of the reaction chamber or on parts thereof} [2013-01]
C23C 16/4405
. . .
{Cleaning of reactor or parts inside the reactor by using reactive gases} [2013-01]
C23C 16/4407
. . .
{Cleaning of reactor or reactor parts by using wet or mechanical methods} [2013-01]
C23C 16/4408
. . .
{by purging residual gases from the reaction chamber or gas lines} [2013-01]
C23C 16/4409
. . .
{characterised by sealing means} [2013-01]
C23C 16/4411
. .
{Cooling of the reaction chamber walls (C23C 16/45572 takes precedence)} [2013-01]
C23C 16/4412
. .
{Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps} [2013-01]
C23C 16/4414
. .
{Electrochemical vapour deposition [EVD]} [2013-01]
C23C 16/4415
. .
{Acoustic wave CVD} [2013-01]
C23C 16/4417
. .
{Methods specially adapted for coating powder} [2013-01]
C23C 16/4418
. .
{Methods for making free-standing articles (C23C 16/01 takes precedence)} [2013-01]
C23C 16/442
. .
using fluidised bed process [2013-01]
C23C 16/448
. .
characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials [2013-01]
C23C 16/4481
. . .
{by evaporation using carrier gas in contact with the source material (C23C 16/4486 takes precedence)} [2013-01]
C23C 16/4482
. . . .
{by bubbling of carrier gas through liquid source material} [2013-01]
C23C 16/4483
. . . .
{using a porous body} [2013-01]
C23C 16/4485
. . .
{by evaporation without using carrier gas in contact with the source material (C23C 16/4486 takes precedence)} [2013-01]
C23C 16/4486
. . .
{by producing an aerosol and subsequent evaporation of the droplets or particles} [2013-01]
C23C 16/4487
. . .
{by using a condenser} [2013-01]
C23C 16/4488
. . .
{by in situ generation of reactive gas by chemical or electrochemical reaction} [2013-01]
C23C 16/452
. . .
by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species [2015-11]
C23C 16/453
. .
passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD (C23C 16/513 takes precedence; for flame or plasma spraying of coating material in the molten state C23C 4/00) [2013-01]
C23C 16/455
. .
characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber [2013-01]
C23C 16/45502
. . .
{Flow conditions in reaction chamber} [2013-01]
C23C 16/45504
. . . .
{Laminar flow} [2013-01]
C23C 16/45506
. . . .
{Turbulent flow} [2013-01]
C23C 16/45508
. . . .
{Radial flow} [2013-01]
C23C 16/4551
. . . .
{Jet streams} [2013-01]
C23C 16/45512
. . .
{Premixing before introduction in the reaction chamber} [2013-01]
C23C 16/45514
. . .
{Mixing in close vicinity to the substrate} [2013-01]
C23C 16/45517
. . .
{Confinement of gases to vicinity of substrate} [2013-01]
C23C 16/45519
. . .
{Inert gas curtains} [2013-01]
C23C 16/45521
. . . .
{the gas, other than thermal contact gas, being introduced the rear of the substrate to flow around its periphery} [2013-01]
C23C 16/45523
. . .
{Pulsed gas flow or change of composition over time} [2013-01]
C23C 16/45525
. . . .
{Atomic layer deposition [ALD]} [2013-01]
C23C 16/45527
. . . . .
{characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations} [2013-01]
C23C 16/45529
. . . . . .
{specially adapted for making a layer stack of alternating different compositions or gradient compositions} [2013-01]
C23C 16/45531
. . . . . .
{specially adapted for making ternary or higher compositions} [2013-01]
C23C 16/45534
. . . . . .
{Use of auxiliary reactants other than used for contributing to the composition of the main film, e.g. catalysts, activators or scavengers} [2013-01]
C23C 16/45536
. . . . . .
{Use of plasma, radiation or electromagnetic fields} [2013-01]
C23C 16/45538
. . . . . . .
{Plasma being used continuously during the ALD cycle} [2013-01]
C23C 16/4554
. . . . . . .
{Plasma being used non-continuously in between ALD reactions (C23C 16/56 takes precedence)} [2013-01]
C23C 16/45542
. . . . . . .
{Plasma being used non-continuously during the ALD reactions} [2013-01]
C23C 16/45544
. . . . .
{characterized by the apparatus} [2013-01]
C23C 16/45546
. . . . . .
{specially adapted for a substrate stack in the ALD reactor} [2013-01]
C23C 16/45548
. . . . . .
{having arrangements for gas injection at different locations of the reactor for each ALD half-reaction} [2013-01]
C23C 16/45551
. . . . . . .
{for relative movement of the substrate and the gas injectors or half-reaction reactor compartments} [2013-01]
C23C 16/45553
. . . . .
{characterized by the use of precursors specially adapted for ALD} [2013-01]
C23C 16/45555
. . . . .
{applied in non-semiconductor technology} [2013-01]
C23C 16/45557
. . .
{Pulsed pressure or control pressure} [2013-01]
C23C 16/45559
. . .
{Diffusion of reactive gas to substrate} [2013-01]
C23C 16/45561
. . .
{Gas plumbing upstream of the reaction chamber} [2013-01]
C23C 16/45563
. . .
{Gas nozzles} [2013-01]
C23C 16/45565
. . . .
{Shower nozzles} [2013-01]
C23C 16/45568
. . . .
{Porous nozzles} [2013-01]
C23C 16/4557
. . . .
{Heated nozzles} [2013-01]
C23C 16/45572
. . . .
{Cooled nozzles} [2013-01]
C23C 16/45574
. . . .
{Nozzles for more than one gas} [2013-01]
C23C 16/45576
. . . .
{Coaxial inlets for each gas} [2013-01]
C23C 16/45578
. . . .
{Elongated nozzles, tubes with holes} [2013-01]
C23C 16/4558
. . . .
{Perforated rings} [2013-01]
C23C 16/45582
. . .
{Expansion of gas before it reaches the substrate} [2013-01]
C23C 16/45585
. . .
{Compression of gas before it reaches the substrate} [2013-01]
C23C 16/45587
. . .
{Mechanical means for changing the gas flow} [2013-01]
C23C 16/45589
. . . .
{Movable means, e.g. fans} [2013-01]
C23C 16/45591
. . . .
{Fixed means, e.g. wings, baffles} [2013-01]
C23C 16/45593
. . .
{Recirculation of reactive gases} [2013-01]
C23C 16/45595
. . .
{Atmospheric CVD gas inlets with no enclosed reaction chamber} [2013-01]
C23C 16/45597
. . .
{Reactive back side gas} [2013-01]
C23C 16/458
. .
characterised by the method used for supporting substrates in the reaction chamber [2013-01]
C23C 16/4581
. . .
{characterised by material of construction or surface finish of the means for supporting the substrate} [2013-01]
C23C 16/4582
. . .
{Rigid and flat substrates, e.g. plates or discs (C23C 16/4581 takes precedence)} [2013-01]
C23C 16/4583
. . . .
{the substrate being supported substantially horizontally} [2013-01]
C23C 16/4584
. . . . .
{the substrate being rotated} [2013-01]
C23C 16/4585
. . . . .
{Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds} [2013-01]
C23C 16/4586
. . . . .
{Elements in the interior of the support, e.g. electrodes, heating or cooling devices} [2013-01]
C23C 16/4587
. . . .
{the substrate being supported substantially vertically} [2013-01]
C23C 16/4588
. . . . .
{the substrate being rotated} [2013-01]
C23C 16/46
. .
characterised by the method used for heating the substrate (C23C 16/48, C23C 16/50 take precedence) [2013-01]
C23C 16/463
. . .
{Cooling of the substrate} [2013-01]
C23C 16/466
. . . .
{using thermal contact gas} [2013-01]
C23C 16/48
. .
by irradiation, e.g. photolysis, radiolysis, particle radiation [2013-01]
C23C 16/481
. . .
{by radiant heating of the substrate} [2013-01]
C23C 16/482
. . .
{using incoherent light, UV to IR, e.g. lamps} [2013-01]
C23C 16/483
. . .
{using coherent light, UV to IR, e.g. lasers} [2013-01]
C23C 16/484
. . .
{using X-ray radiation} [2013-01]
C23C 16/485
. . .
{using synchrotron radiation} [2013-01]
C23C 16/486
. . .
{using ion beam radiation} [2013-01]
C23C 16/487
. . .
{using electron radiation} [2013-01]
C23C 16/488
. . .
{Protection of windows for introduction of radiation into the coating chamber} [2013-01]
C23C 16/50
. .
using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J 37/32, H01J 37/34)} [2013-01]
C23C 16/503
. . .
using dc or ac discharges [2013-01]
C23C 16/505
. . .
using radio frequency discharges [2013-01]
C23C 16/507
. . . .
using external electrodes, e.g. in tunnel type reactors [2013-01]
C23C 16/509
. . . .
using internal electrodes [2013-01]
C23C 16/5093
. . . . .
{Coaxial electrodes} [2013-01]
C23C 16/5096
. . . . .
{Flat-bed apparatus} [2013-01]
C23C 16/511
. . .
using microwave discharges [2013-01]
C23C 16/513
. . .
using plasma jets [2013-01]
C23C 16/515
. . .
using pulsed discharges [2013-01]
C23C 16/517
. . .
using a combination of discharges covered by two or more of groups C23C 16/503 - C23C 16/515 [2016-05]
C23C 16/52
. .
Controlling or regulating the coating process {(C23C 16/45557, C23C 16/279 take precedence)} [2018-01]
C23C 16/54
. .
Apparatus specially adapted for continuous coating [2013-01]
C23C 16/545
. . .
{for coating elongated substrates} [2013-01]
C23C 16/56
.
After-treatment [2013-01]
C23C 18/00
Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating [2018-01]
NOTE

  • This groups covers also suspensions containing reactive liquids and non-reactive solid particles.
C23C 18/02
.
by thermal decomposition [2013-01]
C23C 18/04
. .
Pretreatment of the material to be coated (C23C 18/06 takes precedence) [2017-08]
C23C 18/06
. .
Coating on selected surface areas, e.g. using masks [2013-01]
C23C 18/08
. .
characterised by the deposition of metallic material [2013-01]
C23C 18/10
. . .
Deposition of aluminium only [2013-01]
C23C 18/12
. .
characterised by the deposition of inorganic material other than metallic material [2016-05]
WARNING

C23C 18/1204
. . .
{inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds} [2014-06]
C23C 18/1208
. . . .
{Oxides, e.g. ceramics} [2013-01]
C23C 18/1212
. . . . .
{Zeolites, glasses} [2013-01]
C23C 18/1216
. . . . .
{Metal oxides (C23C 18/1212 takes precedence)} [2013-01]
C23C 18/122
. . . .
{Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes} [2013-01]
C23C 18/1225
. . .
{Deposition of multilayers of inorganic material} [2013-01]
C23C 18/1229
. . .
{Composition of the substrate} [2013-01]
C23C 18/1233
. . . .
{Organic substrates} [2013-01]
C23C 18/1237
. . . . .
{Composite substrates, e.g. laminated, premixed} [2013-01]
C23C 18/1241
. . . .
{Metallic substrates} [2013-01]
C23C 18/1245
. . . .
{Inorganic substrates other than metallic} [2013-01]
C23C 18/125
. . .
{Process of deposition of the inorganic material} [2013-01]
C23C 18/1254
. . . .
{Sol or sol-gel processing} [2013-01]
C23C 18/1258
. . . .
{Spray pyrolysis} [2013-01]
C23C 18/1262
. . . .
{involving particles, e.g. carbon nanotubes [CNT], flakes} [2013-01]
C23C 18/1266
. . . . .
{Particles formed in situ} [2013-01]
C23C 18/127
. . . . .
{Preformed particles} [2013-01]
C23C 18/1275
. . . .
{performed under inert atmosphere} [2013-01]
C23C 18/1279
. . . .
{performed under reactive atmosphere, e.g. oxidising or reducing atmospheres} [2013-01]
C23C 18/1283
. . . .
{Control of temperature, e.g. gradual temperature increase, modulation of temperature} [2013-01]
C23C 18/1287
. . . .
{with flow inducing means, e.g. ultrasonic} [2013-01]
C23C 18/1291
. . . .
{by heating of the substrate} [2013-01]
C23C 18/1295
. . . .
{with after-treatment of the deposited inorganic material} [2013-01]
C23C 18/14
.
Decomposition by irradiation, e.g. photolysis, particle radiation [2013-01]
C23C 18/16
.
by reduction or substitution, e.g. electroless plating (C23C 18/54 takes precedence) [2013-01]
C23C 18/1601
. .
{Process or apparatus} [2013-01]
C23C 18/1603
. . .
{coating on selected surface areas} [2013-01]
C23C 18/1605
. . . .
{by masking} [2016-05]
WARNING

C23C 18/1607
. . . .
{by direct patterning} [2013-01]
C23C 18/1608
. . . . .
{from pretreatment step, i.e. selective pre-treatment} [2013-01]
C23C 18/161
. . . . .
{from plating step, e.g. inkjet} [2013-01]
C23C 18/1612
. . . . .
{through irradiation means} [2013-01]
C23C 18/1614
. . . .
{plating on one side} [2013-01]
C23C 18/1616
. . . . .
{interior or inner surface} [2013-01]
C23C 18/1617
. . .
{Purification and regeneration of coating baths} [2013-01]
C23C 18/1619
. . .
{Apparatus for electroless plating} [2016-05]
WARNING

C23C 18/1621
. . . .
{Protection of inner surfaces of the apparatus} [2013-01]
C23C 18/1623
. . . . .
{through electrochemical processes} [2013-01]
C23C 18/1625
. . . . .
{through chemical processes} [2013-01]
C23C 18/1626
. . . . .
{through mechanical processes} [2013-01]
C23C 18/1628
. . . .
{Specific elements or parts of the apparatus} [2013-01]
C23C 18/163
. . . . .
{Supporting devices for articles to be coated} [2013-01]
C23C 18/1632
. . . .
{Features specific for the apparatus, e.g. layout of cells and of its equipment, multiple cells} [2013-01]
C23C 18/1633
. . .
{Process of electroless plating} [2013-01]
C23C 18/1635
. . . .
{Composition of the substrate} [2013-01]
C23C 18/1637
. . . . .
{metallic substrate} [2013-01]
C23C 18/1639
. . . . .
{Substrates other than metallic, e.g. inorganic or organic or non-conductive} [2013-01]
C23C 18/1641
. . . . . .
{Organic substrates, e.g. resin, plastic} [2013-01]
C23C 18/1642
. . . . . .
{semiconductor (semiconductor H01L 21/288)} [2013-01]
C23C 18/1644
. . . . .
{porous substrates} [2013-01]
C23C 18/1646
. . . .
{Characteristics of the product obtained} [2013-01]
C23C 18/1648
. . . . .
{Porous product} [2013-01]
C23C 18/165
. . . . .
{Multilayered product (layered product B32B)} [2013-01]
C23C 18/1651
. . . . . .
{Two or more layers only obtained by electroless plating} [2013-01]
C23C 18/1653
. . . . . .
{Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating} [2013-01]
C23C 18/1655
. . . .
{Process features} [2013-01]
C23C 18/1657
. . . . .
{Electroless forming, i.e. substrate removed or destroyed at the end of the process} [2013-01]
C23C 18/1658
. . . . .
{with two steps starting with metal deposition followed by addition of reducing agent} [2013-01]
C23C 18/166
. . . . .
{with two steps starting with addition of reducing agent followed by metal deposition} [2013-01]
C23C 18/1662
. . . . .
{Use of incorporated material in the solution or dispersion, e.g. particles, whiskers, wires} [2013-01]
C23C 18/1664
. . . . .
{with additional means during the plating process} [2013-01]
C23C 18/1666
. . . . . .
{Ultrasonics} [2013-01]
C23C 18/1667
. . . . . .
{Radiant energy, e.g. laser} [2013-01]
C23C 18/1669
. . . . . .
{Agitation, e.g. air introduction} [2016-11]
C23C 18/1671
. . . . . .
{Electric field} [2013-01]
C23C 18/1673
. . . . . .
{Magnetic field} [2013-01]
C23C 18/1675
. . . .
{Process conditions} [2013-01]
C23C 18/1676
. . . . .
{Heating of the solution} [2013-01]
C23C 18/1678
. . . . .
{Heating of the substrate} [2013-01]
C23C 18/168
. . . . .
{Control of temperature, e.g. temperature of bath, substrate} [2013-01]
C23C 18/1682
. . . . .
{Control of atmosphere} [2013-01]
C23C 18/1683
. . . . .
{Control of electrolyte composition, e.g. measurement, adjustment (regeneration of bath C23C 18/1617)} [2013-01]
C23C 18/1685
. . . . .
{with supercritical condition, e.g. chemical fluid deposition} [2013-01]
C23C 18/1687
. . . . .
{with ionic liquid} [2013-01]
C23C 18/1689
. . . .
{After-treatment} [2013-01]
C23C 18/1691
. . . . .
{Cooling, e g. forced or controlled cooling} [2013-01]
C23C 18/1692
. . . . .
{Heat-treatment} [2013-01]
C23C 18/1694
. . . . . .
{Sequential heat treatment} [2013-01]
C23C 18/1696
. . . . . .
{Control of atmosphere} [2013-01]
C23C 18/1698
. . . . . .
{Control of temperature} [2013-01]
C23C 18/18
. .
Pretreatment of the material to be coated [2017-08]
C23C 18/1803
. . .
{of metallic material surfaces or of a non-specific material surfaces} [2016-05]
WARNING

C23C 18/1806
. . . .
{by mechanical pretreatment, e.g. grinding, sanding} [2013-01]
C23C 18/181
. . . . .
{by formation of electrostatic charges, e.g. tribofriction} [2013-01]
C23C 18/1813
. . . .
{by radiant energy} [2013-01]
C23C 18/1817
. . . . .
{Heat} [2013-01]
C23C 18/182
. . . . .
{Radiation, e.g. UV, laser} [2013-01]
C23C 18/1824
. . . .
{by chemical pretreatment} [2013-01]
C23C 18/1827
. . . . .
{only one step pretreatment} [2013-01]
C23C 18/1831
. . . . . .
{Use of metal, e.g. activation, sensitisation with noble metals} [2013-01]
C23C 18/1834
. . . . . .
{Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers} [2013-01]
C23C 18/1837
. . . . .
{Multistep pretreatment} [2013-01]
C23C 18/1841
. . . . . .
{with use of metal first} [2013-01]
C23C 18/1844
. . . . . .
{with use of organic or inorganic compounds other than metals, first} [2013-01]
C23C 18/1848
. . . .
{by electrochemical pretreatment} [2013-01]
C23C 18/1851
. . .
{of surfaces of non-metallic or semiconducting in organic material} [2013-01]
C23C 18/1855
. . . .
{by mechanical pretreatment, e.g. grinding, sanding} [2016-05]
WARNING

C23C 18/1858
. . . . .
{by formation of electrostatic charges, e.g. tribofriction} [2013-01]
C23C 18/1862
. . . .
{by radiant energy} [2013-01]
C23C 18/1865
. . . . .
{Heat} [2013-01]
C23C 18/1868
. . . . .
{Radiation, e.g. UV, laser} [2013-01]
C23C 18/1872
. . . .
{by chemical pretreatment} [2013-01]
C23C 18/1875
. . . . .
{only one step pretreatment} [2013-01]
C23C 18/1879
. . . . . .
{Use of metal, e.g. activation, sensitisation with noble metals} [2013-01]
C23C 18/1882
. . . . . .
{Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers} [2013-01]
C23C 18/1886
. . . . .
{Multistep pretreatment} [2013-01]
C23C 18/1889
. . . . . .
{with use of metal first} [2013-01]
C23C 18/1893
. . . . . .
{with use of organic or inorganic compounds other than metals, first} [2013-01]
C23C 18/1896
. . . .
{by electrochemical pretreatment} [2013-01]
C23C 18/20
. . .
of organic surfaces, e.g. resins [2013-01]
C23C 18/2006
. . . .
{by other methods than those of C23C 18/22 - C23C 18/30} [2016-05]
C23C 18/2013
. . . . .
{by mechanical pretreatment, e.g. grinding, sanding} [2016-05]
WARNING

C23C 18/202
. . . . . .
{by formation of electrostatic charges, e.g. tribofriction} [2013-01]
C23C 18/2026
. . . . .
{by radiant energy} [2013-01]
C23C 18/2033
. . . . . .
{Heat} [2013-01]
C23C 18/204
. . . . . .
{Radiation, e.g. UV, laser} [2013-01]
C23C 18/2046
. . . . .
{by chemical pretreatment} [2013-01]
C23C 18/2053
. . . . . .
{only one step pretreatment} [2013-01]
C23C 18/206
. . . . . . .
{Use of metal other than noble metals and tin, e.g. activation, sensitisation with metals (sensitising with tin C23C 18/285, sensitising with noble metals C23C 18/30)} [2017-08]
C23C 18/2066
. . . . . . .
{Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers} [2013-01]
C23C 18/2073
. . . . . .
{Multistep pretreatment} [2013-01]
C23C 18/208
. . . . . . .
{with use of metal first} [2013-01]
C23C 18/2086
. . . . . . .
{with use of organic or inorganic compounds other than metals, first} [2013-01]
C23C 18/2093
. . . . .
{by electrochemical pretreatment} [2013-01]
C23C 18/22
. . . .
Roughening, e.g. by etching [2013-01]
C23C 18/24
. . . . .
using acid aqueous solutions [2013-01]
C23C 18/26
. . . . .
using organic liquids [2013-01]
C23C 18/28
. . . .
Sensitising or activating {(not used, see subgroups)} [2013-01]
C23C 18/285
. . . . .
{Sensitising or activating with tin based compound or composition} [2013-01]
C23C 18/30
. . . . .
Activating {or accelerating or sensitising with palladium or other noble metal} [2015-11]
C23C 18/31
. .
Coating with metals [2013-01]
C23C 18/32
. . .
Coating with nickel, cobalt or mixtures thereof with phosphorus or boron (C23C 18/50 takes precedence) [2013-01]
C23C 18/34
. . . .
using reducing agents [2013-01]
C23C 18/36
. . . . .
using hypophosphites [2013-01]
C23C 18/38
. . .
Coating with copper [2013-01]
C23C 18/40
. . . .
using reducing agents [2013-01]
C23C 18/405
. . . . .
{Formaldehyde} [2013-01]
C23C 18/42
. . .
Coating with noble metals [2013-01]
C23C 18/44
. . . .
using reducing agents [2013-01]
C23C 18/48
. .
Coating with alloys [2013-01]
C23C 18/50
. . .
with alloys based on iron, cobalt or nickel [2013-01]
C23C 18/52
. .
using reducing agents for coating with metallic material not provided for in a single one of groups C23C 18/32 - C23C 18/50 [2016-05]
C23C 18/54
.
Contact plating, i.e. electroless electrochemical plating [2013-01]
C23C 20/00
Chemical coating by decomposition of either solid compounds or suspensions of the coating forming compounds, without leaving reaction products of surface material in the coating [2018-01]
NOTE

  • This group covers also suspensions containing non-reactive liquids and reactive solid particles.
C23C 20/02
.
Coating with metallic material [2013-01]
C23C 20/04
. .
with metals [2013-01]
C23C 20/06
.
Coating with inorganic material, other than metallic material [2013-01]
C23C 20/08
. .
with compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides [2013-01]
Chemical surface treatment of metallic material by reaction of the surface with a reactive medium (with a reactive gas C23C 8/00) [2013-01]
C23C 22/00
Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals [2018-01]
NOTES

  • This group covers also suspensions containing reactive liquids and non-reactive solid particles.
  • In groups C23C 22/02 - C23C 22/86, in the absence of an indication to the contrary, classification is made in the last appropriate place.
  • Rejuvenating of the bath is classified in the appropriate place for the specific bath composition.
C23C 22/02
.
using non-aqueous solutions [2013-01]
C23C 22/03
. .
containing phosphorus compounds [2013-01]
C23C 22/04
. .
containing hexavalent chromium compounds [2013-01]
C23C 22/05
.
using aqueous solutions [2013-01]
C23C 22/06
. .
using aqueous acidic solutions with pH less than 6 [2013-01]
C23C 22/07
. . .
containing phosphates [2013-01]
C23C 22/08
. . . .
Orthophosphates [2013-01]
C23C 22/10
. . . . .
containing oxidants [2013-01]
C23C 22/12
. . . . .
containing zinc cations [2013-01]
C23C 22/13
. . . . . .
containing also nitrate or nitrite anions [2013-01]
C23C 22/14
. . . . . .
containing also chlorate anions [2013-01]
C23C 22/16
. . . . . .
containing also peroxy-compounds [2013-01]
C23C 22/17
. . . . . .
containing also organic acids [2013-01]
C23C 22/18
. . . . .
containing manganese cations [2013-01]
C23C 22/182
. . . . . .
{containing also zinc cations} [2013-01]
C23C 22/184
. . . . . . .
{containing also nickel cations} [2013-01]
C23C 22/186
. . . . . .
{containing also copper cations} [2013-01]
C23C 22/188
. . . . . .
{containing also magnesium cations} [2013-01]
C23C 22/20
. . . . .
containing aluminium cations [2013-01]
C23C 22/22
. . . . .
containing alkaline earth metal cations [2013-01]
C23C 22/23
. . . .
Condensed phosphates [2013-01]
C23C 22/24
. . .
containing hexavalent chromium compounds [2013-01]
C23C 22/26
. . . .
containing also organic compounds [2013-01]
C23C 22/27
. . . . .
Acids [2013-01]
C23C 22/28
. . . . .
Macromolecular compounds [2013-01]
C23C 22/30
. . . .
containing also trivalent chromium [2013-01]
C23C 22/32
. . . .
containing also pulverulent metals [2013-01]
C23C 22/33
. . . .
containing also phosphates [2013-01]
C23C 22/34
. . .
containing fluorides or complex fluorides [2013-01]
C23C 22/36
. . . .
containing also phosphates [2013-01]
C23C 22/361
. . . . .
{containing titanium, zirconium or hafnium compounds} [2013-01]
C23C 22/362
. . . . .
{containing also zinc cations} [2013-01]
C23C 22/364
. . . . .
{containing also manganese cations} [2013-01]
C23C 22/365
. . . . . .
{containing also zinc and nickel cations} [2013-01]
C23C 22/367
. . . . .
{containing alkaline earth metal cations} [2013-01]
C23C 22/368
. . . . .
{containing magnesium cations} [2013-01]
C23C 22/37
. . . .
containing also hexavalent chromium compounds [2013-01]
C23C 22/38
. . . . .
containing also phosphates [2013-01]
C23C 22/40
. . .
containing molybdates, tungstates or vanadates [2013-01]
C23C 22/42
. . . .
containing also phosphates [2013-01]
C23C 22/43
. . . .
containing also hexavalent chromium compounds [2013-01]
C23C 22/44
. . . .
containing also fluorides or complex fluorides [2013-01]
C23C 22/46
. . .
containing oxalates [2013-01]
C23C 22/47
. . . .
containing also phosphates [2013-01]
C23C 22/48
. . .
not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates [2013-01]
C23C 22/50
. . . .
Treatment of iron or alloys based thereon [2013-01]
C23C 22/52
. . . .
Treatment of copper or alloys based thereon [2013-01]
C23C 22/53
. . . .
Treatment of zinc or alloys based thereon [2013-01]
C23C 22/54
. . . .
Treatment of refractory metals or alloys based thereon [2013-01]
C23C 22/56
. . . .
Treatment of aluminium or alloys based thereon [2013-01]
C23C 22/57
. . . .
Treatment of magnesium or alloys based thereon [2013-01]
C23C 22/58
. . . .
Treatment of other metallic material [2013-01]
C23C 22/60
. .
using alkaline aqueous solutions with pH greater than 8 [2013-01]
C23C 22/62
. . .
Treatment of iron or alloys based thereon [2013-01]
C23C 22/63
. . .
Treatment of copper or alloys based thereon [2013-01]
C23C 22/64
. . .
Treatment of refractory metals or alloys based thereon [2013-01]
C23C 22/66
. . .
Treatment of aluminium or alloys based thereon [2013-01]
C23C 22/67
. . . .
with solutions containing hexavalent chromium [2013-01]
C23C 22/68
. .
using aqueous solutions with pH between 6 and 8 [2013-01]
C23C 22/70
.
using melts [2013-01]
C23C 22/72
. .
Treatment of iron or alloys based thereon [2013-01]
C23C 22/73
.
characterised by the process [2013-01]
C23C 22/74
. .
for obtaining burned-in conversion coatings [2013-01]
C23C 22/76
. .
Applying the liquid by spraying [2013-01]
C23C 22/77
. .
Controlling or regulating of the coating process [2018-01]
C23C 22/78
.
Pretreatment of the material to be coated [2017-08]
C23C 22/80
. .
with solutions containing titanium or zirconium compounds [2013-01]
C23C 22/82
.
After-treatment [2013-01]
C23C 22/83
. .
Chemical after-treatment [2013-01]
C23C 22/84
. .
Dyeing [2013-01]
C23C 22/86
.
Regeneration of coating baths [2013-01]
C23C 24/00
Coating starting from inorganic powder (spraying of the coating material in molten state C23C 4/00; solid state diffusion C23C 8/00 - C23C 12/00) [2018-01]
C23C 24/02
.
by application of pressure only [2013-01]
C23C 24/04
. .
Impact or kinetic deposition of particles [2013-01]
C23C 24/045
. . .
{by trembling using impacting inert media} [2013-01]
C23C 24/06
. .
Compressing powdered coating material, e.g. by milling [2013-01]
C23C 24/08
.
by application of heat or pressure and heat (C23C 24/04 takes precedence) [2013-01]
C23C 24/082
. .
{without intermediate formation of a liquid in the layer} [2013-01]
C23C 24/085
. . .
{Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides} [2013-01]
C23C 24/087
. . . .
{Coating with metal alloys or metal elements only} [2013-01]
C23C 24/10
. .
with intermediate formation of a liquid phase in the layer [2013-01]
C23C 24/103
. . .
{Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides} [2013-01]
C23C 24/106
. . . .
{Coating with metal alloys or metal elements only} [2013-01]
C23C 26/00
Coating not provided for in groups C23C 2/00 - C23C 24/00 [2016-05]
C23C 26/02
.
applying molten material to the substrate [2018-01]
C23C 28/00
Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C 2/00 - C23C 26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D [2016-05]
C23C 28/02
.
only coatings {only including layers} of metallic material [2013-01]
C23C 28/021
. .
{including at least one metal alloy layer} [2015-10]
C23C 28/022
. . .
{with at least one MCrAlX layer} [2015-10]
C23C 28/023
. .
{only coatings of metal elements only} [2013-01]
C23C 28/025
. . .
{with at least one zinc-based layer} [2015-10]
C23C 28/026
. .
{including at least one amorphous metallic material layer} [2015-10]
C23C 28/027
. .
{including at least one metal matrix material comprising a mixture of at least two metals or metal phases or metal matrix composites, e.g. metal matrix with embedded inorganic hard particles, CERMET, MMC.} [2015-10]
C23C 28/028
. .
{Including graded layers in composition or in physical properties, e.g. density, porosity, grain size} [2015-10]
C23C 28/04
.
only coatings of inorganic non-metallic material [2013-01]
C23C 28/042
. .
{including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides} [2015-10]
C23C 28/044
. .
{coatings specially adapted for cutting tools or wear applications} [2016-05]
C23C 28/046
. .
{with at least one amorphous inorganic material layer, e.g. DLC, a-C:H, a-C:Me, the layer being doped or not} [2013-01]
C23C 28/048
. .
{with layers graded in composition or physical properties} [2013-01]
C23C 28/30
.
{Coatings combining at least one metallic layer and at least one inorganic non-metallic layer} [2013-01]
C23C 28/32
. .
{including at least one pure metallic layer} [2013-01]
C23C 28/321
. . .
{with at least one metal alloy layer} [2013-01]
C23C 28/3215
. . . .
{at least one MCrAlX layer} [2013-01]
C23C 28/322
. . .
{only coatings of metal elements only} [2013-01]
C23C 28/3225
. . . .
{with at least one zinc-based layer} [2013-01]
C23C 28/323
. . .
{with at least one amorphous metallic material layer} [2013-01]
C23C 28/324
. . .
{with at least one metal matrix material layer comprising a mixture of at least two metals or metal phases or a metal-matrix material with hard embedded particles, e.g. WC-Me} [2013-01]
C23C 28/325
. . .
{with layers graded in composition or in physical properties} [2013-01]
C23C 28/34
. .
{including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates} [2013-01]
C23C 28/341
. . .
{with at least one carbide layer} [2013-01]
C23C 28/343
. . .
{with at least one DLC or an amorphous carbon based layer, the layer being doped or not} [2013-01]
C23C 28/345
. . .
{with at least one oxide layer} [2013-01]
C23C 28/3455
. . . .
{with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer} [2013-01]
C23C 28/347
. . .
{with layers adapted for cutting tools or wear applications} [2013-01]
C23C 28/36
. .
{including layers graded in composition or physical properties} [2013-01]
C23C 28/40
.
{Coatings including alternating layers following a pattern, a periodic or defined repetition} [2013-01]
C23C 28/42
. .
{characterized by the composition of the alternating layers} [2013-01]
C23C 28/44
. .
{characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness} [2013-01]
C23C 30/00
Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process (C23C 26/00, C23C 28/00 take precedence) [2013-01]
C23C 30/005
.
{on hard metal substrates} [2013-01]

C23C 2222/00
Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium [2013-01]
C23C 2222/10
.
Use of solutions containing trivalent chromium but free of hexavalent chromium [2013-01]
C23C 2222/20
.
Use of solutions containing silanes [2013-01]