1. CPC Sections
  2. CPC Section H
  3. CPC Class H05
  4. CPC Subclass H05H
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Version: 2025.01
CPC
COOPERATIVE PATENT CLASSIFICATION
​​
H05H
PLASMA TECHNIQUE (apparatus or processes specially adapted for producing X-rays H05G 2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
NOTES

  • This subclass covers:
    • generating or handling plasma;
    • devices for accelerating electrons, ion beams or neutral particles;
    • devices for producing neutral particle beams;
    • targets for (a), (b) or (c).
  • This subclass does not cover devices for producing, accelerating, influencing or using a flow of electrons or ions within electric discharge tubes or discharge lamps, which are covered by subclass H01J.
WARNING

  • In this subclass non-limiting references (in the sense of paragraph 39 of the Guide to the IPC) may still be displayed in the scheme.
H05H 1/00
Generating plasma; Handling plasma
H05H 1/0006
.
{Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature}
H05H 1/0012
. .
{using electromagnetic or particle radiation, e.g. interferometry}
H05H 1/0018
. . .
{Details}
H05H 1/0025
. . .
{by using photoelectric means (H05H 1/0031 - H05H 1/0043 take precedence)}
H05H 1/0031
. . .
{by interferrometry}
H05H 1/0037
. . .
{by spectrometry}
H05H 1/0043
. . .
{by using infrared or ultraviolet radiation}
H05H 1/005
. . .
{by using X-rays or alpha rays}
H05H 1/0056
. . .
{by using neutrons}
H05H 1/0062
. . .
{by using microwaves}
H05H 1/0068
. .
{by thermal means}
H05H 1/0075
. . .
{Langmuir probes}
H05H 1/0081
. .
{by electric means}
H05H 1/0087
. .
{by magnetic means}
H05H 1/0093
. .
{by acoustic means, e.g. ultrasonic}
H05H 1/01
.
{Handling plasma, e.g. of subatomic particles}
H05H 1/02
.
Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma ({G21B 1/00 takes precedence;} electron optics H01J)
H05H 1/03
. .
using electrostatic fields
H05H 1/04
. .
using magnetic fields substantially generated by the discharge in the plasma
H05H 1/06
. . .
Longitudinal pinch devices
H05H 1/08
. . .
Theta pinch devices {, e.g. SCYLLA}
H05H 1/10
. .
using externally-applied magnetic fields only {, e.g. Q-machines, Yin-Yang, base-ball}
H05H 1/105
. . .
{using magnetic pumping}
H05H 1/11
. . .
using cusp configuration (H05H 1/14 takes precedence)
H05H 1/12
. . .
wherein the containment vessel forms a closed or nearly closed loop {(G21B 1/05 takes precedence)}
H05H 1/14
. . .
wherein the containment vessel is straight and has magnetic mirrors
H05H 1/16
. .
using externally-applied electric and magnetic fields
H05H 1/18
. . .
wherein the fields oscillate at very high frequency, e.g. in the microwave range {, e.g. using cyclotron resonance}
H05H 1/20
. .
Ohmic heating
H05H 1/22
. .
for injection heating {(G21B 1/15 takes precedence)}
H05H 1/24
.
Generating plasma {(nuclear fusion reactors G21B 1/00; gas-filled discharge reactors H01J 37/32)}
H05H 1/2406
. .
{using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes}
H05H 1/2418
. . .
{the electrodes being embedded in the dielectric}
H05H 1/2425
. . .
{the electrodes being flush with the dielectric}
H05H 1/2431
. . .
{using cylindrical electrodes, e.g. rotary drums}
H05H 1/2437
. . .
{Multilayer systems}
H05H 1/2439
. . .
{Surface discharges, e.g. air flow control}
H05H 1/2441
. . .
{characterised by the physical-chemical properties of the dielectric, e.g. porous dielectric}
H05H 1/2443
. . .
{the plasma fluid flowing through a dielectric tube}
H05H 1/245
. . . .
{the plasma being activated using internal electrodes}
H05H 1/246
. . . .
{the plasma being activated using external electrodes (H05H 1/245 takes precedence)}
H05H 1/2465
. . . .
{the plasma being activated by inductive coupling, e.g. using coiled electrodes}
H05H 1/247
. .
{using discharges in liquid media}
H05H 1/2475
. .
{using acoustic pressure discharges}
H05H 1/2481
. . .
{the plasma being activated using piezoelectric actuators}
H05H 1/2487
. . .
{the plasma being activated using mechanical actuators}
H05H 1/2493
. . .
{the plasma being activated using horns}
H05H 1/26
. .
Plasma torches
H05H 1/28
. . .
Cooling arrangements
H05H 1/30
. . .
using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/28 takes precedence)
H05H 1/32
. . .
using an arc (H05H 1/28 takes precedence)
H05H 1/34
. . . .
Details, e.g. electrodes, nozzles
H05H 1/3405
. . . . .
{Arrangements for stabilising or constricting the arc, e.g. by an additional gas flow}
H05H 1/341
. . . . .
{Arrangements for providing coaxial protecting fluids}
H05H 1/3421
. . . . .
{Transferred arc or pilot arc mode}
H05H 1/3423
. . . . .
{Connecting means, e.g. electrical connecting means or fluid connections}
H05H 1/3425
. . . . .
{Melting or consuming electrodes}
H05H 1/3431
. . . . .
{Coaxial cylindrical electrodes}
H05H 1/3436
. . . . .
{Hollow cathodes with internal coolant flow}
H05H 1/3442
. . . . .
{Cathodes with inserted tip}
H05H 1/3447
. . . . .
{Rod-like cathodes}
H05H 1/3452
. . . . .
{Supplementary electrodes between cathode and anode, e.g. cascade}
H05H 1/3457
. . . . .
{Nozzle protection devices}
H05H 1/3463
. . . . .
{Oblique nozzles}
H05H 1/3468
. . . . .
{Vortex generators}
H05H 1/3473
. . . . .
{Safety means}
H05H 1/3478
. . . . .
{Geometrical details}
H05H 1/3484
. . . . .
{Convergent-divergent nozzles}
H05H 1/3489
. . . . .
{Means for contact starting}
H05H 1/3494
. . . . .
{Means for controlling discharge parameters}
H05H 1/36
. . . . .
Circuit arrangements (H05H 1/38, H05H 1/40 take precedence)
H05H 1/38
. . . . .
Guiding or centering of electrodes
H05H 1/40
. . . . .
using applied magnetic fields, e.g. for focusing or rotating the arc {(cf. B23K 9/08, B23K 9/073)}
H05H 1/42
. . . .
with provisions for introducing materials into the plasma, e.g. powder or liquid {(arc stabilising or constricting arrangements H05H 1/3405; coaxial protecting fluids H05H 1/341)}
H05H 1/44
. . . .
using more than one torch
H05H 1/46
. .
using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/26 takes precedence)
H05H 1/461
. . .
{Microwave discharges}
H05H 1/4615
. . . .
{using surface waves}
H05H 1/4622
. . . .
{using waveguides}
H05H 1/463
. . . .
{using antennas or applicators}
H05H 1/4637
. . . .
{using cables}
H05H 1/4645
. . .
{Radiofrequency discharges}
H05H 1/4652
. . . .
{using inductive coupling means, e.g. coils}
H05H 1/466
. . . .
{using capacitive coupling means, e.g. electrodes}
H05H 1/4697
. .
{using glow discharges}
H05H 1/47
. .
{using corona discharges}
H05H 1/471
. . .
{Pointed electrodes}
H05H 1/473
. . .
{Cylindrical electrodes, e.g. rotary drums}
H05H 1/475
. . .
{Filamentary electrodes}
H05H 1/477
. . .
{Segmented electrodes}
H05H 1/48
. .
using an arc (H05H 1/26 takes precedence)
H05H 1/481
. . .
{Hollow cathodes}
H05H 1/482
. . .
{Arrangements to provide gliding arc discharges}
H05H 1/484
. . .
{Arrangements to provide plasma curtains or plasma showers}
H05H 1/486
. . .
{Arrangements to provide capillary discharges}
H05H 1/488
. . .
{Liquid electrodes}
H05H 1/50
. . .
and using applied magnetic fields, e.g. for focusing or rotating the arc
H05H 1/52
. .
using exploding wires or spark gaps (H05H 1/26 takes precedence)
H05H 1/54
.
Plasma accelerators
H05H 3/00
Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
H05H 3/02
.
Molecular or atomic-beam generation, e.g. resonant beam generation
H05H 3/04
.
Acceleration by electromagnetic wave pressure
H05H 3/06
.
Generating neutron beams (targets for producing nuclear reactions H05H 6/00; neutron sources G21G 4/02)
H05H 5/00
Direct voltage accelerators; Accelerators using single pulses (H05H 3/06 takes precedence)
H05H 5/02
.
Details (targets for producing nuclear reactions H05H 6/00)
H05H 5/03
. .
Accelerating tubes
H05H 5/04
.
energised by electrostatic generators
H05H 5/042
. .
{of the van de Graaf type}
H05H 5/045
. .
{High voltage cascades, e.g. Greinacher cascade}
H05H 5/047
. .
{Pulsed generators}
H05H 5/06
.
Multistage accelerators
H05H 5/063
. .
{Tandems}
H05H 5/066
. .
{Onion-like structures}
H05H 5/08
.
Particle accelerators using step-up transformers, e.g. resonance transformers
H05H 6/00
Targets for producing nuclear reactions (supports for targets or objects to be irradiated G21K 5/08 {; preparation of tritium C01B 4/00; targets, e.g. pellets for fusion reactions by laser or charged particles beam injection H05H 1/22})
H05H 2006/002
.
{Windows}
H05H 6/005
.
{Polarised targets (polarising devices, e.g. for obtaining a polarised ion beam G21K 1/16)}
H05H 2006/007
.
{Radiation protection arrangements, e.g. screens}
H05H 7/00
Details of devices of the types covered by groups H05H 9/00, H05H 11/00, H05H 13/00
H05H 7/001
.
{Arrangements for beam delivery or irradiation (irradiation systems per se G21K 5/00)}
H05H 2007/002
. .
{for modifying beam trajectory, e.g. gantries}
H05H 2007/004
. .
{for modifying beam energy, e.g. spread out Bragg peak devices}
H05H 2007/005
. .
{for modifying beam emittance, e.g. stochastic cooling devices, stripper foils}
H05H 2007/007
. .
{for focusing the beam to irradiation target}
H05H 2007/008
. .
{for measuring beam parameters}
H05H 7/02
.
Circuits or systems for supplying or feeding radio-frequency energy
H05H 2007/022
. .
{Pulsed systems}
H05H 2007/025
. .
{Radiofrequency systems}
H05H 2007/027
. .
{Microwave systems}
H05H 7/04
.
Magnet systems {, e.g. undulators, wigglers (free-electron laser H01S 3/0903)}; Energisation thereof
H05H 2007/041
. .
{for beam bunching, e.g. undulators}
H05H 2007/043
. .
{for beam focusing}
H05H 2007/045
. .
{for beam bending}
H05H 2007/046
. .
{for beam deflection}
H05H 2007/048
. .
{for modifying beam trajectory, e.g. gantry systems}
H05H 7/06
.
Two-beam arrangements; Multi-beam arrangements {storage rings}; Electron rings
H05H 2007/065
. .
{Multi-beam merging, e.g. funneling}
H05H 7/08
.
Arrangements for injecting particles into orbits
H05H 2007/081
. .
{Sources}
H05H 2007/082
. . .
{Ion sources, e.g. ECR, duoplasmatron, PIG, laser sources}
H05H 2007/084
. . .
{Electron sources}
H05H 2007/085
. .
{by electrostatic means}
H05H 2007/087
. .
{by magnetic means}
H05H 2007/088
. .
{by mechanical means, e.g. stripping foils}
H05H 7/10
.
Arrangements for ejecting particles from orbits
H05H 7/12
.
Arrangements for varying final energy of beam
H05H 2007/122
. .
{by electromagnetic means, e.g. RF cavities}
H05H 2007/125
. .
{by mechanical means, e.g. stripping foils}
H05H 2007/127
. .
{by emittance variation, e.g. stochastic cooling}
H05H 7/14
.
Vacuum chambers (H05H 5/03 takes precedence)
H05H 7/16
. .
of the waveguide type
H05H 7/18
. .
Cavities; Resonators {(travelling-wave tubes H01J 23/18; hyperfrequency cavities in general H01P 7/04, H01P 7/06)}
H05H 7/20
. . .
with superconductive walls
H05H 7/22
.
Details of linear accelerators, e.g. drift tubes (H05H 7/02 - H05H 7/20 take precedence)
H05H 2007/222
. .
{drift tubes}
H05H 2007/225
. .
{coupled cavities arrangements}
H05H 2007/227
. .
{power coupling, e.g. coupling loops}
H05H 9/00
Linear accelerators
H05H 9/005
.
{Dielectric wall accelerators}
H05H 9/02
.
Travelling-wave linear accelerators {(travelling-wave tubes H01J 25/34)}
H05H 9/04
.
Standing-wave linear accelerators
H05H 9/041
. .
{Hadron LINACS}
H05H 9/042
. . .
{Drift tube LINACS}
H05H 9/044
. . .
{Coupling cavity LINACS, e.g. side coupled}
H05H 9/045
. . .
{Radio frequency quadrupoles}
H05H 9/047
. . .
{Hybrid systems}
H05H 9/048
. .
{Lepton LINACS}
H05H 11/00
Magnetic induction accelerators, e.g. betatrons
H05H 11/02
.
Air-cored betatrons
H05H 11/04
.
Biased betatrons
H05H 13/00
Magnetic resonance accelerators; Cyclotrons {(strophotrons, turbine tubes H01J 25/62)}
H05H 13/005
.
{Cyclotrons}
H05H 13/02
.
Synchrocyclotrons, i.e. frequency modulated cyclotrons
H05H 13/04
.
Synchrotrons
H05H 13/06
.
Air-cored magnetic resonance accelerators
H05H 13/08
.
Alternating-gradient magnetic resonance accelerators
H05H 13/085
. .
{Fixed-field alternating gradient accelerators [FFAG]}
H05H 13/10
.
Accelerators comprising one or more linear accelerating sections and bending magnets or the like to return the charged particles in a trajectory parallel to the first accelerating section, e.g. microtrons {or rhodotrons}
H05H 15/00
Methods or devices for acceleration of charged particles not otherwise provided for {, e.g. wakefield accelerators}
H05H 2240/00
Testing
H05H 2240/10
.
at atmospheric pressure
H05H 2240/20
.
Non-thermal plasma
H05H 2242/00
Auxiliary systems
H05H 2242/10
.
Cooling arrangements
H05H 2242/20
.
Power circuits
H05H 2242/22
. .
DC, AC or pulsed generators
H05H 2242/24
. .
Radiofrequency or microwave generators
H05H 2242/26
. .
Matching networks
H05H 2245/00
Applications of plasma devices
H05H 2245/10
.
Treatment of gases
H05H 2245/15
. .
Ambient air; Ozonisers
H05H 2245/17
. .
Exhaust gases
H05H 2245/20
.
Treatment of liquids
H05H 2245/30
.
Medical applications
H05H 2245/32
. .
Surgery, e.g. scalpels, blades or bistoury; Treatments inside the body
H05H 2245/34
. .
Skin treatments, e.g. disinfection or wound treatment
H05H 2245/36
. .
Sterilisation of objects, liquids, volumes or surfaces
H05H 2245/40
.
Surface treatments
H05H 2245/42
. .
Coating or etching of large items
H05H 2245/50
.
Production of nanostructures
H05H 2245/60
.
Portable devices
H05H 2245/70
.
Automotive applications, e.g. engines
H05H 2245/80
.
Burners or furnaces for heat generation, for fuel combustion or for incineration of wastes
H05H 2277/00
Applications of particle accelerators
H05H 2277/10
.
Medical devices
H05H 2277/11
. .
Radiotherapy
H05H 2277/113
. . .
Diagnostic systems
H05H 2277/116
. . .
Isotope production
H05H 2277/12
.
Ion implantation
H05H 2277/13
.
Nuclear physics, e.g. spallation sources, accelerator driven systems, search or generation of exotic elements
H05H 2277/14
.
Portable devices
H05H 2277/1405
. .
Detection systems, e.g. for safety