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[Search a list of Patent Appplications for class 522]  Class   522SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES
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This Class 522 is considered to be an integral part of Class 520 (see the Class 520 schedule for the position of this Class in schedule hierarchy). This Class retains all pertinent definitions and class lines of Class 520
                SYNTHETIC RESINS (CLASS 520, SUBCLASS 1)
   [List of Patents for class 522 subclass 1]  1           Subclass 1 indent level is 1 COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY
    [List of Patents for class 522 subclass 2]  2           Subclass 2 indent level is 2 Processes of forming or modifying a solid polymer by laser; or compositions therefore
    [List of Patents for class 522 subclass 3]  3           Subclass 3 indent level is 2 Processes of forming or modifying a solid polymer wherein specified mixing, stirring, agitating, movement of material or directional orientation is employed; or compositions therefore
    [List of Patents for class 522 subclass 4]  4           Subclass 4 indent level is 2 Processes of forming or modifying a solid polymer by wave energy wherein at least two distinct external radiant energy sources are utilized; or compositions therefore
    [List of Patents for class 522 subclass 5]  5           Subclass 5 indent level is 2 Processes of forming or modifying a solid polymer by wave energy wherein a temperature less than 0 degree C (32 degree F) or greater than 250 degree C (482 degree F) is employed; or compositions therefore
   [List of Patents for class 522 subclass 6]  6           Subclass 6 indent level is 2 Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of at least one specified rate-affecting material; e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc. wave energy in order to prepare a cellular product
   [List of Patents for class 522 subclass 7]  7           Subclass 7 indent level is 3 Contains two or more rate-affecting materials, at least one of which is specified
   [List of Patents for class 522 subclass 8]  8           Subclass 8 indent level is 4 At least two specified rate-affecting materials containing keto group not part of a ring; or contains a nonspecified photoinitiator or photosensitizer and specified ketone containing material wherein the keto group is not part of a ring
    [List of Patents for class 522 subclass 11]  11           Subclass 11 indent level is 4 Contains compound containing keto group not part of a ring and nonspecified rate-affecting material other than mere photoinitiator or photosensitizer
   [List of Patents for class 522 subclass 12]  12           Subclass 12 indent level is 4 Contains compound containing keto group not part of a ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer
    [List of Patents for class 522 subclass 24]  24           Subclass 24 indent level is 4 Specified rate-affecting material is a peroxide
    [List of Patents for class 522 subclass 25]  25           Subclass 25 indent level is 4 Specified rate-affecting material contains onium group
    [List of Patents for class 522 subclass 26]  26           Subclass 26 indent level is 4 Specified rate-affecting material is heterocyclic
    [List of Patents for class 522 subclass 27]  27           Subclass 27 indent level is 4 Specified rate-affecting material contains sulfur
    [List of Patents for class 522 subclass 28]  28           Subclass 28 indent level is 4 Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen
    [List of Patents for class 522 subclass 29]  29           Subclass 29 indent level is 4 Specified rate-affecting material is a metal-containing organic compound
    [List of Patents for class 522 subclass 30]  30           Subclass 30 indent level is 4 Specified rate-affecting material is organic
   [List of Patents for class 522 subclass 31]  31           Subclass 31 indent level is 3 Specified rate-affecting material contains onium group
    [List of Patents for class 522 subclass 32]  32           Subclass 32 indent level is 4 Diazonium containing material
   [List of Patents for class 522 subclass 33]  33           Subclass 33 indent level is 3 Specified rate-affecting material contains a ketone group -c-(CO)n-c-, the (CO)n not being part of a ring
   [List of Patents for class 522 subclass 47]  47           Subclass 47 indent level is 3 Specified rate-affecting material is a quinone
   [List of Patents for class 522 subclass 49]  49           Subclass 49 indent level is 3 Specified rate-affecting material contains chalcogen other than as oxygen
   [List of Patents for class 522 subclass 60]  60           Subclass 60 indent level is 3 Specified rate-affecting material is a peroxide
    [List of Patents for class 522 subclass 61]  61           Subclass 61 indent level is 4 Hydroperoxide
    [List of Patents for class 522 subclass 62]  62           Subclass 62 indent level is 3 Specified rate-affecting material contains a C-N=N-C-group
    [List of Patents for class 522 subclass 63]  63           Subclass 63 indent level is 3 Specified rate-affecting material contains nitrogen or oxygen atom in heterocyclic ring
    [List of Patents for class 522 subclass 64]  64           Subclass 64 indent level is 3 Specified rate-affecting material contains phosphorous
    [List of Patents for class 522 subclass 65]  65           Subclass 65 indent level is 3 Specified rate-affecting material contains nitrogen
    [List of Patents for class 522 subclass 66]  66           Subclass 66 indent level is 3 Specified rate-affecting material contains metal atom
    [List of Patents for class 522 subclass 67]  67           Subclass 67 indent level is 3 Specified rate-affecting material contains halogen
   [List of Patents for class 522 subclass 68]  68           Subclass 68 indent level is 3 Specified rate-affecting material contains oxygen
    [List of Patents for class 522 subclass 69]  69           Subclass 69 indent level is 4 Phenolic, e.g., hydroquinone, etc.
    [List of Patents for class 522 subclass 70]  70           Subclass 70 indent level is 3 Specified rate-affecting material contains only carbon and hydrogen
   [List of Patents for class 522 subclass 71]  71           Subclass 71 indent level is 2 Processes of preparing or treating a solid polymer by wave energy in the presence of a designated nonreactant material (DNRM); or compositions therefore
    [List of Patents for class 522 subclass 72]  72           Subclass 72 indent level is 3 Carbohydrate or derivative DNRM
    [List of Patents for class 522 subclass 73]  73           Subclass 73 indent level is 3 Coal, asphaltic, or bituminous material DNRM
   [List of Patents for class 522 subclass 74]  74           Subclass 74 indent level is 3 Organic DNRM
    [List of Patents for class 522 subclass 75]  75           Subclass 75 indent level is 4 Heterocyclic ring containing DNRM
    [List of Patents for class 522 subclass 76]  76           Subclass 76 indent level is 4 Phosphorous containing DNRM
    [List of Patents for class 522 subclass 77]  77           Subclass 77 indent level is 4 Silicon containing DNRM
    [List of Patents for class 522 subclass 78]  78           Subclass 78 indent level is 4 Nitrogen containing DNRM
    [List of Patents for class 522 subclass 79]  79           Subclass 79 indent level is 4 Oxygen containing DNRM
    [List of Patents for class 522 subclass 80]  80           Subclass 80 indent level is 4 Carbon and hydrogen only containing DNRM
    [List of Patents for class 522 subclass 81]  81           Subclass 81 indent level is 3 Heavy metal containing DNRM
    [List of Patents for class 522 subclass 82]  82           Subclass 82 indent level is 3 Phosphorous or sulfur containing DNRM
   [List of Patents for class 522 subclass 83]  83           Subclass 83 indent level is 3 Oxygen containing DNRM
   [List of Patents for class 522 subclass 84]  84           Subclass 84 indent level is 4 Water
    [List of Patents for class 522 subclass 87]  87           Subclass 87 indent level is 2 Processes involving protein as reactant or as solid polymer; or compositions therefore
   [List of Patents for class 522 subclass 88]  88           Subclass 88 indent level is 2 Processes involving carbohydrate as reactant or as solid polymer; or compositions therefore
   [List of Patents for class 522 subclass 90]  90           Subclass 90 indent level is 2 Processes involving a polyurethane having terminal ethylenic unsaturation as reactant or as solid polymer; or compositions therefore
    [List of Patents for class 522 subclass 99]  99           Subclass 99 indent level is 2 Processes involving a polysiloxane having ethylenic unsaturation as reactant or as solid polymer; or compositions therefore
   [List of Patents for class 522 subclass 100]  100           Subclass 100 indent level is 2 Processes involving an ethylenically unsaturated material derived from poly 1,2-epoxide as reactant or a solid polymer; or compositions thereof
   [List of Patents for class 522 subclass 104]  104           Subclass 104 indent level is 2 Processes involving an ethylenically unsaturated polyester derived from a polycarboxylic acid or derivative and polyol, condensate or solid polymer thereof; or compositions therefore