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 [Search a list of Patent Appplications for class 522]   CLASS 522,SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES
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SECTION I - CLASS DEFINITION

GENERAL SUMMARY OF SUBJECT MATTER WITHIN THIS CLASS

A. The following types of claimed subject matter are proper for this class.

1. A claim drawn to a process of making a photopolymerizable composition of reactant X plus photoiniator or photosensitizer.

2. A claim drawn to a photopolymerizable composition of reactant X plus photoinitiator or photosensitizer.

3. A claim drawn to a process of irradiating reactant X with or without a photoinitiator or photosensitizer being present.

4. A claim drawn to a photopolymerizable composition of reactant X plus photoinitiator or photosensitizer and any other material (e.g., filler, solvent, etc.).

In the types of subject matter (1-4 above), reactant X can be a monomer, low molecular weight condensation or addition product, or solid polymer. The sole proviso is that the final product be a solid polymer as is required by the Class 520 Series of classes. When a claim so expressly states, a monomer or polymer is considered to be a photoinitiator or photosensitizer.

The recitation of a specified amount of photoinitiator or photosensitizer is unnecessary for purposes of classification in this class.

B. To be properly classified in this class, a compound must have a photoinitiator or photosensitizer claimed in addition to the monomer to be polymerized or the polymer to be treated. For example, a claim drawn to a photopolymerizable composition comprising an ethylenically unsaturated monomer plus a photoinitiator is properly classified herein, whereas a claim drawn to a substituted benzophenone autopolymerizable composition is not properly classifiable in this class. The requirement for proper classification is separateness of monomer or polymer and photoinitiator or phtosensitizer. A material described as being both a photoinitiator or photosenitizer and a reactant and a separate monomer or solid polymer is a proper composition for subclass 1 of this class. Products which are the result of a wave energy process are normally excluded from this class and are classified in other areas of the 520 Series of clases. An exception to this would be a situation wherein a further wave energy step is contemplated and the formed product is an admixture with a photoinitiator or photosensitizer.

A claim drawn to a specific photoinitiator such as a benzophenone with no mention in the claim of the functionality of the substance as a photoinitiator is classified herein if the disclosure teaches the use of benzophenone as a photoinitiator.

A combination of chemical process steps not involving wave energy followed by a subsequent chemical reaction involving wave energy is classified herein provided the product is proper subject matter for the Class 520 Series.

Claims drawn to the utilization of wave energy to initiate a chemical reaction followed by the application of heat are proper for this class. For example, a process of partially polymerizing a monomer of methylfluoroacrylate by wave energy followed by treatment with heat to complete the polymerization is proper for the Class 520 Series.

The utilization of wave energy to induce a chemical reaction which thereby proceeds without the assistance of further wave energy is considered to be proper subject matter for this class; for example, a claim drawn to utilizing wave energy to activate a peroxide in order to generate free radicals, wherein the free radicals promote a chemical reaction is classified herein.

SECTION II - LINES WITH OTHER CLASSES AND WITHIN THIS CLASS

The step in a process claim utilizing wave energy is the proper basis for classification purposes. For example:

A. A claim drawn to processes of polymerixing ethylene in the presence of carbon black (DNRM) by wave energy is properly classified in subclass 71, whereas a claim drawn to polymerizing ethylene in the presence of wave energy followed by treating the product with carbon black (DNRM) is properly classified in subclass 189.

B. A claim drawn to treating polyacrylonitrile with vinyl chloride in the presence of energy is properly classified in subclass 124, whereas a claim drawn to treating a graft polyacrylonitrile-vinyl chloride copolymer with wave energy is properly classified in subclass 149.

C. A claim drawn to the process of making polyethylene by polymerizing ethylene in the presence of wave energy followed by chemically treating said product with halogen (with no wave energy present) would be classified in subclass 189, whereas a claim drawn to the process of reacting polyethylene with halogen in the presence of wave energy following by the addition of carbon black would be classified in subclass 133.

Classification in Class 522 is on the first solid polymer prepared. For instance, a process of chemically modifying a solid polymer derived from ethylene only, by sulfonating, (nonwave energy process) and then subsequently reacting said sulfonated polymer with elemental halogen using wave energy is proper in subclass 133, since the first solid polymer prepared is polyethylene. Subclass 132 does provide for a halogenated polymer which is subsequently reacted in that the language of the subclass is "contains" rather than "derived". In subclass 154 the language is "derived" and therefore if a halogenated polyethylene is treated using wave energy classification in subclass 161 is proper since the first solid polymer is prepared from ethylene.

A process of treating a solid polymer with wave energy followed by the addition of a chemical reactant is presumed, in the absence to the contrary to proceed entirely by wave energy and is classified in this class subclasses 113-147; however, a process of treating an irradiated polymer with a chemical reactant is properly classified in Class 525. Additionally a process of treating a reactant with wave energy followed by adding a solid polymer and reacting therewith is presumed in the absence of information to the contrary to proceed entirely by wave energy and is classified in this class.

A process of treating a preirradiated polymer (no wave energy process step recited) is properly classified in Classes 523-525 when no further wave energy step is claimed. For example, (1) a process of a mixed preirradiated polymer with a DNRM is properly classified in Class 524, and (2) a process for treating a preirradiated polymer with an ethylenic monomer is properly classified in Class 525.

The combination of Class 204 wave energy step followed by a Class 522 wave energy step is classified herein; for example, a claim drawn to a process of utilizing wave energy to synthesize a monomer which is subsequently polymerized in the presence of wave energy is classified herein.

The utilization of wave energy to generate heat, whereby the heat generates or induces a chemical reaction is not considrered to be "a chemical reaction induced by wave energy" and thus is not proper subject matter for Class 522. The process, however, is proper in for the Class 520 Series if a solid polymer is produced.

Class 204, Chemistry: Electrical and Wave Energy, appropriate subclasses provide for producing a product of the type provided for in the Class 520 Series by other than a wave energy process. Class 204 is superior to the Class 520 Series; therefore, a patent claiming in the alternative a process of preparing an organic compound and a synthetic resin or natural rubber in the presence of wave energy is classified for original purposes in Class 204 and cross-referenced to the Class 520 Series. In the situation where an alternative process claim is presented along with a specific process claim to the synthetic resin or natural rubber, there is no specific claim to the nonsynthetic resin or nonnatural rubber species, and the process is directed to wave energy, the same rule of original patent placement applies. Any process step involving electrolysis, an electric current, electro-osmosis, electrophoresis, an electrostatic field, an electrical discharge, or a magnetic field and also involving the preparing or treating of a synthetic resin or natural rubber is proper for Class 204, even when the wave energy step involved is subsequent to a Class 204 step. Combinations of chemical process steps provided for by the Class 520 Series (other than those involving wave energy) and process steps falling within the definition of Class 204 are proper for Class 204 when the Class 520 Series process steps are preparatory to the Class 204 process steps and are proper for the Class 520 Series when the Class 204 process steps are preparatory to the Class 520 Series process steps.

Class 430, Radiation Imagery Chemistry: Process, Composition, or Product Thereof, appropriate subclasses provide for radiation sensitive compositions and elements and for processes of exposing said composition or elements to wave energy using an imagewise exposure technique. Class 522 provides for compositions and processes involving use of radiation for polymerizing compositions having a photoinitiator or photosensitizer or for modifying polymers. Class 430 provides for compositions solely disclosed, or claimed for radiation imagery. Compositions and processes not involving radiation imagery, or disclosing both a radiation imagery use, and another use are placed in Class 522 and cross-referenced to Class 430. Also, see Class 430 classification line for compositions with art claimed, especially, multiple use (Class 430, III A 2a).

SECTION III - SUBCLASS REFERENCES TO THE CURRENT CLASS

Schedule Outline of Class 522: The schedule is divided into a number of parts, each of which is distinct and provides for different types of subject matter. The following SEARCH THIS CLASS, SUBCLASS is a breakdown of the major areas and indicates the type of subject matter provided therein.

SEE OR SEARCH THIS CLASS, SUBCLASS:

1,generic subclass for the class.
2,through 5, for manipulative process areas which provide for certain designated processes of preparing or treating a polymer or compositions therefore. This area has no generic subclass and therefore documents not covered under the ambit of this subclass range are classified below on some other basis.
6,through 70, for the specified rate-affecting material area which provides for processes of preparing or treating polymers or compositions therefor wherein a rate-affecting material is utilized simultaneously with the wave energy and wherein at least one rate-affecting material is designated by at least one atom, e.g., a nitrogen-containing photoinitiator, etc. This area is further subdiveded into the following six subclass ranges.
7,through 30, for two or more rate-affecting materials, only one of which need be specifically claimed.
8,through 10, for either (1) at least two rate-affecting material containing a keto group which is not part of a ring (e.g., benzophenone, etc.) or (ii) the combination of one rate-affecting material containing a keto group which is not part of a ring plus a rate-affecting material referred to as a "photoinitiator or photosensitizer". The basic premise of these subclasses is that a rate-affecting material identified as a "photoinitiator or photosensitizer" is to be equated with a rate-affecting material containing a keto group wherein the keto group is not part of a ring.
11,for the combination of a rate-affecting material containing a keto group not part of a ring plus a broadly claimed rate-affecting material, other than "photoinitiator or photosensitizer", e.g., the combination of a benzophenone and a curing catalyst would be proper for this subclass, etc.
12,through 23, for the combination of either (1) a rate-affecting material containing a keto group not part of a ring plus a rate-affecting material wherein at least one atom is designated; or (2) a rate-affecting material referred to as a "photoinitiator or photosensitizer" plus a rate-affecting material wherein at least one atom is designated. The basis of classification in these subclasses is with the latter ingredient of the aforementioned combinations (1) and (2).
24,through 30, for the combination of two or more rate-affecting materials neither one of which contains a keto group not part of a ring. The basis of classification in these subclasses is with the first appearing rate-affecting material provided in the schedule hierarchy.
31,through 70, for specified rate-affecting material.
71,through 86, for the designated nonreactant areas provide for processes of preparing or treating polymers or compositions therefor, wherein a designated nonreactant material is present when the wave energy is applied.
87,through 189, for the polymer preparation or treatment area which provides for processes or compositions therefor of the following six categories.
87,through 108, specifically for proteins and carbohydrates as reactants and for treating a terminally unsaturated polyurethane, ethylenically unsaturated siloxane, polysiloxane, polyester or polypoxide derivative.
109,and 110, for chemically modifying a blend of two or more solid polymers by a chemical reactant.
111,and 112, for treating a blend of two or more solid polymers.
113,through 147, for chemically modifying a solid polymer by a chemical reactant in the presence of wave energy.
148,through 166, for treating a solid polymer in the presence of wave energy wherein a chemical reaction occurs.
167,through 189, for the preparation of a solid polymer by utilizing wave energy.

SECTION IV - REFERENCES TO OTHER CLASSES

SEE OR SEARCH CLASS:

8Bleaching and Dyeing; Fluid Treatment and Chemical Modification of Textiles and Fibers,   appropriate subclasses for bleaching or dyeing; fluid treatment and chemical modification of textiles and fibers wherein use is made of electrical radiant or wave energy other than electrolysis, for which see Class 205, subclasses 689+ .
128Surgery,   appropriate subclassesfor electrical or wave energy treatment of the living human body and apparatus specialized therefor.
205Electrolysis: Processes, Compositions Used Therein, Methods of Preparing the Compositions,   subclasses 689+ , for chemical modification of textiles and fibers using electrolysis.
252Compositions,   appropriate subclassesfor electrical or wave energy methods, other than electrolytic for the preparation of dispersions.
422Chemical Apparatus and Process Disinfecting, Deodorizing, Preserving, or Sterilizing,   subclasses 131+ for polymerization apparatus.
427Coating Processes,   appropriate subclassesfor processes of coating a substrate followed by curing the coating using electrical or wave energy. Included in Class 427 are processes of producing a coating by application of wave energy chemistry to a base material which supplies a part or all of the coating, e.g., conversion of the surface of a polymeric material to produce a film thereon by the application of wave energy, etc.
525through 528, Synthetic Resins or Natural Rubbers,   appropriate subclasses for processes of preparing and treating polymers by chemical and physical means.

SECTION V - GLOSSARY

DESIGNATED NONREACTANT MATERIAL (DNRM)

As used in this class, designated nonreactant material (DNRM) is a material wherein at least one of the chemical atoms can be deduced with certainty. For purposes of this class, organic material although inherently reciting the presence of a carbon atom is considered to be too broad. An exemplary list of materials to be regarded as DNRM"s is as follows: metal hydrate, chalcogen, carboxylic acid, peroxy, peroxide, latex, alkali or alkaline earth metal, transition metal, halogen, proten donor, sulfiede, drying oil, fat, fatty acid or ester, water, carbon black, etc. This list is by no means limited to the above examples.

The following list is not exhaustive and merely enumerates certain materials that will not be considered as DNRM"s, e.g., organic compound, metal containing, inorganic compound, organometallic compound, solvent, wax, magnetic, hydrophobic, hydrophillic, antiplasticizer, plasticizer, filler, preservative, antioxidant, antiozonant, stablizer, lubricant, fibrous additive, particulate additive, liquid, solid, gas, dispersant, emulsifier, crystalline, plastic, flourescent, phosphorescent, liminescent, deliquescent, drier, dessicant, humectant, blue color,numerically described without providing a chemical atom, Lewis acid or base, mineral, organic solvent, cosolvent, Ziegler or Natta catalysts, alfin catalyst, free radical, amphoteric, anionic, ionic, denaturant, electrostatic, dielectric, conductor, insulator, etc. This list is to be regarded as illustrative rather than exhaustive.

WAVE ENERGY

The term "wave energy" includes radiations as well as wave energies transmitted by various mediums and embraces electromagnetic waves or radiations, ultrasonic and supersonic waves, nuetrons, protons, duetron, and other corpuscular radiations.

ELECTROMAGNETIC WAVES

The term "electromagnetic waves" as employed herein includes, for example, X-rays and gamma rays; ultraviolet, infrared, and visible light rays, and short electric and radio waves. Energy which produces merely a thermal effect or heat waves, per se, is excluded. Microwave energy is considered to produce a thermal effect unless there is a direct statement to the contrary, and is not proper for this class.

SUBCLASSES

[List of Patents for class 522 subclass 1]    1COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY:
 This subclass is indented under Class 520, subclass 1.  Subject matter involving processes of (1) preparing a solid polymer in the presence of wave energy is employed to induce the polymerization; or (2) chemically modifying a solid polymer with a chemical reactant in the presence of wave energy is employed to induce the reaction; or (3) modifying a solid polymer by wave energy wherein the wave energy induces a chemical reaction in the solid polymer; and compositions of (1), (2) and (3) to be polymerized or reacted provided a photoinitiator or photosensitizer is present.
  
[List of Patents for class 522 subclass 2]    2Processes of forming or modifying a solid polymer by laser; or compositions therefore:
 This subclass is indented under subclass 1.  Subject matter involving the use of light amplified by stimulated emission of radiation, i.e., laser, or composition therefore.
(1) Note. This area provides for a specific wave energy process, i.e., laser. In order for a wave energy process to be classified herein as an original, there must be a claim to the noted process or the total disclosure in the patent must be directed to the specific process. The wave energy process in the claim need not be limited to the provided specific process if the claim specifically recites the process of this subclass. Processes not claimed or solely disclosed are classified below on some other aspect.
(2) Note. This subclass provides for compositions perfected so as to be utilized with a laser. See General Rules As To Patent Placement in the class definition.

SEE OR SEARCH CLASS:

216Etching a Substrate: Processes,   subclass 65 for process of using a laser in combination with chemical etchant.
  
[List of Patents for class 522 subclass 3]    3Processes of forming or modifying a solid polymer wherein specific mixing, stirring, agitating, movement of material or directional orientation is employed; or compositions therefore:
 This subclass is indented under subclass 1.  Subject matter involving specific mixing, stirring, agitating, movement of material or directional orientation; or compositions therefor.
(1) Note. The steps of mixing, stirring, agitating, movement of material or directional orientation must involve a direct relationship with wave energy and not be ancillary to the wave energy exposure. For instance, mixing two ingredients under specific conditions to merely form a composition which is then exposed to a form of wave energy is not proper for this subclass; however, mixing of the same ingredients under the same conditions while said formed composition is exposed to wave energy is proper herein.
(2) Note. Specified for purposes of this subclass requires the naming of a movement imparting rotor, stirrer, impeller or any other device in terms of its specific dimension, design, size, or shape therefor, or requires the recitation of a reactor of a design to facilitate movement or agitation; or requires a positive recitation in the claims as to velocity or designated time of mixing, said time being either continuous or intermittent.
(3) Note. Directional orientation includes adding material horizontally, tangentially, from above or below, etc.
(4) Note. This subclass also provides for those compositions perfected so as to be utilized is a process involving the requirements of this subclass.
  
[List of Patents for class 522 subclass 4]    4Process of forming or modifying a solid polymer by wave energy wherein at least two distinct external radiant energy sources are utilized; or compositions therefore:
 This subclass is indented under subclass 1.  Subject matter involving the use or at least two distinct energy sources; or compositions therefore.
(1) Note. The two sources or energy maybe utilized in any manner, e.g., successive, or concurrent, etc. Each of the energy sources must cause a chemical reaction of its own right or must potentiate, accelerate, or have a synergistic affect in regard to the chemical reaction involved.
(2) Note. This subclass also provides for those compositions perfected so as to be utilized in a process involving the requirements or this subclass.
(3) Note. "Distinct" as used in this subclass includes the same type of energy either derived from one or more sources when said energy is used at different energy levels or wave length levels. It also includes the same type of energy derived from two different generating sources.
  
[List of Patents for class 522 subclass 5]    5Processes of forming or modifying a solid polymer by wave energy wherein a temperature less than 0xC (32xF) or greater than 250xC(482xF) is employed; or compositions therefore:
 This subclass is indented under subclass 1.  Subject matter involving a temperature less than 0xC (32xF) or greater than 250xC (482xF); or compositions therefore.
(1) Note. The temperature conditions required must involve a direct relationship with wave energy. For instance treatment of a material by wave energy and subsequent physical treatment at the temperature lower than 0xC is not proper subject matter for this subclass.
(2) Note. A process performed while "frozen" or under "cryogenic" conditions will be placed herein unless there is a disclosure that the temperature is greater than 32xF.
(3) Note. This subclass also provides for those compositions perfected so as to be utilized in a process involving the requirements of this subclass.
  
[List of Patents for class 522 subclass 6]    6Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of a least one specified rate-affecting material, e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc.:
 This subclass is indented under subclass 1.  Subject matter wherein said process or composition to be polymerized or modified requires, in addition to the wave energy source, at least one specified rate-affecting material.
(1) Note. A rate-affecting material is a material which either affects the rate of reaction, permits reduced amount of wave energy, increases or decreases the degree of polymerization, cure, cross-linking, or grafting, or scavenges or provides storage stability of reactive materials or inhibits reaction; and includes photoinitiator, photosensitizer, activator, dark storage stabilizer, accelerator, inhibitor, or initiator reducing agent, retarder, photoreducible dye, sensitizing auxiliary, electron donor, generator, or curing catalyst.
(2) Note. A curing agent is presumed to be a cross-linking agent and is not considered to be a rate-affecting material. A curing catalyst, on the other hand, is considered to be a rate-affecting material.
(3) Note. A specified rate-affecting material is a rate-affecting material (see (1) Note) wherein at least one of the chemical atoms can be deduced with certainty. The following are examples of specified rate-affecting materials: benzophenone, oxygen containing curing catalyst, and a metal oxide containing inhibitor. The following are examples or rate-affecting materials which are not specified: a metal containing rate-affecting material, an organic containing rate-affecting material, an inorganic catalyst, an organometallic catalyst, a Lewis acid or base catalyst, a Ziegler catalyst.
(4) Note. A compound not claimed although solely disclosed as a rate-affecting material is considered to be a proper specified rate-affecting material. For example, a claim drawn to a process of preparing a solid polymer in the presence of wave energy and a metal oxide is disclosed as functioning in a catalyst capacity.
(5) Note. Unless disclosed to the contrary, a benzophenone or derivative thereof is presumed to be a specified rate-affecting material though not claimed or disclosed as having catalytic activity.

SEE OR SEARCH THIS CLASS, SUBCLASS:

71,for pigmented materials which function only to change the quantity of radiation received. These are considered to be DNRM".
  
[List of Patents for class 522 subclass 7]    7Contains two or more rate-affecting materials, at least one of which is specified:
 This subclass is indented under subclass 6.  Subject matter wherein at least two rate-affecting materials are claimed; at least one rate-affecting material is specified.
(1) Note. An example of a patent properly classified in this subclass is a photoinitiator and a metal oxide curing catalyst.
  
[List of Patents for class 522 subclass 8]    8At least two specified rate-affecting material containing keto group not part of a ring; or contains nonspecified photoinitiator or photosensitizer and a specified ketone containing material wherein the keto group is not part of a ring:
 This subclass is indented under subclass 7.  Subject matter wherein either (a) at least two rate-affecting materials are specified and each of which contains at least one organic keto group not part of a ring system, or (b) the combination of one specified rate-affecting material containing at least one organic keto group not part of a ring system plus a rate-affecting material designated as either a "photosensitizer" or "photoinitiator".
(1) Note. Examples of combinations of rate-affecting materials proper for this subclass include
(a)

 superscript +  photosensitizer

+photosensitizer

(b) acyloin photoinitiator + benzophenone
(c) diaminobenophenone photosensitizer+ benzophenone
(d) a mixture of benzophenone and Michler"s ketone as the photoinitiator
(2) Note. A material having a keto group as part of a ring may still be proper for this subclass if in fact an additional keto group is present which is not part of a ring, e.g.,

etc.

etc.

(3) Note. Ring as used in this subclass includes heterocyclic rings, carbocyclic, or any other ring system.
(4) Note. See Class 520, the Glossary, for a definition of the term "ketone".

SEE OR SEARCH THIS CLASS, SUBCLASS:

68,for a ketone containing a C=O group wherein the C of the C=O is part of a carbocyclic ring and there are no other keto moieties.
  
[List of Patents for class 522 subclass 9]    9With a heterocyclic specified rate-affecting material:
 This subclass is indented under subclass 8.  Subject matter which includes an additional specific rate-affecting material which is heterocyclic.
(1) Note. See Class 520, the Glossary, for the definition of "heterocyclic".
(2) Note. An example of a patent proper for this subclass is one having the combination of (a) a 2,2, "-deithiobis-(benzothiazole) sensitizer (b) aromatic ketone photosensitizer and an (c) aromatic ketone photosensitizer.
  
[List of Patents for class 522 subclass 10]    10With a tertiary amine specific rate-affecting material:
 This subclass is indented under subclass 8.  Subject matter which includes an additional specific rate-affecting material which contains a trivalent nitrogen atom bonded to three atoms which are other than hydrogen.
  
[List of Patents for class 522 subclass 11]    11Contains compound containing keto group not part of a ring and nonspecified rate-affecting material other than mere photoinitiator or photosensitzer:
 This subclass is indented under subclass 7.  Subject matter wherein one rate-affecting material containing at least one organic keto group not part of a ring, as below at the end of this definition, and the other rate-affecting material is one wherein none of the chemical atoms can be deduced from the claim with certainty and wherein the rate-affecting material which is not chemically stated is other than a photoinitiator or phtosensitizer.

Image 1 for class 522 subclass 11

Image 2 for class 522 subclass 11

(1) Note. A material having a keto group as part of a ring may still be proper for this subclass if in fact an additional keto group is present which is not part of a ring, e.g., as shown in the second illustration, above.
(2) Note. Ring as used in this subclass includes heterocyclic rings.
(3) Note. See Class 520, the Glossary, for a definition of the term "Ketone".

SEE OR SEARCH THIS CLASS, SUBCLASS:

8+,for a system containing a specified rate-affecting material containing at least one keto group not part of a ring in combination with a rate-affecting material designated merely as a "photoinitiator" or "photosensitizer".
  
[List of Patents for class 522 subclass 12]    12Contains compounds containing keto group not part of ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer:
 This subclass is indented under subclass 7.  Subject matter wherein either (a) one rate-affecting material contains a keto group not part of a ring plus a specified rate-affecting material or (b) one specified rate-affecting material plus a rate-affecting material designated merely as a "photoinitiator" or "photosensitizer".
(1) Note. Classification in the subclasses indented hereinunder is based upon the first-appearing specified rate-affecting material.
(2) Note. A material having a keto group as part of a ring may still be proper for this subclass if in fact an additional keto group is present which is not part of a ring, e.g.,

etc.

etc.

(3) Note. Ring as used in this subclass includes heterocyclic rings, carbocyclic, or any other ring system.
(4) Note. See Class 520, the Glossary, for a definition of the term "ketone"

SEE OR SEARCH THIS CLASS, SUBCLASS:

8+,for the combination of either two rate-affecting materials both of which contain a keto group not part of ring or one specified rate-affecting material containing a keto group not part of a ring plus a rate-affecting material designated merely as a "photoinitiator" or photosensitizer".
13,for peroxide catalyst plus benzoin ethyl ether catalyst.
21,for the combination of resorcinol monobenzoate plus photoinitiator.
22,for the combination of Mn2(CO)10plus

Image 2 for class 522 subclass 12

  
[List of Patents for class 522 subclass 13]    13Specified rate-affecting material is a peroxide or azo compound:
 This subclass is indented under subclass 12.  Subject matter wherein the specified rate-affecting material contains a -O-O- or N=n group.
  
[List of Patents for class 522 subclass 14]    14Specified rate-affecting material is an amide or tertiary amine:
 This subclass is indented under subclass 12.  Subject matter wherein the specified rate-affecting material is an amide of a carboxylic acia or a nitrogen compound having a nitrogen atom substituted by three organic radicals, i.e., R3N.
(1) Note. See Class 520, the Glossary, for a definition of the term "amine".
(2) Note. See Class 520, the Glossary, under carboxylic acid or derivative for a definition of the term "carboxylic acid amide".

SEE OR SEARCH THIS CLASS, SUBCLASS:

15,for nitrogen containing onium group compounds as rate-affecting materials.
  
[List of Patents for class 522 subclass 15]    15Specified rate-affecting material contains onium group:
 This subclass is indented under subclass 12.  Subject matter wherein the specified rate-affecting material is an onium group containing compound.
  
[List of Patents for class 522 subclass 16]    16Specified rate-affecting material is heterocyclic:
 This subclass is indented under subclass 12.  Subject matter wherein the specified rate-affecting material is a heterocyclic ring compound.
(1) Note. See Class 520, the Glossary, for a definition of the term "heterocyclic.
  
[List of Patents for class 522 subclass 17]    17Specified rate-affecting material contains sulfur:
 This subclass is indented under subclass 12.  Subject matter wherein the specified rate-affecting material contains a sulfur atom.
  
[List of Patents for class 522 subclass 18]    18Specified rate-affecting material contains phosphorus, arsenic, antimony or nitrogen atom:
 This subclass is indented under subclass 12.  Subject matter wherein the specified rate-affecting material contains at least one atom of phosphorus, arsenic, antimony or nitrogen.
  
[List of Patents for class 522 subclass 19]    19Specified rate-affecting material is an aldehyde or aldehyde derivative:
 This subclass is indented under subclass 12.  Subject matter wherein the specified rate-affecting material is an aldehyde or aldehyde derivative.
(1) Note. See Class 520, the Glossary, for a definition of the term "aldehyde" and "aldehyde derivative".
  
[List of Patents for class 522 subclass 20]    20Specified rate-affecting material is a carboxylic acid or derivative:
 This subclass is indented under subclass 12.  Subject matter wherein the specified rate-affecting material is a carboxylic acid or derivative.
(1) Note. See Class 520, the Glossary, for a definition of the term "carboxylic acid or derivative". By schedule hierarchy the derivatives in this area are limited to acyclic anhydrides, esters and salts.
  
[List of Patents for class 522 subclass 21]    21Specified rate-affecting material contains C-OH or C-O-C group:
 This subclass is indented under subclass 12.  Subject matter wherein the specified rate-affecting material contains a C-OH or C-O-C Group.
  
[List of Patents for class 522 subclass 22]    22Specified rate-affecting material contains an inorganic compound:
 This subclass is indented under subclass 12.  Subject matter wherein the specified rate-affecting material is an inorganic compound.
(1) Note. See Class 520, Glossary, for the definition of "organic". For purposes of this subclass, inorganic compounds are those not included in said definition.
  
[List of Patents for class 522 subclass 23]    23Specified rate-affecting material contains only carbon and hydrogen or halogen and at least one atom of carbon is bonded to hydrogen or a halogen atom:
 This subclass is indented under subclass 12.  Subject matter wherein the specified rate-affecting material contains at least one atom of carbon bonded to at least one atom of hydrogen or halogen and wherein no other diverse atoms are present.
  
[List of Patents for class 522 subclass 24]    24Specified rate-affecting material is a peroxide:
 This subclass is indented under subclass 7.  Subject matter wherein at least one of the specified rate-affecting materials contains a O-O group.
  
[List of Patents for class 522 subclass 25]    25Specified rate-affecting material contains onium group:
 This subclass is indented under subclass 7.  Subject matter wherein at least one of the specified rate-affecting materials is an onium group containing compound.
  
[List of Patents for class 522 subclass 26]    26Specified rate-affecting material is heterocyclic:
 This subclass is indented under subclass 7.  Subject matter wherein at least one of the specified rate-affecting materials contains a heterocyclic ring.
(1) Note. See Class 520, Glossary, for a definition of the term "heterocyclic.
  
[List of Patents for class 522 subclass 27]    27Specified rate-affecting material contains sulfur:
 This subclass is indented under subclass 7.  Subject matter wherein at least one of the specified rate-affecting materials contains a sulfur atom.
  
[List of Patents for class 522 subclass 28]    28Specified rate-affecting material contains phosphorus, arsenic, antimony or nitrogen:
 This subclass is indented under subclass 7.  Subject matter wherein at least one of the specified rate-affecting materials contains an atom of phosphorus, arsenic, antimony, or nitrogen.
  
[List of Patents for class 522 subclass 29]    29Specified rate-affecting material is a metal-containing organic compound:
 This subclass is indented under subclass 7.  Subject matter wherein at least one of the specified rate-affecting materials is organic and contains at least one metal atom.
(1) Note. See Class 520, the Glossary, for a definition of the terms "metal" and "organic compound".
  
[List of Patents for class 522 subclass 30]    30Specified rate-affecting material is organic:
 This subclass is indented under subclass 7.  Subject matter wherein at least one of the specified rate-affecting materials is organic.
(1) Note. See Class 520, Glossary, for a definition of the term "organic compound".
  
[List of Patents for class 522 subclass 31]    31Specified rate-affecting materials contains onium group:
 This subclass is indented under subclass 6.  Subject matter wherein the specified rate-affecting material is an onium group containing compound.
  
[List of Patents for class 522 subclass 32]    32Diazonium containing material:
 This subclass is indented under subclass 31.  Subject matter wherein the specified rate-affecting material contains a -N=N salt group.
  
[List of Patents for class 522 subclass 33]    33Specified rate-affecting material contains a ketone group -c- (CO)n-c-, the (CO)n not being part of a ring:
 This subclass is indented under subclass 6.  Subject matter wherein the specified rate-affecting material contains at least one keto group which is not part of a ring system.
(1) Note. See Class 520, Glossary, for a definition of the term "ketone". The type of ketone materials excluded from this subclass are, for instance, those where oxygen is solely double bonded to a carbon atom and which carbon atom is part of a carbocyclic ring, or any other ring system.
(2) Note. Included in this subclass are those compounds which may contain two or more ketone moieties and wherein one of the C=O groups is part of a part of a ring system and wherein at least one C=O group is not.
  
[List of Patents for class 522 subclass 34]    34Containing ethylenic unsaturation:
 This subclass is indented under subclass 33.  Subject matter wherein the ketone compound is ethylenically unsaturated.
(1) Note. See Class 520, Glossary, for a definition of the term "ethylenically unsaturated".
  
[List of Patents for class 522 subclass 35]    35Contained in polymeric rate-affecting material, e.g., synthetic resin, etc.:
 This subclass is indented under subclass 33.  Subject matter wherein the ketone containing material is polymeric in nature.
(1) Note. The polymeric material may be liquid or solid.
  
[List of Patents for class 522 subclass 36]    36Containing two or more ketone groups:
 This subclass is indented under subclass 33.  Subject matter wherein the ketone compound contains at least two ketone groups.
(1) Note. For purposes of this class, a compound containing a -CC group, wherein * is two or more, is considered as being a plural ketone containing compound. Additionally, a compound containing a -CCC- group is considered as having two ketone groups may be part of a ring system as long as another ketone group is present which is acyclic.
  
[List of Patents for class 522 subclass 37]    37Adjacent (C=O) * groups where * is at least two:
 This subclass is indented under subclass 36.  Subject matter wherein the ketone compound contains at least two carbonyl groups that are adjacent to each other.
  
[List of Patents for class 522 subclass 38]    38Containing phosphorus:
 This subclass is indented under subclass 33.  Subject matter wherein the ketone compound contains at least one atom of phosphorus.
  
[List of Patents for class 522 subclass 39]    39Containing nitrogen:
 This subclass is indented under subclass 33.  Subject matter wherein the ketone compound contains at least one atom of nitrogen.
  
[List of Patents for class 522 subclass 40]    40Containing C-CO-CHOH, e.g., benzoin, etc.:
 This subclass is indented under subclass 33.  Subject matter wherein the ketone compound contains the structure C, e.g., benzoin, etc.
  
[List of Patents for class 522 subclass 41]    41Containing C-CO-CHOH-CHOR wherein R is organic:
 This subclass is indented under subclass 40.  Subject matter wherein the ketone compound contains the structure C wherein R is organic.
  
[List of Patents for class 522 subclass 42]    42Containing C-CO-C(R)(OH) wherein R is organic:
 This subclass is indented under subclass 33.  Subject matter wherein the ketone compound contains the structure C, wherein R is organic.
  
[List of Patents for class 522 subclass 43]    43Containing C-CO-C(H)(OR) wherein R is organic, e.g., benzoin methyl ether, etc.:
 This subclass is indented under subclass 33.  Subject matter wherein the ketone compound contains the structure, below, wherein R is organic, e.g., benzoin methyl ether, etc. C
  
[List of Patents for class 522 subclass 44]    44Containing C-CO-C(R)(OR) wherein R is organic, e.g., diethyoxacetophenone, etc.:
 This subclass is indented under subclass 33.  Subject matter wherein the ketone compound contains the structure, below, wherein R is organic. For an example, see the structure following the one immediately below.

etc.

etc.

(1) Note. Diethoxyacetophenone is considered proper for this subclass unless specifically identified as to where the ether linkages are connected and which, if specified, differ from that required by the definition of this subclass.
  
[List of Patents for class 522 subclass 45]    45Containing halogen, e.g., chloroacetone, etc.:
 This subclass is indented under subclass 33.  Subject matter wherein the ketone compound contains at least one atom of halogen.
(1) Note. Halogen is limited to fluorine, chlorine, bromine, iodine or astatine.
  
[List of Patents for class 522 subclass 46]    46At least two aryl groups connected directly to same carbonyl carbon, e.g., benzophenone, etc.:
 This subclass is indented under subclass 33.  Subject matter wherein the ketone compound contains the structure RR, wherein both R groups are aryl.
  
[List of Patents for class 522 subclass 47]    47Specified rate-affected material is a quinone:
 This subclass is indented under subclass 6.  Subject matter wherein the specified rate-affecting material contains the structure, i.e.

Image 1 for class 522 subclass 47

  
[List of Patents for class 522 subclass 48]    48Quinone ring is part of polynuclear system, e.g., anthraquinone, etc.:
 This subclass is indented under subclass 47.  Subject matter wherein the group, as shown below, is bonded at least two of its carbon atoms with additional atoms which form a ring therewith.

Image 1 for class 522 subclass 48

  
[List of Patents for class 522 subclass 49]    49Specified rate-affecting material contains chalogen other than as oxygen:
 This subclass is indented under subclass 6.  Subject matter wherein the specified rate-affecting material contains an atom of sulfur, selenium or tellurium.
  
[List of Patents for class 522 subclass 50]    50Hetero nitrogen ring:
 This subclass is indented under subclass 49.  Subject matter wherein the chalcogen compound contains at least one heterocyclic nitrogen ring.
(1) Note. See Class 520, Glossary, for a definition of the term "heterocyclic".
(2) Note. The chalcogen atom can be part of the heterocyclic nitrogen ring.
  
[List of Patents for class 522 subclass 51]    51Containing mercapto or mercaptide group, e.g., (thio) mercaptobenzoxazole, etc.:
 This subclass is indented under subclass 50.  Subject matter wherein sulfur is present as C-SH or C-S metal and wherein the carbon atoms bonded to sulfur are not double bonded to a chalcogen atom.
  
[List of Patents for class 522 subclass 52]    52Containing halogen:
 This subclass is indented under subclass 50.  Subject matter the heterocyclic ring compound contains at least one halogen atom.
(1) Note. Halogen is limited to fluorine, cholrine, bromoine, iodine or astatine.
  
[List of Patents for class 522 subclass 53]    53Hetero sulfur ring:
 This subclass is indented under subclass 49.  Subject matter wherein sulfur is present as an atom in a heterocyclic ring.
(1) Note. See Class 520, Glossary, for a definition of the term "heterocyclic".
  
[List of Patents for class 522 subclass 54]    54