US D802,220 S
Mask
Jose L. Escutia Farias, Phoenix, AZ (US); and Anthony Todd Miceli, Castaic, CA (US)
Filed by Jose L. Escutia Farias, Phoenix, AZ (US); and Anthony Todd Miceli, Castaic, CA (US)
Filed on Apr. 21, 2016, as Appl. No. 29/562,024.
Term of patent 15 Years
LOC (10) Cl. 29 - 02
U.S. Cl. D29—110
OG exemplary drawing
 
The ornamental design for a mask, as shown and described.