US D801,942 S
Target profile for a physical vapor deposition chamber target
Martin Lee Riker, Milpitas, CA (US); Fuhong Zhang, Cupertino, CA (US); and Yu Liu, Campbell, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed on Apr. 16, 2015, as Appl. No. 29/524,109.
Term of patent 14 Years
LOC (10) Cl. 13 - 03
U.S. Cl. D13—182
OG exemplary drawing
 
The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.