US D801,942 S | ||
Target profile for a physical vapor deposition chamber target | ||
Martin Lee Riker, Milpitas, CA (US); Fuhong Zhang, Cupertino, CA (US); and Yu Liu, Campbell, CA (US) | ||
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US) | ||
Filed by APPLIED MATERIALS, INC., Santa Clara, CA (US) | ||
Filed on Apr. 16, 2015, as Appl. No. 29/524,109. | ||
Term of patent 14 Years | ||
LOC (10) Cl. 13 - 03 |
U.S. Cl. D13—182 |
The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described. |