US 9,814,099 B2
Substrate support with surface feature for reduced reflection and manufacturing techniques for producing same
Shu-Kwan Lau, Mountain View, CA (US); Joseph M. Ranish, San Jose, CA (US); Paul Brillhart, Pleasanton, CA (US); and Mehmet Tugrul Samir, Mountain View, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed on Jul. 7, 2014, as Appl. No. 14/324,557.
Claims priority of provisional application 61/861,956, filed on Aug. 2, 2013.
Prior Publication US 2015/0037017 A1, Feb. 5, 2015
Int. Cl. H05B 3/00 (2006.01); F27D 5/00 (2006.01)
CPC H05B 3/0047 (2013.01) [F27D 5/0037 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A susceptor for supporting a substrate in a process chamber, comprising:
a first surface comprising a substrate support surface; and
a second surface opposite the first surface, wherein a portion of the second surface comprises a feature having a plurality of spaced apart structures to absorb incident radiant energy at a wavelength of about 1.0 micrometer to about 4.0 micrometers.