US 9,812,668 B2
Organic electroluminescence display device and method of manufacturing organic electroluminescence display device
Akinori Kamiya, Tokyo (JP)
Assigned to Japan Display Inc., Tokyo (JP)
Filed by Japan Display Inc., Tokyo (JP)
Filed on Oct. 27, 2016, as Appl. No. 15/335,554.
Application 15/335,554 is a continuation of application No. 14/847,869, filed on Sep. 8, 2015, granted, now 9,515,289.
Application 14/847,869 is a continuation of application No. 14/210,907, filed on Mar. 14, 2014, granted, now 9,159,951, issued on Oct. 13, 2015.
Claims priority of application No. 2013-053469 (JP), filed on Mar. 15, 2013.
Prior Publication US 2017/0047384 A1, Feb. 16, 2017
Int. Cl. H01L 51/52 (2006.01); H01L 27/32 (2006.01); H01L 51/56 (2006.01); H01L 51/50 (2006.01)
CPC H01L 51/5253 (2013.01) [H01L 27/3244 (2013.01); H01L 27/3246 (2013.01); H01L 51/5016 (2013.01); H01L 51/5056 (2013.01); H01L 51/5072 (2013.01); H01L 51/5088 (2013.01); H01L 51/5092 (2013.01); H01L 51/5234 (2013.01); H01L 51/5271 (2013.01); H01L 51/56 (2013.01); H01L 51/5237 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A display device comprising:
a first substrate;
a plurality of organic emitting elements on the first substrate, each of the organic emitting elements including an anode, an organic emitting layer on the anode, and a cathode on the organic emitting layer, the organic emitting elements sharing the cathode;
an insulation film exposing a part of the anode and covering an edge of the anode of each of the organic emitting elements; and
a sealing film covering the organic emitting elements and the insulation film, the sealing film including a first barrier layer, a base layer including silicon oxide or amorphous silicon on the first barrier layer, an organic layer on the base layer, and a second barrier layer on the base layer and the organic layer, a first thickness of the first barrier layer being thicker than a second thickness of the base layer, wherein the first barrier layer includes SiN or SiON, and the second barrier layer includes SiN or SiON,
wherein the sealing film includes a first region where the first barrier layer, the base layer, and the second barrier layer are laminated and the second barrier layer is in physical contact with the base layer; and a second region where the first barrier layer, the base layer, the organic layer, and the second barrier layer are laminated.