US 9,812,668 B2 | ||
Organic electroluminescence display device and method of manufacturing organic electroluminescence display device | ||
Akinori Kamiya, Tokyo (JP) | ||
Assigned to Japan Display Inc., Tokyo (JP) | ||
Filed by Japan Display Inc., Tokyo (JP) | ||
Filed on Oct. 27, 2016, as Appl. No. 15/335,554. | ||
Application 15/335,554 is a continuation of application No. 14/847,869, filed on Sep. 8, 2015, granted, now 9,515,289. | ||
Application 14/847,869 is a continuation of application No. 14/210,907, filed on Mar. 14, 2014, granted, now 9,159,951, issued on Oct. 13, 2015. | ||
Claims priority of application No. 2013-053469 (JP), filed on Mar. 15, 2013. | ||
Prior Publication US 2017/0047384 A1, Feb. 16, 2017 | ||
Int. Cl. H01L 51/52 (2006.01); H01L 27/32 (2006.01); H01L 51/56 (2006.01); H01L 51/50 (2006.01) |
CPC H01L 51/5253 (2013.01) [H01L 27/3244 (2013.01); H01L 27/3246 (2013.01); H01L 51/5016 (2013.01); H01L 51/5056 (2013.01); H01L 51/5072 (2013.01); H01L 51/5088 (2013.01); H01L 51/5092 (2013.01); H01L 51/5234 (2013.01); H01L 51/5271 (2013.01); H01L 51/56 (2013.01); H01L 51/5237 (2013.01)] | 15 Claims |
1. A display device comprising:
a first substrate;
a plurality of organic emitting elements on the first substrate, each of the organic emitting elements including an anode,
an organic emitting layer on the anode, and a cathode on the organic emitting layer, the organic emitting elements sharing
the cathode;
an insulation film exposing a part of the anode and covering an edge of the anode of each of the organic emitting elements;
and
a sealing film covering the organic emitting elements and the insulation film, the sealing film including a first barrier
layer, a base layer including silicon oxide or amorphous silicon on the first barrier layer, an organic layer on the base
layer, and a second barrier layer on the base layer and the organic layer, a first thickness of the first barrier layer being
thicker than a second thickness of the base layer, wherein the first barrier layer includes SiN or SiON, and the second barrier
layer includes SiN or SiON,
wherein the sealing film includes a first region where the first barrier layer, the base layer, and the second barrier layer
are laminated and the second barrier layer is in physical contact with the base layer; and a second region where the first
barrier layer, the base layer, the organic layer, and the second barrier layer are laminated.
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