US 9,812,471 B2
Laser annealing apparatus and method of manufacturing display apparatus by using the same
Hongro Lee, Yongin-si (KR); and Chunghwan Lee, Yongin-si (KR)
Assigned to SAMSUNG DISPLAY CO., LTD., Yongon-Si, Gyeonggi-Do (KR)
Filed by SAMSUNG DISPLAY CO., LTD., Yongin-si, Gyeonggi-Do (KR)
Filed on Mar. 2, 2016, as Appl. No. 15/59,049.
Claims priority of application No. 10-2015-0111636 (KR), filed on Aug. 7, 2015.
Prior Publication US 2017/0040352 A1, Feb. 9, 2017
Int. Cl. H01L 21/02 (2006.01); H01L 27/12 (2006.01); H01L 21/67 (2006.01); H01L 21/268 (2006.01)
CPC H01L 27/1285 (2013.01) [H01L 21/02675 (2013.01); H01L 21/02678 (2013.01); H01L 21/02691 (2013.01); H01L 21/268 (2013.01); H01L 21/67115 (2013.01)] 18 Claims
OG exemplary drawing
1. A method of manufacturing a display apparatus, comprising:
applying a line laser beam onto an amorphous silicon layer formed on a substrate, wherein the line laser beam extends in a first direction,
wherein applying the line laser beam onto the amorphous silicon layer comprises:
applying the line laser beam onto the amorphous silicon layer multiple times while the substrate is moved in both the first direction and in a second direction crossing the first direction at substantially a same time,
wherein the line laser beam is applied onto the amorphous silicon layer while the substrate is rotated by an angle θ less than about 90 degrees within a first plane defined by the first direction and the second direction, the angle θ being an angle between the second direction and an edge of the substrate.