US 9,812,315 B2
Treating solution for electronic parts, and process for producing electronic parts
Toshitada Kato, Noda (JP); Naoya Sato, Noda (JP); Shigeru Kamon, Noda (JP); and Koichiro Ogata, Noda (JP)
Assigned to FINE POLYMERS CORPORATION, Tokyo (JP)
Filed by FINE POLYMERS CORPORATION, Toyko (JP)
Filed on Mar. 27, 2015, as Appl. No. 14/670,785.
Claims priority of application No. 2014-070641 (JP), filed on Mar. 29, 2014.
Prior Publication US 2015/0279654 A1, Oct. 1, 2015
Int. Cl. H01L 21/02 (2006.01); C11D 3/34 (2006.01); C11D 3/20 (2006.01); C11D 3/28 (2006.01); C11D 3/18 (2006.01); C11D 11/00 (2006.01); C09K 13/08 (2006.01); C11D 3/04 (2006.01); H01L 21/311 (2006.01); C11D 1/02 (2006.01)
CPC H01L 21/0206 (2013.01) [C09K 13/08 (2013.01); C11D 1/02 (2013.01); C11D 3/042 (2013.01); C11D 3/187 (2013.01); C11D 3/2096 (2013.01); C11D 3/28 (2013.01); C11D 3/349 (2013.01); C11D 3/3481 (2013.01); C11D 11/0047 (2013.01); H01L 21/31111 (2013.01)] 18 Claims
 
1. An aqueous treating solution for electronic parts comprising:
1) one or more of anionic surface active agents having the following formulae (1), (2) and (3):

OG Complex Work Unit Drawing
wherein R1, R2, and R3 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, and X1 stands for a functional group capable of becoming an anionic ion;

OG Complex Work Unit Drawing
wherein, R4 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, X2 stands for a functional group capable of becoming an anionic ion, and n stands for a natural number of 2 or greater;

OG Complex Work Unit Drawing
wherein R5 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, and X3, and X4 stands for a functional group capable of becoming an anionic ion, and
2) a cyclic compound having an occupied area smaller than a naphthalene ring, wherein said cyclic compound is represented by the following formulae (7):

OG Complex Work Unit Drawing
wherein d1, d2, d3, d4, d5, d6, d7, and d8 stands for any one or more of a carbon atom, a nitrogen atom, an oxygen atom, a sulfur atom and a phosphorus atom, these 8 constituting elements form a cyclic structure by having any chemical bond between neighboring constituting elements, providing a cyclic compound showing aromaticity under conditions under which it is used, or d1, d2, d3, d4, d5, d6, d7, and d8 may further bond to a functional group;
wherein said aqueous solution has a pH value of 2 to 6;
which contains hydrofluoric acid in an amount of 0.001 to 50 mass %.