US 9,812,308 B2
Device for manipulating charged particles
Alexander Berdnikov, St. Petersburg (RU); Alina Andreyeva, Yorkshire (GB); and Roger Giles, Yorkshire (GB)
Assigned to Shimadzu Research Laboratory (Europe) Ltd., Manchester, Lancashire (GB)
Filed by Shimadzu Research Laboratory (Europe) Ltd., Manchester, Lancashire (GB)
Filed on Oct. 21, 2016, as Appl. No. 15/299,665.
Application 15/299,665 is a continuation of application No. 14/115,134, granted, now 9,536,721, previously published as PCT/EP2012/058310, filed on May 4, 2012.
Claims priority of application No. 2011119286 (RU), filed on May 5, 2011; and application No. 2011119296 (RU), filed on May 5, 2011.
Prior Publication US 2017/0140911 A1, May 18, 2017
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 49/00 (2006.01); H01J 49/06 (2006.01)
CPC H01J 49/0095 (2013.01) [H01J 49/062 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A device for manipulating charged particles, the device comprising:
a series of electrodes arranged so as to form a channel for transportation of the charged particles, the series of electrodes being adjacent to one another along a length of the channel;
a power supply unit adapted to provide supply voltages to said electrodes so as to create a non-uniform high-frequency electric field within said channel, the pseudopotential of said field having two or more local maxima along the length of said channel for transportation of charged particles, at least within a certain interval of time, wherein transportation of the charged particles along the length of the channel is provided by transposition of the at least two of said maxima of the pseudopotential such that the at least two of said maxima are caused to travel with time along the channel, at least within a certain interval of time and at least within a part of the length of the channel, wherein the supply voltages are high-frequency voltages;
wherein the channel is filled with a buffer gas and the pressure of the buffer gas varies along the length of the channel, so that injection of charged particles into the device at an inlet of the device takes place at a higher pressure as compared with an outlet of the device;
wherein the device is configured to transport the charged particles to a low pressure region of the channel in which the pressure is less than 5×10−3 mbar;
wherein in the process of transportation of the charged particles, equalisation of kinetic energies of charged particles occurs due to collisions and energy exchange between charged particles and buffer gas molecules.