US 9,812,304 B2
Method of fine tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device
Mark A. Bernick, White Oak, PA (US); and Richard Newcomb, McKeesport, PA (US)
Assigned to ANGSTROM SCIENCES, INC., Duquesne, PA (US)
Filed by Angstrom Sciences, Inc., Duquesne, PA (US)
Filed on Jan. 12, 2015, as Appl. No. 14/594,336.
Application 14/594,336 is a division of application No. 12/887,065, filed on Sep. 21, 2010, granted, now 8,951,394.
Claims priority of provisional application 61/299,669, filed on Jan. 29, 2010.
Prior Publication US 2015/0194294 A1, Jul. 9, 2015
Int. Cl. C23C 14/00 (2006.01); C25B 11/00 (2006.01); C25B 13/00 (2006.01); H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01); C23C 14/54 (2006.01)
CPC H01J 37/3461 (2013.01) [C23C 14/3407 (2013.01); C23C 14/35 (2013.01); C23C 14/54 (2013.01); H01J 37/345 (2013.01); H01J 37/347 (2013.01); H01J 37/3423 (2013.01); H01J 37/3435 (2013.01); H01J 2237/3323 (2013.01); Y10T 29/49002 (2015.01)] 4 Claims
OG exemplary drawing
 
1. A method of fine-tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device, the magnetron sputtering electrode comprising:
a rotatable cylindrical target having a first end and a second end with respect to an axis of the rotatable cylindrical target;
a target retaining member for holding the rotatable cylindrical target;
a cathode body positioned to be within the rotatable cylindrical target and defining a magnet receiving chamber; and
a magnet arrangement received within the magnet receiving chamber, the magnet arrangement having a first turnaround corresponding to the first end of the rotatable cylindrical target and a second turnaround corresponding to the second end of the rotatable cylindrical target, the magnet arrangement comprised of a plurality of magnets positioned between the first turnaround and the second turnaround, wherein each magnet extends from a base of the magnet to a top portion of the magnet in a height direction towards an interior surface of the rotatable cylindrical target, wherein the magnet arrangement has a length direction, a height direction, and a width direction, wherein the length direction of the magnet arrangement corresponds to the axial direction of the rotatable cylindrical target, and wherein the height direction of the magnet arrangement corresponds to the height direction of the plurality of magnets;
wherein the method comprises the steps of:
identifying a plurality of localized regions of a substrate coating, each of the plurality of localized regions having a thickness that is non-uniform beyond a predetermined acceptable deviation;
selecting a plurality of shunts, each of the plurality of shunts having a size and shape corresponding to a respective one of the plurality of localized regions;
attaching the plurality of shunts to the cathode body outside the magnet receiving chamber at a plurality of different length positions with respect to the length direction of the magnet arrangement,
wherein each of the plurality of shunts is spaced away from a side of the magnet arrangement in the width direction of the magnet arrangement and extends in a plane substantially parallel to the side of the magnet arrangement, at a length position along the length of the magnet arrangement between the first turnaround and the second turnaround corresponding to the respective localized region of the substrate coating, and at a height position relative to the height of the magnet arrangement, such that each of the plurality of shunts reduces the magnetic field of the magnet arrangement by an effective amount to cause the thickness of the coating of the substrate at the respective localized region to be within the predetermined acceptable deviation,
wherein each of the plurality of shunts is movable relative to the magnet arrangement in at least the height direction of the magnet arrangement; and
adjusting the height position of at least one of the plurality shunts with respect to the magnet arrangement so as to tune the effect of the magnet arrangement on coating thickness uniformity along the axial direction of the rotatable cylindrical target.