| US 9,812,294 B2 | ||
| Sub-pulsing during a state | ||
| John C. Valcore, Jr., Fremont, CA (US); Harmeet Singh, Fremont, CA (US); and Bradford J. Lyndaker, San Ramon, CA (US) | ||
| Assigned to Lam Research Corporation, Fremont, CA (US) | ||
| Filed by Lam Research Corporation, Fremont, CA (US) | ||
| Filed on Jun. 2, 2016, as Appl. No. 15/172,004. | ||
| Application 15/172,004 is a division of application No. 14/466,724, filed on Aug. 22, 2014, granted, now 9,390,893. | ||
| Application 14/466,724 is a continuation in part of application No. 13/620,386, filed on Sep. 14, 2012, granted, now 9,197,196, issued on Nov. 24, 2015. | ||
| Application 13/620,386 is a continuation in part of application No. 13/531,491, filed on Jun. 22, 2012, granted, now 9,114,666, issued on Aug. 25, 2015. | ||
| Claims priority of provisional application 61/602,040, filed on Feb. 22, 2012. | ||
| Claims priority of provisional application 61/602,041, filed on Feb. 22, 2012. | ||
| Prior Publication US 2016/0276137 A1, Sep. 22, 2016 | ||
| Int. Cl. H01J 37/32 (2006.01); H05H 1/24 (2006.01); H03L 7/00 (2006.01); H03K 3/01 (2006.01); H03L 7/06 (2006.01); H05H 1/46 (2006.01) | ||
| CPC H01J 37/32146 (2013.01) [H01J 37/3244 (2013.01); H01J 37/3255 (2013.01); H01J 37/32082 (2013.01); H01J 37/32174 (2013.01); H01J 37/32183 (2013.01); H03K 3/01 (2013.01); H03L 7/00 (2013.01); H03L 7/06 (2013.01); H01J 2237/327 (2013.01); H05H 2001/4682 (2013.01)] | 20 Claims |
| 1. A radio frequency (RF) generator comprising:
a processor for:
receiving a clock signal from a clock source, the clock signal having two states;
generating a pulsed signal from the clock signal, the pulsed signal having sub-states within one of the states, the sub-states
having a frequency greater than a frequency of the states; and
providing the pulsed signal to control power of an RF signal, the power controlled to be synchronous with the pulsed signal;
and
an RF power supply coupled to the processor, the RF power supply for generating the RF signal having the power for providing
the RF signal to a plasma chamber via an impedance matching circuit.
|