US 9,812,293 B2
Dielectric window, plasma processing system including the window, and method of fabricating semiconductor device using the system
Jung-hwan Um, Seongnam-si (KR); Sung-moon Park, Suwon-si (KR); and Dong-wook Kim, Seoul (KR)
Assigned to Samsung Electronics Co., Ltd., Gyeonggi-do (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do (KR)
Filed on Jun. 10, 2016, as Appl. No. 15/179,389.
Claims priority of application No. 10-2015-0134815 (KR), filed on Sep. 23, 2015.
Prior Publication US 2017/0084427 A1, Mar. 23, 2017
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32119 (2013.01) [H01J 37/321 (2013.01); H01J 37/3211 (2013.01); H01J 37/3266 (2013.01)] 16 Claims
OG exemplary drawing
1. A dielectric window comprising a first dielectric material, the dielectric window including a first surface facing an inside of a plasma chamber and a second surface opposite to the first surface and facing an outside of the plasma chamber, the dielectric window defining a groove in the second surface thereof, the groove configured to control magnetic fields in the plasma chamber,
wherein a position of the groove is determined such that interference between magnetic fields respectively generated by an inner coil and an outer coil located over the second surface of the dielectric window is inhibited, and
a depth of the groove is determined so as to uniformize magnitudes of the magnetic fields.