US 9,812,286 B2
Localized, in-vacuum modification of small structures
David H. Narum, Orono, MN (US); Milos Toth, Redfern (AU); Steven Randolph, Portland, OR (US); and Aurelien Philippe Jean Maclou Botman, Portland, OR (US)
Assigned to FEI Company, Hillsboro, OR (US)
Filed by FEI Company, Hillsboro, OR (US)
Filed on Dec. 22, 2015, as Appl. No. 14/978,180.
Application 14/978,180 is a division of application No. 13/236,587, filed on Sep. 19, 2011, granted, now 9,255,339.
Prior Publication US 2016/0189920 A1, Jun. 30, 2016
Int. Cl. C25D 17/10 (2006.01); C25D 5/02 (2006.01); H01J 37/20 (2006.01); C25D 5/04 (2006.01); C25D 5/00 (2006.01); C25D 17/00 (2006.01); C25D 17/12 (2006.01); C25D 21/04 (2006.01); C25D 21/12 (2006.01); H01J 37/18 (2006.01); H01J 37/22 (2006.01); H01J 37/28 (2006.01)
CPC H01J 37/20 (2013.01) [C25D 5/003 (2013.01); C25D 5/02 (2013.01); C25D 5/026 (2013.01); C25D 5/04 (2013.01); C25D 17/005 (2013.01); C25D 17/10 (2013.01); C25D 17/12 (2013.01); C25D 21/04 (2013.01); C25D 21/12 (2013.01); H01J 37/18 (2013.01); H01J 37/222 (2013.01); H01J 37/28 (2013.01); H01J 2237/182 (2013.01); H01J 2237/202 (2013.01); H01J 2237/2003 (2013.01); H01J 2237/2801 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A charged particle beam system, comprising:
a vacuum chamber,
a charged particle beam column configured to direct a charged particle beam onto a sample placed inside the vacuum chamber,
a micromanipulator extending within the vacuum chamber, the micromanipulator capable of moving an object with submicron precision,
a movable nano pen connected to the micromanipulator and configured to hold an electrolyte solution, and
an electrode provided at the movable nano pen; and
configured to operate in a state in which:
the charged particle beam, electrolyte solution locally applied to an insulating surface of a substrate by the movable nano pen, and the electrode at the movable nano pen form an electrochemical circuit; and
the charged particle beam functions as a virtual electrode, providing a beam current that completes the electrochemical circuit to support an electrochemical reaction causing deposition of a component of the locally applied electrolyte solution onto the insulating surface.