US 9,812,286 B2 | ||
Localized, in-vacuum modification of small structures | ||
David H. Narum, Orono, MN (US); Milos Toth, Redfern (AU); Steven Randolph, Portland, OR (US); and Aurelien Philippe Jean Maclou Botman, Portland, OR (US) | ||
Assigned to FEI Company, Hillsboro, OR (US) | ||
Filed by FEI Company, Hillsboro, OR (US) | ||
Filed on Dec. 22, 2015, as Appl. No. 14/978,180. | ||
Application 14/978,180 is a division of application No. 13/236,587, filed on Sep. 19, 2011, granted, now 9,255,339. | ||
Prior Publication US 2016/0189920 A1, Jun. 30, 2016 | ||
Int. Cl. C25D 17/10 (2006.01); C25D 5/02 (2006.01); H01J 37/20 (2006.01); C25D 5/04 (2006.01); C25D 5/00 (2006.01); C25D 17/00 (2006.01); C25D 17/12 (2006.01); C25D 21/04 (2006.01); C25D 21/12 (2006.01); H01J 37/18 (2006.01); H01J 37/22 (2006.01); H01J 37/28 (2006.01) |
CPC H01J 37/20 (2013.01) [C25D 5/003 (2013.01); C25D 5/02 (2013.01); C25D 5/026 (2013.01); C25D 5/04 (2013.01); C25D 17/005 (2013.01); C25D 17/10 (2013.01); C25D 17/12 (2013.01); C25D 21/04 (2013.01); C25D 21/12 (2013.01); H01J 37/18 (2013.01); H01J 37/222 (2013.01); H01J 37/28 (2013.01); H01J 2237/182 (2013.01); H01J 2237/202 (2013.01); H01J 2237/2003 (2013.01); H01J 2237/2801 (2013.01)] | 17 Claims |
1. A charged particle beam system, comprising:
a vacuum chamber,
a charged particle beam column configured to direct a charged particle beam onto a sample placed inside the vacuum chamber,
a micromanipulator extending within the vacuum chamber, the micromanipulator capable of moving an object with submicron precision,
a movable nano pen connected to the micromanipulator and configured to hold an electrolyte solution, and
an electrode provided at the movable nano pen; and
configured to operate in a state in which:
the charged particle beam, electrolyte solution locally applied to an insulating surface of a substrate by the movable nano
pen, and the electrode at the movable nano pen form an electrochemical circuit; and
the charged particle beam functions as a virtual electrode, providing a beam current that completes the electrochemical circuit
to support an electrochemical reaction causing deposition of a component of the locally applied electrolyte solution onto
the insulating surface.
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