| US 9,812,283 B2 | ||
| Charged particle source | ||
| Shuai Li, Fremont, CA (US) | ||
| Assigned to HERMES MICROVISION, INC., Hsinchu (TW) | ||
| Filed by Hermes Microvision Inc., Hsinchu (TW) | ||
| Filed on Jan. 12, 2017, as Appl. No. 15/404,440. | ||
| Application 15/404,440 is a division of application No. 14/964,221, filed on Dec. 9, 2015. | ||
| Claims priority of provisional application 62/089,609, filed on Dec. 9, 2014. | ||
| Prior Publication US 2017/0125202 A1, May 4, 2017 | ||
| Int. Cl. H01J 37/143 (2006.01); H01J 37/28 (2006.01); H01J 3/20 (2006.01); H01J 37/09 (2006.01) | ||
| CPC H01J 37/143 (2013.01) [H01J 3/20 (2013.01); H01J 37/09 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/063 (2013.01); H01J 2237/141 (2013.01); H01J 2237/1415 (2013.01); H01J 2237/2806 (2013.01); H01J 2237/2817 (2013.01)] | 19 Claims |
| 1. An electron source, comprising:
an emitter, providing an electron beam along an optical axis;
an upper magnetic field generator, generating a first magnetic field;
a lower magnetic field generator, generating a second magnetic field; and
an anode, extracting the electron beam from the emitter,
wherein the first magnetic field superposed with the second magnetic field provides a magnetic field strength, wherein said
magnetic field strength is zero at a tip of the emitter and increases along the optical axis to a local maximum immediately
away from the tip between the tip and the anode.
|