US 9,811,623 B2
Method for generating pattern, storage medium, and information processing apparatus
Hiroyuki Ishii, Shioya-gun (JP); Ryo Nakayama, Utsunomiya (JP); and Tadashi Arai, Saitama (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Jul. 17, 2015, as Appl. No. 14/802,851.
Claims priority of application No. 2014-149015 (JP), filed on Jul. 22, 2014.
Prior Publication US 2016/0026743 A1, Jan. 28, 2016
Int. Cl. G06F 17/50 (2006.01)
CPC G06F 17/5068 (2013.01) 20 Claims
OG exemplary drawing
 
1. A method for generating a pattern of a mask used for a mask manufacturing method for manufacturing the mask by arranging side by side a plurality of cells selected from a cell library containing a plurality of cells using a processor, the method comprising:
defining a footprint of a main pattern which is resolved in a first cell and a second cell;
arranging side by side the first cell and the second cell, the second cell having an auxiliary pattern which assists resolution of a main pattern of the second cell and is not resolved outside the footprint of the main pattern of the second cell, in such a manner that the auxiliary pattern outside the footprint of the second cell is present in the footprint of the main pattern of the first cell; and
generating the pattern of the mask by removing a pattern element of the auxiliary pattern in a portion where a pattern element of the auxiliary pattern outside the footprint of the second cell overlaps with the pattern of the first cell,
wherein the mask manufacturing method comprises a step of manufacturing the mask based on data of the generated pattern.