US 9,811,615 B2
Simultaneous retargeting of layout features based on process window simulation
George P. Lippincott, Lake Oswego, OR (US); Zhitang Yu, Pleasanton, CA (US); and Xima Zhang, Pleasanton, CA (US)
Assigned to Mentor Graphics Corporation, Wilsonville, OR (US)
Filed by Mentor Graphics Corporation, Wilsonville, OR (US)
Filed on Oct. 20, 2015, as Appl. No. 14/918,266.
Prior Publication US 2017/0109459 A1, Apr. 20, 2017
Int. Cl. G06F 17/50 (2006.01); G03F 1/36 (2012.01)
CPC G06F 17/5009 (2013.01) [G03F 1/36 (2013.01); G06F 17/5072 (2013.01)] 20 Claims
OG exemplary drawing
 
1. One or more non-transitory computer-readable media storing computer-executable instructions which, when executed, cause one or more processors to perform a method, the method comprising:
performing a process window simulation on a layout design to generate process window information, the layout design corresponding to at least a portion of an integrated circuit, and the process window information comprising predicted print positions of layout features computed under various process conditions;
determining retargeted print positions for a plurality of edge fragments in the layout design based on minimizing a combined change of targeted print positions for the plurality of edge fragments under constraints on changes of the targeted print positions for the plurality of edge fragments, the constraints being represented based on the process window information and specification limits for printed layout features;
determining edge placement errors of the plurality of edge fragments based on the retargeted print positions;
determining adjustment amounts of the plurality of edge fragments based on the edge placement errors;
adjusting positions of the plurality of edge fragments by the adjustment amounts; and
performing optical proximity correction using the adjusted positions of the plurality of edge fragments and the retargeted print positions.