US 9,811,007 B2
Lithographic apparatus and method of cooling a component in a lithographic apparatus
Frank Johannes Jacobus Van Boxtel, Eindhoven (NL); Antonius Johannus Van Der Net, Tilburg (NL); and Leonarda Hendrika Van Den Heuvel, Aarle-Rixtel (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by Frank Johannes Jacobus Van Boxtel, Eindhoven (NL); Antonius Johannus Van Der Net, Tilburg (NL); and Leonarda Hendrika Van Den Heuvel, Aarle-Rixtel (NL)
Filed on Oct. 4, 2012, as Appl. No. 13/644,653.
Claims priority of provisional application 61/544,896, filed on Oct. 7, 2011.
Prior Publication US 2013/0088694 A1, Apr. 11, 2013
Int. Cl. G03B 27/52 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/70875 (2013.01) [G03F 7/70891 (2013.01); G03F 7/70991 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A lithographic apparatus comprising:
a component;
a local cooler to apply a local cooling load to the component, the local cooler comprising:
a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component, wherein the gas passageway further comprises an outlet downstream of the component; and
a gas handling system connected to the outlet and configured to use gas from the passageway for a purpose primarily other than as a coolant, wherein the gas handling system is configured to use the gas from the passageway to purge a space of unwanted gas or contaminants or to form a contactless seal between two surfaces or to dry a wet surface.