US 9,811,005 B2
Lithographic apparatus and device manufacturing method
Yang-Shan Huang, Velhoven (NL); and Theodorus Petrus Maria Cadee, Asten (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Jan. 21, 2016, as Appl. No. 15/3,768.
Application 15/003,768 is a continuation of application No. 13/871,328, filed on Apr. 26, 2013, granted, now 9,261,798, issued on Feb. 16, 2016.
Claims priority of provisional application 61/650,708, filed on May 23, 2012.
Prior Publication US 2016/0154322 A1, Jun. 2, 2016
Int. Cl. G03F 7/20 (2006.01)
CPC G03F 7/70775 (2013.01) [G03F 7/70725 (2013.01); G03F 7/70758 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A lithographic apparatus comprising:
a support configured to support a patterning device, the patterning device configured to impart a radiation beam with a pattern in its cross-section to form a patterned radiation beam;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
a positioning device for in use positioning the substrate table relative to the projection system, the positioning device comprising:
a first positioning member mounted to the substrate table; and
a second positioning member co-operating with the first positioning member to position the substrate table, the second positioning member being mounted to a support structure;
a position measurement system configured to measure a position of a bottom surface of the substrate table in a direction of an optical axis; and
an actuator configured to exert a vertical force on the bottom surface of the substrate table at the position.