US 9,811,002 B2
Determination and application of non-monotonic dose sensitivity
Jozef Maria Finders, Veldhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 14/904,395
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Jul. 1, 2014, PCT No. PCT/EP2014/063912
§ 371(c)(1), (2) Date Jan. 11, 2016,
PCT Pub. No. WO2015/007511, PCT Pub. Date Jan. 22, 2015.
Claims priority of provisional application 61/856,350, filed on Jul. 19, 2013.
Prior Publication US 2016/0179016 A1, Jun. 23, 2016
Int. Cl. G03B 27/32 (2006.01); G03C 5/00 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/70558 (2013.01) [G03F 7/705 (2013.01); G03F 7/70625 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for lithography using a lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate, the method comprising determining, by a computer comprising a memory, values of, or a function describing, dose sensitivity of at least part of the pattern at a plurality of values of dose, wherein the dose sensitivity is not a constant, nor monotonically increasing nor monotonically decreasing function of the dose around nominal dose.