US 9,810,997 B2
Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
Shinji Sato, Fukaya (JP); and Kenyo Odanaka, Kawagoe (JP)
Assigned to NIKON CORPORATION, Tokyo (JP)
Filed by NIKON CORPORATION, Tokyo (JP)
Filed on Jun. 18, 2015, as Appl. No. 14/743,265.
Application 14/743,265 is a continuation of application No. PCT/JP2013/084800, filed on Dec. 26, 2013.
Claims priority of provisional application 61/746,470, filed on Dec. 27, 2012.
Prior Publication US 2016/0070177 A1, Mar. 10, 2016
This patent is subject to a terminal disclaimer.
Int. Cl. G03B 27/52 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/70341 (2013.01) [G03F 7/709 (2013.01)] 27 Claims
OG exemplary drawing
 
1. A liquid immersion member that is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical member, the liquid immersion member comprising:
a first liquid supply part that is configured to supply the first liquid;
a first member that is disposed at at least a portion of surrounding of the optical member;
a second member that is capable of being opposite to the object, and is movable outside an optical path of the exposure light; and
a second liquid supply part that is configured to supply a second liquid,
wherein the second member is moved so that one of a first state and a second state is changed to the other state, the first state being a state in which the second member is opposite to the second liquid supply part and the second state being a state in which the second member is not opposite to the second supply part.