US 9,810,996 B2
Optical imaging device with thermal attenuation
Bernhard Gellrich, Aalen (DE); Jens Kugler, Aalen (DE); Thomas Ittner, Aalen (DE); Stefan Hembacher, Bobingen (DE); Karl-Heinz Schimitzek, Oberkochen (DE); Payam Tayebati, Riedstadt (DE); and Hubert Holderer, Oberkochen (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on Nov. 3, 2014, as Appl. No. 14/531,109.
Application 14/531,109 is a continuation of application No. 13/712,576, filed on Dec. 12, 2012, granted, now 8,902,401.
Application 13/712,576 is a continuation of application No. 12/267,074, filed on Nov. 7, 2008, granted, now 8,363,206, issued on Jan. 29, 2013.
Application 12/267,074 is a continuation of application No. PCT/EP2007/054503, filed on May 9, 2007.
Claims priority of application No. 10 2006 021 797 (DE), filed on May 9, 2006.
Prior Publication US 2015/0109591 A1, Apr. 23, 2015
This patent is subject to a terminal disclaimer.
Int. Cl. G03B 27/52 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/70341 (2013.01) [G03F 7/70891 (2013.01)] 41 Claims
OG exemplary drawing
 
1. An optical imaging device, comprising:
a mask device configured to receive a mask comprising a pattern;
a substrate device configured to receive a substrate;
a projection device comprising an optical element group configured to project the pattern onto the substrate, the projection device comprising a plurality of optical elements which comprise an immersion element; and
a thermal attenuation device comprising an influencing device,
wherein:
the optical imaging device comprises an immersion zone between the immersion element and the substrate;
the influencing device comprises a shielding;
during use of the optical imaging device:
the immersion element is at least temporarily located adjacent to the immersion zone; and
the immersion zone at least temporarily contains an immersion medium;
the thermal attenuation device reduces fluctuations within a temperature distribution of the immersion element induced by the immersion medium;
as a function of at least one control value, the shielding of the influencing device influences the temperature distribution of the immersion element; and
the shielding of the influencing device is disposed between a part of the immersion element and the immersion medium so that the shielding of the influencing device thermally shields the part of the immersion element against the immersion medium; and
the shielding protrudes into a projection space confined by a surface of the substrate facing the immersion element, a surface of the immersion element facing the substrate, and a projection of the immersion element onto the substrate in a direction perpendicular to the surface of the substrate.