US 9,810,995 B2
Exposure apparatus and device manufacturing method
Akimitsu Ebihara, Fukaya (JP)
Assigned to NIKON CORPORATION, Tokyo (JP)
Filed by NIKON CORPORATION, Tokyo (JP)
Filed on Jan. 17, 2017, as Appl. No. 15/407,597.
Application 15/407,597 is a division of application No. 15/054,920, filed on Feb. 26, 2016, granted, now 9,551,943.
Application 15/054,920 is a division of application No. 14/669,326, filed on Mar. 26, 2015, granted, now 9,274,437.
Application 14/669,326 is a division of application No. 14/230,377, filed on Mar. 31, 2014, granted, now 9,001,307, issued on Apr. 7, 2014.
Application 14/230,377 is a division of application No. 13/852,807, filed on Mar. 28, 2013, granted, now 8,724,085, issued on May 13, 2014.
Application 13/852,807 is a division of application No. 11/889,733, filed on Aug. 16, 2007, granted, now 8,436,978, issued on May 7, 2013.
Application 11/889,733 is a division of application No. 11/258,846, filed on Oct. 27, 2005, granted, now 7,321,419, issued on Jan. 22, 2008.
Application 11/258,846 is a continuation of application No. PCT/JP2004/008595, filed on Jun. 18, 2004.
Claims priority of application No. 2003-174259 (JP), filed on Jun. 19, 2003.
Prior Publication US 2017/0123326 A1, May 4, 2017
Int. Cl. G03B 27/52 (2006.01); G03B 27/42 (2006.01); G03F 7/20 (2006.01); B82Y 10/00 (2011.01)
CPC G03F 7/70333 (2013.01) [B82Y 10/00 (2013.01); G03F 7/70225 (2013.01); G03F 7/70325 (2013.01); G03F 7/70341 (2013.01); G03F 7/70716 (2013.01); G03F 7/70725 (2013.01); G03F 7/70733 (2013.01); G03F 7/70758 (2013.01); G03F 7/70816 (2013.01); Y10T 29/49826 (2015.01)] 45 Claims
OG exemplary drawing
 
1. An exposure apparatus that exposes a substrate with illumination light via a liquid, the exposure apparatus comprising:
a catadioptric type projection optical system having a plurality of optical elements and a lens barrel, the lens barrel being arranged to hold the plurality of optical elements, the plurality of optical elements having a lens, which is located at a closest position to an image plane among the plurality of optical elements and has an exit surface arranged to be in contact with the liquid;
a correction system arranged to control a part of the plurality of optical elements to adjust an optical property of the projection optical system;
a liquid immersion member surrounding the lens such that a liquid immersion region is formed with the liquid below the projection optical system by use of the liquid immersion member;
first and second holding members each arranged below the liquid immersion member, and each having an upper surface arranged to be in contact with the liquid immersion region, each of the upper surfaces having a hole configured to hold the substrate;
a drive system having a motor to move the first and second holding members and arranged to support the first and second holding members by levitation;
a measurement system having an encoder arranged to obtain positional information of the first and second holding members; and
a controller coupled to the correction system and the drive system, and arranged to control the drive system based on measured information of the measurement system and to control the correction system to adjust the optical property,
wherein the controller is arranged to control the drive system such that, when one holding member of the first and second holding members is arranged opposite to the projection optical system, the other holding member of the first and second holding members comes close to the one holding member, and such that the close first and second holding members are moved relative to the liquid immersion member so that the other holding member is arranged opposite to the projection optical system in place of the one holding member while the liquid immersion region is substantially maintained below the projection optical system.