US 9,810,989 B2
Edge exposure apparatus, edge exposure method and non-transitory computer storage medium
Hiroshi Tomita, Koshi, Kumamoto (JP)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Feb. 4, 2016, as Appl. No. 15/15,254.
Claims priority of application No. 2015-035309 (JP), filed on Feb. 25, 2015.
Prior Publication US 2016/0246187 A1, Aug. 25, 2016
Int. Cl. G03B 27/32 (2006.01); G03B 27/52 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/2028 (2013.01) [G03F 7/2022 (2013.01)] 13 Claims
OG exemplary drawing
 
1. An edge exposure apparatus for exposing an edge portion of a substrate coated with a resist film, the edge exposure apparatus comprising:
an imaging unit that images a front surface of the substrate;
a substrate holding unit that holds the substrate;
an exposure unit that exposes the edge portion of the substrate held on the substrate holding unit;
a first moving mechanism that moves and rotates the substrate holding unit;
a second moving mechanism that moves the exposure unit; and
a control unit that controls the first moving mechanism and the second moving mechanism,
wherein the control unit is configured to control the first moving mechanism and the second moving mechanism so as to acquire array information of a plurality of shots of a pattern on the substrate from a substrate image of a substrate, which has already been subjected to pattern exposure, imaged by the imaging unit, and expose the edge portion of the substrate, based on the acquired array information,
wherein the control unit is further configured to:
calculate a dimension of one shot of the plurality of shots of the pattern;
dispose a plurality of imaginary shots, each having the calculated dimension of the one shot, to cover an entirety of the front surface of the substrate;
determine which of the plurality of imaginary shots overlap with an outer edge portion of the substrate, as a region where the edge portion of the substrate is to be exposed;
calculate coordinates of each of the plurality of imaginary shots which are determined to be the region where the edge portion of the substrate is to be exposed; and
control at least any one of the first moving mechanism and the second moving mechanism, based on the calculated coordinates, so that the region where the edge portion is to be exposed is exposed by the exposure unit.