US 9,810,987 B2
Substrate treatment method, computer storage medium and substrate treatment system
Makoto Muramatsu, Koshi (JP); Takahiro Kitano, Koshi (JP); Tadatoshi Tomita, Koshi (JP); Takanori Nishi, Koshi (JP); Shinichiro Kawakami, Koshi (JP); and Takashi Yamauchi, Koshi (JP)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Appl. No. 14/896,415
Filed by Tokyo Electron Limited, Tokyo (JP)
PCT Filed Jun. 6, 2014, PCT No. PCT/JP2014/065087
§ 371(c)(1), (2) Date Dec. 7, 2015,
PCT Pub. No. WO2014/208311, PCT Pub. Date Dec. 31, 2014.
Claims priority of application No. 2013-133383 (JP), filed on Jun. 26, 2013.
Prior Publication US 2016/0124307 A1, May 5, 2016
Int. Cl. G03F 7/004 (2006.01); G03F 7/20 (2006.01); C08L 53/00 (2006.01); C09D 153/00 (2006.01); H01L 21/027 (2006.01); G03F 7/32 (2006.01); H01L 21/02 (2006.01); G03F 7/40 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); H01L 21/67 (2006.01); G03F 7/16 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/20 (2013.01) [C08L 53/00 (2013.01); C09D 153/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/16 (2013.01); G03F 7/32 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); H01L 21/02282 (2013.01); H01L 21/3086 (2013.01); H01L 21/31133 (2013.01); H01L 21/6708 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); B81C 2201/0149 (2013.01)] 5 Claims
OG exemplary drawing
1. A method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, the substrate treatment method comprising:
a neutral layer forming step of forming, on the substrate, a neutral layer having an intermediate affinity to the hydrophilic polymer and the hydrophobic polymer;
a resist pattern forming step of performing exposure processing on a resist film formed on the neutral layer, and then developing the resist film after the exposure processing to form a resist pattern;
a block copolymer coating step of applying the block copolymer to the substrate after formation of the resist pattern;
a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer; and
a polymer removal step of selectively removing the hydrophilic polymer from the phase-separated block copolymer,
wherein in the polymer removal step, the hydrophilic polymer is removed by:
irradiating the phase-separated block copolymer with an energy ray;
then supplying a first polar organic solvent having a first degree of dissolving the hydrophilic polymer, being lower in boiling point than water and capable of dissolving water, and not dissolving the hydrophobic polymer, to the block copolymer; and
then supplying a second polar organic solvent having a second dissolving degree lower than the first dissolving degree, being higher in boiling point than water, and not dissolving the hydrophobic polymer, to the block copolymer.