US 9,810,982 B2
Photoresist polymers and photoresist compositions
Jin Park, Yongin-si (KR); Hyun-Woo Kim, Seongnam-si (KR); and Jin-Kyu Han, Hwaseong-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-Si, Gyeonggi-Do (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-do (KR)
Filed on Mar. 16, 2017, as Appl. No. 15/461,211.
Application 15/461,211 is a division of application No. 14/886,155, filed on Oct. 19, 2015, granted, now 9,625,816.
Claims priority of application No. 10-2014-0167424 (KR), filed on Nov. 27, 2014.
Prior Publication US 2017/0184966 A1, Jun. 29, 2017
Int. Cl. G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/32 (2006.01); G03F 7/36 (2006.01); G03F 7/004 (2006.01); G03F 7/016 (2006.01); G03F 7/20 (2006.01); H01L 29/423 (2006.01); H01L 21/027 (2006.01)
CPC G03F 7/039 (2013.01) [G03F 7/0045 (2013.01); G03F 7/016 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/327 (2013.01); G03F 7/36 (2013.01); H01L 21/0274 (2013.01); H01L 29/4236 (2013.01)] 8 Claims
 
1. A photoresist polymer, comprising:
a first repeating unit including a halogen donor group; and
a second repeating unit including a leaving group capable of being removed by a photochemical reaction, the leaving group being connected to the second repeating unit by a sulfide bond.
 
6. A photoresist composition, comprising:
a photoresist polymer comprising a first repeating unit including a halogen donor group, and a second repeating unit including a leaving group capable of being removed by a photochemical reaction, the leaving group being connected to the second repeating unit by a sulfide bond; and
a solvent.