US 9,810,930 B2
Mask processing using films with spatially selective birefringence reduction
William Ward Merrill, Mahtomedi, MN (US); and Douglas S. Dunn, Maplewood, MN (US)
Assigned to 3M INNOVATIVE PROPERTIES COMPANY, St. Paul, MN (US)
Filed by 3M INNOVATIVE PROPERTIES COMPANY, St. Paul, MN (US)
Filed on Jul. 25, 2016, as Appl. No. 15/218,097.
Application 15/218,097 is a continuation of application No. 14/755,457, filed on Jun. 30, 2015, granted, now 9,423,545.
Application 14/755,457 is a continuation of application No. 13/703,549, granted, now 9,101,956, previously published as PCT/US2011/042368, filed on Jun. 29, 2011.
Claims priority of provisional application 61/360,129, filed on Jun. 30, 2010.
Prior Publication US 2016/0334649 A1, Nov. 17, 2016
Int. Cl. G02F 1/01 (2006.01); B05D 5/06 (2006.01); G03F 7/20 (2006.01); B42D 25/391 (2014.01); G02F 1/00 (2006.01); G02F 1/19 (2006.01); G02B 5/28 (2006.01); G02B 5/30 (2006.01); G02B 5/32 (2006.01); G02B 1/12 (2006.01); G11B 20/12 (2006.01)
CPC G02F 1/0147 (2013.01) [B05D 5/063 (2013.01); B42D 25/391 (2014.10); G02B 1/12 (2013.01); G02B 5/285 (2013.01); G02B 5/3083 (2013.01); G02B 5/32 (2013.01); G02F 1/009 (2013.01); G02F 1/0063 (2013.01); G02F 1/0136 (2013.01); G02F 1/19 (2013.01); G03F 7/2045 (2013.01); G11B 20/1261 (2013.01)] 29 Claims
OG exemplary drawing
 
1. A method of making a patterned film, comprising:
providing a first film having a first reflective characteristic, the first film also having a first absorption characteristic suitable to, upon exposure to a first radiant beam, absorptively heat a portion of the first film by an amount sufficient to change the first reflective characteristic to a second reflective characteristic by a change in birefringence, and the first film comprises a first blended layer that includes first and second polymer materials separated into distinct first and second phases, respectively, and wherein the change from the first reflective characteristic to the second reflective characteristic is substantially attributable to a change in birefringence of at least one of the first and second polymer materials;
providing a second film having a first detectable characteristic that changes to a different second detectable characteristic upon exposure to a second radiant beam;
directing the first radiant beam preferentially at a second zone rather than a first zone of the first film to change the first reflective characteristic to the second reflective characteristic in the second zone by a change in birefringence so as to convert the first film to a patterned mask; and
using the patterned mask to pattern the second radiant beam, and directing the patterned second radiant beam at the second film to change the first detectable characteristic to the second detectable characteristic at selected portions of the second film.