US 9,810,823 B2
Plasmonic filter
Romain Girard Desprolet, Grenoble (FR); Sandrine Lhostis, Thonon les Bains (FR); and Salim Boutami, Grenoble (FR)
Assigned to STMicroelectronics (Crolles 2) SAS, Crolles (FR); STMicroelectronics SA, Montrouge (FR); and Commissariat A L'Energie Atomique et aux Energies Alternatives, Paris (FR)
Filed by STMicroelectronics SA, Montrouge (FR); STMicroelectronics (Crolles 2) SAS, Crolles (FR); and Commissariat A L'Energie Atomique et aux Energies Alternatives, Paris (FR)
Filed on Nov. 21, 2016, as Appl. No. 15/357,871.
Claims priority of application No. 15 61454 (FR), filed on Nov. 27, 2015.
Prior Publication US 2017/0153367 A1, Jun. 1, 2017
Int. Cl. H01Q 15/02 (2006.01); G02B 5/20 (2006.01); H01L 27/146 (2006.01)
CPC G02B 5/208 (2013.01) [G02B 5/204 (2013.01); H01L 27/1462 (2013.01); H01L 27/14621 (2013.01); H01L 27/14645 (2013.01); H01L 27/14649 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An infrared high-pass plasmonic filter, comprising:
a copper layer interposed between two layers of a dielectric material;
an array of patterns made of the dielectric material, each pattern being in the shape of a greek cross, with arms of adjacent patterns being collinear;
wherein a ratio (B/A) of a width (B) to a length (A) of each arm is in a range from 0.3 to 0.6, and wherein a distance (D) separating opposite ends of arms of adjacent patterns being shorter than 10 nm.