US 9,810,532 B2
Substrate treating apparatus and substrate treating methods
Koji Hashimoto, Kyoto (JP); Akito Hatano, Kyoto (JP); Toyohide Hayashi, Kyoto (JP); and Keiichi Tsuchiya, Kyoto (JP)
Assigned to SCREEN Holdings Co., Ltd., (JP)
Filed by SCREEN Holdings Co., Ltd., Kyoto (JP)
Filed on Sep. 16, 2015, as Appl. No. 14/855,846.
Claims priority of application No. 2014-198972 (JP), filed on Sep. 29, 2014.
Prior Publication US 2016/0091306 A1, Mar. 31, 2016
Int. Cl. G06F 7/00 (2006.01); G01B 11/26 (2006.01); G01B 11/06 (2006.01); G01V 8/20 (2006.01); B25J 11/00 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01)
CPC G01B 11/26 (2013.01) [B25J 11/0095 (2013.01); G01B 11/0608 (2013.01); G01V 8/20 (2013.01); H01L 21/67259 (2013.01); H01L 21/67778 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A substrate treating apparatus comprising:
a receiver for receiving a carrier placed thereon, the carrier being constructed to contain a plurality of substrates;
a substrate detecting sensor facing a horizontal direction crossing a fore-and-aft direction in which the substrates are moved into and out of the carrier, to detect presence or absence of each substrate;
a height sensor for detecting heights of the substrate detecting sensor;
an up-and-down mechanism for moving the substrate detecting sensor up and down;
an advance/withdraw mechanism for moving the substrate detecting sensor in the fore-and-aft direction;
a controller for causing the substrate detecting sensor to detect presence or absence of each substrate and causing the height sensor to detect heights of the substrate detecting sensor for detecting heights of each substrate in at least two different locations in the fore-and-aft direction by operating the up-and-down mechanism to move the substrate detecting sensor up and down, and operating the advance/withdraw mechanism to move the substrate detecting sensor in the fore-and-aft direction; and
a substrate condition acquiring unit for acquiring a tilt of each substrate relative to a horizontal plane in the fore-and-aft direction based on a difference in heights of each substrate detected in the at least two different locations.