US 9,809,746 B2
Etching liquid, kit of same, etching method using same, method for producing semiconductor substrate product, and method for manufacturing semiconductor element
Yasuo Sugishima, Shizuoka (JP); Atsushi Mizutani, Shizuoka (JP); and Keeyoung Park, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Dec. 2, 2015, as Appl. No. 14/956,500.
Application 14/956,500 is a continuation of application No. PCT/JP2014/064429, filed on May 30, 2014.
Claims priority of application No. 2013-117911 (JP), filed on Jun. 4, 2013; application No. 2013-154769 (JP), filed on Jul. 25, 2013; and application No. 2013-273291 (JP), filed on Dec. 27, 2013.
Prior Publication US 2016/0083650 A1, Mar. 24, 2016
Int. Cl. C09K 13/06 (2006.01); C09K 13/08 (2006.01); H01L 21/3213 (2006.01)
CPC C09K 13/08 (2013.01) [H01L 21/32134 (2013.01)] 22 Claims
OG exemplary drawing
 
1. An etching liquid comprising:
nitric acid;
a fluorine-containing compound; and
a nitrogen-containing organic compound A containing a nitrogen atom, wherein the nitrogen-containing organic compound is a compound including a repeating unit represented by any one of the following Formulae a-2 to a-8 or a compound represented by the following Formula b,

OG Complex Work Unit Drawing
Ra represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a heterocyclic group, Rb represents an alkyl group, an alkenyl group, or an aryl group, La represents an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, Lb represents a single bond, an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, Rc represents a hydrogen atom or an alkyl group, n represents an integer of 0 or greater, the upper limit of n is a number of respective substitutable cyclic structural portions, rings Q1 to Q3 represent a nitrogen-containing heterocycle, and the symbol “*” in the formula indicates a binding position,
Rc2N-[Ld-N(Rc)]m-Ld-NRc2  b
in the formula, Rc has the same definition as that described above, m represents an integer of 0 or greater, Ld represents an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, a plurality of Rc's and Ld's may be the same as or different from each other, and a plurality of Rc's and Ld's may be bonded to each other to form a ring.