US 9,809,669 B2
Salt, resin, resist composition and method for producing resist pattern
Hiromu Sakamoto, Osaka (JP); and Koji Ichikawa, Osaka (JP)
Assigned to SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo (JP)
Filed by SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo (JP)
Filed on Nov. 25, 2015, as Appl. No. 14/952,420.
Claims priority of application No. 2014-238521 (JP), filed on Nov. 26, 2014.
Prior Publication US 2016/0145205 A1, May 26, 2016
Int. Cl. G03F 7/004 (2006.01); G03F 7/38 (2006.01); C07C 69/54 (2006.01); C07C 69/653 (2006.01); C07C 309/04 (2006.01); C07C 309/06 (2006.01); C07C 309/07 (2006.01); C07C 309/20 (2006.01); C07C 309/22 (2006.01); C07C 309/23 (2006.01); C07C 303/32 (2006.01); C08F 228/02 (2006.01); C07C 309/17 (2006.01); C08F 220/18 (2006.01); G03F 7/039 (2006.01); C07C 381/12 (2006.01); C08F 220/20 (2006.01); C08F 226/06 (2006.01); C08F 220/30 (2006.01)
CPC C08F 228/02 (2013.01) [C07C 69/54 (2013.01); C07C 69/653 (2013.01); C07C 303/32 (2013.01); C07C 309/04 (2013.01); C07C 309/06 (2013.01); C07C 309/07 (2013.01); C07C 309/17 (2013.01); C07C 309/20 (2013.01); C07C 309/22 (2013.01); C07C 309/23 (2013.01); C07C 381/12 (2013.01); C08F 220/18 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/38 (2013.01); C07C 2603/74 (2017.05); C08F 220/20 (2013.01); C08F 226/06 (2013.01); C08F 2220/1858 (2013.01); C08F 2220/1883 (2013.01); C08F 2220/1891 (2013.01); C08F 2220/301 (2013.01); C08F 2220/303 (2013.01)] 9 Claims
 
1. A salt represented by formula (I):

OG Complex Work Unit Drawing
wherein Q 1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group,
R1 and R2 each independently represent a hydrogen atom, a fluorine atom or a CI to C6 perfluoroalkyl group,
z represents an integer of 0 to 6,
R3 represents a hydrogen atom, a fluorine atom, a C1 to C12 alkyl group or a C1 to C12 fluorinated alkyl group,
R4 represents —(CH2)n-Rf or —CHRf1Rf2, where n =1 to 6, and Rf, Rf1 and Rf2 are each independently a C1 to C6 perfluoroalkyl group,
L2 represents a single bond, a C1 to C12 divalent saturated hydrocarbon group or *-A2-X1-(A3-X2)a-A4-,
* represents a binding site to —CR3R4,
A2, A3 and A4 each independently represent a C1 to C6 alkanediyl group,
X1 and X2 each independently represent —O—, —CO—O— or —O—CO—,
a represents 0 or 1,
R5 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom,
L1 represents any one of groups represented by formulae (b1-1) to (b1-3), * represents a bonding site to —CR3R4;

OG Complex Work Unit Drawing
wherein Lb2 represents a single bond or a C1 to C22 divalent saturated hydrocarbon group where a hydrogen atom may be replaced by a fluorine atom;
Lb3 represents a single bond or a C1 to C22 divalent saturated hydrocarbon group where a hydrogen atom may be replaced by a fluorine atom or a hydroxy group and where a methylene group may be replaced by an oxygen atom or a carbonyl group;
provided that the carbon atoms contained in Lb2 and Lb3 is 22 or less in total;
Lb4 represents a single bond or a C1 to C22 divalent saturated hydrocarbon group where a hydrogen atom may be replaced by a fluorine atom;
Lb5 represents a single bond or a C1 to C22 divalent saturated hydrocarbon group where a hydrogen atom may be replaced by a fluorine atom or a hydroxy group, and a methylene group may be replaced by an oxygen atom or a carbonyl group;
provided that the carbon atoms contained in Lb4 and Lb5 is 22 or less in total;
Lb6 represents a single bond or a C1 to C23 divalent saturated hydrocarbon group where a hydrogen atom may be replaced by a fluorine atom or a hydroxy group; and
Lb7 represents a single bond or a C1 to C23 divalent saturated hydrocarbon group where a hydrogen atom may be replaced by a fluorine atom or a hydroxy group, and a methylene group may be replaced by an oxygen atom or a carbonyl group;
provided that the carbon atoms contained in Lb6 and Lb7 is 23 or less in total, and
Z+ represents an organic cation.