US 9,809,608 B2
Cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the same
Se Jin Jang, Daegu (KR); Byeong-il Yang, Daejeon (KR); Sung Gi Kim, Daejeon (KR); Jong Hyun Kim, Daejeon (KR); Do Yeon Kim, Gyeongsangbuk-do (KR); Sang-Do Lee, Daejeon (KR); Jang Hyeon Seok, Daejeon (KR); Sang Ick Lee, Daejeon (KR); and Myong Woon Kim, Daejeon (KR)
Assigned to DNF CO., LTD., Daejeon (KR)
Appl. No. 15/110,707
Filed by DNF CO., LTD., Daejeon (KR)
PCT Filed Jan. 8, 2015, PCT No. PCT/KR2015/000189
§ 371(c)(1), (2) Date Jul. 8, 2016,
PCT Pub. No. WO2015/105350, PCT Pub. Date Jul. 16, 2015.
Claims priority of application No. 10-2014-0002202 (KR), filed on Jan. 8, 2014.
Prior Publication US 2016/0326193 A1, Nov. 10, 2016
Int. Cl. C07F 7/00 (2006.01); C07F 7/21 (2006.01); H01L 21/02 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01)
CPC C07F 7/21 (2013.01) [C23C 16/402 (2013.01); C23C 16/45553 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/02164 (2013.01); H01L 21/02222 (2013.01); H01L 21/02274 (2013.01)] 12 Claims
 
1. A cyclodisilazane derivative represented by the following Chemical Formula 1:

OG Complex Work Unit Drawing
in Chemical Formula 1,
R1 to R3 are each independently hydrogen, halogen, (C1-C5)alkyl or (C2-C5)alkenyl, and
R4 is C3 alkyl or (C2-C5)alkenyl.