US 9,809,601 B2
Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
Masatoshi Echigo, Kanagawa (JP); Takashi Makinoshima, Kanagawa (JP); and Naoya Uchiyama, Okayama (JP)
Assigned to Mitsubishi Gas Chemical Company, Inc., Tokyo (JP)
Appl. No. 14/766,499
Filed by Mitsubishi Gas Chemical Company, Inc., Tokyo (JP)
PCT Filed Feb. 4, 2014, PCT No. PCT/JP2014/052530
§ 371(c)(1), (2) Date Aug. 7, 2015,
PCT Pub. No. WO2014/123107, PCT Pub. Date Aug. 14, 2014.
Claims priority of application No. 2013-023809 (JP), filed on Feb. 8, 2013.
Prior Publication US 2015/0376202 A1, Dec. 31, 2015
Int. Cl. C07D 493/14 (2006.01); C07D 495/14 (2006.01); C07D 493/04 (2006.01); C07D 495/04 (2006.01); G03F 7/11 (2006.01); C07D 311/82 (2006.01); C07D 307/92 (2006.01); C07D 333/76 (2006.01); C07D 335/12 (2006.01); H01L 21/311 (2006.01); C09D 7/12 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01)
CPC C07D 493/14 (2013.01) [C07D 307/92 (2013.01); C07D 311/82 (2013.01); C07D 333/76 (2013.01); C07D 335/12 (2013.01); C07D 493/04 (2013.01); C07D 495/04 (2013.01); C07D 495/14 (2013.01); C09D 7/1233 (2013.01); G03F 7/0752 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/327 (2013.01); H01L 21/31116 (2013.01); H01L 21/31144 (2013.01)] 16 Claims
 
1. A material for forming an underlayer film for lithography, comprising a compound having a structure represented by the following general formula (1):

OG Complex Work Unit Drawing
in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, each R2 independently represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, each m is independently an integer of 0 to 3, n is 1, p is 0 or 1, and q is an integer of 1 to 100,
wherein the compound having the structure represented by the general formula (1) comprises a compound represented by the following general formula (1c):

OG Complex Work Unit Drawing
in formula (1c), R1, n, and q are the same as defined in the formula (1) and each R4 independantly represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, and each m4 is independantly an integer of 0 to 2; and
at least one of an acid generating agent and a crosslinking agent.