US 9,808,841 B2
Reticle chuck cleaner and reticle chuck cleaning method
Yoshihito Kobayashi, Tokyo (JP); Masamitsu Itoh, Tokyo (JP); Taro Inada, Shibukawa (JP); and Jun Watanabe, Tokyo (JP)
Assigned to Toshiba Memory Corporation, Tokyo (JP)
Appl. No. 14/342,718
Filed by Yoshihito Kobayashi, Tokyo (JP); Masamitsu Itoh, Tokyo (JP); Taro Inada, Shibukawa (JP); and Jun Watanabe, Tokyo (JP)
PCT Filed Jun. 22, 2012, PCT No. PCT/JP2012/066041
§ 371(c)(1), (2), (4) Date May 30, 2014,
PCT Pub. No. WO2013/035415, PCT Pub. Date Mar. 14, 2013.
Claims priority of application No. 2011-192595 (JP), filed on Sep. 5, 2011.
Prior Publication US 2014/0326278 A1, Nov. 6, 2014
Int. Cl. B08B 7/00 (2006.01); G03F 7/20 (2006.01)
CPC B08B 7/0028 (2013.01) [B08B 7/0014 (2013.01); G03F 7/707 (2013.01); G03F 7/70925 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A reticle chuck cleaner for cleaning a reticle chuck of an apparatus, comprising:
an adhesive layer to be adhered to a chuck region of the reticle chuck;
a support layer on the adhesive layer; and
a substrate having a shape capable of being carried to the reticle chuck,
a partial adhesive layer having an adhesive region and a non-adhesive region, the partial adhesive layer provided between the support layer and the substrate,
wherein the support layer and the substrate are partially bonded by the partial adhesive layer.