Manual of U.S. Patent Classification
as of June 30, 2000

Class
522
SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

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Subclass		Title
ClassTitle		===> SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES
		This Class 522 is considered to be an integral part of Class 520 (see the Class 520 schedule for the position of this Class in schedule hierarchy). This Class retains all pertinent definitions and class lines of Class 520
		SYNTHETIC RESINS (Class 520, Subclass 1)
1		. COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY
2		. . Processes of forming or modifying a solid polymer by laser; or compositions therefore
3		. . Processes of forming or modifying a solid polymer wherein specified mixing, stirring, agitating, movement of material or directional orientation is employed; or compositions therefore
4		. . Processes of forming or modifying a solid polymer by wave energy wherein at least two distinct external radiant energy sources are utilized; or compositions therefore
5		. . Processes of forming or modifying a solid polymer by wave energy wherein a temperature less than 0 degree C (32 degree F) or greater than 250 degree C (482 degree F) is employed; or compositions therefore
6		. . Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of at least one specified rate-affecting material; e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc. wave energy in order to prepare a cellular product
7		. . . Contains two or more rate-affecting materials, at least one of which is specified
8		. . . . At least two specified rate-affecting materials containing keto group not part of a ring; or contains a nonspecified photoinitiator or photosensitizer and specified ketone containing material wherein the keto group is not part of a ring
9		. . . . . With a heterocyclic specified rate-affecting material
10		. . . . . With a tertiary amine specified rate-affecting material
11		. . . . Contains compound containing keto group not part of a ring and nonspecified rate-affecting material other than mere photoinitiator or photosensitizer
12		. . . . Contains compound containing keto group not part of a ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer
13		. . . . . Specified rate-affecting material is a peroxide or azo compound
14		. . . . . Specified rate-affecting material is an amide or tertiary amine
15		. . . . . Specified rate-affecting material contains onium group
16		. . . . . Specified rate-affecting material is heterocyclic
17		. . . . . Specified rate-affecting material contains sulfur
18		. . . . . Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen atom
19		. . . . . Specified rate-affecting material is an aldehyde or aldehyde derivative
20		. . . . . Specified rate-affecting material is a carboxylic acid or derivative
21		. . . . . Specified rate-affecting material contains C-OH or C-O-C group
22		. . . . . Specified rate-affecting material contains an inorganic compound
23		. . . . . Specified rate-affecting material contains only carbon, hydrogen, or halogen and at least one atom of carbon is bonded to hydrogen or a halogen atom
24		. . . . Specified rate-affecting material is a peroxide
25		. . . . Specified rate-affecting material contains onium group
26		. . . . Specified rate-affecting material is heterocyclic
27		. . . . Specified rate-affecting material contains sulfur
28		. . . . Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen
29		. . . . Specified rate-affecting material is a metal-containing organic compound
30		. . . . Specified rate-affecting material is organic
31		. . . Specified rate-affecting material contains onium group
32		. . . . Diazonium containing material
33		. . . Specified rate-affecting material contains a ketone group -c-(CO)n-c-, the (CO)n not being part of a ring
34		. . . . Containing ethylenic unsaturation
35		. . . . Contained in polymeric rate-affecting material, e.g., synthetic resin, etc.
36		. . . . Containing two or more ketone groups
37		. . . . . Adjacent (C=O)* groups where * is at least two
38		. . . . Containing phosphorous
39		. . . . Containing nitrogen
40		. . . . Containing C-CO-CHOH, e.g., benzoin, etc.
41		. . . . . Containing C-CO-CHOH-CHOR wherein R is organic
42		. . . . Containing C-CO-C(R)(OH) wherein R is organic
43		. . . . Containing C-CO-C(H)(OR) wherein R is organic, e.g., benzoin methyl ether, etc.
44		. . . . Containing C-CO-C(R)(OR) wherein R is organic, e.g., diethoxyacetophenone, etc.
45		. . . . Containing halogen, e.g., chloroacetone, etc.
46		. . . . At least two aryl groups connected directly to same carbonyl carbon, e.g., benzophenone, etc.
47		. . . Specified rate-affecting material is a quinone
48		. . . . Quinone ring is part of polynuclear system, e.g., anthraquinone, etc.
49		. . . Specified rate-affecting material contains chalcogen other than as oxygen
50		. . . . Hetero nitrogen ring
51		. . . . . Containing mercapto or mercaptide group, e.g., (thio)mercaptobenzoxazole, etc.
52		. . . . . Containing halogen
53		. . . . Hetero sulfur ring
54		. . . . C-(S)*-C wherein * is at least two
55		. . . . Sulfide
56		. . . . Mercapto group attached directly to aromatic ring, e.g., thiophenol, etc.
57		. . . . Nitrogen containing compound
58		. . . . Sulfenate, e.g., R-O-S-R, etc.
59		. . . . (O=S=O), e.g., sulfuryl or sulfonyl containing, etc.
60		. . . Specified rate-affecting material is a peroxide
61		. . . . Hydroperoxide
62		. . . Specified rate-affecting material contains a C-N=N-C-group
63		. . . Specified rate-affecting material contains nitrogen or oxygen atom in heterocyclic ring
64		. . . Specified rate-affecting material contains phosphorous
65		. . . Specified rate-affecting material contains nitrogen
66		. . . Specified rate-affecting material contains metal atom
67		. . . Specified rate-affecting material contains halogen
68		. . . Specified rate-affecting material contains oxygen
69		. . . . Phenolic, e.g., hydroquinone, etc.
70		. . . Specified rate-affecting material contains only carbon and hydrogen
71		. . Processes of preparing or treating a solid polymer by wave energy in the presence of a designated nonreactant material (DNRM); or compositions therefore
72		. . . Carbohydrate or derivative DNRM
73		. . . Coal, asphaltic, or bituminous material DNRM
74		. . . Organic DNRM
75		. . . . Heterocyclic ring containing DNRM
76		. . . . Phosphorous containing DNRM
77		. . . . Silicon containing DNRM
78		. . . . Nitrogen containing DNRM
79		. . . . Oxygen containing DNRM
80		. . . . Carbon and hydrogen only containing DNRM
81		. . . Heavy metal containing DNRM
82		. . . Phosphorous or sulfur containing DNRM
83		. . . Oxygen containing DNRM
84		. . . . Water
85		. . . . . Reacting an ethylenic monomer in the presence of a solid polymer
86		. . . . . Treating a solid polymer
87		. . Processes involving protein as reactant or as solid polymer; or compositions therefore
88		. . Processes involving carbohydrate as reactant or as solid polymer; or compositions therefore
89		. . . Preparing a polymer from carbohydrate and ethylenic reactant
90		. . Processes involving a polyurethane having terminal ethylenic unsaturation as reactant or as solid polymer; or compositions therefore
91		. . . With a polysiloxane reactant or polymer
92		. . . With a reactant containing ethylenic unsaturation derived from poly 1,2 epoxide or polymer
93		. . . With polycarboxylic acid or derivative and a polyol, a condensate or solid polymer thereof reactant
94		. . . With aldehyde or aldehyde derivative reactant, condensate or solid polymer thereof
95		. . . With solid polymer derived solely from ethylenic monomers
96		. . . With ethylenic reactant
97		. . . Polyurethane has an oxygen other than as part of a urethane or carboxylic acid ester group
98		. . . Polyurethane has at least one non-terminal ethylenic group
99		. . Processes involving a polysiloxane having ethylenic unsaturation as reactant or as solid polymer; or compositions therefore
100		. . Processes involving an ethylenically unsaturated material derived from poly 1,2-epoxide as reactant or a solid polymer; or compositions thereof
101		. . . With polycarboxylic acid or derivative and a polyol, condensate or solid polymer thereof
102		. . . With solid polymer derived solely from ethylencally unsaturated monomers
103		. . . With ethylenic reactant
104		. . Processes involving an ethylenically unsaturated polyester derived from a polycarboxylic acid or derivative and polyol, condensate or solid polymer thereof; or compositions therefore
105		. . . With aldehyde or aldehyde derivative reactant or polymer thereof
106		. . . With solid polymer derived from ethylenically unsaturated monomers only
107		. . . With ethylenic reactant
108		. . . Condensate or solid polymer contains oxygen other than as part of a carboxylic acid ester moiety
109		. . Processes of chemically modifying a blend of two or more solid polymers in the presence of a chemical reactant; or compositions therefore
110		. . . At least one solid polymer derived from ethylenic monomers has at least two ethylenic groups
111		. . Processes of treating a blend of two or more solid polymers or reacting one solid polymer with another solid polymer; or compositions therefore
112		. . . At least two solid polymers derived from ethylenic monomers only
113		. . Processes of chemically modifying a solid polymer derived only from ethylenically unsaturated monomers by treating polymer with a chemical reactant; or compositions therefore
114		. . . Chemical reactant is ethylenically unsaturated
115		. . . . Phosphorus
116		. . . . Nitrogen
117		. . . . . Chemical reactant has two or more ethylenic groups
118		. . . . Sulfur
119		. . . . . Chemical reactant has two or more ethylenic groups
120		. . . . Oxygen
121		. . . . . Chemical reactant has two or more ethylenic groups
122		. . . . . Hetero oxygen
123		. . . . . Contains C-OH group other than as part of a COO-moiety
124		. . . . Carbon, hydrogen and halogen or carbon and halogen only
125		. . . . Carbon and hyrogen only
126		. . . Chemical reactant contains nitrogen
127		. . . Chemical reactant contains sulfur
128		. . . . Elemental sulfur
129		. . . Chemical reacant contains oxygen
130		. . . . Contains C=O moiety
131		. . . Chemical reactant is elemental halogen
132		. . . . Solid polymer treated contains halogen
133		. . . . Solid polymer derived from single monomer
134		. . Processes of chemically modifying a solid polymer or SICP derived from at least one saturated monomer by treating solid polymer or SICP with a chemical reactant; or compositions therefor
135		. . . Chemical reactant is ethylenically unsaturated
136		. . . . Nitrogen
137		. . . . . Chemical reactant has two or more ethylenic groups
138		. . . . . Hetero nitrogen
139		. . . . . N-C=O containing
140		. . . . . . Two or more N-C=O groups
141		. . . . Chalcogen
142		. . . . . Chemical reactant has two or more ethylenic groups
143		. . . . . Hetero oxygen
144		. . . . . Carboxylic acid or derivative
145		. . . . Chemical reactant has two or more ethylenic groups and contains only carbon and hydrogen
146		. . . Chemical reactant contains chalcogen
147		. . . Chemical reactant contains halogen
148		. . Processes of treating a solid polymer or SICP derived from silicon containing reactant; or compositions therefore
149		. . Processes of treating a reaction product of a solid polymer and ethylenic reactant; or compositions therefore e.g., graft- or graft-type polymer, etc.
150		. . Processes of treating a solid polymer derived from ethylenic monomers only; or compositions therefore
151		. . . Solid polymer derived from nitrogen containing monomer
152		. . . . Nitrogen containing monomer contains oxygen
153		. . . Solid polymer derived from carboxylic acid or derivative monomer
154		. . . . Oxygen other than as part of carboxylic acid or derivative moiety
155		. . . Solid polymer derived from halogen containing monomer
156		. . . . Halogen is fluorine
157		. . . Solid polymer derived from monomer containing only carbon and hydrogen
158		. . . . At least one reactant contains two or more ethylenic groups
159		. . . . . Polyisoprene or natural rubber
160		. . . . Carbocyclic ring containing, e.g., styrene, etc.
161		. . . . Derived from ethylene
162		. . Processes of treating a solid polymer or SICP derived from at least one nonethylenic reactant or compositions therefore
163		. . . Solid polymer or SICP derived from reactant having halo-C(=O)-halo,halo C(=O)-O, or -O-C(=O)-O-group
164		. . . Solid polymer or SICP derived from polycarboxylic acid or derivative and organic amine or from organic amine salt of a polycarboxylic acid
165		. . . Solid polymer or SICP derived from polycarboxylic acid or derivative and polyol
166		. . . Solid polymer or SICP derived from at least one heterocyclic monomer or aldehyde or aldehyde derivative
167		. . Processes of preparing a solid polymer from heterocyclic nitrogen monomers; or compositions therefore, e.g., carbazole, etc.
168		. . Processes of preparing a solid polymer from a heterocyclic chalogen monomer; or compsitions therefore
169		. . . Two or more hetero atoms in hetero ring at least one of which is oxygen
170		. . . 1,2 epoxy
171		. . Processes of preparing a solid polymer from at least one phosphorous containing monomer; or compositions therefore
172		. . Processes of preparing a solid polymer from at least one silicon containing monomer; or compositions therefore
173		. . Processes of preparing a solid polymer from at least one nitrogen containing monomer; or compositions therefore
174		. . . Nitrogen containing reactant contains a N-C=O or N-C=O moiety
175		. . . . Acrylamide or methacrylamide
176		. . . Organic polyamine and polycarboxylic acid or derivative or from an organic amine salt of a polycarboxylic acid
177		. . . Acrylonitrile or methacrylonitrile
178		. . Processes of preparing a solid polymer from at least one oxygen containing monomer; or compositions therefore
179		. . . Polycarboxylic acid or derivative and polyol, or condensate thereof, e.g., dimethylterephthalate, etc.
180		. . . Sulfur containing
181		. . . Ether group
182		. . . Carboxylic acid or derivative
183		. . . . Oxygen other than as part of a COO-group
184		. . Processes of preparing a solid polymer from ethylenic reactants only; or compositions therefore
185		. . . Carbon, hydrogen and halogen only reactant contains at least three carbon atoms
186		. . . At least one reactant contains two or more ethylenic groups
187		. . . At least one reactant contains halogen
188		. . . Derived from aromatic hydrocarbon
189		. . . Derived from ethylene only
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		CROSS-REFERENCE ART COLLECTIONS
		******************************
901		DARK STORAGE STABILIZER
902		AIR INHIBITION
903		REMOVAL OF RESIDUAL MONOMER
904		MONOMER OR POLYMER CONTAINS INITIATING GROUP
905		. Benzophenone group
906		PREPARING SHRINKABLE MATERIAL
907		INVOLVING PRECURSOR OF AN ULTRAVIOLET ABSORBER, E.G., MONOBENZOATE, ETC.
908		DENTAL UTILITY
909		SOLVENTLESS INK
910		TREATMENT THROUGH AN EXTERNAL FILTER OR MASK (NONPHOTOGRAGHIC PROCESS)
911		SPECIFIED TREATMENT INVOLVING MEGARAD OR LESS
912		. Polymer derived from ethylenic monomers only
913		NUMERICALLY SPECIFIED DISTINCT WAVELENGTH
914		. Wavelength of 200 nanometers or less
915		INVOLVING INERT GAS, STEAM, NITROGEN GAS, OR CARBON DIOXIDE

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Last Modified: 6 October 2000