US 7,470,954 B2
Fabrication method for arranging ultra-fine particles
Seung-Heon Lee, Daejeon (Korea, Republic of); Frédéric S. Diana, Santa Clara, Calif. (US); Antonio Badolato, Santa Barbara, Calif. (US); Pierre M. Petroff, Santa Barbara, Calif. (US); and Edward J. Kramer, Santa Barbara, Calif. (US)
Assigned to The Regents of the University of California, Oakland, Calif. (US)
Filed on Nov. 14, 2005, as Appl. No. 11/274,916.
Application 11/274916 is a division of application No. 10/759589, filed on Jan. 15, 2004, granted, now 6,989,324.
Prior Publication US 2006/0154466 A1, Jul. 13, 2006
Int. Cl. H01L 29/94 (2006.01); H01L 31/062 (2006.01)
U.S. Cl. 257—331 14 Claims
OG exemplary drawing
 
1. A fabricated device comprising:
a photoresist coated-substrate formed with wells through its surface, said wells having gradually sloping walls and an aspect ratio of less than 0.37, and micelles enclosing nanoparticles disposed in said wells.