forming a gate electrode and a gate line on the substrate;

depositing a first insulating layer on the gate electrode and the gate line;

forming an active layer on the first insulating layer over the gate electrode;

forming an ohmic contact layer on the active layer;

forming source and drain electrodes on the ohmic contact layer, and a data line connected to the source electrode, the data line defining a pixel region with the gate line;

depositing a second insulating layer on the source and drain electrodes, and the data line, the second insulating layer having an inorganic material;

forming a reflection layer on the second insulating layer and a photoresist layer on the reflection layer;

forming a reflective plate on the second insulating layer at the pixel region, by etching the reflection layer by using the photoresist layer as a first etching mask, the reflective plate having a transmissive hole, wherein the photoresist layer remains after forming the reflective plate;

etching the second insulating layer by using the photoresist layer and the reflective plate as a second etching mask;

removing the photoresist layer after etching the second insulating layer;

forming a third insulating layer on the reflective plate; and

forming a pixel electrode on the third insulating layer at the pixel region, the pixel electrode being transparent and connected to the drain electrode.