| US 7,468,517 B2 | ||
| Single stage charged particle beam energy width reduction system for charged particle beam system | ||
| Jürgen Frosien, Riemerling (Germany); Ralf Degenhardt, Landsham (Germany); Stefan Lanio, Erding (Germany); and Gerald Schönecker, Munich (Germany) | ||
| Assigned to ICT Integrated Circuit Testing Gesellschaft fur Halbleiternruftechnik mbH, Heimstetten (Germany) | ||
| Appl. No. 10/571,345 PCT Filed Sep. 02, 2004, PCT No. PCT/EP2004/009796 § 371(c)(1), (2), (4) Date Sep. 28, 2006, PCT Pub. No. WO2005/024889, PCT Pub. Date Mar. 17, 2005. |
||
| Claims priority of application No. 03020710 (EP), filed on Sep. 11, 2003; and application No. 03028694 (EP), filed on Dec. 16, 2003. | ||
| Prior Publication US 2007/0158561 A1, Jul. 12, 2007 | ||
| Int. Cl. G21K 1/08 (2006.01); H01J 37/21 (2006.01); H01J 37/20 (2006.01) | ||
| U.S. Cl. 250—396R [250/310; 250/396 ML] | 27 Claims |

| 1. Charged particle beam device with a z-axis along an optical axis, comprising:
a first lens generating a crossover, the crossover having a z-position zc;
a second lens positioned after the crossover;
an element acting in a focusing and dispersive manner in an x-z plane, the center of the element acting in a focusing and
dispersive manner having essentially the z-position zc;
a multipole element, which acts in the x-z-plane and the y-z-plane, the center of the multipole element having essentially
the z-position zc;
a first charged particle selection element being positioned in beam direction before the element acting in a focusing and
dispersive manner; and
a second charged particle selection element being positioned in beam direction behind the element acting in a focusing and
dispersive manner, wherein the second charged particle selection element is velocity dependent selection element.
|