| US 7,468,512 B2 | ||
| Computer program products for measuring critical dimensions of fine patterns using scanning electron microscope pictures and secondary electron signal profiles | ||
| Min-Sub Kang, Gyeonggi-do (Korea, Republic of); Sang-Kil Lee, Gyeonggi-do (Korea, Republic of); Kwang-Sik Kim, Gyeonggi-do (Korea, Republic of); Kyung-Ho Jung, Incheon-si (Korea, Republic of); and Sung-Joong Kim, Gyeonggi-do (Korea, Republic of) | ||
| Assigned to Samsung Electronics Co., Ltd., (Korea, Republic of) | ||
| Filed on Jun. 27, 2006, as Appl. No. 11/426,713. | ||
| Application 11/426713 is a division of application No. 11/008477, filed on Dec. 09, 2004, granted, now 7,091,485. | ||
| Claims priority of application No. 2003-0090187 (KR), filed on Dec. 11, 2003. | ||
| Prior Publication US 2006/0231753 A1, Oct. 19, 2006 | ||
| Int. Cl. G01N 23/00 (2006.01) | ||
| U.S. Cl. 250—307 [250/306] | 4 Claims |
| 1. A computer program product that is configured to inspect a pattern, the computer program product comprising a computer
usable storage medium having computer-readable program code embodied in the mediums the computer-readable program code comprising:
computer-readable program code that is configured to acquire a scanning electron microscope picture of an inspection pattern;
computer-readable program code that is configured to acquire a scanning electron microscope secondary electron signal profile
of the inspection pattern using the scanning electron microscope picture; and
computer-readable program code that is configured to determine whether the inspection pattern is defective by comparing the
scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern
and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning
electron microscope secondary electron signal profile of a sample pattern.
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