| US 7,468,494 B2 | ||
| Reaction enhancing gas feed for injecting gas into a plasma chamber | ||
| Juan Jose Gonzalez, Fort Collins, Colo. (US); Andrew Shabalin, Fort Collins, Colo. (US); and Fernando Gustavo Tomasel, Fort Collins, Colo. (US) | ||
| Assigned to Advanced Energy Industries, Fort Collins, Colo. (US) | ||
| Filed on Jan. 31, 2003, as Appl. No. 10/355,632. | ||
| Prior Publication US 2004/0149701 A1, Aug. 05, 2004 | ||
| Int. Cl. B23K 9/00 (2006.01) | ||
| U.S. Cl. 219—121.51 [219/121.43; 219/121.41; 118/723 R; 156/345.33; 156/345.29] | 8 Claims |
| 1. A plasma source apparatus comprising:
a) a plasma chamber for containing a plasma therein;
b) a gas inlet disposed at a sidewall of the plasma chamber for injecting a working gas into the plasma chamber; and
c) a gas speed reducer disposed at the gas inlet, the gas speed reducer enhancing the production of reaction products in the
plasma chamber by reducing the speed at which the working gas interacts with the plasma, the gas speed reducer comprising
a chamber having an open end connected to the gas inlet, a closed end, and a sidewall having at least one aperture through
which the working gas is diffused into the plasma chamber.
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