| US 7,468,235 B2 | ||
| Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositions | ||
| Mitsuhiro Hata, Suwon-si (Korea, Republic of); Sang-Jun Choi, Seoul (Korea, Republic of); and Man-Hyoung Ryoo, Hwaseong-si (Korea, Republic of) | ||
| Assigned to Samsung Electronics Co., Ltd., Gyeonggi-do (Korea, Republic of) | ||
| Filed on Jun. 07, 2006, as Appl. No. 11/447,907. | ||
| Claims priority of application No. 10-2005-0079953 (KR), filed on Aug. 30, 2005. | ||
| Prior Publication US 2007/0048671 A1, Mar. 01, 2007 | ||
| Int. Cl. G03C 5/00 (2006.01); G03C 1/76 (2006.01); G03F 7/00 (2006.01) | ||
| U.S. Cl. 430—270.1 [430/914; 430/287.1; 430/281.1; 430/322; 430/449; 526/281; 526/271; 522/121; 522/125; 522/114] | 14 Claims |
| 1. A barrier coating composition for immersion photolithography comprising:
a polymer having a weight average molecular weight (Mw) of 5,000 to 100,000 daltons; and
an organic solvent,
wherein the polymer is represented by formula I:
 wherein the expressions (1+m+n)=1; (0.1≤1/(1+m+n))≤0.7; 0.3≤(m/(1+m+n))≤0.9; and 0.0≤1≤(n/(1+m+n))≤0.6 are satisfied;
Rf is selected from a group consisting of C1 to C5 fluorine-substituted hydrocarbon group; and
Z is 5-norbornene-2-methanol.
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