| US 7,463,402 B2 | ||
| Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography | ||
| Wenceslao A. Cebuhar, Norwalk, Conn. (US); Jason D. Hintersteiner, Bethel, Conn. (US); Azat Latypov, Danbury, Conn. (US); and Gerald Volpe, Stamford, Conn. (US) | ||
| Assigned to ASML Holding N.V., Veldhoven (Netherlands) | ||
| Filed on Jan. 10, 2006, as Appl. No. 11/328,179. | ||
| Application 11/328179 is a continuation of application No. 10/981590, filed on Nov. 05, 2004, granted, now 6,985,280. | ||
| Application 10/981590 is a continuation of application No. 10/630871, filed on Jul. 31, 2003, granted, now 6,831,768, filed on Dec. 14, 2004. | ||
| Prior Publication US 2006/0114546 A1, Jun. 01, 2006 | ||
| Int. Cl. G02B 26/00 (2006.01); G03B 27/54 (2006.01) | ||
| U.S. Cl. 359—290 [355/87] | 3 Claims |
| 1. A maskless lithography system, comprising:
an illumination source;
an object configured to be exposed to produce a pattern; and
a controller, wherein:
the controller modulates a power of a light beam from the illumination source that exposes the object to produce a range of
grayscale levels on the object;
the pattern is produced by the light beam having a first power;
the controller overlaps the pattern with a light beam having a second power to produce an overlapping exposure;
the overlapping exposure creates a different range of grayscale levels on the object; and
the controller repeats the overlapping step until a desired number of grayscale levels is achieved.
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