| US 7,462,028 B2 | ||
| Partial vacuum environment imprinting | ||
| Anshuman Cherala, Austin, Tex. (US); Pankaj B. Lad, DeSoto, Tex. (US); Ian M. McMackin, Austin, Tex. (US); and Byung-Jin Choi, Austin, Tex. (US) | ||
| Assigned to Molecular Imprints, Inc., Austin, Tex. (US) | ||
| Filed on Apr. 02, 2007, as Appl. No. 11/695,263. | ||
| Claims priority of provisional application 60/788779, filed on Apr. 03, 2006. | ||
| Prior Publication US 2007/0275114 A1, Nov. 29, 2007 | ||
| Int. Cl. B28B 11/08 (2006.01) | ||
| U.S. Cl. 425—385 [425/388] | 5 Claims |
| 1. A system for creating a specific environment during a nanolithography imprinting process, comprising:
a substrate disposed on a chuck surface;
a template stage having an air bearing reference surface;
an air bearing surface disposed around the substrate and interfacing with the air bearing reference surface creating an interface
gap;
a template coupled to the template stage and positioned in close proximity to the substrate creating a controlled volume surrounding
a nano-imprint mold on the template and the substrate; and
a means for creating a partial vacuum in the controlled volume surrounding the nano-imprint mold and the substrate thereby
enabling a gas flow through the interface gap and the controlled volume to create the specific environment in the controlled
volume.
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