US 11,835,106 B2
Method for manufacturing damper device, lithographic apparatus, projection system, and device manufacturing method
Derk Ten Hoopen, Zevenaar (NL); Francois-Xavier Debiesme, Eindhoven (NL); and Eric Pierre-Yves Vennat, Veldhoven (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 16/772,406
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Nov. 15, 2018, PCT No. PCT/EP2018/081326
§ 371(c)(1), (2) Date Jun. 12, 2020,
PCT Pub. No. WO2019/115134, PCT Pub. Date Jun. 20, 2019.
Claims priority of application No. 17207548 (EP), filed on Dec. 15, 2017.
Prior Publication US 2021/0079971 A1, Mar. 18, 2021
Int. Cl. G03F 7/20 (2006.01); F16F 9/30 (2006.01); F16F 9/32 (2006.01); G03F 7/00 (2006.01)
CPC F16F 9/306 (2013.01) [F16F 9/3207 (2013.01); G03F 7/70808 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A method for manufacturing a damper device including a first part and a second part, wherein the first part and second part each contain blade portions that extend toward each other and form a space, said method comprising the following steps:
providing a compressed damping material in the space between the blade portions of the first and second parts, or
compressing a damping material in the space between the blade portions of the first and second parts; and
heating the damper device to a predetermined temperature to adhere the damping material to the first part and the second part,
wherein the first part of the damper device is disposed at a first end of the damper device and is configured to connect to a first device and the second part of the damper device is disposed at a second end of the damper device and is configured to connect to a second device such that the damper device provides damping between the first and second devices.