CPC C12Q 1/6844 (2013.01) [B01J 19/0046 (2013.01); C12Q 1/686 (2013.01); C40B 50/18 (2013.01); B01J 2219/00529 (2013.01); B01J 2219/00608 (2013.01); B01J 2219/00621 (2013.01); B01J 2219/00637 (2013.01); B01J 2219/00641 (2013.01); B01J 2219/00644 (2013.01); B01J 2219/00648 (2013.01); B01J 2219/00653 (2013.01); B01J 2219/00659 (2013.01); B01J 2219/00662 (2013.01); B01J 2219/00722 (2013.01); B01J 2219/00788 (2013.01); C40B 40/06 (2013.01)] | 18 Claims |
1. A method comprising:
forming a patterned substrate that comprises a plurality of base pads, using a nano-imprint lithography process, wherein forming the patterned substrate comprises:
forming a transfer layer on a substrate die;
forming an imprint resist layer on the transfer layer;
contacting the imprint resist layer with a working mold, the working mold comprising a plurality of lands separated by recessed portions, and creating in the imprint resist layer a plurality of imprint resist regions separated by transfer regions at which portions of the transfer layer are exposed from the imprint resist layer;
at least partially curing the imprint resist regions;
removing the exposed portions of the transfer layer at the transfer regions so as to expose portions of the substrate die;
depositing a deposition material on the imprint resist regions and the exposed portions of the substrate die so as to form the base pads on the substrate die; and
removing portions of the transfer layer, imprint resist layer, and deposition material from the substrate die at locations other than the base pads; and
attaching a capture substance to each of the plurality of base pads, optionally through a linker, the capture substance being adapted to promote capture of a target molecule.
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