US 7,460,220 B2
Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected
Shunji Maeda, Yokohama (Japan); Yasuhiko Nakayama, Yokohama (Japan); Minoru Yoshida, Yokohama (Japan); Hitoshi Kubota, Fujisawa (Japan); and Kenji Oka, Fujisawa (Japan)
Assigned to Renesas Technology Corporation, Tokyo (Japan)
Filed on Nov. 29, 2006, as Appl. No. 11/605,242.
Application 11/605242 is a continuation of application No. 10/686584, filed on Oct. 17, 2003, granted, now 7,180,584.
Application 10/686584 is a continuation of application No. 10/098478, filed on Mar. 18, 2002, granted, now 7,061,600.
Application 10/098478 is a continuation of application No. 09/588201, filed on Jun. 06, 2000, granted, now 6,404,498.
Application 09/588201 is a continuation of application No. 09/107432, filed on Jun. 30, 1998, granted, now 6,263,099.
Application 09/107432 is a continuation of application No. 08/539886, filed on Oct. 06, 1995, granted, now 5,774,222.
Claims priority of application No. 6-268130 (JP), filed on Oct. 07, 1994.
Prior Publication US 2007/0070336 A1, Mar. 29, 2007
Int. Cl. G01N 21/00 (2006.01)
U.S. Cl. 356—237.2  [356/237.5] 11 Claims
OG exemplary drawing
 
1. A method of inspecting a specimen, comprising:
emitting a light from a lamp of a light source;
illuminating a specimen on which plural patterns are formed with the light emitted from the light source and, passed through an objective lens;
forming an optical image of the specimen by collecting light reflected from the specimen by the illuminating and passed through the objective lens and a image forming lens;
detecting the optical image with a TDI image sensor; and
processing a signal from the TDI image sensor and detecting a defect of a pattern among the plural patterns formed on the specimen,
wherein an accumulation time of the TDI image sensor is controlled based on an intensity of the light detected by the TDI image sensor, and the optical image detected by the TDI image sensor is formed with light having a wavelength selected from the wavelengths of the light emitted from the light source.